Abstract

Laser marking is demonstrated using a nanosecond (ns) pulse duration laser in combination with a liquid crystal spatial light modulator to generate two-dimensional patterns directly onto thin films and bulk metal surfaces. Previous demonstrations of laser marking with such devices have been limited to low average power lasers. Application in the ns regime enables more complex, larger scale marks to be generated with more widely available and industrially proven laser systems. The dynamic nature of the device is utilized to improve mark quality by reducing the impact of the inherently speckled intensity distribution across the generated image and reduce thermal effects in the marked surface.

© 2011 Optical Society of America

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  1. A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. J. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H. P. Herzig, and N. de Rooij, “Multifunctional micro-optical elements for laser beam homogenizing and beam shaping,” Proc. SPIE 6879, 68790Q (2008).
    [CrossRef]
  2. A. Laskin, Beam Shaping? Easy! (Industrial Laser Solutions, 2006), pp. 17–19.
  3. E. Neiss, M. Flury, and J. Fontaine, “Diffractive optical elements for laser marking applications,” Proc. SPIE 7003, 70032L (2008).
    [CrossRef]
  4. T. Kajava, A. Hakola, H. Elfstrom, J. Simonen, P. Paakkonen, and J. Turunen, “Flat-top profile of an excimer-laser beam generated using beam-splitter gratings,” Opt. Commun. 268, 289–293 (2006).
    [CrossRef]
  5. T. Lizotte and O. Ohar, “Structured beam shaping for precision laser dicing of multilayered substrates,” Proc. SPIE 6458, 64580X (2007).
    [CrossRef]
  6. J. Ihlemann and K. Rubahn, “Excimer laser micro machining: fabrication and applications of dielectric masks,” Appl. Surf. Sci. 154, 587–592 (2000).
    [CrossRef]
  7. S. Campbell, S. M. F. Triphan, R. El-Agmy, A. H. Greenaway, and D. T. Reid, “Direct optimization of femtosecond laser ablation using adaptive wavefront shaping,” J. Opt. A Pure Appl. Opt. 9, 1100–1104 (2007).
    [CrossRef]
  8. R. J. Beck, R.Carrington, J. P. Parry, W. N. MacPherson, A. Waddie, D. T. Reid, N. Weston, J. D. Shephard, and D. P. Hand, “Adaptive optics for optimization of laser processing,” in Proceedings of LAMP2009—the 5th International Congress on Laser Advanced Materials Processing (2009), paper 09-018.
  9. J. C. Sinquin, J. M. Lurcon, and C. Guillemard, “Deformable mirror technologies for astronomy at CILAS,” Proc. SPIE 7015, 70150O (2008).
    [CrossRef]
  10. I. Murokh, A. Kerner, and S. Filatov, “Laser marking using a digital micro-mirror device,” U.S. patent 6,836,284 (28 December 2004).
  11. E. T. Ritschdorff and J. B. Shear, “Multiphoton lithography using a high-repetition rate microchip laser,” Anal. Chem. 82, 8733–8737 (2010).
    [CrossRef] [PubMed]
  12. A. Bertsch, S. Zissi, J. Y. Jezequel, S. Corbel, and J. C. Andre, “Microstereophotolithography using a liquid crystal display as dynamic mask-generator,” Microsyst. Technol. 3, 42–47 (1997).
    [CrossRef]
  13. V. Laude, “Twisted-nematic liquid-crystal pixelated active lens,” Opt. Commun. 153, 134–152 (1998).
    [CrossRef]
  14. E. Martin-Badosa, M. Montes-Usategui, A. Carnicer, J. Andilla, E. Pleguezuelos, and I. Juvells, “Design strategies for optimizing holographic optical tweezers set-ups,” J. Opt. A Pure Appl. Opt. 9, S267–S277 (2007).
    [CrossRef]
  15. K. D. Wulff, D. G. Cole, R. L. Clark, R. DiLeonardo, J. Leach, J. Cooper, G. Gibson, and M. J. Padgett, “Aberration correction in holographic optical tweezers,” Opt. Express 14, 4169–4174(2006).
    [CrossRef] [PubMed]
  16. P. M. Prieto, E. J. Fernandez, S. Manzanera, and P. Artal, “Adaptive optics with a programmable phase modulator: applications in the human eye,” Opt. Express 12, 4059–4071(2004).
    [CrossRef] [PubMed]
  17. M. Pospiech, M. Emons, A. Steinmann, G. Palmer, R. Osellame, N. Bellini, G. Cerullo, and U. Morgner, “Double waveguide couplers produced by simultaneous femtosecond writing,” Opt. Express 17, 3555–3563 (2009).
    [CrossRef] [PubMed]
  18. L. Kelemen, S. Valkai, and P. Ormos, “Parallel photopolymerisation with complex light patterns generated by diffractive optical elements,” Opt. Express 15, 14488–14497 (2007).
    [CrossRef] [PubMed]
  19. Z. Kuang, D. Liu, W. Perrie, S. Edwardson, M. Sharp, E. Fearon, G. Dearden, and K. Watkins, “Fast parallel diffractive multi-beam femtosecond laser surface micro-structuring,” Appl. Surf. Sci. 255, 6582–6588 (2009).
    [CrossRef]
  20. A. T. Sandstrom, A.-K.Holmer, U. Lungblad, and D. Hanstorp, “Pattern generation system using a spatial light modulator,” U.S. patent 6,700,095 (2 March 2004).
  21. D. L. Chen, Y. Zhang, A. Feng, Z. Xu, B. Li, and H. Shen, “Investigation of laser marking technology with the image mask of liquid crystal display,” Appl. Mech. Mat. 43, 633–636(2011).
    [CrossRef]
  22. F. Ghauri, “Method and system for laser-based high-speed digital marking of objects,” U.S. patent application 20100054287 (4 March 2010).
  23. R. J. Beck, J. P. Parry, W. N. MacPherson, A. Waddie, N. J. Weston, J. D. Shephard, and D. P. Hand, “Application of cooled spatial light modulator for high power nanosecond laser micromachining,” Opt. Express 18, 17059–17065 (2010).
    [CrossRef] [PubMed]
  24. E. Buckley, “Holographic laser projection technology,” in SID Symposium Digest (Society for Information Display, 2008), Vol  Xxxix, Books I–III, pp. 1074–1078.
    [CrossRef]
  25. J. Amako, H. Miura, and T. Sonehara, “Speckle-noise reduction on kinoform reconstruction using a phase-only spatial light-modulator,” Appl. Opt. 34, 3165–3171 (1995).
    [CrossRef] [PubMed]
  26. L. Golan and S. Shoham, “Speckle elimination using shift-averaging in high-rate holographic projection,” Opt. Express 17, 1330–1339 (2009).
    [CrossRef] [PubMed]
  27. M. Polin, K. Ladavac, S. H. Lee, Y. Roichman, and D. G. Grier, “Optimized holographic optical traps,” Opt. Express 13, 5831–5845 (2005).
    [CrossRef] [PubMed]
  28. D. Palima and V. R. Daria, “Holographic projection of arbitrary light patterns with a suppressed zero-order beam,” Appl. Opt. 46, 4197–4201 (2007).
    [CrossRef] [PubMed]
  29. J. W. Goodman, “Some fundamental properties of speckle,” J. Opt. Soc. Am. 66, 1145–1150 (1976).
    [CrossRef]

