Abstract

We present phase-conjugate holographic lithography with a hologram recorded by a digital micromirror device (DMD) and a telecentric lens. In our lithography system, a phase-conjugate hologram is applied instead of conventional masks or reticles to form patterns. This method has the advantage of increasing focus range, and it is applicable to the formation of patterns on fairly uneven surfaces. The hologram pattern is dynamically generated by the DMD, and its resolution is mainly determined by the demagnification of the telecentric lens. We experimentally demonstrate that our holographic lithographic system has a large focus range, and it is feasible to make a large-area hologram by stitching each pattern generated by the DMD without a falling off in resolution.

© 2011 Optical Society of America

Full Article  |  PDF Article

References

  • View by:
  • |
  • |
  • |

  1. M. Rothschild, T. Bloomstein, T. Fedynyshyn, R. Kunz, V. Liberman, M. Switkes, N. Efremow, S. Palmacci, J. Sedlacek, and D. Hardy, “Recent trends in optical lithography,” Lincoln Lab. J. 14, 221–236 (2003).
  2. S. Okazaki, “Resolution limits of optical lithography,” J. Vac. Sci. Technol. B 9, 2829–2833 (1991).
    [CrossRef]
  3. T. A. Brunner, “Why optical lithography will live forever,” J. Vac. Sci. Technol. B 21, 2632–2637 (2003).
    [CrossRef]
  4. E. H. Anderson, C. M. Horwitz, and H. I. Smith, “Holographic lithography with thick photoresist,” Appl. Phys. Lett. 43, 874–875 (1983).
    [CrossRef]
  5. J. Brook and R. Daendliker, “Holographic photolithography for submicron VLSI structures,” Microelectron. Eng. 11, 127–131(1990).
    [CrossRef]
  6. F. Clube, S. Gray, D. Struchen, J. C. Tisserand, S. Malfoy, and Y. Darbellay, “Holographic microlithography,” Opt. Eng. 34, 2724–2730 (1995).
    [CrossRef]
  7. J. M. Carter, D. B. Olster, M. L. Schattenburg, A. Yen, and H. I. Smith, “Large-area, freestanding gratings for atom interferometry produced using holographic lithography,” J. Vac. Sci. Technol. B 10, 2909–2911 (1992).
    [CrossRef]
  8. T. Kondo, S. Juodkazis, V. Mizeikis, H. Misawa, and S. Matsuo, “Holographic lithography of periodic two- and three-dimensional microstructures in photoresist SU-8,” Opt. Express 14, 7943–7953 (2006).
    [CrossRef] [PubMed]
  9. G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
    [CrossRef]
  10. I. W. Jung, J. S. Wang, and O. Solgaard, “Optical pattern generation using a, spatial light modulator for maskless lithography,” IEEE J. Sel. Top. Quantum Electron. 13, 147–154(2007).
    [CrossRef]
  11. Y. Lim, J. Hahn, and B. Lee, “Volumetric film patterning method using a digital micro-mirror device and telecentric lens,” in Digital Holography and Three-Dimensional Imaging, OSA Technical Digest (CD) (Optical Society of America, 2008), paper DWB4.
  12. Y. Lim, “Study on generation and application of coupled light waves based on surface plasmons and holography,” Ph.D dissertation (Seoul National University, 2010).
  13. G. P. Watson, V. Aksyuk, D. M. Tennant, and R. A. Cirelli, “Comparison of tilting and piston mirror elements for 65 nmnode spatial light modulator optical maskless lithography,” J. Vac. Sci. Technol. B 22, 3038–3042 (2004).
    [CrossRef]
  14. D. Henry, J. W. Gemmink, L. Pain, and S. V. Postnikov, “Status and future of maskless lithography,” Microelectron. Eng. 83, 951–955 (2006).
    [CrossRef]
  15. S. E. Chung, W. Park, H. Park, K. Yu, N. Park, and S. Kwon, “Optofluidic maskless lithography system for real-time synthesis of photopolymerized microstructures in microfluidic channels,” Appl. Phys. Lett. 91, 041106 (2007).
    [CrossRef]
  16. S. A. Lee, S. E. Chung, W. Park, S. H. Lee, and S. Kwon, “Three-dimensional fabrication of heterogeneous microstructures using soft membrane deformation and optofluidic maskless lithography,” Lab Chip 9, 1670–1675 (2009).
    [CrossRef] [PubMed]
  17. C. Sun, N. Fang, D. M. Wu, and X. Zhang, “Projection micro-stereolithography using digital micro-mirror dynamic mask,” Sens. Actuators A 121, 113–120 (2005).
    [CrossRef]
  18. K. Totsu, K. Fujishiro, S. Tanaka, and M. Esashi, “Fabrication of three-dimensional microstructure using maskless gray-scale lithography,” Sens. Actuators A 130, 387–392 (2006).
    [CrossRef]
  19. J. W. Goodman, Introduction to Fourier Optics, 3rd ed.(Roberts & Company, 2004).
  20. J. Hahn, Y. Lim, H. Kim, and B. Lee, “Micro-optical fields generated by a spatial light modulator,” J. Holography Speckle 5, 141–148 (2009).
    [CrossRef]
  21. K. A. Stetson, “Holography with total internally reflected light,” Appl. Phys. Lett. 11, 225–226 (1967).
    [CrossRef]
  22. K. A. Stetson, “Improved resolution and signal-to-noise ratios in total internal reflection holograms,” Appl. Phys. Lett. 12, 362–364 (1968).
    [CrossRef]
  23. S. Sainov and R. Stoycheva-Topalova, “Total internal reflection holographic recording in very thin films,” J. Opt. A 2, 117–120 (2000).
    [CrossRef]
  24. M. Born and E. Wolf, Principles of Optics, 7th ed. (Cambridge Univ., 1999).
  25. S. Han, T. Kim, S. Chung, and B. Lee, “Dispersion characteristics of holographic multiple-channel demultiplexers,” IEEE Photon. Technol. Lett. 16, 1879–1881 (2004).
    [CrossRef]
  26. S. Han, B.-A. Yu, S. Chung, H. Kim, J. Paek, and B. Lee, “Filter characteristics of a chirped volume holographic grating,” Opt. Lett. 29, 107–109 (2004).
    [CrossRef] [PubMed]

