Abstract

The effect of ion etching on the reflectance of Al coatings in the far ultraviolet is investigated. Ion etching of an overlayer grown on Al was performed by applying 100-300 eV Ar+ ions using an ion gun. Ion etching was employed to remove the oxide naturally grown on an Al film that had been in contact with atmosphere. Ion etching was also used to remove part or all of the protective MgF2 film on Al. The reflectance at 121.6 nm, H Lyman α line of the overlayer-removed Al surface was monitored after protecting it with a MgF2 layer. Ion etching on both types of coatings resulted in an excellent reflectance value at 121.6 nm, whereas a reflectance loss was observed at longer wavelengths.

© 2008 Optical Society of America

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    [CrossRef]
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    [CrossRef]
  32. J. I. Larruquert and R. A. M. Keski-Kuha, “Multilayer coatings with high reflectance in the EUV spectral region from 50 to 121.6 nm,” Appl. Opt. 38, 1231-1236 (1999).
    [CrossRef]

2007 (1)

2006 (1)

E. Chason, W. L. Chan, and M. S. Bharathi, “Kinetic Monte Carlo simulations of ion-induced ripple formation: dependence on flux, temperature, and defect concentration in the linear regime,” Phys. Rev. B 74, 224103 (2006).

2005 (1)

B. Ziberi, F. Frost, Th. Höche, and B. Rauschenbach, “Ripple pattern formation on silicon surfaces by low-energy ion-beam erosion: experiment and theory,” Phys. Rev. B 72, 235310(2005).

2003 (1)

J. I. Larruquert and R. A. M. Keski-Kuha, “Far ultraviolet optical properties of MgF2 films deposited by ion-beam-sputtering and their application as protective coatings for Al,” Opt. Commun. 215, 93-99 (2003).

2001 (1)

2000 (1)

1999 (2)

J. I. Larruquert and R. A. M. Keski-Kuha, “Multilayer coatings with high reflectance in the EUV spectral region from 50 to 121.6 nm,” Appl. Opt. 38, 1231-1236 (1999).
[CrossRef]

K. Soyama, W. Ishiyama, and K. Murakami, “Enhancement of reflectivity of multilayer neutron mirrors by ion polishing: optimization of the ion beam parameters,” J. Phys. Chem. Solids 60, 1587-1590 (1999).
[CrossRef]

1998 (2)

J. A. Aznárez, J. A. Méndez, J. L. Sacedón, and M. Sánchez-Avedillo, “EDMO: experimental deposition of materials in orbit,” Preparing for the Future Newsletter (ESA Publications, 1998), Vol. 8, Issue 3, pp. 12-14.

H. J. Stock, G. Haindl, F. Hamelmann, D. Menke, O. Wehmeyer, U. Kleineberg, U. Heinzmann, P. Bulicke, D. Fuchs, and G. Ulm, “Carbon/titanium multilayers as soft-x-ray mirrors for the water window,” Appl. Opt. 37, 6002-6005 (1998).
[CrossRef]

1997 (3)

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Life prolongation of far ultraviolet reflecting aluminum coatings by periodic recoating of the oxidized surface,” Opt. Commun. 135, 60-64 (1997).

S. Rusponi, C. Boragno, and U. Valbusa, “Ripple structure on Ag(110) surfaces induced by ion sputtering,” Phys. Rev. Lett. 78, 2795-2798 (1997).
[CrossRef]

H. J. Voorma, E. Louis, F. Bijkerk, and S. Abdali, “Angular and energy dependence of ion bombardment of Mo/Si multilayers,” J. Appl. Phys. 82, 1876-1881 (1997).
[CrossRef]

1996 (2)

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Degradation of far ultraviolet reflectance of aluminum films exposed to atomic oxygen. In-orbit coating application,” Opt. Commun. 124, 208-215 (1996).

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Optical constants of aluminum films in the extreme ultraviolet interval of 82-77 nm,” Appl. Opt. 35, 5692-5697 (1996).

1995 (1)

1994 (1)

1991 (1)

E. J. Puik, M. J. van der Wiel, H. Zeijlemaker, and J. Verhoeven, “Ion etching of thin W layers: enhanced reflectivity of W-C multilayer coatings,” Appl. Surf. Sci. 47, 63-76(1991).
[CrossRef]

1990 (2)

E. Spiller, “Enhancement of the reflectivity of multilayer x-ray mirrors by ion polishing,” Opt. Eng. 29, 609-613 (1990).

J. S. Edmends, C. N. Maldé, and S. J. B. Corrigan, “Measurements of the far ultraviolet reflectivity of evaporated aluminum films under exposure to O2, H2O, CO, and CO2,” Vacuum 40, 471-475 (1990).
[CrossRef]

1989 (1)

E. Spiller, “Smoothing of multilayer x-ray mirrors by ion beam polishing,” Appl. Phys. Lett. 54, 2293-2295 (1989).
[CrossRef]

1984 (1)

M. Grande, “Prospects for producing normal incidence aluminum reflectors in the 800 Å to 1200 Å range,” Internal Report RAL-84-037 (Rutherford Appleton Laboratory, 1984).

1983 (3)

1979 (2)

A. V. Bruns, G. M. Grechko, A. A. Gubarev, P. I. Klimuk, V. I. Sevast'yanov, A. B. Severny, and K. P. Feoktistov, “Spectroscopy of solar active regions performed from Salyut-4,” Izv. Krym. Astrofiz. Obs. 59, 3-30 (1979).

