Abstract

This study investigates the optical properties and microstructure of Ta2O5 film deposited with the glancing angle deposition technique. The tilted nanocolumn microstructure, examined with scanning electron microscopy, induces the optical anisotropy of thin film. The optical properties of thin film are characterized with an inverse synthesis method. Based on the Cauchy model, the dispersion equations of optical constants of film are determined from the transmittance spectra measured at normal and oblique incidence over 400800nm. The starting values derived with an envelope method quicken the optimization process greatly. The dispersion of the principal indices N1, N2, and N3 and the thickness d of thin film are presented statistically. A good agreement between the measured optical properties and theoretical calculation is obtained, which validates the model established for thin film produced by glancing angle deposition.

© 2008 Optical Society of America

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2008 (1)

X. D. Xiao, G. P. Dong, H. J. Qi, Z. X. Fan, H. B. He, and J. D. Shao, “Effects of annealing on microstructure and optical properties of TiO2 sculptured thin films,” Chin. Phys. Lett. 25, 2181-2184 (2008).
[CrossRef]

2007 (2)

H. J. Qi, J. D. Shao, and Z. X. Fan, “Analysis of characteristic matrix for a uniaxially birefringent thin film,” Europhys. Lett. 78, 17004 (2007).
[CrossRef]

Y. J. Jen, C. Y. Peng, and H. H. Chang, “Optical constant determination of an anisotropic thin film via polarization conversion,” Opt. Express 15, 4445-4451 (2007).
[CrossRef] [PubMed]

2006 (2)

M. H. Asghar, F. Placido, and S. Naseem, “Characterization of Ta2O5 thin films prepared by reactive evaporation,” Eur. Phys. J. Appl. Phys. 36, 119-124 (2006).
[CrossRef]

J. Gospodyn and J. C. Sit, “Characterization of dielectric columnar thin films by variable angle Mueller matrix and spectroscopic ellipsometry,” Opt. Mater. 29, 318-325 (2006).
[CrossRef]

2005 (3)

H. J. Qi, D. P. Zhang, J. D. Shao, and Z. X. Fan, “Matrix analysis of an anisotropic optical thin film,” Europhys. Lett. 70, 257-266 (2005).
[CrossRef]

Y. J. Jen, C. H. Hsieh, and T. S. Lo, “Optical constant determination of an anisotropic thin film via surface plasmon resonance: analyzed by sensitivity calculation,” Opt. Commun. 244, 269-277 (2005).
[CrossRef]

A. C. van Popta, M. J. Brett, and J. C. Sit, “Double-handed circular Bragg phenomena in polygonal helix thin films,” J. Appl. Phys. 98, 083517 (2005).
[CrossRef]

2004 (1)

2002 (1)

2001 (1)

E. Franke, M. Schubert, C. L. Trimble, M. J. DeVries, and J. A. Woollam, “Optical properties of amorphous and polycrystalline tantalum oxide thin films measured by spectroscopic ellipsometry from 0.03 to 8.5 eV,” Thin Solid Films 388, 283-289 (2001).
[CrossRef]

2000 (1)

R. Messier, V. C. Venugopal, and P. D. Sunal, “Origin and evolution of sculptured thin films,” J. Vac. Sci. Technol. A 18, 1538-1545 (2000).
[CrossRef]

1999 (3)

S. Ezhilvalavan and T. Y. Tseng, “Preparation and properties of tantalum pentoxide (Ta2O5) thin films for ultra large scale integrated circuits (ULSIs) application-A review,” J. Mater. Sci.: Mater. Electron. 10, 9-31 (1999).
[CrossRef]

P. C. Joshi and M. W. Cole, “Influence of postedeposition annealing on the enhanced structural and electrical properties of amorphous and crystalline Ta2O5 thin films for dynamic random access memory applications,” J. Appl. Phys. 86, 871-880 (1999).
[CrossRef]

I. J. Hodgkinson and Q. H. Wu, “Vacuum deposited biaxial thin films with all principal axes inclined to the substrate,” J. Vac. Sci. Technol. A 17, 2928-2932 (1999).
[CrossRef]

1998 (5)

I. J. Hodgkinson, J. C. Hazel, and Q. H. Wu, “In situ measurement of principal refractive indices of thin films by two-angle ellipsometry,” Thin Solid Films 313-314, 368-372 (1998).
[CrossRef]