2011

D. L. Chen, Y. Zhang, A. Feng, Z. Xu, B. Li, and H. Shen, “Investigation of laser marking technology with the image mask of liquid crystal display,” Appl. Mech. Mat. 43, 633–636(2011).
[CrossRef]

2010

2009

2008

J. C. Sinquin, J. M. Lurcon, and C. Guillemard, “Deformable mirror technologies for astronomy at CILAS,” Proc. SPIE 7015, 70150O (2008).
[CrossRef]

A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. J. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H. P. Herzig, and N. de Rooij, “Multifunctional micro-optical elements for laser beam homogenizing and beam shaping,” Proc. SPIE 6879, 68790Q (2008).
[CrossRef]

E. Neiss, M. Flury, and J. Fontaine, “Diffractive optical elements for laser marking applications,” Proc. SPIE 7003, 70032L (2008).
[CrossRef]

2007

T. Lizotte and O. Ohar, “Structured beam shaping for precision laser dicing of multilayered substrates,” Proc. SPIE 6458, 64580X (2007).
[CrossRef]

S. Campbell, S. M. F. Triphan, R. El-Agmy, A. H. Greenaway, and D. T. Reid, “Direct optimization of femtosecond laser ablation using adaptive wavefront shaping,” J. Opt. A Pure Appl. Opt. 9, 1100–1104 (2007).
[CrossRef]

L. Kelemen, S. Valkai, and P. Ormos, “Parallel photopolymerisation with complex light patterns generated by diffractive optical elements,” Opt. Express 15, 14488–14497 (2007).
[CrossRef] [PubMed]

E. Martin-Badosa, M. Montes-Usategui, A. Carnicer, J. Andilla, E. Pleguezuelos, and I. Juvells, “Design strategies for optimizing holographic optical tweezers set-ups,” J. Opt. A Pure Appl. Opt. 9, S267–S277 (2007).
[CrossRef]

D. Palima and V. R. Daria, “Holographic projection of arbitrary light patterns with a suppressed zero-order beam,” Appl. Opt. 46, 4197–4201 (2007).
[CrossRef] [PubMed]

2006

K. D. Wulff, D. G. Cole, R. L. Clark, R. DiLeonardo, J. Leach, J. Cooper, G. Gibson, and M. J. Padgett, “Aberration correction in holographic optical tweezers,” Opt. Express 14, 4169–4174(2006).
[CrossRef] [PubMed]

T. Kajava, A. Hakola, H. Elfstrom, J. Simonen, P. Paakkonen, and J. Turunen, “Flat-top profile of an excimer-laser beam generated using beam-splitter gratings,” Opt. Commun. 268, 289–293 (2006).
[CrossRef]

2005

2004

2000

J. Ihlemann and K. Rubahn, “Excimer laser micro machining: fabrication and applications of dielectric masks,” Appl. Surf. Sci. 154, 587–592 (2000).
[CrossRef]

1998

V. Laude, “Twisted-nematic liquid-crystal pixelated active lens,” Opt. Commun. 153, 134–152 (1998).
[CrossRef]

1997

A. Bertsch, S. Zissi, J. Y. Jezequel, S. Corbel, and J. C. Andre, “Microstereophotolithography using a liquid crystal display as dynamic mask-generator,” Microsyst. Technol. 3, 42–47 (1997).
[CrossRef]

1995

1976

Amako, J.

