Abstract

The coupling effect between a 355 nm laser and a 1064 nm laser in damage initiation and morphology formation was investigated on beam splitters. When extra 1064 nm pulse energy was low, 355 nm laser-induced damage thresholds (LIDTs) increased because of laser conditioning, and when 1064 nm pulse energy was high enough, 355 nm LIDTs decreased. Damage morphologies were also studied to explore the damage mechanism at respective wavelengths. For the entirely different electric field intensity distributions, 355 nm laser-induced damages were mainly from nanometer-sized absorbers at upper interfaces, while initiators for the 1064 nm laser were located at substrate-coating interface or substrate subsurface. Under simultaneous illumination, the sensitive defects were still the precursors, and damages also showed the representative damage characteristics induced by a single laser, namely, 355 nm laser-induced small pits and 1064 nm laser-induced large delamination. Further studies also showed that, although the 1064 nm laser fluence was kept unchanged, delamination area grew with the increase of pits, which were induced by the 355 nm laser. A possible mechanism was proposed to interpret the delamination area growth phenomenon.

© 2012 Optical Society of America

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    [CrossRef]
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    [CrossRef]
  4. G. Liu, M. Zhou, G. Hu, X. Liu, Y. Jin, H. He, and Z. Fan, “Calculation of temperature fields with a film-substrate interfacial layer model to discuss the layer-pair number effects on the damage thresholds of LaF3/MgF2 high reflectors at 355 nm,” Appl. Surf. Sci. 256, 4206–4210 (2010).
    [CrossRef]
  5. L. Xiaofeng, Z. Yuan’an, L. Dawei, G. Hu, Y. Gao, F. Zhengxiu, and S. Jianda, “Characteristics of plasma scalds in multilayer dielectric films,” Appl. Opt. 50, 4226–4231 (2011).
    [CrossRef]
  6. C. Wei, H. He, J. Shao, T. Wang, D. Zhang, and Z. Fan, “Effects of CO2 laser conditioning of the antireflection Y2O3/SiO2coatings at 351 nm,” Opt. Commun. 252, 336–343(2005).
    [CrossRef]
  7. S. Papernov and A. W. Schmid, “Localized absorption effects during 351 nm, pulsed laser irradiation of dielectric multilayer thin films,” J. Appl. Phys. 82, 5422 (1997).
    [CrossRef]
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    [CrossRef]
  9. P. DeMange, R. A. Negres, A. M. Rubenchik, H. B. Radousky, M. D. Feit, and S. G. Demos, “Understanding and predicting the damage performance of KDxH2−xPO4 crystals under simultaneous exposure to 532- and 355-nm pulses,” Appl. Phys. Lett. 89, 181922 (2006).
    [CrossRef]
  10. S. Reyne, M. Loiseau, G. Duchateau, J.-Y. Natoli, and L. Lamaignere, “Toward a better understanding of multi-wavelength effects on KDP crystals,” Proc. SPIE 7361, 73610Z(2009).
    [CrossRef]
  11. P. DeMange, R. A. Negres, C. W. Carr, H. B. Radousky, and S. G. Demos, “Multi-wavelength investigation of laser-induced defect reactions in KDP leading to enhanced damage resistance,” in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science and Photonic Applications Systems Technologies, Technical Digest (CD) (Optical Society of America, 2005), paper JFB7.
  12. M. A. Norton, E. E. Donohue, M. D. Feit, R. P. Hackel, W. G. Hollingsworth, A. M. Rubenchik, and M. L. Spaeth, “Growth of laser damage in SiO2 under multiple wavelength irradiation,” Proc. SPIE 5991, 91–102 (2005).
    [CrossRef]
  13. M. A. Norton, A. V. Carr, C. W. Carr, E. E. Donohue, M. D. Feit, W. G. Hollingsworth, Z. Liao, R. A. Negres, A. M. Rubenchik, and P. J. Wegner, “Laser damage growth in fused silica with simultaneous 351 nm and 1053 nm irradiation,” Proc. SPIE 7132, 71321H (2008).
    [CrossRef]
  14. M. Zhou, J. D. Shao, Z. X. Fan, Y. A. Zhao, and D. W. Li, “Effect of multiple wavelengths combination on laser-induced damage in multilayer mirrors,” Opt. Express 17, 20313–20320 (2009).
    [CrossRef]
  15. M. Zhou, J. Shao, Z. Fan, X. Ling, and S. Li, “The coupling effect of simultaneous multi-wavelength irradiation on multilayer thin-films,” Opt. Commun. 283, 3320–3323(2010).
    [CrossRef]
  16. M. Zhou, J. Shao, Z. Fan, G. Hu, and Y. Shan, “Damage performance of thin-film beam splitter for third harmonic separation under simultaneous exposure to 1ω and 3ω pulses,” Opt. Commun. 282, 3132–3135 (2009).
    [CrossRef]
  17. M. Zhou, Y. A. Zhao, X. L. Ling, S. H. Li, J. D. Shao, and Z. X. Fan, “Damage performance of multilayer films under simultaneous exposure to multi-wavelength pulses,” Chin. Phys. Lett. 26, (2009).
  18. J. Capoulade, L. Gallais, J.-Y. Natoli, and M. Commandré, “Multiscale analysis of the laser-induced damage threshold in optical coatings,” Appl. Opt. 47, 5272–5280 (2008).
    [CrossRef]
  19. K. R. Manes, H. G. Ahlstrom, R. A. Haas, and J. F. Holzrichter, “Light-plasma interaction studies with high-power glass laser,” J. Opt. Soc. Am. 67, 717–726 (1977).
    [CrossRef]
  20. J. Freidberg, R. Mitchell, R. Morse, and L. Rudsinski, “Resonant absorption of laser light by plasma targets,” Phys. Rev. Lett. 28, 795–799 (1972).
    [CrossRef]
  21. C. J. Stolz, F. Y. Génin, T. A. Reitter, N. E. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
    [CrossRef]

2011 (1)

2010 (2)

G. Liu, M. Zhou, G. Hu, X. Liu, Y. Jin, H. He, and Z. Fan, “Calculation of temperature fields with a film-substrate interfacial layer model to discuss the layer-pair number effects on the damage thresholds of LaF3/MgF2 high reflectors at 355 nm,” Appl. Surf. Sci. 256, 4206–4210 (2010).
[CrossRef]

M. Zhou, J. Shao, Z. Fan, X. Ling, and S. Li, “The coupling effect of simultaneous multi-wavelength irradiation on multilayer thin-films,” Opt. Commun. 283, 3320–3323(2010).
[CrossRef]

2009 (4)

M. Zhou, J. Shao, Z. Fan, G. Hu, and Y. Shan, “Damage performance of thin-film beam splitter for third harmonic separation under simultaneous exposure to 1ω and 3ω pulses,” Opt. Commun. 282, 3132–3135 (2009).
[CrossRef]

M. Zhou, Y. A. Zhao, X. L. Ling, S. H. Li, J. D. Shao, and Z. X. Fan, “Damage performance of multilayer films under simultaneous exposure to multi-wavelength pulses,” Chin. Phys. Lett. 26, (2009).