B. Lecourt, D. Blaudez, and J. M. Turlet, “Anisotropy in Langmuir-Blodgett films studied by generalized spectroscopic ellipsometry,” Thin Solid Films 313-314, 790-794 (1998).
[CrossRef]

I. J. Hodgkinson, Q. H. Wu, and J. Hazel, “Empirical equations for the principal refractive indices and column angle of obliquely deposited films of tantalum oxide, titanium oxide, and zirconium oxide,” Appl. Opt. 37, 2653-2659 (1998).
[CrossRef]

C. Chaneliere, S. Four, J. L. Autran, R. A. B. Devine, and N. P. Sandler, “Properties of amorphous and crystalline Ta2O5 thin films deposited on Si from Ta(OC2H5)5 precursor,” J. Appl. Phys. 83, 4823-4829 (1998).
[CrossRef]

C. Chaneliere, J. L. Autran, R. A. B. Devine, and B. Balland, “Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications,” Mater. Sci. Eng. R22, 269-322 (1998).

1997 (2)

R. Messier, T. Gehrke, C. Frankel, V. C. Venugopal, W. Otano, and A. Lahktakia, “Engineered sculptured nematic thin films,” J. Vac. Sci. Technol. A 15, 2148-2152 (1997).
[CrossRef]

K. Robbie and M. J. Brett, “Sculptured thin films and glancing angle deposition: growth mechanics and applications,” J. Vac. Sci. Technol. A 15, 1460-1465 (1997).
[CrossRef]

1996 (2)

K. Robbie, M. J. Brett, and A. Lakhtakia, “Chiral sculptured thin films,” Nature 384, 616-616 (1996).
[CrossRef]

H. Jänchen, D. Endelema, N. Kaiser, and F. Flory, “Determination of the refractive indices of highly biaxial anisotropic coatings using guided modes,” Pure Appl. Opt. 5, 405-415(1996).
[CrossRef]

1995 (1)

H. M. Wang, “Analysis of anisotropic thin film parameters from prism coupler measurements,” J. Mod. Opt. 42, 2173-2181 (1995).
[CrossRef]

1994 (2)

H. M. Wang, “Determination of refractive indices and thickness of absorbing crystalline thin films by using prism coupler,” Fiber Integr. Opt. 13, 293-308 (1994).
[CrossRef]

K. Shiraishi and K. Matsumura, “Fabrication of spatial walk-off polarizing films by oblique deposition,” IEEE J. Quantum Electron. 30, 2417-2420 (1994).
[CrossRef]

1993 (2)

1989 (2)

1988 (1)

1985 (1)

1979 (1)

W. M. Paulson, F. S. Hickernell, and R. L. Davis, “Effects of deposition parameters on optical loss for RF-sputtered Ta2O5 and Si3N4 waveguides,” J. Vac. Sci. Technol. 16, 307-310 (1979).
[CrossRef]

Arnold, M.

Asghar, M. H.

M. H. Asghar, F. Placido, and S. Naseem, “Characterization of Ta2O5 thin films prepared by reactive evaporation,” Eur. Phys. J. Appl. Phys. 36, 119-124 (2006).
[CrossRef]

Autran, J. L.

C. Chaneliere, J. L. Autran, R. A. B. Devine, and B. Balland, “Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications,” Mater. Sci. Eng. R22, 269-322 (1998).

C. Chaneliere, S. Four, J. L. Autran, R. A. B. Devine, and N. P. Sandler, “Properties of amorphous and crystalline Ta2O5 thin films deposited on Si from Ta(OC2H5)5 precursor,” J. Appl. Phys. 83, 4823-4829 (1998).
[CrossRef]

Balland, B.

C. Chaneliere, J. L. Autran, R. A. B. Devine, and B. Balland, “Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications,” Mater. Sci. Eng. R22, 269-322 (1998).

Blaudez, D.

B. Lecourt, D. Blaudez, and J. M. Turlet, “Anisotropy in Langmuir-Blodgett films studied by generalized spectroscopic ellipsometry,” Thin Solid Films 313-314, 790-794 (1998).
[CrossRef]

Brett, M. J.

A. C. van Popta, M. J. Brett, and J. C. Sit, “Double-handed circular Bragg phenomena in polygonal helix thin films,” J. Appl. Phys. 98, 083517 (2005).
[CrossRef]

K. Robbie and M. J. Brett, “Sculptured thin films and glancing angle deposition: growth mechanics and applications,” J. Vac. Sci. Technol. A 15, 1460-1465 (1997).
[CrossRef]

K. Robbie, M. J. Brett, and A. Lakhtakia, “Chiral sculptured thin films,” Nature 384, 616-616 (1996).
[CrossRef]

Chaneliere, C.

