J. Garofalo, C. J. Biddick, R. L. Kostelak, and S. Vaidya, “Mask assisted off axis illumination technique for random logic,” J. Vac. Sci. Technol. B 11, 2651-2658 (1993).

[CrossRef]

M. Born and E. Wolf, Principles of Optics, 6th ed. (Pergamon, 1980), Chap. 10.

R. J. Socha, J. S. Petersen, J. F. Chen, T. L.Laidig, K. E.Wampler, and R. F. Caldwell, “Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation I,” Proc. SPIE 3546617-641 (1998).

[CrossRef]

K. Yamazoe, P. Cantu', G. Capetti, E. Evangelista, Y. Hasegawa, J. Iwasa, O. Toublan, S. Loi, M. Lupo, A. Pepe, T. Kuno, A. Suzuki, and K. Saitoh, “Full-chip implementation of IDEAL Smile on 90 nm-node devices by ArF lithography,” Jpn. J. Appl. Phys. 44, 5526-5534 (2005).

[CrossRef]

K. Yamazoe, P. Cantu', G. Capetti, E. Evangelista, Y. Hasegawa, J. Iwasa, O. Toublan, S. Loi, M. Lupo, A. Pepe, T. Kuno, A. Suzuki, and K. Saitoh, “Full-chip implementation of IDEAL Smile on 90 nm-node devices by ArF lithography,” Jpn. J. Appl. Phys. 44, 5526-5534 (2005).

[CrossRef]

G. R. McIntyre, J. Holwill, A. Neureuther, L. Capodieci, Y. Zou, H. Levinson, and J. Kye, “Screening layouts for high-numerical aperture and polarization effects using pattern matching,” J. Vac. Sci. Technol. B 23, 2646-2652 (2005).

[CrossRef]

R. J. Socha, D. J. Van Den Broeke, S. D. Hsu, J. F. Chen, T. L. Laidig, N. Corcoran, U. Hollerbach, K. E. Wampler, X. Shi, and W. Conley, “Contact hole reticle optimization by using interference mapping lithography (IML),” Proc. SPIE 5377, 222-240 (2004).

[CrossRef]

R. J. Socha, J. S. Petersen, J. F. Chen, T. L.Laidig, K. E.Wampler, and R. F. Caldwell, “Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation I,” Proc. SPIE 3546617-641 (1998).

[CrossRef]

N. B. Cobb, “Fast optical and process proximity correction algorithms for integrated circuit manufacturing,” Ph.D. dissertation (Electrical Engineering and Computer Science, University of California, Berkeley, 1998).

R. J. Socha, D. J. Van Den Broeke, S. D. Hsu, J. F. Chen, T. L. Laidig, N. Corcoran, U. Hollerbach, K. E. Wampler, X. Shi, and W. Conley, “Contact hole reticle optimization by using interference mapping lithography (IML),” Proc. SPIE 5377, 222-240 (2004).

[CrossRef]

R. J. Socha, D. J. Van Den Broeke, S. D. Hsu, J. F. Chen, T. L. Laidig, N. Corcoran, U. Hollerbach, K. E. Wampler, X. Shi, and W. Conley, “Contact hole reticle optimization by using interference mapping lithography (IML),” Proc. SPIE 5377, 222-240 (2004).

[CrossRef]

K. Yamazoe, P. Cantu', G. Capetti, E. Evangelista, Y. Hasegawa, J. Iwasa, O. Toublan, S. Loi, M. Lupo, A. Pepe, T. Kuno, A. Suzuki, and K. Saitoh, “Full-chip implementation of IDEAL Smile on 90 nm-node devices by ArF lithography,” Jpn. J. Appl. Phys. 44, 5526-5534 (2005).

[CrossRef]

H. Gamo, “Matrix treatment of partial coherence,” in *Progress in Optics*, E. Wolf, ed.(North-Holland, 1964), Vol. 3, Chap. 3.

[CrossRef]

J. Garofalo, C. J. Biddick, R. L. Kostelak, and S. Vaidya, “Mask assisted off axis illumination technique for random logic,” J. Vac. Sci. Technol. B 11, 2651-2658 (1993).