S. Reyne, M. Loiseau, G. Duchateau, J.-Y. Natoli, and L. Lamaignere, “Toward a better understanding of multi-wavelength effects on KDP crystals,” Proc. SPIE 7361, 73610Z(2009).
[CrossRef]

M. Zhou, J. D. Shao, Z. X. Fan, Y. A. Zhao, and D. W. Li, “Effect of multiple wavelengths combination on laser-induced damage in multilayer mirrors,” Opt. Express 17, 20313–20320 (2009).
[CrossRef]

2008 (3)

M. A. Norton, A. V. Carr, C. W. Carr, E. E. Donohue, M. D. Feit, W. G. Hollingsworth, Z. Liao, R. A. Negres, A. M. Rubenchik, and P. J. Wegner, “Laser damage growth in fused silica with simultaneous 351 nm and 1053 nm irradiation,” Proc. SPIE 7132, 71321H (2008).
[CrossRef]

J. Capoulade, L. Gallais, J.-Y. Natoli, and M. Commandré, “Multiscale analysis of the laser-induced damage threshold in optical coatings,” Appl. Opt. 47, 5272–5280 (2008).
[CrossRef]

P. DeMange, R. A. Negres, A. M. Rubenchik, H. B. Radousky, M. D. Feit, and S. G. Demos, “The energy coupling efficiency of multiwavelength laser pulses to damage initiating defects in deuterated KH2PO4 nonlinear crystals,” J. Appl. Phys. 103, 083122 (2008).
[CrossRef]

2007 (1)

L. Lamaignere, S. Reyne, M. Loiseau, J. C. Poncetta, and H. Bercegol, “Effects of wavelengths combination on initiation and growth of laser-induced surface damage in SiO2,” Proc. SPIE 6720, 67200F (2007).
[CrossRef]

2006 (1)

P. DeMange, R. A. Negres, A. M. Rubenchik, H. B. Radousky, M. D. Feit, and S. G. Demos, “Understanding and predicting the damage performance of KDxH2−xPO4 crystals under simultaneous exposure to 532- and 355-nm pulses,” Appl. Phys. Lett. 89, 181922 (2006).
[CrossRef]

2005 (2)

C. Wei, H. He, J. Shao, T. Wang, D. Zhang, and Z. Fan, “Effects of CO2 laser conditioning of the antireflection Y2O3/SiO2coatings at 351 nm,” Opt. Commun. 252, 336–343(2005).
[CrossRef]

M. A. Norton, E. E. Donohue, M. D. Feit, R. P. Hackel, W. G. Hollingsworth, A. M. Rubenchik, and M. L. Spaeth, “Growth of laser damage in SiO2 under multiple wavelength irradiation,” Proc. SPIE 5991, 91–102 (2005).
[CrossRef]

2004 (2)

X. Ma, Y. Wang, Z. Fan, and J. Shao, “Harmonic beam splitter design and fabrication,” Chin. Opt. Lett. 2, 670–672 (2004).

P. Wegner, J. Auerbach, T. Biesiada, S. Dixit, J. Lawson, J. Menapace, T. Parham, D. Swift, P. Whiteman, and W. Williams, “NIF final optics system: frequency conversion and beam conditioning,” Proc. SPIE 5341, 180–189 (2004).
[CrossRef]

1997 (2)

S. Papernov and A. W. Schmid, “Localized absorption effects during 351 nm, pulsed laser irradiation of dielectric multilayer thin films,” J. Appl. Phys. 82, 5422 (1997).
[CrossRef]

C. J. Stolz, F. Y. Génin, T. A. Reitter, N. E. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
[CrossRef]

1977 (1)

1972 (1)

J. Freidberg, R. Mitchell, R. Morse, and L. Rudsinski, “Resonant absorption of laser light by plasma targets,” Phys. Rev. Lett. 28, 795–799 (1972).
[CrossRef]

Ahlstrom, H. G.

Anzellotti, J. F.

C. J. Stolz, F. Y. Génin, T. A. Reitter, N. E. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
[CrossRef]

Auerbach, J.

P. Wegner, J. Auerbach, T. Biesiada, S. Dixit, J. Lawson, J. Menapace, T. Parham, D. Swift, P. Whiteman, and W. Williams, “NIF final optics system: frequency conversion and beam conditioning,” Proc. SPIE 5341, 180–189 (2004).
[CrossRef]

Bercegol, H.

L. Lamaignere, S. Reyne, M. Loiseau, J. C. Poncetta, and H. Bercegol, “Effects of wavelengths combination on initiation and growth of laser-induced surface damage in SiO2,” Proc. SPIE 6720, 67200F (2007).
[CrossRef]

Bevis, R. P.

C. J. Stolz, F. Y. Génin, T. A. Reitter, N. E. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
[CrossRef]

Biesiada, T.

P. Wegner, J. Auerbach, T. Biesiada, S. Dixit, J. Lawson, J. Menapace, T. Parham, D. Swift, P. Whiteman, and W. Williams, “NIF final optics system: frequency conversion and beam conditioning,” Proc. SPIE 5341, 180–189 (2004).
[CrossRef]

Capoulade, J.

Carr, A. V.