C. Chaneliere, S. Four, J. L. Autran, R. A. B. Devine, and N. P. Sandler, “Properties of amorphous and crystalline Ta2O5 thin films deposited on Si from Ta(OC2H5)5 precursor,” J. Appl. Phys. 83, 4823-4829 (1998).
[CrossRef]

C. Chaneliere, J. L. Autran, R. A. B. Devine, and B. Balland, “Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications,” Mater. Sci. Eng. R22, 269-322 (1998).

Chang, H. H.

Cole, M. W.

P. C. Joshi and M. W. Cole, “Influence of postedeposition annealing on the enhanced structural and electrical properties of amorphous and crystalline Ta2O5 thin films for dynamic random access memory applications,” J. Appl. Phys. 86, 871-880 (1999).
[CrossRef]

Davis, R. L.

W. M. Paulson, F. S. Hickernell, and R. L. Davis, “Effects of deposition parameters on optical loss for RF-sputtered Ta2O5 and Si3N4 waveguides,” J. Vac. Sci. Technol. 16, 307-310 (1979).
[CrossRef]

Devine, R. A. B.

C. Chaneliere, S. Four, J. L. Autran, R. A. B. Devine, and N. P. Sandler, “Properties of amorphous and crystalline Ta2O5 thin films deposited on Si from Ta(OC2H5)5 precursor,” J. Appl. Phys. 83, 4823-4829 (1998).
[CrossRef]

C. Chaneliere, J. L. Autran, R. A. B. Devine, and B. Balland, “Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications,” Mater. Sci. Eng. R22, 269-322 (1998).

DeVries, M. J.

E. Franke, M. Schubert, C. L. Trimble, M. J. DeVries, and J. A. Woollam, “Optical properties of amorphous and polycrystalline tantalum oxide thin films measured by spectroscopic ellipsometry from 0.03 to 8.5 eV,” Thin Solid Films 388, 283-289 (2001).
[CrossRef]

Dobrowolski, J. A.

Dollase, W.

Dong, G. P.

X. D. Xiao, G. P. Dong, H. J. Qi, Z. X. Fan, H. B. He, and J. D. Shao, “Effects of annealing on microstructure and optical properties of TiO2 sculptured thin films,” Chin. Phys. Lett. 25, 2181-2184 (2008).
[CrossRef]

Endelema, D.

H. Jänchen, D. Endelema, N. Kaiser, and F. Flory, “Determination of the refractive indices of highly biaxial anisotropic coatings using guided modes,” Pure Appl. Opt. 5, 405-415(1996).
[CrossRef]

F. Flory, D. Endelema, E. Pelletier, and I. J. Hodgkinson, “Anisotropy in thin films: modeling and measurement of guided and nonguided optical properties: application to TiO2 films,” Appl. Opt. 32, 5649-5659 (1993).
[CrossRef] [PubMed]

Ezhilvalavan, S.

S. Ezhilvalavan and T. Y. Tseng, “Preparation and properties of tantalum pentoxide (Ta2O5) thin films for ultra large scale integrated circuits (ULSIs) application-A review,” J. Mater. Sci.: Mater. Electron. 10, 9-31 (1999).
[CrossRef]

Fan, Z. X.

X. D. Xiao, G. P. Dong, H. J. Qi, Z. X. Fan, H. B. He, and J. D. Shao, “Effects of annealing on microstructure and optical properties of TiO2 sculptured thin films,” Chin. Phys. Lett. 25, 2181-2184 (2008).
[CrossRef]

H. J. Qi, J. D. Shao, and Z. X. Fan, “Analysis of characteristic matrix for a uniaxially birefringent thin film,” Europhys. Lett. 78, 17004 (2007).
[CrossRef]

H. J. Qi, D. P. Zhang, J. D. Shao, and Z. X. Fan, “Matrix analysis of an anisotropic optical thin film,” Europhys. Lett. 70, 257-266 (2005).
[CrossRef]

Flory, F.

Four, S.

C. Chaneliere, S. Four, J. L. Autran, R. A. B. Devine, and N. P. Sandler, “Properties of amorphous and crystalline Ta2O5 thin films deposited on Si from Ta(OC2H5)5 precursor,” J. Appl. Phys. 83, 4823-4829 (1998).
[CrossRef]

Franke, E.

