T. Matsuyama, N. Kita, and Y. Mizuno, “Pupilgram adjusting scheme using intelligent illuminator for ArF immersion exposure tool,” Proc. SPIE 7973, 79731H (2011).

X. Ma and G. R. Arce, “PSM design for inverse lithography with partially coherent illumination,” Opt. Express 16, 20126–20141 (2008).

[CrossRef]

D. G. Flagello, B. Geh, R. Socha, P. Liu, Y. Cao, R. Stas, O. Natt, and J. Zimmermann, “Understanding illumination effects for control of optical proximity effects (OPE),” Proc. SPIE 6924, 69241U (2008).

G. Perçin, A. Sezginer, and F. X. Zach, “Metrology for stepper illumination pupil profile,” J. Micro/nanolithogr. MEMS MOEMS 5, 023006 (2006).

F. M. Schellenberg, “A history of resolution enhancement technology,” Opt. Rev. 12, 83–89 (2005).

[CrossRef]

J. Shin, C. Hwang, S. Lee, S. Woo, H. Cho, and J. Moon, “Understanding the impact of source displacement error on sub-90 nm patterns using a fresnel zone plate,” J. Vac. Sci. Technol. B 23, 2653–2656 (2005).

[CrossRef]

Y. Granik and K. Adam, “Analytical approximations of the source intensity distributions,” Proc. SPIE 5992, 599255 (2005).

Y. Granik, “Source optimization for image fidelity and throughput,” J. Micro/nanolithogr. MEMS MOEMS 3, 509–522 (2004).

[CrossRef]

C. Bodendorf, R. E. Schlief, and R. Ziebold, “Impact of measured pupil illumination fill distribution on lithography simulation and OPC models,” Proc. SPIE 5377, 1130–1145 (2004).

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration setup and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

T. C. Barrett, “Impact of illumination pupil-fill spatial variation on simulated imaging performance,” Proc. SPIE 4000, 804–817 (2000).

E. Barouch, S. L. Knodle, S. A. Orszag, and M. Yeung, “Illuminator optimization for projection printing,” Proc. SPIE 3679, 697–703 (1999).

E. Wolf, “New spectral representation of random sources and of the partially coherent fields that they generate,” Opt. Commun. 38, 3–6 (1981).

[CrossRef]

Y. Granik and K. Adam, “Analytical approximations of the source intensity distributions,” Proc. SPIE 5992, 599255 (2005).

E. Barouch, S. L. Knodle, S. A. Orszag, and M. Yeung, “Illuminator optimization for projection printing,” Proc. SPIE 3679, 697–703 (1999).

T. C. Barrett, “Impact of illumination pupil-fill spatial variation on simulated imaging performance,” Proc. SPIE 4000, 804–817 (2000).

C. Bodendorf, R. E. Schlief, and R. Ziebold, “Impact of measured pupil illumination fill distribution on lithography simulation and OPC models,” Proc. SPIE 5377, 1130–1145 (2004).

D. G. Flagello, B. Geh, R. Socha, P. Liu, Y. Cao, R. Stas, O. Natt, and J. Zimmermann, “Understanding illumination effects for control of optical proximity effects (OPE),” Proc. SPIE 6924, 69241U (2008).

J. Shin, C. Hwang, S. Lee, S. Woo, H. Cho, and J. Moon, “Understanding the impact of source displacement error on sub-90 nm patterns using a fresnel zone plate,” J. Vac. Sci. Technol. B 23, 2653–2656 (2005).

[CrossRef]

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration setup and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

D. G. Flagello, B. Geh, R. Socha, P. Liu, Y. Cao, R. Stas, O. Natt, and J. Zimmermann, “Understanding illumination effects for control of optical proximity effects (OPE),” Proc. SPIE 6924, 69241U (2008).

D. G. Flagello, B. Geh, R. Socha, P. Liu, Y. Cao, R. Stas, O. Natt, and J. Zimmermann, “Understanding illumination effects for control of optical proximity effects (OPE),” Proc. SPIE 6924, 69241U (2008).

Y. Granik and K. Adam, “Analytical approximations of the source intensity distributions,” Proc. SPIE 5992, 599255 (2005).

Y. Granik, “Source optimization for image fidelity and throughput,” J. Micro/nanolithogr. MEMS MOEMS 3, 509–522 (2004).

[CrossRef]

J. Shin, C. Hwang, S. Lee, S. Woo, H. Cho, and J. Moon, “Understanding the impact of source displacement error on sub-90 nm patterns using a fresnel zone plate,” J. Vac. Sci. Technol. B 23, 2653–2656 (2005).

