Abstract

During the process of integrated circuit manufacturing, positioning techniques, such as leveling and focusing, are among the key factors in improving the resolution of optical lithography and related lithographic tools. We present a measurement scheme based on the proverbial moiré effect for focus positioning in projection lithography. The framework of this scheme is based on a fundamental model of dual gratings and can also be decomposed into a dual 4f optical system. In this scheme, the moiré effect that usually occurs in the superposition of two gratings also comes forth when they are located at two sides of the dual 4f optical system, which puts one grating together with the other by optical imaging. Related results of this basic dual-grating model have been concluded. The framework of this scheme is built, and the complex structure is explored when similarly broken down to a basic model of two superposed proximity gratings. Finally, experimental results and corresponding analyses indicate that focusing resolution at the nanometer level can be realized by this scheme.

© 2010 Optical Society of America

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Corrections

, "Adaptive Optics feature pagination: publisher’s note," Appl. Opt. 49, 6139-6139 (2010)
https://www.osapublishing.org/ao/abstract.cfm?uri=ao-49-31-6139

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