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Improving thin-film manufacturing yield with robust optimization

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Abstract

A novel robust optimization algorithm is demonstrated that is largely deterministic, and yet it attempts to account for statistical variations in coating. Through Monte Carlo simulations of manufacturing, we compare the performance of a proof-of-concept antireflection (AR) coating designed with our robust optimization to that of a conventionally optimized AR coating. We find that the robust algorithm produces an AR coating with a significantly improved yield.

© 2010 Optical Society of America

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