By modifying some structural characteristics, the annealing process can have considerable effects on the optical performance and laser-induced damage resistance of thin films deposited by electron-beam deposition. Annealing at increased temperature gives rise to an increase of refractive index, the evolutions of packing density, and the structure order of the films due to the removal of adsorbed water in advance, material crystallization, and phase transformation. Thus, the combined effects of greatly strengthened endurance, crystal structure ordering, and stress transition after the annealing leads to an increase of the laser-induced damage threshold in a vacuum environment from 12 to (at , pulse duration, and 1-on-1 testing mode).
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