E. Franke, M. Schubert, C. L. Trimble, M. J. DeVries, and J. A. Woollam, “Optical properties of amorphous and polycrystalline tantalum oxide thin films measured by spectroscopic ellipsometry from 0.03 to 8.5 eV,” Thin Solid Films 388, 283-289 (2001).
[CrossRef]

Frankel, C.

R. Messier, T. Gehrke, C. Frankel, V. C. Venugopal, W. Otano, and A. Lahktakia, “Engineered sculptured nematic thin films,” J. Vac. Sci. Technol. A 15, 2148-2152 (1997).
[CrossRef]

Gehrke, T.

R. Messier, T. Gehrke, C. Frankel, V. C. Venugopal, W. Otano, and A. Lahktakia, “Engineered sculptured nematic thin films,” J. Vac. Sci. Technol. A 15, 2148-2152 (1997).
[CrossRef]

Gospodyn, J.

J. Gospodyn and J. C. Sit, “Characterization of dielectric columnar thin films by variable angle Mueller matrix and spectroscopic ellipsometry,” Opt. Mater. 29, 318-325 (2006).
[CrossRef]

Hazel, J.

Hazel, J. C.

I. J. Hodgkinson, J. C. Hazel, and Q. H. Wu, “In situ measurement of principal refractive indices of thin films by two-angle ellipsometry,” Thin Solid Films 313-314, 368-372 (1998).
[CrossRef]

He, H. B.

X. D. Xiao, G. P. Dong, H. J. Qi, Z. X. Fan, H. B. He, and J. D. Shao, “Effects of annealing on microstructure and optical properties of TiO2 sculptured thin films,” Chin. Phys. Lett. 25, 2181-2184 (2008).
[CrossRef]

Hickernell, F. S.

W. M. Paulson, F. S. Hickernell, and R. L. Davis, “Effects of deposition parameters on optical loss for RF-sputtered Ta2O5 and Si3N4 waveguides,” J. Vac. Sci. Technol. 16, 307-310 (1979).
[CrossRef]

Hodgkinson, I. J.

Horowitz, F.

Hsieh, C. H.

Y. J. Jen, C. H. Hsieh, and T. S. Lo, “Optical constant determination of an anisotropic thin film via surface plasmon resonance: analyzed by sensitivity calculation,” Opt. Commun. 244, 269-277 (2005).
[CrossRef]

Hu, Y.

Jänchen, H.

H. Jänchen, D. Endelema, N. Kaiser, and F. Flory, “Determination of the refractive indices of highly biaxial anisotropic coatings using guided modes,” Pure Appl. Opt. 5, 405-415(1996).
[CrossRef]

Jen, Y. J.

Y. J. Jen, C. Y. Peng, and H. H. Chang, “Optical constant determination of an anisotropic thin film via polarization conversion,” Opt. Express 15, 4445-4451 (2007).
[CrossRef] [PubMed]

Y. J. Jen, C. H. Hsieh, and T. S. Lo, “Optical constant determination of an anisotropic thin film via surface plasmon resonance: analyzed by sensitivity calculation,” Opt. Commun. 244, 269-277 (2005).
[CrossRef]

Joshi, P. C.

P. C. Joshi and M. W. Cole, “Influence of postedeposition annealing on the enhanced structural and electrical properties of amorphous and crystalline Ta2O5 thin films for dynamic random access memory applications,” J. Appl. Phys. 86, 871-880 (1999).
[CrossRef]

Kaiser, N.

H. Jänchen, D. Endelema, N. Kaiser, and F. Flory, “Determination of the refractive indices of highly biaxial anisotropic coatings using guided modes,” Pure Appl. Opt. 5, 405-415(1996).
[CrossRef]

Lahktakia, A.

R. Messier, T. Gehrke, C. Frankel, V. C. Venugopal, W. Otano, and A. Lahktakia, “Engineered sculptured nematic thin films,” J. Vac. Sci. Technol. A 15, 2148-2152 (1997).
[CrossRef]

Lakhtakia, A.

K. Robbie, M. J. Brett, and A. Lakhtakia, “Chiral sculptured thin films,” Nature 384, 616-616 (1996).
[CrossRef]

Lecourt, B.

B. Lecourt, D. Blaudez, and J. M. Turlet, “Anisotropy in Langmuir-Blodgett films studied by generalized spectroscopic ellipsometry,” Thin Solid Films 313-314, 790-794 (1998).
[CrossRef]

Lo, T. S.