M. A. Norton, A. V. Carr, C. W. Carr, E. E. Donohue, M. D. Feit, W. G. Hollingsworth, Z. Liao, R. A. Negres, A. M. Rubenchik, and P. J. Wegner, “Laser damage growth in fused silica with simultaneous 351 nm and 1053 nm irradiation,” Proc. SPIE 7132, 71321H (2008).
[CrossRef]

Carr, C. W.

M. A. Norton, A. V. Carr, C. W. Carr, E. E. Donohue, M. D. Feit, W. G. Hollingsworth, Z. Liao, R. A. Negres, A. M. Rubenchik, and P. J. Wegner, “Laser damage growth in fused silica with simultaneous 351 nm and 1053 nm irradiation,” Proc. SPIE 7132, 71321H (2008).
[CrossRef]

P. DeMange, R. A. Negres, C. W. Carr, H. B. Radousky, and S. G. Demos, “Multi-wavelength investigation of laser-induced defect reactions in KDP leading to enhanced damage resistance,” in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science and Photonic Applications Systems Technologies, Technical Digest (CD) (Optical Society of America, 2005), paper JFB7.

Commandré, M.

Dawei, L.

DeMange, P.

P. DeMange, R. A. Negres, A. M. Rubenchik, H. B. Radousky, M. D. Feit, and S. G. Demos, “The energy coupling efficiency of multiwavelength laser pulses to damage initiating defects in deuterated KH2PO4 nonlinear crystals,” J. Appl. Phys. 103, 083122 (2008).
[CrossRef]

P. DeMange, R. A. Negres, A. M. Rubenchik, H. B. Radousky, M. D. Feit, and S. G. Demos, “Understanding and predicting the damage performance of KDxH2−xPO4 crystals under simultaneous exposure to 532- and 355-nm pulses,” Appl. Phys. Lett. 89, 181922 (2006).
[CrossRef]

P. DeMange, R. A. Negres, C. W. Carr, H. B. Radousky, and S. G. Demos, “Multi-wavelength investigation of laser-induced defect reactions in KDP leading to enhanced damage resistance,” in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science and Photonic Applications Systems Technologies, Technical Digest (CD) (Optical Society of America, 2005), paper JFB7.

Demos, S. G.

P. DeMange, R. A. Negres, A. M. Rubenchik, H. B. Radousky, M. D. Feit, and S. G. Demos, “The energy coupling efficiency of multiwavelength laser pulses to damage initiating defects in deuterated KH2PO4 nonlinear crystals,” J. Appl. Phys. 103, 083122 (2008).
[CrossRef]

P. DeMange, R. A. Negres, A. M. Rubenchik, H. B. Radousky, M. D. Feit, and S. G. Demos, “Understanding and predicting the damage performance of KDxH2−xPO4 crystals under simultaneous exposure to 532- and 355-nm pulses,” Appl. Phys. Lett. 89, 181922 (2006).
[CrossRef]

P. DeMange, R. A. Negres, C. W. Carr, H. B. Radousky, and S. G. Demos, “Multi-wavelength investigation of laser-induced defect reactions in KDP leading to enhanced damage resistance,” in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science and Photonic Applications Systems Technologies, Technical Digest (CD) (Optical Society of America, 2005), paper JFB7.

Dixit, S.

P. Wegner, J. Auerbach, T. Biesiada, S. Dixit, J. Lawson, J. Menapace, T. Parham, D. Swift, P. Whiteman, and W. Williams, “NIF final optics system: frequency conversion and beam conditioning,” Proc. SPIE 5341, 180–189 (2004).
[CrossRef]

Donohue, E. E.

M. A. Norton, A. V. Carr, C. W. Carr, E. E. Donohue, M. D. Feit, W. G. Hollingsworth, Z. Liao, R. A. Negres, A. M. Rubenchik, and P. J. Wegner, “Laser damage growth in fused silica with simultaneous 351 nm and 1053 nm irradiation,” Proc. SPIE 7132, 71321H (2008).
[CrossRef]

M. A. Norton, E. E. Donohue, M. D. Feit, R. P. Hackel, W. G. Hollingsworth, A. M. Rubenchik, and M. L. Spaeth, “Growth of laser damage in SiO2 under multiple wavelength irradiation,” Proc. SPIE 5991, 91–102 (2005).
[CrossRef]

Duchateau, G.

S. Reyne, M. Loiseau, G. Duchateau, J.-Y. Natoli, and L. Lamaignere, “Toward a better understanding of multi-wavelength effects on KDP crystals,” Proc. SPIE 7361, 73610Z(2009).
[CrossRef]

Fan, Z.

G. Liu, M. Zhou, G. Hu, X. Liu, Y. Jin, H. He, and Z. Fan, “Calculation of temperature fields with a film-substrate interfacial layer model to discuss the layer-pair number effects on the damage thresholds of LaF3/MgF2 high reflectors at 355 nm,” Appl. Surf. Sci. 256, 4206–4210 (2010).
[CrossRef]

M. Zhou, J. Shao, Z. Fan, X. Ling, and S. Li, “The coupling effect of simultaneous multi-wavelength irradiation on multilayer thin-films,” Opt. Commun. 283, 3320–3323(2010).
[CrossRef]

M. Zhou, J. Shao, Z. Fan, G. Hu, and Y. Shan, “Damage performance of thin-film beam splitter for third harmonic separation under simultaneous exposure to 1ω and 3ω pulses,” Opt. Commun. 282, 3132–3135 (2009).
[CrossRef]

C. Wei, H. He, J. Shao, T. Wang, D. Zhang, and Z. Fan, “Effects of CO2 laser conditioning of the antireflection Y2O3/SiO2coatings at 351 nm,” Opt. Commun. 252, 336–343(2005).
[CrossRef]

X. Ma, Y. Wang, Z. Fan, and J. Shao, “Harmonic beam splitter design and fabrication,” Chin. Opt. Lett. 2, 670–672 (2004).

Fan, Z. X.

M. Zhou, Y. A. Zhao, X. L. Ling, S. H. Li, J. D. Shao, and Z. X. Fan, “Damage performance of multilayer films under simultaneous exposure to multi-wavelength pulses,” Chin. Phys. Lett. 26, (2009).

M. Zhou, J. D. Shao, Z. X. Fan, Y. A. Zhao, and D. W. Li, “Effect of multiple wavelengths combination on laser-induced damage in multilayer mirrors,” Opt. Express 17, 20313–20320 (2009).
[CrossRef]

Feit, M. D.