2009 (2)

S. A. Lee, S. E. Chung, W. Park, S. H. Lee, and S. Kwon, “Three-dimensional fabrication of heterogeneous microstructures using soft membrane deformation and optofluidic maskless lithography,” Lab Chip 9, 1670–1675 (2009).
[CrossRef] [PubMed]

J. Hahn, Y. Lim, H. Kim, and B. Lee, “Micro-optical fields generated by a spatial light modulator,” J. Holography Speckle 5, 141–148 (2009).
[CrossRef]

2007 (2)

S. E. Chung, W. Park, H. Park, K. Yu, N. Park, and S. Kwon, “Optofluidic maskless lithography system for real-time synthesis of photopolymerized microstructures in microfluidic channels,” Appl. Phys. Lett. 91, 041106 (2007).
[CrossRef]

I. W. Jung, J. S. Wang, and O. Solgaard, “Optical pattern generation using a, spatial light modulator for maskless lithography,” IEEE J. Sel. Top. Quantum Electron. 13, 147–154(2007).
[CrossRef]

2006 (4)

D. Henry, J. W. Gemmink, L. Pain, and S. V. Postnikov, “Status and future of maskless lithography,” Microelectron. Eng. 83, 951–955 (2006).
[CrossRef]

K. Totsu, K. Fujishiro, S. Tanaka, and M. Esashi, “Fabrication of three-dimensional microstructure using maskless gray-scale lithography,” Sens. Actuators A 130, 387–392 (2006).
[CrossRef]

T. Kondo, S. Juodkazis, V. Mizeikis, H. Misawa, and S. Matsuo, “Holographic lithography of periodic two- and three-dimensional microstructures in photoresist SU-8,” Opt. Express 14, 7943–7953 (2006).
[CrossRef] [PubMed]

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

2005 (1)

C. Sun, N. Fang, D. M. Wu, and X. Zhang, “Projection micro-stereolithography using digital micro-mirror dynamic mask,” Sens. Actuators A 121, 113–120 (2005).
[CrossRef]

2004 (3)

G. P. Watson, V. Aksyuk, D. M. Tennant, and R. A. Cirelli, “Comparison of tilting and piston mirror elements for 65 nmnode spatial light modulator optical maskless lithography,” J. Vac. Sci. Technol. B 22, 3038–3042 (2004).
[CrossRef]

S. Han, T. Kim, S. Chung, and B. Lee, “Dispersion characteristics of holographic multiple-channel demultiplexers,” IEEE Photon. Technol. Lett. 16, 1879–1881 (2004).
[CrossRef]

S. Han, B.-A. Yu, S. Chung, H. Kim, J. Paek, and B. Lee, “Filter characteristics of a chirped volume holographic grating,” Opt. Lett. 29, 107–109 (2004).
[CrossRef] [PubMed]

2003 (2)

M. Rothschild, T. Bloomstein, T. Fedynyshyn, R. Kunz, V. Liberman, M. Switkes, N. Efremow, S. Palmacci, J. Sedlacek, and D. Hardy, “Recent trends in optical lithography,” Lincoln Lab. J. 14, 221–236 (2003).

T. A. Brunner, “Why optical lithography will live forever,” J. Vac. Sci. Technol. B 21, 2632–2637 (2003).
[CrossRef]

2000 (1)

S. Sainov and R. Stoycheva-Topalova, “Total internal reflection holographic recording in very thin films,” J. Opt. A 2, 117–120 (2000).
[CrossRef]

1995 (1)

F. Clube, S. Gray, D. Struchen, J. C. Tisserand, S. Malfoy, and Y. Darbellay, “Holographic microlithography,” Opt. Eng. 34, 2724–2730 (1995).
[CrossRef]

1992 (1)

J. M. Carter, D. B. Olster, M. L. Schattenburg, A. Yen, and H. I. Smith, “Large-area, freestanding gratings for atom interferometry produced using holographic lithography,” J. Vac. Sci. Technol. B 10, 2909–2911 (1992).
[CrossRef]

1991 (1)

S. Okazaki, “Resolution limits of optical lithography,” J. Vac. Sci. Technol. B 9, 2829–2833 (1991).
[CrossRef]

1990 (1)

J. Brook and R. Daendliker, “Holographic photolithography for submicron VLSI structures,” Microelectron. Eng. 11, 127–131(1990).
[CrossRef]

1983 (1)

E. H. Anderson, C. M. Horwitz, and H. I. Smith, “Holographic lithography with thick photoresist,” Appl. Phys. Lett. 43, 874–875 (1983).
[CrossRef]

1968 (1)

K. A. Stetson, “Improved resolution and signal-to-noise ratios in total internal reflection holograms,” Appl. Phys. Lett. 12, 362–364 (1968).
[CrossRef]

1967 (1)

K. A. Stetson, “Holography with total internally reflected light,” Appl. Phys. Lett. 11, 225–226 (1967).
[CrossRef]

Aksyuk, V.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

G. P. Watson, V. Aksyuk, D. M. Tennant, and R. A. Cirelli, “Comparison of tilting and piston mirror elements for 65 nmnode spatial light modulator optical maskless lithography,” J. Vac. Sci. Technol. B 22, 3038–3042 (2004).
[CrossRef]

Anderson, E. H.

E. H. Anderson, C. M. Horwitz, and H. I. Smith, “Holographic lithography with thick photoresist,” Appl. Phys. Lett. 43, 874–875 (1983).
[CrossRef]

Basavanhally, N.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

Bloomstein, T.

M. Rothschild, T. Bloomstein, T. Fedynyshyn, R. Kunz, V. Liberman, M. Switkes, N. Efremow, S. Palmacci, J. Sedlacek, and D. Hardy, “Recent trends in optical lithography,” Lincoln Lab. J. 14, 221–236 (2003).

Bolle, C. A.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

Born, M.

M. Born and E. Wolf, Principles of Optics, 7th ed. (Cambridge Univ., 1999).

Bower, J. E.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

Brook, J.

J. Brook and R. Daendliker, “Holographic photolithography for submicron VLSI structures,” Microelectron. Eng. 11, 127–131(1990).
[CrossRef]

Brunner, T. A.

T. A. Brunner, “Why optical lithography will live forever,” J. Vac. Sci. Technol. B 21, 2632–2637 (2003).
[CrossRef]

Carter, J. M.

J. M. Carter, D. B. Olster, M. L. Schattenburg, A. Yen, and H. I. Smith, “Large-area, freestanding gratings for atom interferometry produced using holographic lithography,” J. Vac. Sci. Technol. B 10, 2909–2911 (1992).
[CrossRef]

Chung, S.

S. Han, T. Kim, S. Chung, and B. Lee, “Dispersion characteristics of holographic multiple-channel demultiplexers,” IEEE Photon. Technol. Lett. 16, 1879–1881 (2004).
[CrossRef]

S. Han, B.-A. Yu, S. Chung, H. Kim, J. Paek, and B. Lee, “Filter characteristics of a chirped volume holographic grating,” Opt. Lett. 29, 107–109 (2004).
[CrossRef] [PubMed]

Chung, S. E.

S. A. Lee, S. E. Chung, W. Park, S. H. Lee, and S. Kwon, “Three-dimensional fabrication of heterogeneous microstructures using soft membrane deformation and optofluidic maskless lithography,” Lab Chip 9, 1670–1675 (2009).
[CrossRef] [PubMed]

S. E. Chung, W. Park, H. Park, K. Yu, N. Park, and S. Kwon, “Optofluidic maskless lithography system for real-time synthesis of photopolymerized microstructures in microfluidic channels,” Appl. Phys. Lett. 91, 041106 (2007).
[CrossRef]

Cirelli, R. A.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

G. P. Watson, V. Aksyuk, D. M. Tennant, and R. A. Cirelli, “Comparison of tilting and piston mirror elements for 65 nmnode spatial light modulator optical maskless lithography,” J. Vac. Sci. Technol. B 22, 3038–3042 (2004).
[CrossRef]

Clube, F.

F. Clube, S. Gray, D. Struchen, J. C. Tisserand, S. Malfoy, and Y. Darbellay, “Holographic microlithography,” Opt. Eng. 34, 2724–2730 (1995).
[CrossRef]

Daendliker, R.

J. Brook and R. Daendliker, “Holographic photolithography for submicron VLSI structures,” Microelectron. Eng. 11, 127–131(1990).
[CrossRef]

Darbellay, Y.

F. Clube, S. Gray, D. Struchen, J. C. Tisserand, S. Malfoy, and Y. Darbellay, “Holographic microlithography,” Opt. Eng. 34, 2724–2730 (1995).
[CrossRef]

Efremow, N.

