Direct measurement of absorption-induced wavefront distortion in high optical power systems

Aidan F. Brooks; David Hosken; Jesper Munch; Peter J. Veitch; Zewu Yan; Chunnong Zhao; Yaohui Fan; Li Ju; David Blair; Phil Willems; Bram Slagmolen; Jerome Degallaix

doi:10.1364/AO.48.000355

Direct measurement of absorption-induced wavefront distortion in high optical power systems

Aidan F. Brooks, David Hosken, Jesper Munch, Peter J. Veitch, Zewu Yan, Chunnong Zhao, Yaohui Fan, Li Ju, David Blair, Phil Willems, Bram Slagmolen, and Jerome Degallaix

Applied Optics
Vol. 48,
Issue 2,
pp. 355-364
(2009)
•https://doi.org/10.1364/AO.48.000355

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Aidan F. Brooks, David Hosken, Jesper Munch, Peter J. Veitch, Zewu Yan, Chunnong Zhao, Yaohui Fan, Li Ju, David Blair, Phil Willems, Bram Slagmolen, and Jerome Degallaix, "Direct measurement of absorption-induced wavefront distortion in high optical power systems," Appl. Opt. 48, 355-364 (2009)

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Related Topics
Table of Contents Category
- Instrumentation, Measurement, and Metrology
Optics & Photonics Topics
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The topics in this list come from the OSA Optics and Photonics Topics applied to this article.
Previously assigned OCIS codes
- Fabry-Perot (120.2230)
- Thermal lensing (350.6830)
- Optical sensing and sensors (280.4788)

About this Article
History
- Original Manuscript: October 10, 2008
- Manuscript Accepted: November 21, 2008
- Published: January 7, 2009

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Abstract

Wavefront distortion due to absorption in the substrates and coatings of mirrors in advanced gravitational wave interferometers has the potential to compromise the operation and sensitivity of these interferometers [Opt. Lett. 29, 2635–2637 (2004)]. We report the first direct spatially-resolved measurement, to our knowledge, of such wavefront distortion in a high optical power cavity. The measurement was made using an ultrahigh sensitivity Hartmann wavefront sensor on a dedicated test facility. The sensitivity of the sensor was $λ / 730$ , where $λ = 800 nm$ .

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	ITM	ETM	CP
Material	Sapphire	Sapphire	Fused Silica
Diameter	$100 mm$	$150 mm$	$160 mm$
Thickness	$46 mm$	$80 mm$	$17 mm$
Radius of curvature	flat	$720 \pm 100 m$	flat
Transmittance	$1840 \pm 100 ppm$	$20 ppm$	$n / a$
Thermal conductivity	$33 W m^{- 1} K^{- 1}$	$33 W m^{- 1} K^{- 1}$	$1.38 W m^{- 1} K^{- 1}$
Absorption	$\approx 50 ppm / cm$	$n / a$	$\approx 5.5 ppm$
Thermo-optic coefficient ( $d n / d T$ )	$13 \times 10^{- 6} K^{- 1}$	$13 \times 10^{- 6} K^{- 1}$	$10 \times 10^{- 6} K^{- 1}$

	Sapphire	Fused Silica
Thermo-optic effect	1	1
Elasto-optic effect	0.2	$- 0.01$
Thermo-elastic expansion	0.8	0.06
Volumetric distortion	$v_{2} = 1.2$	$v_{1} = 0.99$
Surface deformation	$s_{4} = s_{3} = 0.4$	$s_{2} = s_{1} = 0.03$

	ITM	ETM	CP
Material	Sapphire	Sapphire	Fused Silica
Diameter	$100 mm$	$150 mm$	$160 mm$
Thickness	$46 mm$	$80 mm$	$17 mm$
Radius of curvature	flat	$720 \pm 100 m$	flat
Transmittance	$1840 \pm 100 ppm$	$20 ppm$	$n / a$
Thermal conductivity	$33 W m^{- 1} K^{- 1}$	$33 W m^{- 1} K^{- 1}$	$1.38 W m^{- 1} K^{- 1}$
Absorption	$\approx 50 ppm / cm$	$n / a$	$\approx 5.5 ppm$
Thermo-optic coefficient ( $d n / d T$ )	$13 \times 10^{- 6} K^{- 1}$	$13 \times 10^{- 6} K^{- 1}$	$10 \times 10^{- 6} K^{- 1}$

	Sapphire	Fused Silica
Thermo-optic effect	1	1
Elasto-optic effect	0.2	$- 0.01$
Thermo-elastic expansion	0.8	0.06
Volumetric distortion	$v_{2} = 1.2$	$v_{1} = 0.99$
Surface deformation	$s_{4} = s_{3} = 0.4$	$s_{2} = s_{1} = 0.03$

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