P. DeMange, R. A. Negres, A. M. Rubenchik, H. B. Radousky, M. D. Feit, and S. G. Demos, “The energy coupling efficiency of multiwavelength laser pulses to damage initiating defects in deuterated KH2PO4 nonlinear crystals,” J. Appl. Phys. 103, 083122 (2008).
[CrossRef]

M. A. Norton, A. V. Carr, C. W. Carr, E. E. Donohue, M. D. Feit, W. G. Hollingsworth, Z. Liao, R. A. Negres, A. M. Rubenchik, and P. J. Wegner, “Laser damage growth in fused silica with simultaneous 351 nm and 1053 nm irradiation,” Proc. SPIE 7132, 71321H (2008).
[CrossRef]

P. DeMange, R. A. Negres, A. M. Rubenchik, H. B. Radousky, M. D. Feit, and S. G. Demos, “Understanding and predicting the damage performance of KDxH2−xPO4 crystals under simultaneous exposure to 532- and 355-nm pulses,” Appl. Phys. Lett. 89, 181922 (2006).
[CrossRef]

M. A. Norton, E. E. Donohue, M. D. Feit, R. P. Hackel, W. G. Hollingsworth, A. M. Rubenchik, and M. L. Spaeth, “Growth of laser damage in SiO2 under multiple wavelength irradiation,” Proc. SPIE 5991, 91–102 (2005).
[CrossRef]

Freidberg, J.

J. Freidberg, R. Mitchell, R. Morse, and L. Rudsinski, “Resonant absorption of laser light by plasma targets,” Phys. Rev. Lett. 28, 795–799 (1972).
[CrossRef]

Gallais, L.

Gao, Y.

Génin, F. Y.

C. J. Stolz, F. Y. Génin, T. A. Reitter, N. E. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
[CrossRef]

Haas, R. A.

Hackel, R. P.

M. A. Norton, E. E. Donohue, M. D. Feit, R. P. Hackel, W. G. Hollingsworth, A. M. Rubenchik, and M. L. Spaeth, “Growth of laser damage in SiO2 under multiple wavelength irradiation,” Proc. SPIE 5991, 91–102 (2005).
[CrossRef]

He, H.

G. Liu, M. Zhou, G. Hu, X. Liu, Y. Jin, H. He, and Z. Fan, “Calculation of temperature fields with a film-substrate interfacial layer model to discuss the layer-pair number effects on the damage thresholds of LaF3/MgF2 high reflectors at 355 nm,” Appl. Surf. Sci. 256, 4206–4210 (2010).
[CrossRef]

C. Wei, H. He, J. Shao, T. Wang, D. Zhang, and Z. Fan, “Effects of CO2 laser conditioning of the antireflection Y2O3/SiO2coatings at 351 nm,” Opt. Commun. 252, 336–343(2005).
[CrossRef]

Hollingsworth, W. G.

M. A. Norton, A. V. Carr, C. W. Carr, E. E. Donohue, M. D. Feit, W. G. Hollingsworth, Z. Liao, R. A. Negres, A. M. Rubenchik, and P. J. Wegner, “Laser damage growth in fused silica with simultaneous 351 nm and 1053 nm irradiation,” Proc. SPIE 7132, 71321H (2008).
[CrossRef]

M. A. Norton, E. E. Donohue, M. D. Feit, R. P. Hackel, W. G. Hollingsworth, A. M. Rubenchik, and M. L. Spaeth, “Growth of laser damage in SiO2 under multiple wavelength irradiation,” Proc. SPIE 5991, 91–102 (2005).
[CrossRef]

Holzrichter, J. F.

Hu, G.

L. Xiaofeng, Z. Yuan’an, L. Dawei, G. Hu, Y. Gao, F. Zhengxiu, and S. Jianda, “Characteristics of plasma scalds in multilayer dielectric films,” Appl. Opt. 50, 4226–4231 (2011).
[CrossRef]

G. Liu, M. Zhou, G. Hu, X. Liu, Y. Jin, H. He, and Z. Fan, “Calculation of temperature fields with a film-substrate interfacial layer model to discuss the layer-pair number effects on the damage thresholds of LaF3/MgF2 high reflectors at 355 nm,” Appl. Surf. Sci. 256, 4206–4210 (2010).
[CrossRef]

M. Zhou, J. Shao, Z. Fan, G. Hu, and Y. Shan, “Damage performance of thin-film beam splitter for third harmonic separation under simultaneous exposure to 1ω and 3ω pulses,” Opt. Commun. 282, 3132–3135 (2009).
[CrossRef]

Jianda, S.

Jin, Y.

G. Liu, M. Zhou, G. Hu, X. Liu, Y. Jin, H. He, and Z. Fan, “Calculation of temperature fields with a film-substrate interfacial layer model to discuss the layer-pair number effects on the damage thresholds of LaF3/MgF2 high reflectors at 355 nm,” Appl. Surf. Sci. 256, 4206–4210 (2010).
[CrossRef]

Lamaignere, L.

S. Reyne, M. Loiseau, G. Duchateau, J.-Y. Natoli, and L. Lamaignere, “Toward a better understanding of multi-wavelength effects on KDP crystals,” Proc. SPIE 7361, 73610Z(2009).
[CrossRef]

L. Lamaignere, S. Reyne, M. Loiseau, J. C. Poncetta, and H. Bercegol, “Effects of wavelengths combination on initiation and growth of laser-induced surface damage in SiO2,” Proc. SPIE 6720, 67200F (2007).
[CrossRef]

Lawson, J.

P. Wegner, J. Auerbach, T. Biesiada, S. Dixit, J. Lawson, J. Menapace, T. Parham, D. Swift, P. Whiteman, and W. Williams, “NIF final optics system: frequency conversion and beam conditioning,” Proc. SPIE 5341, 180–189 (2004).
[CrossRef]

Li, D. W.

Li, S.

M. Zhou, J. Shao, Z. Fan, X. Ling, and S. Li, “The coupling effect of simultaneous multi-wavelength irradiation on multilayer thin-films,” Opt. Commun. 283, 3320–3323(2010).
[CrossRef]

Li, S. H.