[CrossRef]

J. W. Goodman, *Statistical Optics*, 1st ed. (Wiley-Interscience, 1985), Chap. 7.

J. W. Goodman, *Statistical Optics*, 1st ed. (Wiley-Interscience, 1985), pp. 109-111.

K. Yamazoe, Y. Sekine, M. Kawashima, M. Hakko, T. Ono, and T. Honda, “Resolution enhancement by aerial image approximation with 2D-TCC,” Proc. SPIE 6730, 67302H (2007).

[CrossRef]

K. Yamazoe, P. Cantu', G. Capetti, E. Evangelista, Y. Hasegawa, J. Iwasa, O. Toublan, S. Loi, M. Lupo, A. Pepe, T. Kuno, A. Suzuki, and K. Saitoh, “Full-chip implementation of IDEAL Smile on 90 nm-node devices by ArF lithography,” Jpn. J. Appl. Phys. 44, 5526-5534 (2005).

[CrossRef]

R. J. Socha, D. J. Van Den Broeke, S. D. Hsu, J. F. Chen, T. L. Laidig, N. Corcoran, U. Hollerbach, K. E. Wampler, X. Shi, and W. Conley, “Contact hole reticle optimization by using interference mapping lithography (IML),” Proc. SPIE 5377, 222-240 (2004).

[CrossRef]

G. R. McIntyre, J. Holwill, A. Neureuther, L. Capodieci, Y. Zou, H. Levinson, and J. Kye, “Screening layouts for high-numerical aperture and polarization effects using pattern matching,” J. Vac. Sci. Technol. B 23, 2646-2652 (2005).

[CrossRef]

K. Yamazoe, Y. Sekine, M. Kawashima, M. Hakko, T. Ono, and T. Honda, “Resolution enhancement by aerial image approximation with 2D-TCC,” Proc. SPIE 6730, 67302H (2007).

[CrossRef]

H. H. Hopkins, “On the diffraction theory of optical image,” Proc. R. Soc. London Ser. A 217, 408-432 (1953).

[CrossRef]

R. J. Socha, D. J. Van Den Broeke, S. D. Hsu, J. F. Chen, T. L. Laidig, N. Corcoran, U. Hollerbach, K. E. Wampler, X. Shi, and W. Conley, “Contact hole reticle optimization by using interference mapping lithography (IML),” Proc. SPIE 5377, 222-240 (2004).

[CrossRef]

K. Yamazoe, P. Cantu', G. Capetti, E. Evangelista, Y. Hasegawa, J. Iwasa, O. Toublan, S. Loi, M. Lupo, A. Pepe, T. Kuno, A. Suzuki, and K. Saitoh, “Full-chip implementation of IDEAL Smile on 90 nm-node devices by ArF lithography,” Jpn. J. Appl. Phys. 44, 5526-5534 (2005).

[CrossRef]

K. Yamazoe, Y. Sekine, M. Kawashima, M. Hakko, T. Ono, and T. Honda, “Resolution enhancement by aerial image approximation with 2D-TCC,” Proc. SPIE 6730, 67302H (2007).

[CrossRef]

J. Garofalo, C. J. Biddick, R. L. Kostelak, and S. Vaidya, “Mask assisted off axis illumination technique for random logic,” J. Vac. Sci. Technol. B 11, 2651-2658 (1993).

[CrossRef]

K. Yamazoe, P. Cantu', G. Capetti, E. Evangelista, Y. Hasegawa, J. Iwasa, O. Toublan, S. Loi, M. Lupo, A. Pepe, T. Kuno, A. Suzuki, and K. Saitoh, “Full-chip implementation of IDEAL Smile on 90 nm-node devices by ArF lithography,” Jpn. J. Appl. Phys. 44, 5526-5534 (2005).

[CrossRef]

G. R. McIntyre, J. Holwill, A. Neureuther, L. Capodieci, Y. Zou, H. Levinson, and J. Kye, “Screening layouts for high-numerical aperture and polarization effects using pattern matching,” J. Vac. Sci. Technol. B 23, 2646-2652 (2005).

[CrossRef]

R. J. Socha, D. J. Van Den Broeke, S. D. Hsu, J. F. Chen, T. L. Laidig, N. Corcoran, U. Hollerbach, K. E. Wampler, X. Shi, and W. Conley, “Contact hole reticle optimization by using interference mapping lithography (IML),” Proc. SPIE 5377, 222-240 (2004).

[CrossRef]

R. J. Socha, J. S. Petersen, J. F. Chen, T. L.Laidig, K. E.Wampler, and R. F. Caldwell, “Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation I,” Proc. SPIE 3546617-641 (1998).

[CrossRef]

G. R. McIntyre, J. Holwill, A. Neureuther, L. Capodieci, Y. Zou, H. Levinson, and J. Kye, “Screening layouts for high-numerical aperture and polarization effects using pattern matching,” J. Vac. Sci. Technol. B 23, 2646-2652 (2005).

[CrossRef]

K. Yamazoe, P. Cantu', G. Capetti, E. Evangelista, Y. Hasegawa, J. Iwasa, O. Toublan, S. Loi, M. Lupo, A. Pepe, T. Kuno, A. Suzuki, and K. Saitoh, “Full-chip implementation of IDEAL Smile on 90 nm-node devices by ArF lithography,” Jpn. J. Appl. Phys. 44, 5526-5534 (2005).

[CrossRef]

K. Yamazoe, P. Cantu', G. Capetti, E. Evangelista, Y. Hasegawa, J. Iwasa, O. Toublan, S. Loi, M. Lupo, A. Pepe, T. Kuno, A. Suzuki, and K. Saitoh, “Full-chip implementation of IDEAL Smile on 90 nm-node devices by ArF lithography,” Jpn. J. Appl. Phys. 44, 5526-5534 (2005).

[CrossRef]

M. Mansuripur, *Classical Optics and Its Applications* (Cambridge U. Press, 2002), pp. 89-100.

G. R. McIntyre, J. Holwill, A. Neureuther, L. Capodieci, Y. Zou, H. Levinson, and J. Kye, “Screening layouts for high-numerical aperture and polarization effects using pattern matching,” J. Vac. Sci. Technol. B 23, 2646-2652 (2005).

[CrossRef]

G. R. McIntyre, J. Holwill, A. Neureuther, L. Capodieci, Y. Zou, H. Levinson, and J. Kye, “Screening layouts for high-numerical aperture and polarization effects using pattern matching,” J. Vac. Sci. Technol. B 23, 2646-2652 (2005).

[CrossRef]

K. Yamazoe, Y. Sekine, M. Kawashima, M. Hakko, T. Ono, and T. Honda, “Resolution enhancement by aerial image approximation with 2D-TCC,” Proc. SPIE 6730, 67302H (2007).

[CrossRef]

K. Yamazoe, P. Cantu', G. Capetti, E. Evangelista, Y. Hasegawa, J. Iwasa, O. Toublan, S. Loi, M. Lupo, A. Pepe, T. Kuno, A. Suzuki, and K. Saitoh, “Full-chip implementation of IDEAL Smile on 90 nm-node devices by ArF lithography,” Jpn. J. Appl. Phys. 44, 5526-5534 (2005).

[CrossRef]

R. J. Socha, J. S. Petersen, J. F. Chen, T. L.Laidig, K. E.Wampler, and R. F. Caldwell, “Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation I,” Proc. SPIE 3546617-641 (1998).

[CrossRef]

K. Yamazoe, P. Cantu', G. Capetti, E. Evangelista, Y. Hasegawa, J. Iwasa, O. Toublan, S. Loi, M. Lupo, A. Pepe, T. Kuno, A. Suzuki, and K. Saitoh, “Full-chip implementation of IDEAL Smile on 90 nm-node devices by ArF lithography,” Jpn. J. Appl. Phys. 44, 5526-5534 (2005).

[CrossRef]

F. M. Schellenberg, “Resolution enhancement technology: the past, the present, and extensions of the future,” Proc SPIE 5377, 1-20 (2004).

K. Yamazoe, Y. Sekine, M. Kawashima, M. Hakko, T. Ono, and T. Honda, “Resolution enhancement by aerial image approximation with 2D-TCC,” Proc. SPIE 6730, 67302H (2007).

[CrossRef]

R. J. Socha, D. J. Van Den Broeke, S. D. Hsu, J. F. Chen, T. L. Laidig, N. Corcoran, U. Hollerbach, K. E. Wampler, X. Shi, and W. Conley, “Contact hole reticle optimization by using interference mapping lithography (IML),” Proc. SPIE 5377, 222-240 (2004).

[CrossRef]

R. Socha, “Propagation effects of partially coherent light in optical lithography and inspection,” Ph.D. dissertation (Electronics Research Laboratory, University of California, Berkeley, 1997).

R. J. Socha, D. J. Van Den Broeke, S. D. Hsu, J. F. Chen, T. L. Laidig, N. Corcoran, U. Hollerbach, K. E. Wampler, X. Shi, and W. Conley, “Contact hole reticle optimization by using interference mapping lithography (IML),” Proc. SPIE 5377, 222-240 (2004).

[CrossRef]

R. J. Socha, J. S. Petersen, J. F. Chen, T. L.Laidig, K. E.Wampler, and R. F. Caldwell, “Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation I,” Proc. SPIE 3546617-641 (1998).

[CrossRef]

K. Yamazoe, P. Cantu', G. Capetti, E. Evangelista, Y. Hasegawa, J. Iwasa, O. Toublan, S. Loi, M. Lupo, A. Pepe, T. Kuno, A. Suzuki, and K. Saitoh, “Full-chip implementation of IDEAL Smile on 90 nm-node devices by ArF lithography,” Jpn. J. Appl. Phys. 44, 5526-5534 (2005).

[CrossRef]

K. Yamazoe, P. Cantu', G. Capetti, E. Evangelista, Y. Hasegawa, J. Iwasa, O. Toublan, S. Loi, M. Lupo, A. Pepe, T. Kuno, A. Suzuki, and K. Saitoh, “Full-chip implementation of IDEAL Smile on 90 nm-node devices by ArF lithography,” Jpn. J. Appl. Phys. 44, 5526-5534 (2005).

[CrossRef]

J. Garofalo, C. J. Biddick, R. L. Kostelak, and S. Vaidya, “Mask assisted off axis illumination technique for random logic,” J. Vac. Sci. Technol. B 11, 2651-2658 (1993).

[CrossRef]

R. J. Socha, D. J. Van Den Broeke, S. D. Hsu, J. F. Chen, T. L. Laidig, N. Corcoran, U. Hollerbach, K. E. Wampler, X. Shi, and W. Conley, “Contact hole reticle optimization by using interference mapping lithography (IML),” Proc. SPIE 5377, 222-240 (2004).

[CrossRef]

R. J. Socha, D. J. Van Den Broeke, S. D. Hsu, J. F. Chen, T. L. Laidig, N. Corcoran, U. Hollerbach, K. E. Wampler, X. Shi, and W. Conley, “Contact hole reticle optimization by using interference mapping lithography (IML),” Proc. SPIE 5377, 222-240 (2004).

[CrossRef]

R. J. Socha, J. S. Petersen, J. F. Chen, T. L.Laidig, K. E.Wampler, and R. F. Caldwell, “Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation I,” Proc. SPIE 3546617-641 (1998).

[CrossRef]

M. Born and E. Wolf, Principles of Optics, 6th ed. (Pergamon, 1980), Chap. 10.

A. K. Wong, *Resolution Enhancement Techniques in Optical Lithography*, Vol. TT47 of SPIE Tutorial Texts in Optical Engineering (SPIE Press, 2001), Chap. 4.

[CrossRef]

K. Yamazoe, Y. Sekine, M. Kawashima, M. Hakko, T. Ono, and T. Honda, “Resolution enhancement by aerial image approximation with 2D-TCC,” Proc. SPIE 6730, 67302H (2007).