Y. J. Jen, C. H. Hsieh, and T. S. Lo, “Optical constant determination of an anisotropic thin film via surface plasmon resonance: analyzed by sensitivity calculation,” Opt. Commun. 244, 269-277 (2005).
[CrossRef]

Macleod, H. A.

Matsumura, K.

K. Shiraishi and K. Matsumura, “Fabrication of spatial walk-off polarizing films by oblique deposition,” IEEE J. Quantum Electron. 30, 2417-2420 (1994).
[CrossRef]

Messier, R.

R. Messier, V. C. Venugopal, and P. D. Sunal, “Origin and evolution of sculptured thin films,” J. Vac. Sci. Technol. A 18, 1538-1545 (2000).
[CrossRef]

R. Messier, T. Gehrke, C. Frankel, V. C. Venugopal, W. Otano, and A. Lahktakia, “Engineered sculptured nematic thin films,” J. Vac. Sci. Technol. A 15, 2148-2152 (1997).
[CrossRef]

Motohiro, T.

Naseem, S.

M. H. Asghar, F. Placido, and S. Naseem, “Characterization of Ta2O5 thin films prepared by reactive evaporation,” Eur. Phys. J. Appl. Phys. 36, 119-124 (2006).
[CrossRef]

Otano, W.

R. Messier, T. Gehrke, C. Frankel, V. C. Venugopal, W. Otano, and A. Lahktakia, “Engineered sculptured nematic thin films,” J. Vac. Sci. Technol. A 15, 2148-2152 (1997).
[CrossRef]

Paulson, W. M.

W. M. Paulson, F. S. Hickernell, and R. L. Davis, “Effects of deposition parameters on optical loss for RF-sputtered Ta2O5 and Si3N4 waveguides,” J. Vac. Sci. Technol. 16, 307-310 (1979).
[CrossRef]

Pelletier, E.

Peng, C. Y.

Placido, F.

M. H. Asghar, F. Placido, and S. Naseem, “Characterization of Ta2O5 thin films prepared by reactive evaporation,” Eur. Phys. J. Appl. Phys. 36, 119-124 (2006).
[CrossRef]

Plante, L. M.

Qi, H. J.

X. D. Xiao, G. P. Dong, H. J. Qi, Z. X. Fan, H. B. He, and J. D. Shao, “Effects of annealing on microstructure and optical properties of TiO2 sculptured thin films,” Chin. Phys. Lett. 25, 2181-2184 (2008).
[CrossRef]

H. J. Qi, J. D. Shao, and Z. X. Fan, “Analysis of characteristic matrix for a uniaxially birefringent thin film,” Europhys. Lett. 78, 17004 (2007).
[CrossRef]

H. J. Qi, D. P. Zhang, J. D. Shao, and Z. X. Fan, “Matrix analysis of an anisotropic optical thin film,” Europhys. Lett. 70, 257-266 (2005).
[CrossRef]

Robbie, K.

K. Robbie and M. J. Brett, “Sculptured thin films and glancing angle deposition: growth mechanics and applications,” J. Vac. Sci. Technol. A 15, 1460-1465 (1997).
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K. Robbie, M. J. Brett, and A. Lakhtakia, “Chiral sculptured thin films,” Nature 384, 616-616 (1996).
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Sandler, N. P.

C. Chaneliere, S. Four, J. L. Autran, R. A. B. Devine, and N. P. Sandler, “Properties of amorphous and crystalline Ta2O5 thin films deposited on Si from Ta(OC2H5)5 precursor,” J. Appl. Phys. 83, 4823-4829 (1998).
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Sasaki, K.

Schubert, M.

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E. Franke, M. Schubert, C. L. Trimble, M. J. DeVries, and J. A. Woollam, “Optical properties of amorphous and polycrystalline tantalum oxide thin films measured by spectroscopic ellipsometry from 0.03 to 8.5 eV,” Thin Solid Films 388, 283-289 (2001).
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Shao, J. D.

X. D. Xiao, G. P. Dong, H. J. Qi, Z. X. Fan, H. B. He, and J. D. Shao, “Effects of annealing on microstructure and optical properties of TiO2 sculptured thin films,” Chin. Phys. Lett. 25, 2181-2184 (2008).
[CrossRef]

H. J. Qi, J. D. Shao, and Z. X. Fan, “Analysis of characteristic matrix for a uniaxially birefringent thin film,” Europhys. Lett. 78, 17004 (2007).
[CrossRef]

H. J. Qi, D. P. Zhang, J. D. Shao, and Z. X. Fan, “Matrix analysis of an anisotropic optical thin film,” Europhys. Lett. 70, 257-266 (2005).
[CrossRef]

Shiraishi, K.