Andilla, J.

E. Martin-Badosa, M. Montes-Usategui, A. Carnicer, J. Andilla, E. Pleguezuelos, and I. Juvells, “Design strategies for optimizing holographic optical tweezers set-ups,” J. Opt. A Pure Appl. Opt. 9, S267–S277 (2007).
[CrossRef]

Andre, J. C.

A. Bertsch, S. Zissi, J. Y. Jezequel, S. Corbel, and J. C. Andre, “Microstereophotolithography using a liquid crystal display as dynamic mask-generator,” Microsyst. Technol. 3, 42–47 (1997).
[CrossRef]

Artal, P.

Beck, R. J.

R. J. Beck, J. P. Parry, W. N. MacPherson, A. Waddie, N. J. Weston, J. D. Shephard, and D. P. Hand, “Application of cooled spatial light modulator for high power nanosecond laser micromachining,” Opt. Express 18, 17059–17065 (2010).
[CrossRef] [PubMed]

R. J. Beck, R.Carrington, J. P. Parry, W. N. MacPherson, A. Waddie, D. T. Reid, N. Weston, J. D. Shephard, and D. P. Hand, “Adaptive optics for optimization of laser processing,” in Proceedings of LAMP2009—the 5th International Congress on Laser Advanced Materials Processing (2009), paper 09-018.

Bellini, N.

Bertsch, A.

A. Bertsch, S. Zissi, J. Y. Jezequel, S. Corbel, and J. C. Andre, “Microstereophotolithography using a liquid crystal display as dynamic mask-generator,” Microsyst. Technol. 3, 42–47 (1997).
[CrossRef]

Bich, A.

A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. J. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H. P. Herzig, and N. de Rooij, “Multifunctional micro-optical elements for laser beam homogenizing and beam shaping,” Proc. SPIE 6879, 68790Q (2008).
[CrossRef]

Bitterli, R.

A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. J. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H. P. Herzig, and N. de Rooij, “Multifunctional micro-optical elements for laser beam homogenizing and beam shaping,” Proc. SPIE 6879, 68790Q (2008).
[CrossRef]

Buckley, E.

E. Buckley, “Holographic laser projection technology,” in SID Symposium Digest (Society for Information Display, 2008), Vol  Xxxix, Books I–III, pp. 1074–1078.
[CrossRef]

Campbell, S.

S. Campbell, S. M. F. Triphan, R. El-Agmy, A. H. Greenaway, and D. T. Reid, “Direct optimization of femtosecond laser ablation using adaptive wavefront shaping,” J. Opt. A Pure Appl. Opt. 9, 1100–1104 (2007).
[CrossRef]

Carnicer, A.

E. Martin-Badosa, M. Montes-Usategui, A. Carnicer, J. Andilla, E. Pleguezuelos, and I. Juvells, “Design strategies for optimizing holographic optical tweezers set-ups,” J. Opt. A Pure Appl. Opt. 9, S267–S277 (2007).
[CrossRef]

Carrington, R.

R. J. Beck, R.Carrington, J. P. Parry, W. N. MacPherson, A. Waddie, D. T. Reid, N. Weston, J. D. Shephard, and D. P. Hand, “Adaptive optics for optimization of laser processing,” in Proceedings of LAMP2009—the 5th International Congress on Laser Advanced Materials Processing (2009), paper 09-018.

Cerullo, G.

Chen, D. L.

D. L. Chen, Y. Zhang, A. Feng, Z. Xu, B. Li, and H. Shen, “Investigation of laser marking technology with the image mask of liquid crystal display,” Appl. Mech. Mat. 43, 633–636(2011).
[CrossRef]

Clark, R. L.

Cole, D. G.

Cooper, J.

Corbel, S.

A. Bertsch, S. Zissi, J. Y. Jezequel, S. Corbel, and J. C. Andre, “Microstereophotolithography using a liquid crystal display as dynamic mask-generator,” Microsyst. Technol. 3, 42–47 (1997).
[CrossRef]

Daria, V. R.

de Rooij, N.

A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. J. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H. P. Herzig, and N. de Rooij, “Multifunctional micro-optical elements for laser beam homogenizing and beam shaping,” Proc. SPIE 6879, 68790Q (2008).
[CrossRef]

Dearden, G.

Z. Kuang, D. Liu, W. Perrie, S. Edwardson, M. Sharp, E. Fearon, G. Dearden, and K. Watkins, “Fast parallel diffractive multi-beam femtosecond laser surface micro-structuring,” Appl. Surf. Sci. 255, 6582–6588 (2009).
[CrossRef]

DiLeonardo, R.

Dumouchel, C.

A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. J. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H. P. Herzig, and N. de Rooij, “Multifunctional micro-optical elements for laser beam homogenizing and beam shaping,” Proc. SPIE 6879, 68790Q (2008).
[CrossRef]

Edwardson, S.

Z. Kuang, D. Liu, W. Perrie, S. Edwardson, M. Sharp, E. Fearon, G. Dearden, and K. Watkins, “Fast parallel diffractive multi-beam femtosecond laser surface micro-structuring,” Appl. Surf. Sci. 255, 6582–6588 (2009).
[CrossRef]

Eisner, M.

A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. J. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H. P. Herzig, and N. de Rooij, “Multifunctional micro-optical elements for laser beam homogenizing and beam shaping,” Proc. SPIE 6879, 68790Q (2008).
[CrossRef]

El-Agmy, R.