[CrossRef]

K. Yamazoe, P. Cantu', G. Capetti, E. Evangelista, Y. Hasegawa, J. Iwasa, O. Toublan, S. Loi, M. Lupo, A. Pepe, T. Kuno, A. Suzuki, and K. Saitoh, “Full-chip implementation of IDEAL Smile on 90 nm-node devices by ArF lithography,” Jpn. J. Appl. Phys. 44, 5526-5534 (2005).

[CrossRef]

G. R. McIntyre, J. Holwill, A. Neureuther, L. Capodieci, Y. Zou, H. Levinson, and J. Kye, “Screening layouts for high-numerical aperture and polarization effects using pattern matching,” J. Vac. Sci. Technol. B 23, 2646-2652 (2005).

[CrossRef]

G. R. McIntyre, J. Holwill, A. Neureuther, L. Capodieci, Y. Zou, H. Levinson, and J. Kye, “Screening layouts for high-numerical aperture and polarization effects using pattern matching,” J. Vac. Sci. Technol. B 23, 2646-2652 (2005).

[CrossRef]

J. Garofalo, C. J. Biddick, R. L. Kostelak, and S. Vaidya, “Mask assisted off axis illumination technique for random logic,” J. Vac. Sci. Technol. B 11, 2651-2658 (1993).

[CrossRef]

K. Yamazoe, P. Cantu', G. Capetti, E. Evangelista, Y. Hasegawa, J. Iwasa, O. Toublan, S. Loi, M. Lupo, A. Pepe, T. Kuno, A. Suzuki, and K. Saitoh, “Full-chip implementation of IDEAL Smile on 90 nm-node devices by ArF lithography,” Jpn. J. Appl. Phys. 44, 5526-5534 (2005).

[CrossRef]

F. M. Schellenberg, “Resolution enhancement technology: the past, the present, and extensions of the future,” Proc SPIE 5377, 1-20 (2004).

H. H. Hopkins, “On the diffraction theory of optical image,” Proc. R. Soc. London Ser. A 217, 408-432 (1953).

[CrossRef]

R. J. Socha, D. J. Van Den Broeke, S. D. Hsu, J. F. Chen, T. L. Laidig, N. Corcoran, U. Hollerbach, K. E. Wampler, X. Shi, and W. Conley, “Contact hole reticle optimization by using interference mapping lithography (IML),” Proc. SPIE 5377, 222-240 (2004).

[CrossRef]

R. J. Socha, J. S. Petersen, J. F. Chen, T. L.Laidig, K. E.Wampler, and R. F. Caldwell, “Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation I,” Proc. SPIE 3546617-641 (1998).

[CrossRef]

K. Yamazoe, Y. Sekine, M. Kawashima, M. Hakko, T. Ono, and T. Honda, “Resolution enhancement by aerial image approximation with 2D-TCC,” Proc. SPIE 6730, 67302H (2007).

[CrossRef]

M. Mansuripur, *Classical Optics and Its Applications* (Cambridge U. Press, 2002), pp. 89-100.

H. Gamo, “Matrix treatment of partial coherence,” in *Progress in Optics*, E. Wolf, ed.(North-Holland, 1964), Vol. 3, Chap. 3.

[CrossRef]

N. B. Cobb, “Fast optical and process proximity correction algorithms for integrated circuit manufacturing,” Ph.D. dissertation (Electrical Engineering and Computer Science, University of California, Berkeley, 1998).

R. Socha, “Propagation effects of partially coherent light in optical lithography and inspection,” Ph.D. dissertation (Electronics Research Laboratory, University of California, Berkeley, 1997).

J. W. Goodman, *Statistical Optics*, 1st ed. (Wiley-Interscience, 1985), pp. 109-111.

M. Born and E. Wolf, Principles of Optics, 6th ed. (Pergamon, 1980), Chap. 10.

A. K. Wong, *Resolution Enhancement Techniques in Optical Lithography*, Vol. TT47 of SPIE Tutorial Texts in Optical Engineering (SPIE Press, 2001), Chap. 4.

[CrossRef]

J. W. Goodman, *Statistical Optics*, 1st ed. (Wiley-Interscience, 1985), Chap. 7.