A new fabrication method of apodized diffractive optical elements is proposed. It relies on using high energy beam sensitive glass as a halftone mask for variable diffraction efficiency phase masks generation in a resist layer. The presented technology is especially effective in mass production. Although fabrication of an amplitude mask is required, it is then repeatedly used in a single shot projection photolithography, which is much simpler and less laborious than the direct variable-dose pattern writing. Three prototypes of apodized phase masks were manufactured and characterized. The main advantages as well as limitations of the proposed technology are discussed.
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