Abstract

What we believe to be a new type of embedded metal-wire nanograting is fabricated, in which the metal wires are embedded under the trenches of the substrate, and a cladding layer is deposited on the surface of the trenches to protect the metal-wire grating. The substrate of the nanograting is antireflectively coated to further increase the performance of the device. This novel embedded nanograting has a high extinction ratio, low insertion loss for optical communication wavelengths, and good wearability for practical applications. This kind of metal-wire nanograting is attractive as a polarizing beam splitter or combiner to construct various optical devices. By using this newly developed kind of nanograting, a polarization beam splitter∕combiner with good performance is fabricated.

© 2008 Optical Society of America

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References

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  1. E. Hecht, Optics, 3rd ed. (Addison-Wesley Longman, 1998), pp. 327-328.
  2. J. J. Wang, X. Deng, L. Chen, P. F. Sciortino Jr., F. Liu, S. Tai, X. Liu, A. Nikolov, and B. J. Weinbaum, "Free-space nano-optical devices and integration: design, fabrication, and manufacturing," Bell Labs Tech. J. 10, 107-127 (2005).
    [CrossRef]
  3. X. J. Yu and H. S. Kwok, "Optical wire-grid polarizers at oblique angles of incidence," J. Appl. Phys. 93, 4407-4412 (2003).
    [CrossRef]
  4. M. Xu, H. P. Urbach, D. K. G de Bore, and H. J. Cornelissen, "Wire-grid diffraction grating used as polarizing beam splitter for visible light and applied in liquid crystal on silicon," Opt. Express 13, 2303-2320 (2005).
    [CrossRef] [PubMed]
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    [CrossRef] [PubMed]
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    [CrossRef]

2005

2003

X. J. Yu and H. S. Kwok, "Optical wire-grid polarizers at oblique angles of incidence," J. Appl. Phys. 93, 4407-4412 (2003).
[CrossRef]

1998

K. R. Foster, "Software wedge for serial data," IEEE Spectrum 35(6), 91-92 (1998).
[CrossRef]

Bell Labs Tech. J.

J. J. Wang, X. Deng, L. Chen, P. F. Sciortino Jr., F. Liu, S. Tai, X. Liu, A. Nikolov, and B. J. Weinbaum, "Free-space nano-optical devices and integration: design, fabrication, and manufacturing," Bell Labs Tech. J. 10, 107-127 (2005).
[CrossRef]

IEEE Spectrum

K. R. Foster, "Software wedge for serial data," IEEE Spectrum 35(6), 91-92 (1998).
[CrossRef]

J. Appl. Phys.

X. J. Yu and H. S. Kwok, "Optical wire-grid polarizers at oblique angles of incidence," J. Appl. Phys. 93, 4407-4412 (2003).
[CrossRef]

Opt. Express

Opt. Lett.

Other

E. Hecht, Optics, 3rd ed. (Addison-Wesley Longman, 1998), pp. 327-328.

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Figures (8)

Fig. 1
Fig. 1

(Color online) Schematic structure of the embedded metal-wire nanograting.

Fig. 2
Fig. 2

(Color online) Simulated results of the embedded metal-wire nanograting. (a) Extinction ratio, (b) insertion loss.

Fig. 3
Fig. 3

(Color online) (a) Extinction ratio of both polarized lights as a function of the thickness of the metal layer and (b) its duty cycle.

Fig. 4
Fig. 4

(Color online) Schematic fabrication process of the embedded metal-wire nanograting.

Fig. 5
Fig. 5

SEM of the embedded metal-wire nanograting.

Fig. 6
Fig. 6

(Color online) Schematic diagram of the measurement setup for the embedded nanograting.

Fig. 7
Fig. 7

(Color online) Measured results of the embedded metal-wire nanograting. (a) Extinction ratio, (b) insertion loss.

Fig. 8
Fig. 8

(Color online) Schematic view of the polarization beam splitter∕combiner.

Equations (60)

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f = d / w
h 1
h 2
1550 nm
SiO 2
140 nm
380 nm
320 nm
( h 1 t )
SiO 2
520 nm
( h 2 )
10 dB
1550 nm
85 dB
35 dB
0.05 dB
1550 nm
0.02 dB
20 dB
140 nm
SiO 2
0.15 μm
SiO 2
700 nm
SF 6
O 2
( SF 6 : O 2 = 20 : 1 )
SiO 2
520 nm
SiO 2
150 nm
SiO 2
SiO 2
SiO 2
220 nm
SiO 2
SiO 2
SiO 2
SiO 2
SiO 2
SiO 2
SiO 2
S i O 2
140 nm
700 nm
365 nm
SiO 2
520 nm
1550 nm
1550 nm
20 dB
0.3 dB
28 dB
0.11 dB
35 dB
22 dB
0.6 dB
28 dB
0.11 dB

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