Abstract

“Moiré-based focusing and leveling scheme for optical projection lithography” by Yan et al. [1] and “Two-beam coupling dynamic range compression deconvolution” by Haji-saeed et al. [2] have been reassigned and will appear as regular papers in the 1 November issue of Applied Optics.

© 2010 Optical Society of America.

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References

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  1. W. Yan, Y. Yang, W. Chen, S. Hu, and S. Zhou, “Moiré-based focusing and leveling scheme for optical projection lithography,” Appl. Opt. 49, 5959–5963 (2010).
    [Crossref]
  2. B. Haji-saeed, W. D. Goodhue, C. L. Woods, J. Kierstead, and J. Khoury, “Two-beam coupling in dynamic range compression deconvolution,” Appl. Opt. 49, 5964–5976 (2010).
    [Crossref]

2010 (2)

Chen, W.

Goodhue, W. D.

Haji-saeed, B.

Hu, S.

Khoury, J.

Kierstead, J.

Woods, C. L.

Yan, W.

Yang, Y.

Zhou, S.

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