K. Shiraishi and K. Matsumura, “Fabrication of spatial walk-off polarizing films by oblique deposition,” IEEE J. Quantum Electron. 30, 2417-2420 (1994).
[CrossRef]

Sikkens, M.

Silva, L. D.

Sit, J. C.

J. Gospodyn and J. C. Sit, “Characterization of dielectric columnar thin films by variable angle Mueller matrix and spectroscopic ellipsometry,” Opt. Mater. 29, 318-325 (2006).
[CrossRef]

A. C. van Popta, M. J. Brett, and J. C. Sit, “Double-handed circular Bragg phenomena in polygonal helix thin films,” J. Appl. Phys. 98, 083517 (2005).
[CrossRef]

Sullivan, B. T.

Sunal, P. D.

R. Messier, V. C. Venugopal, and P. D. Sunal, “Origin and evolution of sculptured thin films,” J. Vac. Sci. Technol. A 18, 1538-1545 (2000).
[CrossRef]

Taga, Y.

Trimble, C. L.

E. Franke, M. Schubert, C. L. Trimble, M. J. DeVries, and J. A. Woollam, “Optical properties of amorphous and polycrystalline tantalum oxide thin films measured by spectroscopic ellipsometry from 0.03 to 8.5 eV,” Thin Solid Films 388, 283-289 (2001).
[CrossRef]

Tseng, T. Y.

S. Ezhilvalavan and T. Y. Tseng, “Preparation and properties of tantalum pentoxide (Ta2O5) thin films for ultra large scale integrated circuits (ULSIs) application-A review,” J. Mater. Sci.: Mater. Electron. 10, 9-31 (1999).
[CrossRef]

Turlet, J. M.

B. Lecourt, D. Blaudez, and J. M. Turlet, “Anisotropy in Langmuir-Blodgett films studied by generalized spectroscopic ellipsometry,” Thin Solid Films 313-314, 790-794 (1998).
[CrossRef]

van Popta, A. C.

A. C. van Popta, M. J. Brett, and J. C. Sit, “Double-handed circular Bragg phenomena in polygonal helix thin films,” J. Appl. Phys. 98, 083517 (2005).
[CrossRef]

Venugopal, V. C.

R. Messier, V. C. Venugopal, and P. D. Sunal, “Origin and evolution of sculptured thin films,” J. Vac. Sci. Technol. A 18, 1538-1545 (2000).
[CrossRef]

R. Messier, T. Gehrke, C. Frankel, V. C. Venugopal, W. Otano, and A. Lahktakia, “Engineered sculptured nematic thin films,” J. Vac. Sci. Technol. A 15, 2148-2152 (1997).
[CrossRef]

Waldorf, A. J.

Wang, H. M.

H. M. Wang, “Analysis of anisotropic thin film parameters from prism coupler measurements,” J. Mod. Opt. 42, 2173-2181 (1995).
[CrossRef]

H. M. Wang, “Determination of refractive indices and thickness of absorbing crystalline thin films by using prism coupler,” Fiber Integr. Opt. 13, 293-308 (1994).
[CrossRef]

Wharton, J. J.

Woollam, J. A.

E. Franke, M. Schubert, C. L. Trimble, M. J. DeVries, and J. A. Woollam, “Optical properties of amorphous and polycrystalline tantalum oxide thin films measured by spectroscopic ellipsometry from 0.03 to 8.5 eV,” Thin Solid Films 388, 283-289 (2001).
[CrossRef]

Wu, Q. H.

I. J. Hodgkinson, Q. H. Wu, L. D. Silva, and M. Arnold, “Inorganic positive uniaxial films fabricated by serial bideposition,” Opt. Express 12, 3840-3847 (2004).
[CrossRef] [PubMed]

I. J. Hodgkinson and Q. H. Wu, “Vacuum deposited biaxial thin films with all principal axes inclined to the substrate,” J. Vac. Sci. Technol. A 17, 2928-2932 (1999).
[CrossRef]

I. J. Hodgkinson, J. C. Hazel, and Q. H. Wu, “In situ measurement of principal refractive indices of thin films by two-angle ellipsometry,” Thin Solid Films 313-314, 368-372 (1998).
[CrossRef]

I. J. Hodgkinson, Q. H. Wu, and J. Hazel, “Empirical equations for the principal refractive indices and column angle of obliquely deposited films of tantalum oxide, titanium oxide, and zirconium oxide,” Appl. Opt. 37, 2653-2659 (1998).
[CrossRef]

Xiao, X. D.

