Abstract

The reflectance of freshly deposited SiC thin films is measured in situ for what we believe is the first time. SiC was deposited by means of ion-beam sputtering. Reflectance was measured as a function of the incidence angle in the far and extreme ultraviolet wavelengths from 58.4 to 149.2 nm. In situ measurements allowed obtaining the intrinsic reflectance of SiC films, which is somewhat larger than what had been measured for samples exposed to the atmosphere. Reflectance measurements were used to determine the optical constants of the material in the same spectral range. We compare our data to those of the literature corresponding to SiC films deposited by different techniques and exposed to the atmosphere. In situ determined optical constants will allow a more accurate design of multilayers containing ion-beam-sputtered SiC layers.

© 2009 Optical Society of America

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  1. R. P. Madden, L. R. Canfield, and G. Hass, “On the vacuum ultraviolet reflectance of evaporated aluminum before and during oxidation,” J. Opt. Soc. Am. 53, 620-625 (1963).
    [CrossRef]
  2. W. R. Hunter, J. F. Osantowski, and G. Hass, “Reflectance of Al overcoated with MgF2 and LiF in the wavelength region from 1600Å to 300Å at various angles of incidence,” Appl. Opt. 10, 540-544 (1971).
    [CrossRef]
  3. W. J. Choyke, R. F. Farich, and R. A. Hoffman, “SiC, a new material for mirrors. 1: High power lasers; 2: VUV applications,” Appl. Opt. 15, 2006-2007 (1976).
    [CrossRef]
  4. D. L. Windt and B. Bach, “Ion beam deposited silicon carbide on glass optics and replica gratings,” Appl. Opt. 23, 3047-3049(1984).
    [CrossRef]
  5. R. A. M. Keski-Kuha, J. F. Osantowski, H. Herzig, J. S. Gum, and A. R. Toft, “Normal incidence reflectance of ion beam deposited SiC films in the EUV,” Appl. Opt. 27, 2815-2816(1988).
    [CrossRef]
  6. J. B. Kortright and D. L. Windt, “Amorphous silicon carbide coatings for extreme ultraviolet optics,” Appl. Opt. 27, 2841-2843 (1988).
    [CrossRef]
  7. J. I. Larruquert and R. A. M. Keski-Kuha, “Reflectance measurements and optical constants in the extreme ultraviolet for thin films of ion-beam-deposited SiC, Mo, Mg2Si, and InSb and of evaporated Cr,” Appl. Opt. 39, 2772-2781 (2000).
    [CrossRef]
  8. W. J. Choyke, W. D. Partlow, E. P. Supertzi, F. J. Venskytis, and G. B. Brandt, “Silicon-carbide diffraction grating for the vacuum ultraviolet: feasibility,” Appl. Opt. 16, 2013-2014 (1977).
    [CrossRef]
  9. D. Schwarz and R. A. M. Keski-Kuha, “Degradation in EUV reflectance of ion-sputtered SiC films,” in Materials Research Society Symposium Proceedings (Materials Research Society, 1995), Vol. 354, pp. 535-540.
  10. D. Schwarz and R. A. M. Keski-Kuha, “Dual ion beam sputtering of carbides for EUV reflectance,” in Materials Research Society Symposium Proceedings (Materials Research Society, 1996), Vol. 396, pp. 503-508.
  11. D. Garoli, F. Frassetto, G. Monaco, P. Nicolosi, M. G. Pelizzo, F. Rigato, V. Rigato, A. Giglia, and S. Nannarone, “Reflectance measurements and optical constants in the extreme ultraviolet--vacuum ultraviolet regions for SiC with a different C-Si ratio,” Appl. Opt. 45, 5642-5650 (2006).
    [CrossRef]
  12. G. M. Blumenstock, R. A. M. Keski-Kuha, and M. L. Ginter, “Extreme ultraviolet optical properties of ion-beam-deposited boron carbide thin films,” Proc. SPIE 2515, 558-564 (1995).
    [CrossRef]
  13. J. I. Larruquert and R. A. M. Keski-Kuha, “Optical properties of hot-pressed B4C in the extreme ultraviolet,” Appl. Opt. 39, 1537-1540 (2000).
    [CrossRef]
  14. M. Vidal-Dasilva, M. Fernández-Perea, J. A. Méndez, J. A. Aznárez, and J. I. Larruquert, “Electron-beam deposited boron coatings for the extreme ultraviolet,” Appl. Opt. 47, 2926-2930 (2008).
    [CrossRef]
  15. J. I. Larruquert, and R. A. M. Keski-Kuha, “Multilayer coatings with high reflectance in the EUV spectral region from 50 to 121.6 nm,” Appl. Opt. 38, 1231-1236 (1999).
    [CrossRef]
  16. J. I. Larruquert and R. A. M. Keski-Kuha, “Sub-quarter-wave multilayer coatings with high reflectance in the extreme ultraviolet,” Appl. Opt. 41, 5398-5404(2002).
    [CrossRef]
  17. D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Yu. A. Uspenskii, “Terbium-based extreme ultraviolet multilayers,” Opt. Lett. 30, 3186-3188 (2005).
    [CrossRef]
  18. J. I. Larruquert, and R. A. M. Keski-Kuha, “Multilayer coatings for narrowband imaging in the extreme ultraviolet,” Appl. Opt. 40, 1126-1131 (2001).
    [CrossRef]
  19. B. Kjornrattanawanich, D. L. Windt, J. F. Seely, and Y. A. Uspenskii, “SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging,” Appl. Opt. 45, 1765-1772(2006).
    [CrossRef]
  20. J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” Proc. SPIE 6317, 63170T (2006).
    [CrossRef]
  21. B. Kjornrattanawanich, D. L. Windt, Yu. A. Uspenskii, J. F. Seely, “Optical constants determination of neodymium and gadolinium in the 3 nm to 100 nm wavelength range,” Proc. SPIE 6317, 63170U (2006).
    [CrossRef]
  22. B. Kjornrattanawanich, D. L. Windt, and J. F. Seely, “Normal-incidence silicon gadolinium multilayers for imaging at 63 nm wavelength,” Opt. Lett. 33, 965-967 (2008).
    [CrossRef]
  23. M. Fernández-Perea, M. Vidal-Dasilva, J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Narrowband filters and broadband mirrors for the spectral range from 50 to 200 nm,” Proc. SPIE 7018, 70182W (2008).
    [CrossRef]
  24. J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, “Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films,” Rev. Sci. Instrum. 67, 497-502 (1996).
    [CrossRef]
  25. J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, “FUV reflectometer for in situ characterization of thin films deposited under UHV,” Proc. SPIE 4139, 92-101 (2000).
    [CrossRef]