M. Zhou, Y. A. Zhao, X. L. Ling, S. H. Li, J. D. Shao, and Z. X. Fan, “Damage performance of multilayer films under simultaneous exposure to multi-wavelength pulses,” Chin. Phys. Lett. 26, (2009).

Liao, Z.

M. A. Norton, A. V. Carr, C. W. Carr, E. E. Donohue, M. D. Feit, W. G. Hollingsworth, Z. Liao, R. A. Negres, A. M. Rubenchik, and P. J. Wegner, “Laser damage growth in fused silica with simultaneous 351 nm and 1053 nm irradiation,” Proc. SPIE 7132, 71321H (2008).
[CrossRef]

Ling, X.

M. Zhou, J. Shao, Z. Fan, X. Ling, and S. Li, “The coupling effect of simultaneous multi-wavelength irradiation on multilayer thin-films,” Opt. Commun. 283, 3320–3323(2010).
[CrossRef]

Ling, X. L.

M. Zhou, Y. A. Zhao, X. L. Ling, S. H. Li, J. D. Shao, and Z. X. Fan, “Damage performance of multilayer films under simultaneous exposure to multi-wavelength pulses,” Chin. Phys. Lett. 26, (2009).

Liu, G.

G. Liu, M. Zhou, G. Hu, X. Liu, Y. Jin, H. He, and Z. Fan, “Calculation of temperature fields with a film-substrate interfacial layer model to discuss the layer-pair number effects on the damage thresholds of LaF3/MgF2 high reflectors at 355 nm,” Appl. Surf. Sci. 256, 4206–4210 (2010).
[CrossRef]

Liu, X.

G. Liu, M. Zhou, G. Hu, X. Liu, Y. Jin, H. He, and Z. Fan, “Calculation of temperature fields with a film-substrate interfacial layer model to discuss the layer-pair number effects on the damage thresholds of LaF3/MgF2 high reflectors at 355 nm,” Appl. Surf. Sci. 256, 4206–4210 (2010).
[CrossRef]

Loiseau, M.

S. Reyne, M. Loiseau, G. Duchateau, J.-Y. Natoli, and L. Lamaignere, “Toward a better understanding of multi-wavelength effects on KDP crystals,” Proc. SPIE 7361, 73610Z(2009).
[CrossRef]

L. Lamaignere, S. Reyne, M. Loiseau, J. C. Poncetta, and H. Bercegol, “Effects of wavelengths combination on initiation and growth of laser-induced surface damage in SiO2,” Proc. SPIE 6720, 67200F (2007).
[CrossRef]

Ma, X.

Manes, K. R.

Menapace, J.

P. Wegner, J. Auerbach, T. Biesiada, S. Dixit, J. Lawson, J. Menapace, T. Parham, D. Swift, P. Whiteman, and W. Williams, “NIF final optics system: frequency conversion and beam conditioning,” Proc. SPIE 5341, 180–189 (2004).
[CrossRef]

Mitchell, R.

J. Freidberg, R. Mitchell, R. Morse, and L. Rudsinski, “Resonant absorption of laser light by plasma targets,” Phys. Rev. Lett. 28, 795–799 (1972).
[CrossRef]

Molau, N. E.

C. J. Stolz, F. Y. Génin, T. A. Reitter, N. E. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
[CrossRef]

Morse, R.

J. Freidberg, R. Mitchell, R. Morse, and L. Rudsinski, “Resonant absorption of laser light by plasma targets,” Phys. Rev. Lett. 28, 795–799 (1972).
[CrossRef]

Natoli, J.-Y.

S. Reyne, M. Loiseau, G. Duchateau, J.-Y. Natoli, and L. Lamaignere, “Toward a better understanding of multi-wavelength effects on KDP crystals,” Proc. SPIE 7361, 73610Z(2009).
[CrossRef]

J. Capoulade, L. Gallais, J.-Y. Natoli, and M. Commandré, “Multiscale analysis of the laser-induced damage threshold in optical coatings,” Appl. Opt. 47, 5272–5280 (2008).
[CrossRef]

Negres, R. A.

P. DeMange, R. A. Negres, A. M. Rubenchik, H. B. Radousky, M. D. Feit, and S. G. Demos, “The energy coupling efficiency of multiwavelength laser pulses to damage initiating defects in deuterated KH2PO4 nonlinear crystals,” J. Appl. Phys. 103, 083122 (2008).
[CrossRef]

M. A. Norton, A. V. Carr, C. W. Carr, E. E. Donohue, M. D. Feit, W. G. Hollingsworth, Z. Liao, R. A. Negres, A. M. Rubenchik, and P. J. Wegner, “Laser damage growth in fused silica with simultaneous 351 nm and 1053 nm irradiation,” Proc. SPIE 7132, 71321H (2008).
[CrossRef]

P. DeMange, R. A. Negres, A. M. Rubenchik, H. B. Radousky, M. D. Feit, and S. G. Demos, “Understanding and predicting the damage performance of KDxH2−xPO4 crystals under simultaneous exposure to 532- and 355-nm pulses,” Appl. Phys. Lett. 89, 181922 (2006).
[CrossRef]

P. DeMange, R. A. Negres, C. W. Carr, H. B. Radousky, and S. G. Demos, “Multi-wavelength investigation of laser-induced defect reactions in KDP leading to enhanced damage resistance,” in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science and Photonic Applications Systems Technologies, Technical Digest (CD) (Optical Society of America, 2005), paper JFB7.

Norton, M. A.

M. A. Norton, A. V. Carr, C. W. Carr, E. E. Donohue, M. D. Feit, W. G. Hollingsworth, Z. Liao, R. A. Negres, A. M. Rubenchik, and P. J. Wegner, “Laser damage growth in fused silica with simultaneous 351 nm and 1053 nm irradiation,” Proc. SPIE 7132, 71321H (2008).
[CrossRef]

M. A. Norton, E. E. Donohue, M. D. Feit, R. P. Hackel, W. G. Hollingsworth, A. M. Rubenchik, and M. L. Spaeth, “Growth of laser damage in SiO2 under multiple wavelength irradiation,” Proc. SPIE 5991, 91–102 (2005).
[CrossRef]

Papernov, S.