X. D. Xiao, G. P. Dong, H. J. Qi, Z. X. Fan, H. B. He, and J. D. Shao, “Effects of annealing on microstructure and optical properties of TiO2 sculptured thin films,” Chin. Phys. Lett. 25, 2181-2184 (2008).
[CrossRef]

Zhang, D. P.

H. J. Qi, D. P. Zhang, J. D. Shao, and Z. X. Fan, “Matrix analysis of an anisotropic optical thin film,” Europhys. Lett. 70, 257-266 (2005).
[CrossRef]

Zhang, G.

Appl. Opt. (6)

Chin. Phys. Lett. (1)

X. D. Xiao, G. P. Dong, H. J. Qi, Z. X. Fan, H. B. He, and J. D. Shao, “Effects of annealing on microstructure and optical properties of TiO2 sculptured thin films,” Chin. Phys. Lett. 25, 2181-2184 (2008).
[CrossRef]

Eur. Phys. J. Appl. Phys. (1)

M. H. Asghar, F. Placido, and S. Naseem, “Characterization of Ta2O5 thin films prepared by reactive evaporation,” Eur. Phys. J. Appl. Phys. 36, 119-124 (2006).
[CrossRef]

Europhys. Lett. (2)

H. J. Qi, D. P. Zhang, J. D. Shao, and Z. X. Fan, “Matrix analysis of an anisotropic optical thin film,” Europhys. Lett. 70, 257-266 (2005).
[CrossRef]

H. J. Qi, J. D. Shao, and Z. X. Fan, “Analysis of characteristic matrix for a uniaxially birefringent thin film,” Europhys. Lett. 78, 17004 (2007).
[CrossRef]

Fiber Integr. Opt. (1)

H. M. Wang, “Determination of refractive indices and thickness of absorbing crystalline thin films by using prism coupler,” Fiber Integr. Opt. 13, 293-308 (1994).
[CrossRef]

IEEE J. Quantum Electron. (1)

K. Shiraishi and K. Matsumura, “Fabrication of spatial walk-off polarizing films by oblique deposition,” IEEE J. Quantum Electron. 30, 2417-2420 (1994).
[CrossRef]

J. Appl. Phys. (3)

A. C. van Popta, M. J. Brett, and J. C. Sit, “Double-handed circular Bragg phenomena in polygonal helix thin films,” J. Appl. Phys. 98, 083517 (2005).
[CrossRef]

P. C. Joshi and M. W. Cole, “Influence of postedeposition annealing on the enhanced structural and electrical properties of amorphous and crystalline Ta2O5 thin films for dynamic random access memory applications,” J. Appl. Phys. 86, 871-880 (1999).
[CrossRef]

C. Chaneliere, S. Four, J. L. Autran, R. A. B. Devine, and N. P. Sandler, “Properties of amorphous and crystalline Ta2O5 thin films deposited on Si from Ta(OC2H5)5 precursor,” J. Appl. Phys. 83, 4823-4829 (1998).
[CrossRef]

J. Mater. Sci.: Mater. Electron. (1)

S. Ezhilvalavan and T. Y. Tseng, “Preparation and properties of tantalum pentoxide (Ta2O5) thin films for ultra large scale integrated circuits (ULSIs) application-A review,” J. Mater. Sci.: Mater. Electron. 10, 9-31 (1999).
[CrossRef]

J. Mod. Opt. (1)

H. M. Wang, “Analysis of anisotropic thin film parameters from prism coupler measurements,” J. Mod. Opt. 42, 2173-2181 (1995).
[CrossRef]

J. Opt. Soc. Am. A (1)

J. Vac. Sci. Technol. (1)

W. M. Paulson, F. S. Hickernell, and R. L. Davis, “Effects of deposition parameters on optical loss for RF-sputtered Ta2O5 and Si3N4 waveguides,” J. Vac. Sci. Technol. 16, 307-310 (1979).
[CrossRef]

J. Vac. Sci. Technol. A (4)

R. Messier, V. C. Venugopal, and P. D. Sunal, “Origin and evolution of sculptured thin films,” J. Vac. Sci. Technol. A 18, 1538-1545 (2000).
[CrossRef]