S. Campbell, S. M. F. Triphan, R. El-Agmy, A. H. Greenaway, and D. T. Reid, “Direct optimization of femtosecond laser ablation using adaptive wavefront shaping,” J. Opt. A Pure Appl. Opt. 9, 1100–1104 (2007).
[CrossRef]

Elfstrom, H.

T. Kajava, A. Hakola, H. Elfstrom, J. Simonen, P. Paakkonen, and J. Turunen, “Flat-top profile of an excimer-laser beam generated using beam-splitter gratings,” Opt. Commun. 268, 289–293 (2006).
[CrossRef]

Emons, M.

Fearon, E.

Z. Kuang, D. Liu, W. Perrie, S. Edwardson, M. Sharp, E. Fearon, G. Dearden, and K. Watkins, “Fast parallel diffractive multi-beam femtosecond laser surface micro-structuring,” Appl. Surf. Sci. 255, 6582–6588 (2009).
[CrossRef]

Feng, A.

D. L. Chen, Y. Zhang, A. Feng, Z. Xu, B. Li, and H. Shen, “Investigation of laser marking technology with the image mask of liquid crystal display,” Appl. Mech. Mat. 43, 633–636(2011).
[CrossRef]

Fernandez, E. J.

Filatov, S.

I. Murokh, A. Kerner, and S. Filatov, “Laser marking using a digital micro-mirror device,” U.S. patent 6,836,284 (28 December 2004).

Flury, M.

E. Neiss, M. Flury, and J. Fontaine, “Diffractive optical elements for laser marking applications,” Proc. SPIE 7003, 70032L (2008).
[CrossRef]

Fontaine, J.

E. Neiss, M. Flury, and J. Fontaine, “Diffractive optical elements for laser marking applications,” Proc. SPIE 7003, 70032L (2008).
[CrossRef]

Ghauri, F.

F. Ghauri, “Method and system for laser-based high-speed digital marking of objects,” U.S. patent application 20100054287 (4 March 2010).

Gibson, G.

Golan, L.

Goodman, J. W.

Greenaway, A. H.

S. Campbell, S. M. F. Triphan, R. El-Agmy, A. H. Greenaway, and D. T. Reid, “Direct optimization of femtosecond laser ablation using adaptive wavefront shaping,” J. Opt. A Pure Appl. Opt. 9, 1100–1104 (2007).
[CrossRef]

Grier, D. G.

Guillemard, C.

J. C. Sinquin, J. M. Lurcon, and C. Guillemard, “Deformable mirror technologies for astronomy at CILAS,” Proc. SPIE 7015, 70150O (2008).
[CrossRef]

Hakola, A.

T. Kajava, A. Hakola, H. Elfstrom, J. Simonen, P. Paakkonen, and J. Turunen, “Flat-top profile of an excimer-laser beam generated using beam-splitter gratings,” Opt. Commun. 268, 289–293 (2006).
[CrossRef]

Hand, D. P.

R. J. Beck, J. P. Parry, W. N. MacPherson, A. Waddie, N. J. Weston, J. D. Shephard, and D. P. Hand, “Application of cooled spatial light modulator for high power nanosecond laser micromachining,” Opt. Express 18, 17059–17065 (2010).
[CrossRef] [PubMed]

R. J. Beck, R.Carrington, J. P. Parry, W. N. MacPherson, A. Waddie, D. T. Reid, N. Weston, J. D. Shephard, and D. P. Hand, “Adaptive optics for optimization of laser processing,” in Proceedings of LAMP2009—the 5th International Congress on Laser Advanced Materials Processing (2009), paper 09-018.

Hanstorp, D.

A. T. Sandstrom, A.-K.Holmer, U. Lungblad, and D. Hanstorp, “Pattern generation system using a spatial light modulator,” U.S. patent 6,700,095 (2 March 2004).

Herzig, H. P.

A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. J. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H. P. Herzig, and N. de Rooij, “Multifunctional micro-optical elements for laser beam homogenizing and beam shaping,” Proc. SPIE 6879, 68790Q (2008).
[CrossRef]

Holmer, A.-K.

A. T. Sandstrom, A.-K.Holmer, U. Lungblad, and D. Hanstorp, “Pattern generation system using a spatial light modulator,” U.S. patent 6,700,095 (2 March 2004).

Ihlemann, J.

J. Ihlemann and K. Rubahn, “Excimer laser micro machining: fabrication and applications of dielectric masks,” Appl. Surf. Sci. 154, 587–592 (2000).
[CrossRef]

Jezequel, J. Y.

A. Bertsch, S. Zissi, J. Y. Jezequel, S. Corbel, and J. C. Andre, “Microstereophotolithography using a liquid crystal display as dynamic mask-generator,” Microsyst. Technol. 3, 42–47 (1997).
[CrossRef]

Juvells, I.

E. Martin-Badosa, M. Montes-Usategui, A. Carnicer, J. Andilla, E. Pleguezuelos, and I. Juvells, “Design strategies for optimizing holographic optical tweezers set-ups,” J. Opt. A Pure Appl. Opt. 9, S267–S277 (2007).
[CrossRef]

Kajava, T.

T. Kajava, A. Hakola, H. Elfstrom, J. Simonen, P. Paakkonen, and J. Turunen, “Flat-top profile of an excimer-laser beam generated using beam-splitter gratings,” Opt. Commun. 268, 289–293 (2006).
[CrossRef]

Kelemen, L.