2008 (3)

2006 (4)

B. Kjornrattanawanich, D. L. Windt, J. F. Seely, and Y. A. Uspenskii, “SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging,” Appl. Opt. 45, 1765-1772(2006).
[CrossRef]

J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” Proc. SPIE 6317, 63170T (2006).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, Yu. A. Uspenskii, J. F. Seely, “Optical constants determination of neodymium and gadolinium in the 3 nm to 100 nm wavelength range,” Proc. SPIE 6317, 63170U (2006).
[CrossRef]

D. Garoli, F. Frassetto, G. Monaco, P. Nicolosi, M. G. Pelizzo, F. Rigato, V. Rigato, A. Giglia, and S. Nannarone, “Reflectance measurements and optical constants in the extreme ultraviolet--vacuum ultraviolet regions for SiC with a different C-Si ratio,” Appl. Opt. 45, 5642-5650 (2006).
[CrossRef]

2005 (1)

2002 (1)

2001 (1)

2000 (3)

1999 (1)

1996 (1)

J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, “Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films,” Rev. Sci. Instrum. 67, 497-502 (1996).
[CrossRef]

1995 (1)

G. M. Blumenstock, R. A. M. Keski-Kuha, and M. L. Ginter, “Extreme ultraviolet optical properties of ion-beam-deposited boron carbide thin films,” Proc. SPIE 2515, 558-564 (1995).
[CrossRef]

1988 (2)

1984 (1)

1977 (1)

1976 (1)

1971 (1)

1963 (1)

Aznárez, J. A.

