Abstract

We report on a novel aberration correction technique that uses the sequential combination of two different aberration measurement methods to correct for setup-induced and specimen-induced aberrations. The advantages of both methods are combined and, thus, the measurement time is strongly reduced without loss of accuracy. The technique is implemented using a spatial-light-modulator-based wide-field microscope without the need for additional components (e.g., a Shack–Hartmann sensor). The aberrations are measured without a reference object by directly using the specimen to be imaged. We demonstrate experimental results for technical as well as biological specimens.

© 2010 Optical Society of America

Full Article  |  PDF Article

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Figures (9)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Metrics

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription