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Polarization filters with an autocloned symmetric structure

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Abstract

The process of fabricating photonic crystals comprised of alternately stacked high- and low-index dielectric materials on periodic substrates to form zigzag films is called the autocloning technique. In this study, we have fabricated TiO2/SiO2 two-dimensional polarization filters by using electron beam gun evaporation with ion-beam-assisted deposition. The shape of the zigzag structure is preserved, and the total thickness is 8μm. The symmetric structural design can be utilized as an antireflection coating applied to reduce ripples and achieve a 200nm working wavelength range.

© 2011 Optical Society of America

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