[CrossRef]

T. Matsuyama, N. Kita, and Y. Mizuno, “Pupilgram adjusting scheme using intelligent illuminator for ArF immersion exposure tool,” Proc. SPIE 7973, 79731H (2011).

E. Barouch, S. L. Knodle, S. A. Orszag, and M. Yeung, “Illuminator optimization for projection printing,” Proc. SPIE 3679, 697–703 (1999).

J. Shin, C. Hwang, S. Lee, S. Woo, H. Cho, and J. Moon, “Understanding the impact of source displacement error on sub-90 nm patterns using a fresnel zone plate,” J. Vac. Sci. Technol. B 23, 2653–2656 (2005).

[CrossRef]

B. J. Lin, Optical Lithography: Here is Why (SPIE, 2010), Chap. 3.

D. G. Flagello, B. Geh, R. Socha, P. Liu, Y. Cao, R. Stas, O. Natt, and J. Zimmermann, “Understanding illumination effects for control of optical proximity effects (OPE),” Proc. SPIE 6924, 69241U (2008).

W. Liu, S. Y. Liu, T. L. Shi, and Z. R. Tang, “Generalized formulations for aerial image based lens aberration metrology in lithographic tools with arbitrarily shaped illumination sources,” Opt. Express 18, 20096–20104 (2010).

[CrossRef]

W. Liu, S. Y. Liu, T. T. Zhou, and L. J. Wang, “Aerial image based technique for measurement of lens aberrations up to 37th Zernike coefficient in lithographic tools under partial coherent illumination,” Opt. Express 17, 19278–19291 (2009).

[CrossRef]

W. Liu, S. Y. Liu, T. L. Shi, and Z. R. Tang, “Generalized formulations for aerial image based lens aberration metrology in lithographic tools with arbitrarily shaped illumination sources,” Opt. Express 18, 20096–20104 (2010).

[CrossRef]

W. Liu, S. Y. Liu, T. T. Zhou, and L. J. Wang, “Aerial image based technique for measurement of lens aberrations up to 37th Zernike coefficient in lithographic tools under partial coherent illumination,” Opt. Express 17, 19278–19291 (2009).

[CrossRef]

T. Matsuyama, N. Kita, and Y. Mizuno, “Pupilgram adjusting scheme using intelligent illuminator for ArF immersion exposure tool,” Proc. SPIE 7973, 79731H (2011).

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration setup and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

T. Matsuyama, N. Kita, and Y. Mizuno, “Pupilgram adjusting scheme using intelligent illuminator for ArF immersion exposure tool,” Proc. SPIE 7973, 79731H (2011).

J. Shin, C. Hwang, S. Lee, S. Woo, H. Cho, and J. Moon, “Understanding the impact of source displacement error on sub-90 nm patterns using a fresnel zone plate,” J. Vac. Sci. Technol. B 23, 2653–2656 (2005).

[CrossRef]

D. G. Flagello, B. Geh, R. Socha, P. Liu, Y. Cao, R. Stas, O. Natt, and J. Zimmermann, “Understanding illumination effects for control of optical proximity effects (OPE),” Proc. SPIE 6924, 69241U (2008).

E. Barouch, S. L. Knodle, S. A. Orszag, and M. Yeung, “Illuminator optimization for projection printing,” Proc. SPIE 3679, 697–703 (1999).

G. Perçin, A. Sezginer, and F. X. Zach, “Metrology for stepper illumination pupil profile,” J. Micro/nanolithogr. MEMS MOEMS 5, 023006 (2006).

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration setup and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

F. M. Schellenberg, “A history of resolution enhancement technology,” Opt. Rev. 12, 83–89 (2005).

[CrossRef]

C. Bodendorf, R. E. Schlief, and R. Ziebold, “Impact of measured pupil illumination fill distribution on lithography simulation and OPC models,” Proc. SPIE 5377, 1130–1145 (2004).

G. Perçin, A. Sezginer, and F. X. Zach, “Metrology for stepper illumination pupil profile,” J. Micro/nanolithogr. MEMS MOEMS 5, 023006 (2006).

J. Shin, C. Hwang, S. Lee, S. Woo, H. Cho, and J. Moon, “Understanding the impact of source displacement error on sub-90 nm patterns using a fresnel zone plate,” J. Vac. Sci. Technol. B 23, 2653–2656 (2005).

[CrossRef]

D. G. Flagello, B. Geh, R. Socha, P. Liu, Y. Cao, R. Stas, O. Natt, and J. Zimmermann, “Understanding illumination effects for control of optical proximity effects (OPE),” Proc. SPIE 6924, 69241U (2008).