Kerner, A.

I. Murokh, A. Kerner, and S. Filatov, “Laser marking using a digital micro-mirror device,” U.S. patent 6,836,284 (28 December 2004).

Kuang, Z.

Z. Kuang, D. Liu, W. Perrie, S. Edwardson, M. Sharp, E. Fearon, G. Dearden, and K. Watkins, “Fast parallel diffractive multi-beam femtosecond laser surface micro-structuring,” Appl. Surf. Sci. 255, 6582–6588 (2009).
[CrossRef]

Ladavac, K.

Laskin, A.

A. Laskin, Beam Shaping? Easy! (Industrial Laser Solutions, 2006), pp. 17–19.

Laude, V.

V. Laude, “Twisted-nematic liquid-crystal pixelated active lens,” Opt. Commun. 153, 134–152 (1998).
[CrossRef]

Leach, J.

Lee, S. H.

Li, B.

D. L. Chen, Y. Zhang, A. Feng, Z. Xu, B. Li, and H. Shen, “Investigation of laser marking technology with the image mask of liquid crystal display,” Appl. Mech. Mat. 43, 633–636(2011).
[CrossRef]

Liu, D.

Z. Kuang, D. Liu, W. Perrie, S. Edwardson, M. Sharp, E. Fearon, G. Dearden, and K. Watkins, “Fast parallel diffractive multi-beam femtosecond laser surface micro-structuring,” Appl. Surf. Sci. 255, 6582–6588 (2009).
[CrossRef]

Lizotte, T.

T. Lizotte and O. Ohar, “Structured beam shaping for precision laser dicing of multilayered substrates,” Proc. SPIE 6458, 64580X (2007).
[CrossRef]

Lungblad, U.

A. T. Sandstrom, A.-K.Holmer, U. Lungblad, and D. Hanstorp, “Pattern generation system using a spatial light modulator,” U.S. patent 6,700,095 (2 March 2004).

Lurcon, J. M.

J. C. Sinquin, J. M. Lurcon, and C. Guillemard, “Deformable mirror technologies for astronomy at CILAS,” Proc. SPIE 7015, 70150O (2008).
[CrossRef]

MacPherson, W. N.

R. J. Beck, J. P. Parry, W. N. MacPherson, A. Waddie, N. J. Weston, J. D. Shephard, and D. P. Hand, “Application of cooled spatial light modulator for high power nanosecond laser micromachining,” Opt. Express 18, 17059–17065 (2010).
[CrossRef] [PubMed]

R. J. Beck, R.Carrington, J. P. Parry, W. N. MacPherson, A. Waddie, D. T. Reid, N. Weston, J. D. Shephard, and D. P. Hand, “Adaptive optics for optimization of laser processing,” in Proceedings of LAMP2009—the 5th International Congress on Laser Advanced Materials Processing (2009), paper 09-018.

Manzanera, S.

Martin-Badosa, E.

E. Martin-Badosa, M. Montes-Usategui, A. Carnicer, J. Andilla, E. Pleguezuelos, and I. Juvells, “Design strategies for optimizing holographic optical tweezers set-ups,” J. Opt. A Pure Appl. Opt. 9, S267–S277 (2007).
[CrossRef]

Miura, H.

Montes-Usategui, M.

E. Martin-Badosa, M. Montes-Usategui, A. Carnicer, J. Andilla, E. Pleguezuelos, and I. Juvells, “Design strategies for optimizing holographic optical tweezers set-ups,” J. Opt. A Pure Appl. Opt. 9, S267–S277 (2007).
[CrossRef]

Morgner, U.

Murokh, I.

I. Murokh, A. Kerner, and S. Filatov, “Laser marking using a digital micro-mirror device,” U.S. patent 6,836,284 (28 December 2004).

Neiss, E.

E. Neiss, M. Flury, and J. Fontaine, “Diffractive optical elements for laser marking applications,” Proc. SPIE 7003, 70032L (2008).
[CrossRef]

Noell, W.

A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. J. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H. P. Herzig, and N. de Rooij, “Multifunctional micro-optical elements for laser beam homogenizing and beam shaping,” Proc. SPIE 6879, 68790Q (2008).
[CrossRef]

Ohar, O.

T. Lizotte and O. Ohar, “Structured beam shaping for precision laser dicing of multilayered substrates,” Proc. SPIE 6458, 64580X (2007).
[CrossRef]

Ormos, P.

Osellame, R.

Paakkonen, P.

T. Kajava, A. Hakola, H. Elfstrom, J. Simonen, P. Paakkonen, and J. Turunen, “Flat-top profile of an excimer-laser beam generated using beam-splitter gratings,” Opt. Commun. 268, 289–293 (2006).
[CrossRef]

Padgett, M. J.

Palima, D.

Palmer, G.

Parry, J. P.

R. J. Beck, J. P. Parry, W. N. MacPherson, A. Waddie, N. J. Weston, J. D. Shephard, and D. P. Hand, “Application of cooled spatial light modulator for high power nanosecond laser micromachining,” Opt. Express 18, 17059–17065 (2010).
[CrossRef] [PubMed]

R. J. Beck, R.Carrington, J. P. Parry, W. N. MacPherson, A. Waddie, D. T. Reid, N. Weston, J. D. Shephard, and D. P. Hand, “Adaptive optics for optimization of laser processing,” in Proceedings of LAMP2009—the 5th International Congress on Laser Advanced Materials Processing (2009), paper 09-018.