S. Papernov and A. W. Schmid, “Localized absorption effects during 351 nm, pulsed laser irradiation of dielectric multilayer thin films,” J. Appl. Phys. 82, 5422 (1997).
[CrossRef]

Parham, T.

P. Wegner, J. Auerbach, T. Biesiada, S. Dixit, J. Lawson, J. Menapace, T. Parham, D. Swift, P. Whiteman, and W. Williams, “NIF final optics system: frequency conversion and beam conditioning,” Proc. SPIE 5341, 180–189 (2004).
[CrossRef]

Poncetta, J. C.

L. Lamaignere, S. Reyne, M. Loiseau, J. C. Poncetta, and H. Bercegol, “Effects of wavelengths combination on initiation and growth of laser-induced surface damage in SiO2,” Proc. SPIE 6720, 67200F (2007).
[CrossRef]

Radousky, H. B.

P. DeMange, R. A. Negres, A. M. Rubenchik, H. B. Radousky, M. D. Feit, and S. G. Demos, “The energy coupling efficiency of multiwavelength laser pulses to damage initiating defects in deuterated KH2PO4 nonlinear crystals,” J. Appl. Phys. 103, 083122 (2008).
[CrossRef]

P. DeMange, R. A. Negres, A. M. Rubenchik, H. B. Radousky, M. D. Feit, and S. G. Demos, “Understanding and predicting the damage performance of KDxH2−xPO4 crystals under simultaneous exposure to 532- and 355-nm pulses,” Appl. Phys. Lett. 89, 181922 (2006).
[CrossRef]

P. DeMange, R. A. Negres, C. W. Carr, H. B. Radousky, and S. G. Demos, “Multi-wavelength investigation of laser-induced defect reactions in KDP leading to enhanced damage resistance,” in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science and Photonic Applications Systems Technologies, Technical Digest (CD) (Optical Society of America, 2005), paper JFB7.

Reitter, T. A.

C. J. Stolz, F. Y. Génin, T. A. Reitter, N. E. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
[CrossRef]

Reyne, S.

S. Reyne, M. Loiseau, G. Duchateau, J.-Y. Natoli, and L. Lamaignere, “Toward a better understanding of multi-wavelength effects on KDP crystals,” Proc. SPIE 7361, 73610Z(2009).
[CrossRef]

L. Lamaignere, S. Reyne, M. Loiseau, J. C. Poncetta, and H. Bercegol, “Effects of wavelengths combination on initiation and growth of laser-induced surface damage in SiO2,” Proc. SPIE 6720, 67200F (2007).
[CrossRef]

Rubenchik, A. M.

M. A. Norton, A. V. Carr, C. W. Carr, E. E. Donohue, M. D. Feit, W. G. Hollingsworth, Z. Liao, R. A. Negres, A. M. Rubenchik, and P. J. Wegner, “Laser damage growth in fused silica with simultaneous 351 nm and 1053 nm irradiation,” Proc. SPIE 7132, 71321H (2008).
[CrossRef]

P. DeMange, R. A. Negres, A. M. Rubenchik, H. B. Radousky, M. D. Feit, and S. G. Demos, “The energy coupling efficiency of multiwavelength laser pulses to damage initiating defects in deuterated KH2PO4 nonlinear crystals,” J. Appl. Phys. 103, 083122 (2008).
[CrossRef]

P. DeMange, R. A. Negres, A. M. Rubenchik, H. B. Radousky, M. D. Feit, and S. G. Demos, “Understanding and predicting the damage performance of KDxH2−xPO4 crystals under simultaneous exposure to 532- and 355-nm pulses,” Appl. Phys. Lett. 89, 181922 (2006).
[CrossRef]

M. A. Norton, E. E. Donohue, M. D. Feit, R. P. Hackel, W. G. Hollingsworth, A. M. Rubenchik, and M. L. Spaeth, “Growth of laser damage in SiO2 under multiple wavelength irradiation,” Proc. SPIE 5991, 91–102 (2005).
[CrossRef]

Rudsinski, L.

J. Freidberg, R. Mitchell, R. Morse, and L. Rudsinski, “Resonant absorption of laser light by plasma targets,” Phys. Rev. Lett. 28, 795–799 (1972).
[CrossRef]

Schmid, A. W.

S. Papernov and A. W. Schmid, “Localized absorption effects during 351 nm, pulsed laser irradiation of dielectric multilayer thin films,” J. Appl. Phys. 82, 5422 (1997).
[CrossRef]

Shan, Y.

M. Zhou, J. Shao, Z. Fan, G. Hu, and Y. Shan, “Damage performance of thin-film beam splitter for third harmonic separation under simultaneous exposure to 1ω and 3ω pulses,” Opt. Commun. 282, 3132–3135 (2009).
[CrossRef]

Shao, J.

M. Zhou, J. Shao, Z. Fan, X. Ling, and S. Li, “The coupling effect of simultaneous multi-wavelength irradiation on multilayer thin-films,” Opt. Commun. 283, 3320–3323(2010).
[CrossRef]

M. Zhou, J. Shao, Z. Fan, G. Hu, and Y. Shan, “Damage performance of thin-film beam splitter for third harmonic separation under simultaneous exposure to 1ω and 3ω pulses,” Opt. Commun. 282, 3132–3135 (2009).
[CrossRef]

C. Wei, H. He, J. Shao, T. Wang, D. Zhang, and Z. Fan, “Effects of CO2 laser conditioning of the antireflection Y2O3/SiO2coatings at 351 nm,” Opt. Commun. 252, 336–343(2005).
[CrossRef]

X. Ma, Y. Wang, Z. Fan, and J. Shao, “Harmonic beam splitter design and fabrication,” Chin. Opt. Lett. 2, 670–672 (2004).

Shao, J. D.

M. Zhou, Y. A. Zhao, X. L. Ling, S. H. Li, J. D. Shao, and Z. X. Fan, “Damage performance of multilayer films under simultaneous exposure to multi-wavelength pulses,” Chin. Phys. Lett. 26, (2009).

M. Zhou, J. D. Shao, Z. X. Fan, Y. A. Zhao, and D. W. Li, “Effect of multiple wavelengths combination on laser-induced damage in multilayer mirrors,” Opt. Express 17, 20313–20320 (2009).
[CrossRef]

Smith, D. J.