M. Vidal-Dasilva, M. Fernández-Perea, J. A. Méndez, J. A. Aznárez, and J. I. Larruquert, “Electron-beam deposited boron coatings for the extreme ultraviolet,” Appl. Opt. 47, 2926-2930 (2008).
[CrossRef]

M. Fernández-Perea, M. Vidal-Dasilva, J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Narrowband filters and broadband mirrors for the spectral range from 50 to 200 nm,” Proc. SPIE 7018, 70182W (2008).
[CrossRef]

J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, “FUV reflectometer for in situ characterization of thin films deposited under UHV,” Proc. SPIE 4139, 92-101 (2000).
[CrossRef]

J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, “Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films,” Rev. Sci. Instrum. 67, 497-502 (1996).
[CrossRef]

Bach, B.

Blumenstock, G. M.

G. M. Blumenstock, R. A. M. Keski-Kuha, and M. L. Ginter, “Extreme ultraviolet optical properties of ion-beam-deposited boron carbide thin films,” Proc. SPIE 2515, 558-564 (1995).
[CrossRef]

Brandt, G. B.

Canfield, L. R.

Choyke, W. J.

Farich, R. F.

Fernández-Perea, M.

M. Vidal-Dasilva, M. Fernández-Perea, J. A. Méndez, J. A. Aznárez, and J. I. Larruquert, “Electron-beam deposited boron coatings for the extreme ultraviolet,” Appl. Opt. 47, 2926-2930 (2008).
[CrossRef]

M. Fernández-Perea, M. Vidal-Dasilva, J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Narrowband filters and broadband mirrors for the spectral range from 50 to 200 nm,” Proc. SPIE 7018, 70182W (2008).
[CrossRef]

Frassetto, F.

Garoli, D.

Giglia, A.

Ginter, M. L.

G. M. Blumenstock, R. A. M. Keski-Kuha, and M. L. Ginter, “Extreme ultraviolet optical properties of ion-beam-deposited boron carbide thin films,” Proc. SPIE 2515, 558-564 (1995).
[CrossRef]

Gum, J. S.

Hass, G.

Herzig, H.

Hoffman, R. A.

Hunter, W. R.

Keski-Kuha, R. A. M.

J. I. Larruquert and R. A. M. Keski-Kuha, “Sub-quarter-wave multilayer coatings with high reflectance in the extreme ultraviolet,” Appl. Opt. 41, 5398-5404(2002).
[CrossRef]

J. I. Larruquert, and R. A. M. Keski-Kuha, “Multilayer coatings for narrowband imaging in the extreme ultraviolet,” Appl. Opt. 40, 1126-1131 (2001).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, “Reflectance measurements and optical constants in the extreme ultraviolet for thin films of ion-beam-deposited SiC, Mo, Mg2Si, and InSb and of evaporated Cr,” Appl. Opt. 39, 2772-2781 (2000).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, “Optical properties of hot-pressed B4C in the extreme ultraviolet,” Appl. Opt. 39, 1537-1540 (2000).
[CrossRef]

J. I. Larruquert, and R. A. M. Keski-Kuha, “Multilayer coatings with high reflectance in the EUV spectral region from 50 to 121.6 nm,” Appl. Opt. 38, 1231-1236 (1999).
[CrossRef]

G. M. Blumenstock, R. A. M. Keski-Kuha, and M. L. Ginter, “Extreme ultraviolet optical properties of ion-beam-deposited boron carbide thin films,” Proc. SPIE 2515, 558-564 (1995).
[CrossRef]

R. A. M. Keski-Kuha, J. F. Osantowski, H. Herzig, J. S. Gum, and A. R. Toft, “Normal incidence reflectance of ion beam deposited SiC films in the EUV,” Appl. Opt. 27, 2815-2816(1988).
[CrossRef]

D. Schwarz and R. A. M. Keski-Kuha, “Degradation in EUV reflectance of ion-sputtered SiC films,” in Materials Research Society Symposium Proceedings (Materials Research Society, 1995), Vol. 354, pp. 535-540.

D. Schwarz and R. A. M. Keski-Kuha, “Dual ion beam sputtering of carbides for EUV reflectance,” in Materials Research Society Symposium Proceedings (Materials Research Society, 1996), Vol. 396, pp. 503-508.

Kjornrattanawanich, B.