Perrie, W.

Z. Kuang, D. Liu, W. Perrie, S. Edwardson, M. Sharp, E. Fearon, G. Dearden, and K. Watkins, “Fast parallel diffractive multi-beam femtosecond laser surface micro-structuring,” Appl. Surf. Sci. 255, 6582–6588 (2009).
[CrossRef]

Pleguezuelos, E.

E. Martin-Badosa, M. Montes-Usategui, A. Carnicer, J. Andilla, E. Pleguezuelos, and I. Juvells, “Design strategies for optimizing holographic optical tweezers set-ups,” J. Opt. A Pure Appl. Opt. 9, S267–S277 (2007).
[CrossRef]

Polin, M.

Pospiech, M.

Prieto, P. M.

Ramanan, N.

A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. J. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H. P. Herzig, and N. de Rooij, “Multifunctional micro-optical elements for laser beam homogenizing and beam shaping,” Proc. SPIE 6879, 68790Q (2008).
[CrossRef]

Rank, M.

A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. J. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H. P. Herzig, and N. de Rooij, “Multifunctional micro-optical elements for laser beam homogenizing and beam shaping,” Proc. SPIE 6879, 68790Q (2008).
[CrossRef]

Reid, D. T.

S. Campbell, S. M. F. Triphan, R. El-Agmy, A. H. Greenaway, and D. T. Reid, “Direct optimization of femtosecond laser ablation using adaptive wavefront shaping,” J. Opt. A Pure Appl. Opt. 9, 1100–1104 (2007).
[CrossRef]

R. J. Beck, R.Carrington, J. P. Parry, W. N. MacPherson, A. Waddie, D. T. Reid, N. Weston, J. D. Shephard, and D. P. Hand, “Adaptive optics for optimization of laser processing,” in Proceedings of LAMP2009—the 5th International Congress on Laser Advanced Materials Processing (2009), paper 09-018.

Rieck, J.

A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. J. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H. P. Herzig, and N. de Rooij, “Multifunctional micro-optical elements for laser beam homogenizing and beam shaping,” Proc. SPIE 6879, 68790Q (2008).
[CrossRef]

Ritschdorff, E. T.

E. T. Ritschdorff and J. B. Shear, “Multiphoton lithography using a high-repetition rate microchip laser,” Anal. Chem. 82, 8733–8737 (2010).
[CrossRef] [PubMed]

Roichman, Y.

Roth, S.

A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. J. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H. P. Herzig, and N. de Rooij, “Multifunctional micro-optical elements for laser beam homogenizing and beam shaping,” Proc. SPIE 6879, 68790Q (2008).
[CrossRef]

Rubahn, K.

J. Ihlemann and K. Rubahn, “Excimer laser micro machining: fabrication and applications of dielectric masks,” Appl. Surf. Sci. 154, 587–592 (2000).
[CrossRef]

Ruffieux, P.

A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. J. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H. P. Herzig, and N. de Rooij, “Multifunctional micro-optical elements for laser beam homogenizing and beam shaping,” Proc. SPIE 6879, 68790Q (2008).
[CrossRef]

Sandstrom, A. T.

A. T. Sandstrom, A.-K.Holmer, U. Lungblad, and D. Hanstorp, “Pattern generation system using a spatial light modulator,” U.S. patent 6,700,095 (2 March 2004).

Scharf, T.

A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. J. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H. P. Herzig, and N. de Rooij, “Multifunctional micro-optical elements for laser beam homogenizing and beam shaping,” Proc. SPIE 6879, 68790Q (2008).
[CrossRef]

Schmidt, M.

A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. J. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H. P. Herzig, and N. de Rooij, “Multifunctional micro-optical elements for laser beam homogenizing and beam shaping,” Proc. SPIE 6879, 68790Q (2008).
[CrossRef]

Sharp, M.

Z. Kuang, D. Liu, W. Perrie, S. Edwardson, M. Sharp, E. Fearon, G. Dearden, and K. Watkins, “Fast parallel diffractive multi-beam femtosecond laser surface micro-structuring,” Appl. Surf. Sci. 255, 6582–6588 (2009).
[CrossRef]

Shear, J. B.

E. T. Ritschdorff and J. B. Shear, “Multiphoton lithography using a high-repetition rate microchip laser,” Anal. Chem. 82, 8733–8737 (2010).
[CrossRef] [PubMed]

Shen, H.

D. L. Chen, Y. Zhang, A. Feng, Z. Xu, B. Li, and H. Shen, “Investigation of laser marking technology with the image mask of liquid crystal display,” Appl. Mech. Mat. 43, 633–636(2011).
[CrossRef]

Shephard, J. D.

R. J. Beck, J. P. Parry, W. N. MacPherson, A. Waddie, N. J. Weston, J. D. Shephard, and D. P. Hand, “Application of cooled spatial light modulator for high power nanosecond laser micromachining,” Opt. Express 18, 17059–17065 (2010).
[CrossRef] [PubMed]

R. J. Beck, R.Carrington, J. P. Parry, W. N. MacPherson, A. Waddie, D. T. Reid, N. Weston, J. D. Shephard, and D. P. Hand, “Adaptive optics for optimization of laser processing,” in Proceedings of LAMP2009—the 5th International Congress on Laser Advanced Materials Processing (2009), paper 09-018.

