Abstract
A thermal oxidation fabrication technique is employed to form low-loss high-index-contrast silicon shallow-ridge waveguides in silicon-on-insulator (SOI) with maximally tight vertical confinement. Drop-port responses from weakly coupled ring resonators demonstrate propagation losses below for TE modes. This technique is also combined with “magic width” designs mitigating severe lateral radiation leakage for TM modes to achieve propagation loss values of . We discuss the fabrication process utilized to form these low-loss waveguides and implications for sensor devices in particular.
© 2009 Optical Society of America
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