B. Kjornrattanawanich, D. L. Windt, and J. F. Seely, “Normal-incidence silicon gadolinium multilayers for imaging at 63 nm wavelength,” Opt. Lett. 33, 965-967 (2008).
[CrossRef]

J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” Proc. SPIE 6317, 63170T (2006).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, J. F. Seely, and Y. A. Uspenskii, “SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging,” Appl. Opt. 45, 1765-1772(2006).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, Yu. A. Uspenskii, J. F. Seely, “Optical constants determination of neodymium and gadolinium in the 3 nm to 100 nm wavelength range,” Proc. SPIE 6317, 63170U (2006).
[CrossRef]

D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Yu. A. Uspenskii, “Terbium-based extreme ultraviolet multilayers,” Opt. Lett. 30, 3186-3188 (2005).
[CrossRef]

Kortright, J. B.

Larruquert, J. I.

M. Fernández-Perea, M. Vidal-Dasilva, J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Narrowband filters and broadband mirrors for the spectral range from 50 to 200 nm,” Proc. SPIE 7018, 70182W (2008).
[CrossRef]

M. Vidal-Dasilva, M. Fernández-Perea, J. A. Méndez, J. A. Aznárez, and J. I. Larruquert, “Electron-beam deposited boron coatings for the extreme ultraviolet,” Appl. Opt. 47, 2926-2930 (2008).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, “Sub-quarter-wave multilayer coatings with high reflectance in the extreme ultraviolet,” Appl. Opt. 41, 5398-5404(2002).
[CrossRef]

J. I. Larruquert, and R. A. M. Keski-Kuha, “Multilayer coatings for narrowband imaging in the extreme ultraviolet,” Appl. Opt. 40, 1126-1131 (2001).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, “Reflectance measurements and optical constants in the extreme ultraviolet for thin films of ion-beam-deposited SiC, Mo, Mg2Si, and InSb and of evaporated Cr,” Appl. Opt. 39, 2772-2781 (2000).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, “Optical properties of hot-pressed B4C in the extreme ultraviolet,” Appl. Opt. 39, 1537-1540 (2000).
[CrossRef]

J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, “FUV reflectometer for in situ characterization of thin films deposited under UHV,” Proc. SPIE 4139, 92-101 (2000).
[CrossRef]

J. I. Larruquert, and R. A. M. Keski-Kuha, “Multilayer coatings with high reflectance in the EUV spectral region from 50 to 121.6 nm,” Appl. Opt. 38, 1231-1236 (1999).
[CrossRef]

J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, “Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films,” Rev. Sci. Instrum. 67, 497-502 (1996).
[CrossRef]

Madden, R. P.

Méndez, J. A.

M. Fernández-Perea, M. Vidal-Dasilva, J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Narrowband filters and broadband mirrors for the spectral range from 50 to 200 nm,” Proc. SPIE 7018, 70182W (2008).
[CrossRef]

M. Vidal-Dasilva, M. Fernández-Perea, J. A. Méndez, J. A. Aznárez, and J. I. Larruquert, “Electron-beam deposited boron coatings for the extreme ultraviolet,” Appl. Opt. 47, 2926-2930 (2008).
[CrossRef]

J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, “FUV reflectometer for in situ characterization of thin films deposited under UHV,” Proc. SPIE 4139, 92-101 (2000).
[CrossRef]

J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, “Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films,” Rev. Sci. Instrum. 67, 497-502 (1996).
[CrossRef]

Monaco, G.

Nannarone, S.

Nicolosi, P.

Osantowski, J. F.

Partlow, W. D.

Pelizzo, M. G.

Rigato, F.

Rigato, V.

Schwarz, D.

D. Schwarz and R. A. M. Keski-Kuha, “Degradation in EUV reflectance of ion-sputtered SiC films,” in Materials Research Society Symposium Proceedings (Materials Research Society, 1995), Vol. 354, pp. 535-540.

D. Schwarz and R. A. M. Keski-Kuha, “Dual ion beam sputtering of carbides for EUV reflectance,” in Materials Research Society Symposium Proceedings (Materials Research Society, 1996), Vol. 396, pp. 503-508.

Seely, J. F.