Shoham, S.

Simonen, J.

T. Kajava, A. Hakola, H. Elfstrom, J. Simonen, P. Paakkonen, and J. Turunen, “Flat-top profile of an excimer-laser beam generated using beam-splitter gratings,” Opt. Commun. 268, 289–293 (2006).
[CrossRef]

Sinquin, J. C.

J. C. Sinquin, J. M. Lurcon, and C. Guillemard, “Deformable mirror technologies for astronomy at CILAS,” Proc. SPIE 7015, 70150O (2008).
[CrossRef]

Sonehara, T.

Steinmann, A.

Triphan, S. M. F.

S. Campbell, S. M. F. Triphan, R. El-Agmy, A. H. Greenaway, and D. T. Reid, “Direct optimization of femtosecond laser ablation using adaptive wavefront shaping,” J. Opt. A Pure Appl. Opt. 9, 1100–1104 (2007).
[CrossRef]

Turunen, J.

T. Kajava, A. Hakola, H. Elfstrom, J. Simonen, P. Paakkonen, and J. Turunen, “Flat-top profile of an excimer-laser beam generated using beam-splitter gratings,” Opt. Commun. 268, 289–293 (2006).
[CrossRef]

Valkai, S.

Voelkel, R.

A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. J. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H. P. Herzig, and N. de Rooij, “Multifunctional micro-optical elements for laser beam homogenizing and beam shaping,” Proc. SPIE 6879, 68790Q (2008).
[CrossRef]

Waddie, A.

R. J. Beck, J. P. Parry, W. N. MacPherson, A. Waddie, N. J. Weston, J. D. Shephard, and D. P. Hand, “Application of cooled spatial light modulator for high power nanosecond laser micromachining,” Opt. Express 18, 17059–17065 (2010).
[CrossRef] [PubMed]

R. J. Beck, R.Carrington, J. P. Parry, W. N. MacPherson, A. Waddie, D. T. Reid, N. Weston, J. D. Shephard, and D. P. Hand, “Adaptive optics for optimization of laser processing,” in Proceedings of LAMP2009—the 5th International Congress on Laser Advanced Materials Processing (2009), paper 09-018.

Watkins, K.

Z. Kuang, D. Liu, W. Perrie, S. Edwardson, M. Sharp, E. Fearon, G. Dearden, and K. Watkins, “Fast parallel diffractive multi-beam femtosecond laser surface micro-structuring,” Appl. Surf. Sci. 255, 6582–6588 (2009).
[CrossRef]

Weible, K. J.

A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. J. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H. P. Herzig, and N. de Rooij, “Multifunctional micro-optical elements for laser beam homogenizing and beam shaping,” Proc. SPIE 6879, 68790Q (2008).
[CrossRef]

Weston, N.

R. J. Beck, R.Carrington, J. P. Parry, W. N. MacPherson, A. Waddie, D. T. Reid, N. Weston, J. D. Shephard, and D. P. Hand, “Adaptive optics for optimization of laser processing,” in Proceedings of LAMP2009—the 5th International Congress on Laser Advanced Materials Processing (2009), paper 09-018.

Weston, N. J.

Wulff, K. D.

Xu, Z.

D. L. Chen, Y. Zhang, A. Feng, Z. Xu, B. Li, and H. Shen, “Investigation of laser marking technology with the image mask of liquid crystal display,” Appl. Mech. Mat. 43, 633–636(2011).
[CrossRef]

Zhang, Y.

D. L. Chen, Y. Zhang, A. Feng, Z. Xu, B. Li, and H. Shen, “Investigation of laser marking technology with the image mask of liquid crystal display,” Appl. Mech. Mat. 43, 633–636(2011).
[CrossRef]

Zimmermann, M.

A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. J. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H. P. Herzig, and N. de Rooij, “Multifunctional micro-optical elements for laser beam homogenizing and beam shaping,” Proc. SPIE 6879, 68790Q (2008).
[CrossRef]

Zissi, S.

A. Bertsch, S. Zissi, J. Y. Jezequel, S. Corbel, and J. C. Andre, “Microstereophotolithography using a liquid crystal display as dynamic mask-generator,” Microsyst. Technol. 3, 42–47 (1997).
[CrossRef]

Anal. Chem.

E. T. Ritschdorff and J. B. Shear, “Multiphoton lithography using a high-repetition rate microchip laser,” Anal. Chem. 82, 8733–8737 (2010).
[CrossRef] [PubMed]

Appl. Mech. Mat.

D. L. Chen, Y. Zhang, A. Feng, Z. Xu, B. Li, and H. Shen, “Investigation of laser marking technology with the image mask of liquid crystal display,” Appl. Mech. Mat. 43, 633–636(2011).
[CrossRef]

Appl. Opt.

Appl. Surf. Sci.