M. Rothschild, T. Bloomstein, T. Fedynyshyn, R. Kunz, V. Liberman, M. Switkes, N. Efremow, S. Palmacci, J. Sedlacek, and D. Hardy, “Recent trends in optical lithography,” Lincoln Lab. J. 14, 221–236 (2003).

Esashi, M.

K. Totsu, K. Fujishiro, S. Tanaka, and M. Esashi, “Fabrication of three-dimensional microstructure using maskless gray-scale lithography,” Sens. Actuators A 130, 387–392 (2006).
[CrossRef]

Fang, N.

C. Sun, N. Fang, D. M. Wu, and X. Zhang, “Projection micro-stereolithography using digital micro-mirror dynamic mask,” Sens. Actuators A 121, 113–120 (2005).
[CrossRef]

Fedynyshyn, T.

M. Rothschild, T. Bloomstein, T. Fedynyshyn, R. Kunz, V. Liberman, M. Switkes, N. Efremow, S. Palmacci, J. Sedlacek, and D. Hardy, “Recent trends in optical lithography,” Lincoln Lab. J. 14, 221–236 (2003).

Fetter, L.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

Fujishiro, K.

K. Totsu, K. Fujishiro, S. Tanaka, and M. Esashi, “Fabrication of three-dimensional microstructure using maskless gray-scale lithography,” Sens. Actuators A 130, 387–392 (2006).
[CrossRef]

Fullowan, R.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

Gemmink, J. W.

D. Henry, J. W. Gemmink, L. Pain, and S. V. Postnikov, “Status and future of maskless lithography,” Microelectron. Eng. 83, 951–955 (2006).
[CrossRef]

Goodman, J. W.

J. W. Goodman, Introduction to Fourier Optics, 3rd ed.(Roberts & Company, 2004).

Gray, S.

F. Clube, S. Gray, D. Struchen, J. C. Tisserand, S. Malfoy, and Y. Darbellay, “Holographic microlithography,” Opt. Eng. 34, 2724–2730 (1995).
[CrossRef]

Hahn, J.

J. Hahn, Y. Lim, H. Kim, and B. Lee, “Micro-optical fields generated by a spatial light modulator,” J. Holography Speckle 5, 141–148 (2009).
[CrossRef]

Y. Lim, J. Hahn, and B. Lee, “Volumetric film patterning method using a digital micro-mirror device and telecentric lens,” in Digital Holography and Three-Dimensional Imaging, OSA Technical Digest (CD) (Optical Society of America, 2008), paper DWB4.

Han, S.

S. Han, B.-A. Yu, S. Chung, H. Kim, J. Paek, and B. Lee, “Filter characteristics of a chirped volume holographic grating,” Opt. Lett. 29, 107–109 (2004).
[CrossRef] [PubMed]

S. Han, T. Kim, S. Chung, and B. Lee, “Dispersion characteristics of holographic multiple-channel demultiplexers,” IEEE Photon. Technol. Lett. 16, 1879–1881 (2004).
[CrossRef]

Hardy, D.

M. Rothschild, T. Bloomstein, T. Fedynyshyn, R. Kunz, V. Liberman, M. Switkes, N. Efremow, S. Palmacci, J. Sedlacek, and D. Hardy, “Recent trends in optical lithography,” Lincoln Lab. J. 14, 221–236 (2003).

Henry, D.

D. Henry, J. W. Gemmink, L. Pain, and S. V. Postnikov, “Status and future of maskless lithography,” Microelectron. Eng. 83, 951–955 (2006).
[CrossRef]

Horwitz, C. M.

E. H. Anderson, C. M. Horwitz, and H. I. Smith, “Holographic lithography with thick photoresist,” Appl. Phys. Lett. 43, 874–875 (1983).
[CrossRef]

Jung, I. W.

I. W. Jung, J. S. Wang, and O. Solgaard, “Optical pattern generation using a, spatial light modulator for maskless lithography,” IEEE J. Sel. Top. Quantum Electron. 13, 147–154(2007).
[CrossRef]

Juodkazis, S.

Kim, H.

J. Hahn, Y. Lim, H. Kim, and B. Lee, “Micro-optical fields generated by a spatial light modulator,” J. Holography Speckle 5, 141–148 (2009).
[CrossRef]

S. Han, B.-A. Yu, S. Chung, H. Kim, J. Paek, and B. Lee, “Filter characteristics of a chirped volume holographic grating,” Opt. Lett. 29, 107–109 (2004).
[CrossRef] [PubMed]

Kim, T.

S. Han, T. Kim, S. Chung, and B. Lee, “Dispersion characteristics of holographic multiple-channel demultiplexers,” IEEE Photon. Technol. Lett. 16, 1879–1881 (2004).
[CrossRef]

Klemens, F.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

Kondo, T.

Kornblit, A.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

Kunz, R.

M. Rothschild, T. Bloomstein, T. Fedynyshyn, R. Kunz, V. Liberman, M. Switkes, N. Efremow, S. Palmacci, J. Sedlacek, and D. Hardy, “Recent trends in optical lithography,” Lincoln Lab. J. 14, 221–236 (2003).