D. G. Flagello, B. Geh, R. Socha, P. Liu, Y. Cao, R. Stas, O. Natt, and J. Zimmermann, “Understanding illumination effects for control of optical proximity effects (OPE),” Proc. SPIE 6924, 69241U (2008).

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration setup and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration setup and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration setup and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration setup and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

E. Wolf, “New spectral representation of random sources and of the partially coherent fields that they generate,” Opt. Commun. 38, 3–6 (1981).

[CrossRef]

A. K. Wong, Optical Imaging in Projection Microlithography (SPIE, 2005), Chap. 4.

J. Shin, C. Hwang, S. Lee, S. Woo, H. Cho, and J. Moon, “Understanding the impact of source displacement error on sub-90 nm patterns using a fresnel zone plate,” J. Vac. Sci. Technol. B 23, 2653–2656 (2005).

[CrossRef]

E. Barouch, S. L. Knodle, S. A. Orszag, and M. Yeung, “Illuminator optimization for projection printing,” Proc. SPIE 3679, 697–703 (1999).

G. Perçin, A. Sezginer, and F. X. Zach, “Metrology for stepper illumination pupil profile,” J. Micro/nanolithogr. MEMS MOEMS 5, 023006 (2006).

C. Bodendorf, R. E. Schlief, and R. Ziebold, “Impact of measured pupil illumination fill distribution on lithography simulation and OPC models,” Proc. SPIE 5377, 1130–1145 (2004).

D. G. Flagello, B. Geh, R. Socha, P. Liu, Y. Cao, R. Stas, O. Natt, and J. Zimmermann, “Understanding illumination effects for control of optical proximity effects (OPE),” Proc. SPIE 6924, 69241U (2008).

Y. Granik, “Source optimization for image fidelity and throughput,” J. Micro/nanolithogr. MEMS MOEMS 3, 509–522 (2004).

[CrossRef]

G. Perçin, A. Sezginer, and F. X. Zach, “Metrology for stepper illumination pupil profile,” J. Micro/nanolithogr. MEMS MOEMS 5, 023006 (2006).

J. Shin, C. Hwang, S. Lee, S. Woo, H. Cho, and J. Moon, “Understanding the impact of source displacement error on sub-90 nm patterns using a fresnel zone plate,” J. Vac. Sci. Technol. B 23, 2653–2656 (2005).

[CrossRef]

E. Wolf, “New spectral representation of random sources and of the partially coherent fields that they generate,” Opt. Commun. 38, 3–6 (1981).

[CrossRef]

W. Liu, S. Y. Liu, T. T. Zhou, and L. J. Wang, “Aerial image based technique for measurement of lens aberrations up to 37th Zernike coefficient in lithographic tools under partial coherent illumination,” Opt. Express 17, 19278–19291 (2009).

[CrossRef]

W. Liu, S. Y. Liu, T. L. Shi, and Z. R. Tang, “Generalized formulations for aerial image based lens aberration metrology in lithographic tools with arbitrarily shaped illumination sources,” Opt. Express 18, 20096–20104 (2010).

[CrossRef]

X. Ma and G. R. Arce, “PSM design for inverse lithography with partially coherent illumination,” Opt. Express 16, 20126–20141 (2008).

[CrossRef]

F. M. Schellenberg, “A history of resolution enhancement technology,” Opt. Rev. 12, 83–89 (2005).

[CrossRef]

E. Barouch, S. L. Knodle, S. A. Orszag, and M. Yeung, “Illuminator optimization for projection printing,” Proc. SPIE 3679, 697–703 (1999).

T. C. Barrett, “Impact of illumination pupil-fill spatial variation on simulated imaging performance,” Proc. SPIE 4000, 804–817 (2000).

C. Bodendorf, R. E. Schlief, and R. Ziebold, “Impact of measured pupil illumination fill distribution on lithography simulation and OPC models,” Proc. SPIE 5377, 1130–1145 (2004).

Y. Granik and K. Adam, “Analytical approximations of the source intensity distributions,” Proc. SPIE 5992, 599255 (2005).

D. G. Flagello, B. Geh, R. Socha, P. Liu, Y. Cao, R. Stas, O. Natt, and J. Zimmermann, “Understanding illumination effects for control of optical proximity effects (OPE),” Proc. SPIE 6924, 69241U (2008).

T. Matsuyama, N. Kita, and Y. Mizuno, “Pupilgram adjusting scheme using intelligent illuminator for ArF immersion exposure tool,” Proc. SPIE 7973, 79731H (2011).

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration setup and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

A. K. Wong, Optical Imaging in Projection Microlithography (SPIE, 2005), Chap. 4.

B. J. Lin, Optical Lithography: Here is Why (SPIE, 2010), Chap. 3.