B. Kjornrattanawanich, D. L. Windt, and J. F. Seely, “Normal-incidence silicon gadolinium multilayers for imaging at 63 nm wavelength,” Opt. Lett. 33, 965-967 (2008).
[CrossRef]

J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” Proc. SPIE 6317, 63170T (2006).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, Yu. A. Uspenskii, J. F. Seely, “Optical constants determination of neodymium and gadolinium in the 3 nm to 100 nm wavelength range,” Proc. SPIE 6317, 63170U (2006).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, J. F. Seely, and Y. A. Uspenskii, “SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging,” Appl. Opt. 45, 1765-1772(2006).
[CrossRef]

D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Yu. A. Uspenskii, “Terbium-based extreme ultraviolet multilayers,” Opt. Lett. 30, 3186-3188 (2005).
[CrossRef]

Supertzi, E. P.

Toft, A. R.

Uspenskii, Y. A.

J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” Proc. SPIE 6317, 63170T (2006).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, J. F. Seely, and Y. A. Uspenskii, “SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging,” Appl. Opt. 45, 1765-1772(2006).
[CrossRef]

Uspenskii, Yu. A.

B. Kjornrattanawanich, D. L. Windt, Yu. A. Uspenskii, J. F. Seely, “Optical constants determination of neodymium and gadolinium in the 3 nm to 100 nm wavelength range,” Proc. SPIE 6317, 63170U (2006).
[CrossRef]

D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Yu. A. Uspenskii, “Terbium-based extreme ultraviolet multilayers,” Opt. Lett. 30, 3186-3188 (2005).
[CrossRef]

Venskytis, F. J.

Vidal-Dasilva, M.

M. Fernández-Perea, M. Vidal-Dasilva, J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Narrowband filters and broadband mirrors for the spectral range from 50 to 200 nm,” Proc. SPIE 7018, 70182W (2008).
[CrossRef]

M. Vidal-Dasilva, M. Fernández-Perea, J. A. Méndez, J. A. Aznárez, and J. I. Larruquert, “Electron-beam deposited boron coatings for the extreme ultraviolet,” Appl. Opt. 47, 2926-2930 (2008).
[CrossRef]

Windt, D. L.

Appl. Opt. (14)

W. R. Hunter, J. F. Osantowski, and G. Hass, “Reflectance of Al overcoated with MgF2 and LiF in the wavelength region from 1600Å to 300Å at various angles of incidence,” Appl. Opt. 10, 540-544 (1971).
[CrossRef]

W. J. Choyke, W. D. Partlow, E. P. Supertzi, F. J. Venskytis, and G. B. Brandt, “Silicon-carbide diffraction grating for the vacuum ultraviolet: feasibility,” Appl. Opt. 16, 2013-2014 (1977).
[CrossRef]

J. B. Kortright and D. L. Windt, “Amorphous silicon carbide coatings for extreme ultraviolet optics,” Appl. Opt. 27, 2841-2843 (1988).
[CrossRef]

J. I. Larruquert, and R. A. M. Keski-Kuha, “Multilayer coatings with high reflectance in the EUV spectral region from 50 to 121.6 nm,” Appl. Opt. 38, 1231-1236 (1999).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, “Optical properties of hot-pressed B4C in the extreme ultraviolet,” Appl. Opt. 39, 1537-1540 (2000).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, “Reflectance measurements and optical constants in the extreme ultraviolet for thin films of ion-beam-deposited SiC, Mo, Mg2Si, and InSb and of evaporated Cr,” Appl. Opt. 39, 2772-2781 (2000).
[CrossRef]

J. I. Larruquert, and R. A. M. Keski-Kuha, “Multilayer coatings for narrowband imaging in the extreme ultraviolet,” Appl. Opt. 40, 1126-1131 (2001).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, “Sub-quarter-wave multilayer coatings with high reflectance in the extreme ultraviolet,” Appl. Opt. 41, 5398-5404(2002).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, J. F. Seely, and Y. A. Uspenskii, “SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging,” Appl. Opt. 45, 1765-1772(2006).
[CrossRef]