Kwon, S.

S. A. Lee, S. E. Chung, W. Park, S. H. Lee, and S. Kwon, “Three-dimensional fabrication of heterogeneous microstructures using soft membrane deformation and optofluidic maskless lithography,” Lab Chip 9, 1670–1675 (2009).
[CrossRef] [PubMed]

S. E. Chung, W. Park, H. Park, K. Yu, N. Park, and S. Kwon, “Optofluidic maskless lithography system for real-time synthesis of photopolymerized microstructures in microfluidic channels,” Appl. Phys. Lett. 91, 041106 (2007).
[CrossRef]

Lee, B.

J. Hahn, Y. Lim, H. Kim, and B. Lee, “Micro-optical fields generated by a spatial light modulator,” J. Holography Speckle 5, 141–148 (2009).
[CrossRef]

S. Han, T. Kim, S. Chung, and B. Lee, “Dispersion characteristics of holographic multiple-channel demultiplexers,” IEEE Photon. Technol. Lett. 16, 1879–1881 (2004).
[CrossRef]

S. Han, B.-A. Yu, S. Chung, H. Kim, J. Paek, and B. Lee, “Filter characteristics of a chirped volume holographic grating,” Opt. Lett. 29, 107–109 (2004).
[CrossRef] [PubMed]

Y. Lim, J. Hahn, and B. Lee, “Volumetric film patterning method using a digital micro-mirror device and telecentric lens,” in Digital Holography and Three-Dimensional Imaging, OSA Technical Digest (CD) (Optical Society of America, 2008), paper DWB4.

Lee, J.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

Lee, S. A.

S. A. Lee, S. E. Chung, W. Park, S. H. Lee, and S. Kwon, “Three-dimensional fabrication of heterogeneous microstructures using soft membrane deformation and optofluidic maskless lithography,” Lab Chip 9, 1670–1675 (2009).
[CrossRef] [PubMed]

Lee, S. H.

S. A. Lee, S. E. Chung, W. Park, S. H. Lee, and S. Kwon, “Three-dimensional fabrication of heterogeneous microstructures using soft membrane deformation and optofluidic maskless lithography,” Lab Chip 9, 1670–1675 (2009).
[CrossRef] [PubMed]

Liberman, V.

M. Rothschild, T. Bloomstein, T. Fedynyshyn, R. Kunz, V. Liberman, M. Switkes, N. Efremow, S. Palmacci, J. Sedlacek, and D. Hardy, “Recent trends in optical lithography,” Lincoln Lab. J. 14, 221–236 (2003).

Lim, Y.

J. Hahn, Y. Lim, H. Kim, and B. Lee, “Micro-optical fields generated by a spatial light modulator,” J. Holography Speckle 5, 141–148 (2009).
[CrossRef]

Y. Lim, J. Hahn, and B. Lee, “Volumetric film patterning method using a digital micro-mirror device and telecentric lens,” in Digital Holography and Three-Dimensional Imaging, OSA Technical Digest (CD) (Optical Society of America, 2008), paper DWB4.

Y. Lim, “Study on generation and application of coupled light waves based on surface plasmons and holography,” Ph.D dissertation (Seoul National University, 2010).

Lopez, D. O.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

Low, Y. L.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

Malfoy, S.

F. Clube, S. Gray, D. Struchen, J. C. Tisserand, S. Malfoy, and Y. Darbellay, “Holographic microlithography,” Opt. Eng. 34, 2724–2730 (1995).
[CrossRef]

Mansfield, W. M.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

Matsuo, S.

Miner, J.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

Misawa, H.

Mizeikis, V.

Okazaki, S.

S. Okazaki, “Resolution limits of optical lithography,” J. Vac. Sci. Technol. B 9, 2829–2833 (1991).
[CrossRef]

Olster, D. B.

J. M. Carter, D. B. Olster, M. L. Schattenburg, A. Yen, and H. I. Smith, “Large-area, freestanding gratings for atom interferometry produced using holographic lithography,” J. Vac. Sci. Technol. B 10, 2909–2911 (1992).
[CrossRef]

Paek, J.

Pain, L.

D. Henry, J. W. Gemmink, L. Pain, and S. V. Postnikov, “Status and future of maskless lithography,” Microelectron. Eng. 83, 951–955 (2006).
[CrossRef]

Palmacci, S.

M. Rothschild, T. Bloomstein, T. Fedynyshyn, R. Kunz, V. Liberman, M. Switkes, N. Efremow, S. Palmacci, J. Sedlacek, and D. Hardy, “Recent trends in optical lithography,” Lincoln Lab. J. 14, 221–236 (2003).

Papazian, A. R.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

Pardo, F.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

Park, H.

S. E. Chung, W. Park, H. Park, K. Yu, N. Park, and S. Kwon, “Optofluidic maskless lithography system for real-time synthesis of photopolymerized microstructures in microfluidic channels,” Appl. Phys. Lett. 91, 041106 (2007).
[CrossRef]

Park, N.