Z. Kuang, D. Liu, W. Perrie, S. Edwardson, M. Sharp, E. Fearon, G. Dearden, and K. Watkins, “Fast parallel diffractive multi-beam femtosecond laser surface micro-structuring,” Appl. Surf. Sci. 255, 6582–6588 (2009).
[CrossRef]

J. Ihlemann and K. Rubahn, “Excimer laser micro machining: fabrication and applications of dielectric masks,” Appl. Surf. Sci. 154, 587–592 (2000).
[CrossRef]

J. Opt. A Pure Appl. Opt.

S. Campbell, S. M. F. Triphan, R. El-Agmy, A. H. Greenaway, and D. T. Reid, “Direct optimization of femtosecond laser ablation using adaptive wavefront shaping,” J. Opt. A Pure Appl. Opt. 9, 1100–1104 (2007).
[CrossRef]

E. Martin-Badosa, M. Montes-Usategui, A. Carnicer, J. Andilla, E. Pleguezuelos, and I. Juvells, “Design strategies for optimizing holographic optical tweezers set-ups,” J. Opt. A Pure Appl. Opt. 9, S267–S277 (2007).
[CrossRef]

J. Opt. Soc. Am.

Microsyst. Technol.

A. Bertsch, S. Zissi, J. Y. Jezequel, S. Corbel, and J. C. Andre, “Microstereophotolithography using a liquid crystal display as dynamic mask-generator,” Microsyst. Technol. 3, 42–47 (1997).
[CrossRef]

Opt. Commun.

V. Laude, “Twisted-nematic liquid-crystal pixelated active lens,” Opt. Commun. 153, 134–152 (1998).
[CrossRef]

T. Kajava, A. Hakola, H. Elfstrom, J. Simonen, P. Paakkonen, and J. Turunen, “Flat-top profile of an excimer-laser beam generated using beam-splitter gratings,” Opt. Commun. 268, 289–293 (2006).
[CrossRef]

Opt. Express

Proc. SPIE

E. Neiss, M. Flury, and J. Fontaine, “Diffractive optical elements for laser marking applications,” Proc. SPIE 7003, 70032L (2008).
[CrossRef]

T. Lizotte and O. Ohar, “Structured beam shaping for precision laser dicing of multilayered substrates,” Proc. SPIE 6458, 64580X (2007).
[CrossRef]

A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. J. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H. P. Herzig, and N. de Rooij, “Multifunctional micro-optical elements for laser beam homogenizing and beam shaping,” Proc. SPIE 6879, 68790Q (2008).
[CrossRef]

J. C. Sinquin, J. M. Lurcon, and C. Guillemard, “Deformable mirror technologies for astronomy at CILAS,” Proc. SPIE 7015, 70150O (2008).
[CrossRef]

Other

I. Murokh, A. Kerner, and S. Filatov, “Laser marking using a digital micro-mirror device,” U.S. patent 6,836,284 (28 December 2004).

R. J. Beck, R.Carrington, J. P. Parry, W. N. MacPherson, A. Waddie, D. T. Reid, N. Weston, J. D. Shephard, and D. P. Hand, “Adaptive optics for optimization of laser processing,” in Proceedings of LAMP2009—the 5th International Congress on Laser Advanced Materials Processing (2009), paper 09-018.

A. Laskin, Beam Shaping? Easy! (Industrial Laser Solutions, 2006), pp. 17–19.

A. T. Sandstrom, A.-K.Holmer, U. Lungblad, and D. Hanstorp, “Pattern generation system using a spatial light modulator,” U.S. patent 6,700,095 (2 March 2004).

E. Buckley, “Holographic laser projection technology,” in SID Symposium Digest (Society for Information Display, 2008), Vol  Xxxix, Books I–III, pp. 1074–1078.
[CrossRef]

F. Ghauri, “Method and system for laser-based high-speed digital marking of objects,” U.S. patent application 20100054287 (4 March 2010).

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Figures (8)

Fig. 1
Fig. 1

SLM and optical system to deliver image to workpiece.

Fig. 2
Fig. 2

Demonstration of a periodic kinoform shift for a periodicity c = 4 . The phase map is shifted by one period in the horizontal axis and two in the vertical axis. The circle tracks a single feature.

Fig. 3
Fig. 3

Images of holograms formed at the end of a 6-f optical system taken using a CCD camera. A, result for the original calculated kinoform. B, 16 images taken for randomly shifted kinoforms, combined and normalized in software. C, 16 images taken for periodically shifted kinoforms, combined and normalized in software.

Fig. 4
Fig. 4

Plot of normalized intensity values taken from each image shown in Fig. 3. Plots are also shown for the ideal case and for the case where the image is still pixelated but each pixel is of uniform intensity.

Fig. 5
Fig. 5

A, star pattern used to derive kinoform for hologram. B, star pattern marked on thin layer of aluminum coated on glass. A kinoform was marked nine times with 100 ms exposure.

Fig. 6
Fig. 6

Marks on a thin layer of aluminum coated on glass created using an SLM to produce an off-axis image. A, single kinoform marked 16 times with 200 ms exposure. B, 16 randomly shifted kinoforms marked for 200 ms each. C, 16 periodically shifted kinoforms marked for 200 ms each.

Fig. 7
Fig. 7

A, data matrix pattern representing character “A” marked on thin layer of aluminum coated on glass. 16 periodically shifted kinoforms were marked for 10 ms each. B, data matrix marked in photoresist using 16 periodically shifted kinoforms marked for 300 ms each. The stainless steel substrate is untouched by the machining process.

Fig. 8
Fig. 8

Data matrix representing the letters “AOP” marked on stainless steel. A, using a 50 mm single element lens and 16 periodically shifted kinoforms marked for 100 ms each. B, using a 30 mm doublet lens four overlapping patterns are marked using a total of 36 periodically shifted kinoforms each marked for 1.7 ms . C, four separate patterns used to build up the mark shown in B.

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