R. Messier, T. Gehrke, C. Frankel, V. C. Venugopal, W. Otano, and A. Lahktakia, “Engineered sculptured nematic thin films,” J. Vac. Sci. Technol. A 15, 2148-2152 (1997).
[CrossRef]

K. Robbie and M. J. Brett, “Sculptured thin films and glancing angle deposition: growth mechanics and applications,” J. Vac. Sci. Technol. A 15, 1460-1465 (1997).
[CrossRef]

I. J. Hodgkinson and Q. H. Wu, “Vacuum deposited biaxial thin films with all principal axes inclined to the substrate,” J. Vac. Sci. Technol. A 17, 2928-2932 (1999).
[CrossRef]

Mater. Sci. Eng. (1)

C. Chaneliere, J. L. Autran, R. A. B. Devine, and B. Balland, “Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications,” Mater. Sci. Eng. R22, 269-322 (1998).

Nature (1)

K. Robbie, M. J. Brett, and A. Lakhtakia, “Chiral sculptured thin films,” Nature 384, 616-616 (1996).
[CrossRef]

Opt. Commun. (1)

Y. J. Jen, C. H. Hsieh, and T. S. Lo, “Optical constant determination of an anisotropic thin film via surface plasmon resonance: analyzed by sensitivity calculation,” Opt. Commun. 244, 269-277 (2005).
[CrossRef]

Opt. Express (2)

Opt. Lett. (1)

Opt. Mater. (1)

J. Gospodyn and J. C. Sit, “Characterization of dielectric columnar thin films by variable angle Mueller matrix and spectroscopic ellipsometry,” Opt. Mater. 29, 318-325 (2006).
[CrossRef]

Pure Appl. Opt. (1)

H. Jänchen, D. Endelema, N. Kaiser, and F. Flory, “Determination of the refractive indices of highly biaxial anisotropic coatings using guided modes,” Pure Appl. Opt. 5, 405-415(1996).
[CrossRef]

Thin Solid Films (3)

I. J. Hodgkinson, J. C. Hazel, and Q. H. Wu, “In situ measurement of principal refractive indices of thin films by two-angle ellipsometry,” Thin Solid Films 313-314, 368-372 (1998).
[CrossRef]

B. Lecourt, D. Blaudez, and J. M. Turlet, “Anisotropy in Langmuir-Blodgett films studied by generalized spectroscopic ellipsometry,” Thin Solid Films 313-314, 790-794 (1998).
[CrossRef]

E. Franke, M. Schubert, C. L. Trimble, M. J. DeVries, and J. A. Woollam, “Optical properties of amorphous and polycrystalline tantalum oxide thin films measured by spectroscopic ellipsometry from 0.03 to 8.5 eV,” Thin Solid Films 388, 283-289 (2001).
[CrossRef]

Other (1)

H. A. Macleod, in Thin Film Filters, 3rd, ed., W. T. Welford and S. Laurenson, eds. (Institute of Physics, 2001), pp. 12-50.
[CrossRef]

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Figures (6)

Fig. 1
Fig. 1

Cross-section SEM image of Ta 2 O 5 sculptured thin film.

Fig. 2
Fig. 2

Spectral transmittance curves of thin film measured at normal and oblique incidence: (a) TE wave, (b) TM wave.

Fig. 3
Fig. 3

Schematic description of a biaxial thin film model.

Fig. 4
Fig. 4

Extracted optical constant of thin film with an envelope method for TE wave.

Fig. 5
Fig. 5

Dispersion of principal index N 3 determined with transmittance spectra for TE wave.

Fig. 6
Fig. 6

Dispersion of refractive indices n 1 and n 2 and extinction coefficient k determined with transmittance spectra of thin film for TM wave.

Tables (3)

Tables Icon

Table 1 Coefficients in Cauchy Dispersion Equations of Substrate and Film Extracted from Transmittance Spectra Measured at Normal Incidence for TE Wave

Tables Icon

Table 2 Coefficients in Cauchy Dispersion Equations of Refractive Index N 3 Obtained from Measured Transmittance Spectra for TE Wave

Tables Icon

Table 3 Coefficients in Cauchy Dispersion Equations of Refractive Indices n 1 and n 2 and Extinction Coefficient k Determined with Transmittance Spectra for TM Wave

Equations (3)

Equations on this page are rendered with MathJax. Learn more.

n ( λ ) = A n + B n / λ 2 + C n / λ 4 ,
k ( λ ) = A k + B k / λ 2 + C k / λ 4 .
M = i = 1 n ( C i T i ) 2 ,

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