S. E. Chung, W. Park, H. Park, K. Yu, N. Park, and S. Kwon, “Optofluidic maskless lithography system for real-time synthesis of photopolymerized microstructures in microfluidic channels,” Appl. Phys. Lett. 91, 041106 (2007).
[CrossRef]

Park, W.

S. A. Lee, S. E. Chung, W. Park, S. H. Lee, and S. Kwon, “Three-dimensional fabrication of heterogeneous microstructures using soft membrane deformation and optofluidic maskless lithography,” Lab Chip 9, 1670–1675 (2009).
[CrossRef] [PubMed]

S. E. Chung, W. Park, H. Park, K. Yu, N. Park, and S. Kwon, “Optofluidic maskless lithography system for real-time synthesis of photopolymerized microstructures in microfluidic channels,” Appl. Phys. Lett. 91, 041106 (2007).
[CrossRef]

Peabody, M.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

Postnikov, S. V.

D. Henry, J. W. Gemmink, L. Pain, and S. V. Postnikov, “Status and future of maskless lithography,” Microelectron. Eng. 83, 951–955 (2006).
[CrossRef]

Rothschild, M.

M. Rothschild, T. Bloomstein, T. Fedynyshyn, R. Kunz, V. Liberman, M. Switkes, N. Efremow, S. Palmacci, J. Sedlacek, and D. Hardy, “Recent trends in optical lithography,” Lincoln Lab. J. 14, 221–236 (2003).

Sainov, S.

S. Sainov and R. Stoycheva-Topalova, “Total internal reflection holographic recording in very thin films,” J. Opt. A 2, 117–120 (2000).
[CrossRef]

Schattenburg, M. L.

J. M. Carter, D. B. Olster, M. L. Schattenburg, A. Yen, and H. I. Smith, “Large-area, freestanding gratings for atom interferometry produced using holographic lithography,” J. Vac. Sci. Technol. B 10, 2909–2911 (1992).
[CrossRef]

Sedlacek, J.

M. Rothschild, T. Bloomstein, T. Fedynyshyn, R. Kunz, V. Liberman, M. Switkes, N. Efremow, S. Palmacci, J. Sedlacek, and D. Hardy, “Recent trends in optical lithography,” Lincoln Lab. J. 14, 221–236 (2003).

Simon, M. E.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

Smith, H. I.

J. M. Carter, D. B. Olster, M. L. Schattenburg, A. Yen, and H. I. Smith, “Large-area, freestanding gratings for atom interferometry produced using holographic lithography,” J. Vac. Sci. Technol. B 10, 2909–2911 (1992).
[CrossRef]

E. H. Anderson, C. M. Horwitz, and H. I. Smith, “Holographic lithography with thick photoresist,” Appl. Phys. Lett. 43, 874–875 (1983).
[CrossRef]

Solgaard, O.

I. W. Jung, J. S. Wang, and O. Solgaard, “Optical pattern generation using a, spatial light modulator for maskless lithography,” IEEE J. Sel. Top. Quantum Electron. 13, 147–154(2007).
[CrossRef]

Sorsch, T.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

Stetson, K. A.

K. A. Stetson, “Improved resolution and signal-to-noise ratios in total internal reflection holograms,” Appl. Phys. Lett. 12, 362–364 (1968).
[CrossRef]

K. A. Stetson, “Holography with total internally reflected light,” Appl. Phys. Lett. 11, 225–226 (1967).
[CrossRef]

Stoycheva-Topalova, R.

S. Sainov and R. Stoycheva-Topalova, “Total internal reflection holographic recording in very thin films,” J. Opt. A 2, 117–120 (2000).
[CrossRef]

Struchen, D.

F. Clube, S. Gray, D. Struchen, J. C. Tisserand, S. Malfoy, and Y. Darbellay, “Holographic microlithography,” Opt. Eng. 34, 2724–2730 (1995).
[CrossRef]

Sun, C.

C. Sun, N. Fang, D. M. Wu, and X. Zhang, “Projection micro-stereolithography using digital micro-mirror dynamic mask,” Sens. Actuators A 121, 113–120 (2005).
[CrossRef]

Switkes, M.

M. Rothschild, T. Bloomstein, T. Fedynyshyn, R. Kunz, V. Liberman, M. Switkes, N. Efremow, S. Palmacci, J. Sedlacek, and D. Hardy, “Recent trends in optical lithography,” Lincoln Lab. J. 14, 221–236 (2003).

Tanaka, S.

K. Totsu, K. Fujishiro, S. Tanaka, and M. Esashi, “Fabrication of three-dimensional microstructure using maskless gray-scale lithography,” Sens. Actuators A 130, 387–392 (2006).
[CrossRef]

Tennant, D. M.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

G. P. Watson, V. Aksyuk, D. M. Tennant, and R. A. Cirelli, “Comparison of tilting and piston mirror elements for 65 nmnode spatial light modulator optical maskless lithography,” J. Vac. Sci. Technol. B 22, 3038–3042 (2004).
[CrossRef]

Tisserand, J. C.