D. Garoli, F. Frassetto, G. Monaco, P. Nicolosi, M. G. Pelizzo, F. Rigato, V. Rigato, A. Giglia, and S. Nannarone, “Reflectance measurements and optical constants in the extreme ultraviolet--vacuum ultraviolet regions for SiC with a different C-Si ratio,” Appl. Opt. 45, 5642-5650 (2006).
[CrossRef]

M. Vidal-Dasilva, M. Fernández-Perea, J. A. Méndez, J. A. Aznárez, and J. I. Larruquert, “Electron-beam deposited boron coatings for the extreme ultraviolet,” Appl. Opt. 47, 2926-2930 (2008).
[CrossRef]

D. L. Windt and B. Bach, “Ion beam deposited silicon carbide on glass optics and replica gratings,” Appl. Opt. 23, 3047-3049(1984).
[CrossRef]

R. A. M. Keski-Kuha, J. F. Osantowski, H. Herzig, J. S. Gum, and A. R. Toft, “Normal incidence reflectance of ion beam deposited SiC films in the EUV,” Appl. Opt. 27, 2815-2816(1988).
[CrossRef]

W. J. Choyke, R. F. Farich, and R. A. Hoffman, “SiC, a new material for mirrors. 1: High power lasers; 2: VUV applications,” Appl. Opt. 15, 2006-2007 (1976).
[CrossRef]

J. Opt. Soc. Am. (1)

Opt. Lett. (2)

Proc. SPIE (5)

G. M. Blumenstock, R. A. M. Keski-Kuha, and M. L. Ginter, “Extreme ultraviolet optical properties of ion-beam-deposited boron carbide thin films,” Proc. SPIE 2515, 558-564 (1995).
[CrossRef]

J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” Proc. SPIE 6317, 63170T (2006).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, Yu. A. Uspenskii, J. F. Seely, “Optical constants determination of neodymium and gadolinium in the 3 nm to 100 nm wavelength range,” Proc. SPIE 6317, 63170U (2006).
[CrossRef]

M. Fernández-Perea, M. Vidal-Dasilva, J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Narrowband filters and broadband mirrors for the spectral range from 50 to 200 nm,” Proc. SPIE 7018, 70182W (2008).
[CrossRef]

J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, “FUV reflectometer for in situ characterization of thin films deposited under UHV,” Proc. SPIE 4139, 92-101 (2000).
[CrossRef]

Rev. Sci. Instrum. (1)

J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, “Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films,” Rev. Sci. Instrum. 67, 497-502 (1996).
[CrossRef]

Other (2)

D. Schwarz and R. A. M. Keski-Kuha, “Degradation in EUV reflectance of ion-sputtered SiC films,” in Materials Research Society Symposium Proceedings (Materials Research Society, 1995), Vol. 354, pp. 535-540.

D. Schwarz and R. A. M. Keski-Kuha, “Dual ion beam sputtering of carbides for EUV reflectance,” in Materials Research Society Symposium Proceedings (Materials Research Society, 1996), Vol. 396, pp. 503-508.

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Figures (4)

Fig. 1
Fig. 1

Reflectance versus wavelength of an IBS-SiC film measured in situ. The reflectance reported in the literature for IBS coatings briefly exposed to the atmosphere [7] and of CVD-SiC coatings [5] are also shown for comparison.

Fig. 2
Fig. 2

Reflectance versus wavelength of an IBS-SiC film for various angles of incidence measured away from the normal to the sample. Reflectance corresponds to nonpolarized radiation.

Fig. 3
Fig. 3

The optical constants of IBS-SiC films versus wavelength obtained for freshly deposited films measured in situ. The data obtained for samples that had been shortly exposed to the atmosphere [7] are also shown for comparison.

Fig. 4
Fig. 4

In situ reflectance versus wavelength of an IBS-SiC film and the decay of reflectance for this same film after a 15 min exposure to the atmosphere and after a 40 day storage in a desiccator.

Tables (1)

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Table 1 Optical Constants of IBS SiC Obtained from Reflectance Measurements Performed in situ

Equations (3)

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p = I p I s I p + I s ,
R ( θ ) = 1 + p 2 R p ( θ ) + 1 p 2 R s ( θ ) ,
s j 2 = i = 1 , m { R θ ( i ) exp R cal [ θ ( i ) , n j , k j , p ] } 2 ,

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