C. J. Stolz, F. Y. Génin, T. A. Reitter, N. E. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
[CrossRef]

Spaeth, M. L.

M. A. Norton, E. E. Donohue, M. D. Feit, R. P. Hackel, W. G. Hollingsworth, A. M. Rubenchik, and M. L. Spaeth, “Growth of laser damage in SiO2 under multiple wavelength irradiation,” Proc. SPIE 5991, 91–102 (2005).
[CrossRef]

Stolz, C. J.

C. J. Stolz, F. Y. Génin, T. A. Reitter, N. E. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
[CrossRef]

Swift, D.

P. Wegner, J. Auerbach, T. Biesiada, S. Dixit, J. Lawson, J. Menapace, T. Parham, D. Swift, P. Whiteman, and W. Williams, “NIF final optics system: frequency conversion and beam conditioning,” Proc. SPIE 5341, 180–189 (2004).
[CrossRef]

von Gunten, M. K.

C. J. Stolz, F. Y. Génin, T. A. Reitter, N. E. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
[CrossRef]

Wang, T.

C. Wei, H. He, J. Shao, T. Wang, D. Zhang, and Z. Fan, “Effects of CO2 laser conditioning of the antireflection Y2O3/SiO2coatings at 351 nm,” Opt. Commun. 252, 336–343(2005).
[CrossRef]

Wang, Y.

Wegner, P.

P. Wegner, J. Auerbach, T. Biesiada, S. Dixit, J. Lawson, J. Menapace, T. Parham, D. Swift, P. Whiteman, and W. Williams, “NIF final optics system: frequency conversion and beam conditioning,” Proc. SPIE 5341, 180–189 (2004).
[CrossRef]

Wegner, P. J.

M. A. Norton, A. V. Carr, C. W. Carr, E. E. Donohue, M. D. Feit, W. G. Hollingsworth, Z. Liao, R. A. Negres, A. M. Rubenchik, and P. J. Wegner, “Laser damage growth in fused silica with simultaneous 351 nm and 1053 nm irradiation,” Proc. SPIE 7132, 71321H (2008).
[CrossRef]

Wei, C.

C. Wei, H. He, J. Shao, T. Wang, D. Zhang, and Z. Fan, “Effects of CO2 laser conditioning of the antireflection Y2O3/SiO2coatings at 351 nm,” Opt. Commun. 252, 336–343(2005).
[CrossRef]

Whiteman, P.

P. Wegner, J. Auerbach, T. Biesiada, S. Dixit, J. Lawson, J. Menapace, T. Parham, D. Swift, P. Whiteman, and W. Williams, “NIF final optics system: frequency conversion and beam conditioning,” Proc. SPIE 5341, 180–189 (2004).
[CrossRef]

Williams, W.

P. Wegner, J. Auerbach, T. Biesiada, S. Dixit, J. Lawson, J. Menapace, T. Parham, D. Swift, P. Whiteman, and W. Williams, “NIF final optics system: frequency conversion and beam conditioning,” Proc. SPIE 5341, 180–189 (2004).
[CrossRef]

Xiaofeng, L.

Yuan’an, Z.

Zhang, D.

C. Wei, H. He, J. Shao, T. Wang, D. Zhang, and Z. Fan, “Effects of CO2 laser conditioning of the antireflection Y2O3/SiO2coatings at 351 nm,” Opt. Commun. 252, 336–343(2005).
[CrossRef]

Zhao, Y. A.

M. Zhou, J. D. Shao, Z. X. Fan, Y. A. Zhao, and D. W. Li, “Effect of multiple wavelengths combination on laser-induced damage in multilayer mirrors,” Opt. Express 17, 20313–20320 (2009).
[CrossRef]

M. Zhou, Y. A. Zhao, X. L. Ling, S. H. Li, J. D. Shao, and Z. X. Fan, “Damage performance of multilayer films under simultaneous exposure to multi-wavelength pulses,” Chin. Phys. Lett. 26, (2009).

Zhengxiu, F.

Zhou, M.

G. Liu, M. Zhou, G. Hu, X. Liu, Y. Jin, H. He, and Z. Fan, “Calculation of temperature fields with a film-substrate interfacial layer model to discuss the layer-pair number effects on the damage thresholds of LaF3/MgF2 high reflectors at 355 nm,” Appl. Surf. Sci. 256, 4206–4210 (2010).
[CrossRef]

M. Zhou, J. Shao, Z. Fan, X. Ling, and S. Li, “The coupling effect of simultaneous multi-wavelength irradiation on multilayer thin-films,” Opt. Commun. 283, 3320–3323(2010).
[CrossRef]

M. Zhou, J. D. Shao, Z. X. Fan, Y. A. Zhao, and D. W. Li, “Effect of multiple wavelengths combination on laser-induced damage in multilayer mirrors,” Opt. Express 17, 20313–20320 (2009).
[CrossRef]

M. Zhou, J. Shao, Z. Fan, G. Hu, and Y. Shan, “Damage performance of thin-film beam splitter for third harmonic separation under simultaneous exposure to 1ω and 3ω pulses,” Opt. Commun. 282, 3132–3135 (2009).
[CrossRef]

M. Zhou, Y. A. Zhao, X. L. Ling, S. H. Li, J. D. Shao, and Z. X. Fan, “Damage performance of multilayer films under simultaneous exposure to multi-wavelength pulses,” Chin. Phys. Lett. 26, (2009).

Appl. Opt. (2)

Appl. Phys. Lett. (1)

P. DeMange, R. A. Negres, A. M. Rubenchik, H. B. Radousky, M. D. Feit, and S. G. Demos, “Understanding and predicting the damage performance of KDxH2−xPO4 crystals under simultaneous exposure to 532- and 355-nm pulses,” Appl. Phys. Lett. 89, 181922 (2006).
[CrossRef]

Appl. Surf. Sci. (1)

G. Liu, M. Zhou, G. Hu, X. Liu, Y. Jin, H. He, and Z. Fan, “Calculation of temperature fields with a film-substrate interfacial layer model to discuss the layer-pair number effects on the damage thresholds of LaF3/MgF2 high reflectors at 355 nm,” Appl. Surf. Sci. 256, 4206–4210 (2010).
[CrossRef]

Chin. Opt. Lett. (1)

Chin. Phys. Lett. (1)

M. Zhou, Y. A. Zhao, X. L. Ling, S. H. Li, J. D. Shao, and Z. X. Fan, “Damage performance of multilayer films under simultaneous exposure to multi-wavelength pulses,” Chin. Phys. Lett. 26, (2009).