F. Clube, S. Gray, D. Struchen, J. C. Tisserand, S. Malfoy, and Y. Darbellay, “Holographic microlithography,” Opt. Eng. 34, 2724–2730 (1995).
[CrossRef]

Totsu, K.

K. Totsu, K. Fujishiro, S. Tanaka, and M. Esashi, “Fabrication of three-dimensional microstructure using maskless gray-scale lithography,” Sens. Actuators A 130, 387–392 (2006).
[CrossRef]

Wang, J. S.

I. W. Jung, J. S. Wang, and O. Solgaard, “Optical pattern generation using a, spatial light modulator for maskless lithography,” IEEE J. Sel. Top. Quantum Electron. 13, 147–154(2007).
[CrossRef]

Watson, G. P.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

G. P. Watson, V. Aksyuk, D. M. Tennant, and R. A. Cirelli, “Comparison of tilting and piston mirror elements for 65 nmnode spatial light modulator optical maskless lithography,” J. Vac. Sci. Technol. B 22, 3038–3042 (2004).
[CrossRef]

Weiner, J. S.

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

Wolf, E.

M. Born and E. Wolf, Principles of Optics, 7th ed. (Cambridge Univ., 1999).

Wu, D. M.

C. Sun, N. Fang, D. M. Wu, and X. Zhang, “Projection micro-stereolithography using digital micro-mirror dynamic mask,” Sens. Actuators A 121, 113–120 (2005).
[CrossRef]

Yen, A.

J. M. Carter, D. B. Olster, M. L. Schattenburg, A. Yen, and H. I. Smith, “Large-area, freestanding gratings for atom interferometry produced using holographic lithography,” J. Vac. Sci. Technol. B 10, 2909–2911 (1992).
[CrossRef]

Yu, B.-A.

Yu, K.

S. E. Chung, W. Park, H. Park, K. Yu, N. Park, and S. Kwon, “Optofluidic maskless lithography system for real-time synthesis of photopolymerized microstructures in microfluidic channels,” Appl. Phys. Lett. 91, 041106 (2007).
[CrossRef]

Zhang, X.

C. Sun, N. Fang, D. M. Wu, and X. Zhang, “Projection micro-stereolithography using digital micro-mirror dynamic mask,” Sens. Actuators A 121, 113–120 (2005).
[CrossRef]

Appl. Phys. Lett. (4)

E. H. Anderson, C. M. Horwitz, and H. I. Smith, “Holographic lithography with thick photoresist,” Appl. Phys. Lett. 43, 874–875 (1983).
[CrossRef]

S. E. Chung, W. Park, H. Park, K. Yu, N. Park, and S. Kwon, “Optofluidic maskless lithography system for real-time synthesis of photopolymerized microstructures in microfluidic channels,” Appl. Phys. Lett. 91, 041106 (2007).
[CrossRef]

K. A. Stetson, “Holography with total internally reflected light,” Appl. Phys. Lett. 11, 225–226 (1967).
[CrossRef]

K. A. Stetson, “Improved resolution and signal-to-noise ratios in total internal reflection holograms,” Appl. Phys. Lett. 12, 362–364 (1968).
[CrossRef]

IEEE J. Sel. Top. Quantum Electron. (1)

I. W. Jung, J. S. Wang, and O. Solgaard, “Optical pattern generation using a, spatial light modulator for maskless lithography,” IEEE J. Sel. Top. Quantum Electron. 13, 147–154(2007).
[CrossRef]

IEEE Photon. Technol. Lett. (1)

S. Han, T. Kim, S. Chung, and B. Lee, “Dispersion characteristics of holographic multiple-channel demultiplexers,” IEEE Photon. Technol. Lett. 16, 1879–1881 (2004).
[CrossRef]

J. Holography Speckle (1)

J. Hahn, Y. Lim, H. Kim, and B. Lee, “Micro-optical fields generated by a spatial light modulator,” J. Holography Speckle 5, 141–148 (2009).
[CrossRef]

J. Opt. A (1)

S. Sainov and R. Stoycheva-Topalova, “Total internal reflection holographic recording in very thin films,” J. Opt. A 2, 117–120 (2000).
[CrossRef]

J. Vac. Sci. Technol. B (5)

G. P. Watson, V. Aksyuk, D. M. Tennant, and R. A. Cirelli, “Comparison of tilting and piston mirror elements for 65 nmnode spatial light modulator optical maskless lithography,” J. Vac. Sci. Technol. B 22, 3038–3042 (2004).
[CrossRef]

S. Okazaki, “Resolution limits of optical lithography,” J. Vac. Sci. Technol. B 9, 2829–2833 (1991).
[CrossRef]

T. A. Brunner, “Why optical lithography will live forever,” J. Vac. Sci. Technol. B 21, 2632–2637 (2003).
[CrossRef]

J. M. Carter, D. B. Olster, M. L. Schattenburg, A. Yen, and H. I. Smith, “Large-area, freestanding gratings for atom interferometry produced using holographic lithography,” J. Vac. Sci. Technol. B 10, 2909–2911 (1992).
[CrossRef]

