Abstract

The combination of in situ spectrophotometry during film deposition and ex situ spectrophotometry allows insight into the depth distribution of optical losses in plasma ion assisted deposition coatings. An adapted optical characterization strategy for absorbing coatings using only in situ transmittance data has been developed and is exemplified in application to magnesium fluoride coatings. Measurements and simulation results strongly indicate an increased absorption caused by local understoichiometry of the fluoride material close to the fused silica substrate.

© 2010 Optical Society of America

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