J. Appl. Phys. (2)

S. Papernov and A. W. Schmid, “Localized absorption effects during 351 nm, pulsed laser irradiation of dielectric multilayer thin films,” J. Appl. Phys. 82, 5422 (1997).
[CrossRef]

P. DeMange, R. A. Negres, A. M. Rubenchik, H. B. Radousky, M. D. Feit, and S. G. Demos, “The energy coupling efficiency of multiwavelength laser pulses to damage initiating defects in deuterated KH2PO4 nonlinear crystals,” J. Appl. Phys. 103, 083122 (2008).
[CrossRef]

J. Opt. Soc. Am. (1)

Opt. Commun. (3)

C. Wei, H. He, J. Shao, T. Wang, D. Zhang, and Z. Fan, “Effects of CO2 laser conditioning of the antireflection Y2O3/SiO2coatings at 351 nm,” Opt. Commun. 252, 336–343(2005).
[CrossRef]

M. Zhou, J. Shao, Z. Fan, X. Ling, and S. Li, “The coupling effect of simultaneous multi-wavelength irradiation on multilayer thin-films,” Opt. Commun. 283, 3320–3323(2010).
[CrossRef]

M. Zhou, J. Shao, Z. Fan, G. Hu, and Y. Shan, “Damage performance of thin-film beam splitter for third harmonic separation under simultaneous exposure to 1ω and 3ω pulses,” Opt. Commun. 282, 3132–3135 (2009).
[CrossRef]

Opt. Express (1)

Phys. Rev. Lett. (1)

J. Freidberg, R. Mitchell, R. Morse, and L. Rudsinski, “Resonant absorption of laser light by plasma targets,” Phys. Rev. Lett. 28, 795–799 (1972).
[CrossRef]

Proc. SPIE (6)

C. J. Stolz, F. Y. Génin, T. A. Reitter, N. E. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
[CrossRef]

M. A. Norton, E. E. Donohue, M. D. Feit, R. P. Hackel, W. G. Hollingsworth, A. M. Rubenchik, and M. L. Spaeth, “Growth of laser damage in SiO2 under multiple wavelength irradiation,” Proc. SPIE 5991, 91–102 (2005).
[CrossRef]

M. A. Norton, A. V. Carr, C. W. Carr, E. E. Donohue, M. D. Feit, W. G. Hollingsworth, Z. Liao, R. A. Negres, A. M. Rubenchik, and P. J. Wegner, “Laser damage growth in fused silica with simultaneous 351 nm and 1053 nm irradiation,” Proc. SPIE 7132, 71321H (2008).
[CrossRef]

P. Wegner, J. Auerbach, T. Biesiada, S. Dixit, J. Lawson, J. Menapace, T. Parham, D. Swift, P. Whiteman, and W. Williams, “NIF final optics system: frequency conversion and beam conditioning,” Proc. SPIE 5341, 180–189 (2004).
[CrossRef]

L. Lamaignere, S. Reyne, M. Loiseau, J. C. Poncetta, and H. Bercegol, “Effects of wavelengths combination on initiation and growth of laser-induced surface damage in SiO2,” Proc. SPIE 6720, 67200F (2007).
[CrossRef]

S. Reyne, M. Loiseau, G. Duchateau, J.-Y. Natoli, and L. Lamaignere, “Toward a better understanding of multi-wavelength effects on KDP crystals,” Proc. SPIE 7361, 73610Z(2009).
[CrossRef]

Other (1)

P. DeMange, R. A. Negres, C. W. Carr, H. B. Radousky, and S. G. Demos, “Multi-wavelength investigation of laser-induced defect reactions in KDP leading to enhanced damage resistance,” in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science and Photonic Applications Systems Technologies, Technical Digest (CD) (Optical Society of America, 2005), paper JFB7.

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Figures (10)

Fig. 1.
Fig. 1.

Transmittance spectra of the coatings prepared using Hf/SiO2 with coating design G/0.56H0.9L(HL)160.77H2.35L/A.

Fig. 2.
Fig. 2.

Experimental setup for LIDT tests of films under simultaneous irradiation of 355 nm and 1064 nm lasers.

Fig. 3.
Fig. 3.

Images of the beam in the focal plane: near Gaussian beams, but the spots on the samples became eclipses.

Fig. 4.
Fig. 4.

Damage probabilities of the coatings induced by the 355 nm laser combined with low 1064 nm laser fluence.

Fig. 5.
Fig. 5.

Damage probabilities induced by the 355 nm laser combined with (a) high 1064 nm laser fluence, (b) super high 1064 nm laser fluence (higher than 355 nm LIDT), and the revision process.

Fig. 6.
Fig. 6.

LIDTs of all samples: for each point, x axis is the 1064 nm laser fluence and y axis is 355 nm LIDT.

Fig. 7.
Fig. 7.

Damage morphologies of the coatings under simultaneous irradiation when (a) 1064 nm laser fluence is low and did not initiate any deep damages, and (b) 1064 nm laser fluence is high enough to initiate damage independently during the same pulse.

Fig. 8.
Fig. 8.

Damage morphologies induced by (a) 19.0J/cm2 1064 nm laser fluence, and (b) 3.8J/cm2 355 nm laser fluence.

Fig. 9.
Fig. 9.

EFI distribution in the stack obtained by TFCalc: (a) 355 nm laser-induced damages are mainly initiated from the second and fourth interface, corresponding with the second and third peaks of EFI; (b) 1064 nm laser-induced damages are mainly from the substrate-coating interface and subsurface.

Fig. 10.
Fig. 10.

Correlation between the 1064 nm laser-induced delamination area and the number of 355 nm laser-induced pits: pits became greater with increasing 355 nm laser fluence, and delamination area also grew, but 1064 nm laser fluence was kept unchanged.

Equations (1)

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P355=P355&1064P1064*(1P355),

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