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,”J. Vac. Sci. Technol. B 24, 2852–2856 (2006).
[CrossRef]

Lab Chip (1)

S. A. Lee, S. E. Chung, W. Park, S. H. Lee, and S. Kwon, “Three-dimensional fabrication of heterogeneous microstructures using soft membrane deformation and optofluidic maskless lithography,” Lab Chip 9, 1670–1675 (2009).
[CrossRef] [PubMed]

Lincoln Lab. J. (1)

M. Rothschild, T. Bloomstein, T. Fedynyshyn, R. Kunz, V. Liberman, M. Switkes, N. Efremow, S. Palmacci, J. Sedlacek, and D. Hardy, “Recent trends in optical lithography,” Lincoln Lab. J. 14, 221–236 (2003).

Microelectron. Eng. (2)

J. Brook and R. Daendliker, “Holographic photolithography for submicron VLSI structures,” Microelectron. Eng. 11, 127–131(1990).
[CrossRef]

D. Henry, J. W. Gemmink, L. Pain, and S. V. Postnikov, “Status and future of maskless lithography,” Microelectron. Eng. 83, 951–955 (2006).
[CrossRef]

Opt. Eng. (1)

F. Clube, S. Gray, D. Struchen, J. C. Tisserand, S. Malfoy, and Y. Darbellay, “Holographic microlithography,” Opt. Eng. 34, 2724–2730 (1995).
[CrossRef]

Opt. Express (1)

Opt. Lett. (1)

Sens. Actuators A (2)

C. Sun, N. Fang, D. M. Wu, and X. Zhang, “Projection micro-stereolithography using digital micro-mirror dynamic mask,” Sens. Actuators A 121, 113–120 (2005).
[CrossRef]

K. Totsu, K. Fujishiro, S. Tanaka, and M. Esashi, “Fabrication of three-dimensional microstructure using maskless gray-scale lithography,” Sens. Actuators A 130, 387–392 (2006).
[CrossRef]

Other (4)

J. W. Goodman, Introduction to Fourier Optics, 3rd ed.(Roberts & Company, 2004).

Y. Lim, J. Hahn, and B. Lee, “Volumetric film patterning method using a digital micro-mirror device and telecentric lens,” in Digital Holography and Three-Dimensional Imaging, OSA Technical Digest (CD) (Optical Society of America, 2008), paper DWB4.

Y. Lim, “Study on generation and application of coupled light waves based on surface plasmons and holography,” Ph.D dissertation (Seoul National University, 2010).

M. Born and E. Wolf, Principles of Optics, 7th ed. (Cambridge Univ., 1999).

Cited By

OSA participates in CrossRef's Cited-By Linking service. Citing articles from OSA journals and other participating publishers are listed here.

Alert me when this article is cited.


Figures (7)

Fig. 1
Fig. 1

(a) Recording and (b) retrieving of a phase-conjugate hologram in the TIR condition.

Fig. 2
Fig. 2

(a) Schematic of the system for both recording and reconstruction and (b) photo of the system mounted on mechanical stages.

Fig. 3
Fig. 3

DMD images transferred (a) by the well-aligned telecentric lens and (b) by more than 0.1 ° tilted telecentric lens. Reconstructed images from the phase-conjugate holograms, which are recorded (c) with the well-aligned telecentric lens and (d) with a more than 0.1 ° tilted telecentric lens.

Fig. 4
Fig. 4

Wave vector space diagrams for (a) recording and (b) reconstruction. Wave vector space diagrams when (c) wavelength detuning and (d) angle detuning of the reference wave exist.

Fig. 5
Fig. 5

(a) Structure of the signal arm and (b) focus range within which focal planes are formable.

Fig. 6
Fig. 6

(a) Image of the pattern applied for recording of the hologram that is directly captured by the CCD at the focal plane. Reconstructed images from the phase-conjugate holograms recorded at estimated focal planes located (b) at 2500 , (c) 0, and (d)  + 2500 μm .

Fig. 7
Fig. 7

(a) Pattern applied for testing the resolution and the feasibility in stitching holograms. (b) Reconstructed image showing the minimum-resolution area of the test pattern shown in part (a). (c) Test patterns for stitching holograms. (d) Overwrapped area between the first and second holograms and (e) overwrapped area between the second and third holograms. (f) Another result when the exposure time is controlled.

Equations (10)

Equations on this page are rendered with MathJax. Learn more.

K 1 = s r i ,
K 2 = s r o ,
A * = A .
K 1 * = s * r i * ,
K 2 * = s * r o * .
Δ k z = 2 π Δ λ λ record ( λ record + Δ λ ) cos θ i ,
Δ k z = 2 π λ record [ cos θ i cos ( θ i + Δ θ ) ] ,
Δ k z · d π ,
Δ λ λ record 2 2 d cos θ i ,
Δ θ λ record 2 d sin θ i .

Metrics