Yu I. Dymshits, V. A. Korobitsyn, and A. A. Metel'nikov, “Effect of heating on the reflectivity of aluminum coatings in the vacuum ultraviolet,” Sov. J. Opt. Technol. 46, 649-651(1979).

1975 (1)

1974 (1)

1971 (1)

J. G. Endriz and W. E. Spicer, “Study of aluminum films. I. Optical studies of reflectance drops and surface oscillations on controlled-roughness films,” Phys. Rev. B 4, 4144-4159(1971).

1967 (1)

1963 (1)

Abdali, S.

H. J. Voorma, E. Louis, F. Bijkerk, and S. Abdali, “Angular and energy dependence of ion bombardment of Mo/Si multilayers,” J. Appl. Phys. 82, 1876-1881 (1997).
[CrossRef]

Aznárez, J. A.

M. Fernández-Perea, J. I. Larruquert, J. A. Aznárez, A. Pons, and J. A. Méndez, “Vacuum ultraviolet coatings of Al protected with MgF2 prepared both by ion-beam sputtering and by evaporation,” Appl. Opt. 46, 4871-4878 (2007).
[CrossRef]

J. A. Méndez, J. I. Larruquert, and J. A. Aznárez, “Preservation of FUV aluminum reflectance by overcoating with C60 films,” Appl. Opt. 39, 149-156 (2000).
[CrossRef]

J. A. Aznárez, J. A. Méndez, J. L. Sacedón, and M. Sánchez-Avedillo, “EDMO: experimental deposition of materials in orbit,” Preparing for the Future Newsletter (ESA Publications, 1998), Vol. 8, Issue 3, pp. 12-14.

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Life prolongation of far ultraviolet reflecting aluminum coatings by periodic recoating of the oxidized surface,” Opt. Commun. 135, 60-64 (1997).

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Optical constants of aluminum films in the extreme ultraviolet interval of 82-77 nm,” Appl. Opt. 35, 5692-5697 (1996).

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Degradation of far ultraviolet reflectance of aluminum films exposed to atomic oxygen. In-orbit coating application,” Opt. Commun. 124, 208-215 (1996).

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Far ultraviolet reflectance measurements and optical constants of unoxidized Al films,” Appl. Opt. 34, 4892-4899 (1995).

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Far UV reflectance of UHV prepared Al films and its degradation after exposure to O2,” Appl. Opt. 33, 3518-3522 (1994).

Bennett, J. M.

Bharathi, M. S.

E. Chason, W. L. Chan, and M. S. Bharathi, “Kinetic Monte Carlo simulations of ion-induced ripple formation: dependence on flux, temperature, and defect concentration in the linear regime,” Phys. Rev. B 74, 224103 (2006).

Bijkerk, F.

H. J. Voorma, E. Louis, F. Bijkerk, and S. Abdali, “Angular and energy dependence of ion bombardment of Mo/Si multilayers,” J. Appl. Phys. 82, 1876-1881 (1997).
[CrossRef]

Bon, M.

Boragno, C.

S. Rusponi, C. Boragno, and U. Valbusa, “Ripple structure on Ag(110) surfaces induced by ion sputtering,” Phys. Rev. Lett. 78, 2795-2798 (1997).
[CrossRef]

Bruns, A. V.

A. V. Bruns, G. M. Grechko, A. A. Gubarev, P. I. Klimuk, V. I. Sevast'yanov, A. B. Severny, and K. P. Feoktistov, “Spectroscopy of solar active regions performed from Salyut-4,” Izv. Krym. Astrofiz. Obs. 59, 3-30 (1979).

Bulicke, P.

Burton, W. M.

W. M. Burton, “Removable volatile protective coatings for aluminised mirrors used in far-ultraviolet space astronomy,” J. Phys. D 16, L129-L132 (1983).

Canfield, L. R.

Chan, W. L.

E. Chason, W. L. Chan, and M. S. Bharathi, “Kinetic Monte Carlo simulations of ion-induced ripple formation: dependence on flux, temperature, and defect concentration in the linear regime,” Phys. Rev. B 74, 224103 (2006).

Chason, E.

E. Chason, W. L. Chan, and M. S. Bharathi, “Kinetic Monte Carlo simulations of ion-induced ripple formation: dependence on flux, temperature, and defect concentration in the linear regime,” Phys. Rev. B 74, 224103 (2006).

Corrigan, S. J. B.

J. S. Edmends, C. N. Maldé, and S. J. B. Corrigan, “Measurements of the far ultraviolet reflectivity of evaporated aluminum films under exposure to O2, H2O, CO, and CO2,” Vacuum 40, 471-475 (1990).
[CrossRef]

Courbon, M.

Dymshits, Yu I.

Yu I. Dymshits, V. A. Korobitsyn, and A. A. Metel'nikov, “Effect of heating on the reflectivity of aluminum coatings in the vacuum ultraviolet,” Sov. J. Opt. Technol. 46, 649-651(1979).

Edmends, J. S.

J. S. Edmends, C. N. Maldé, and S. J. B. Corrigan, “Measurements of the far ultraviolet reflectivity of evaporated aluminum films under exposure to O2, H2O, CO, and CO2,” Vacuum 40, 471-475 (1990).
[CrossRef]

Elson, J. M.

Endriz, J. G.

J. G. Endriz and W. E. Spicer, “Study of aluminum films. I. Optical studies of reflectance drops and surface oscillations on controlled-roughness films,” Phys. Rev. B 4, 4144-4159(1971).

Feoktistov, K. P.

A. V. Bruns, G. M. Grechko, A. A. Gubarev, P. I. Klimuk, V. I. Sevast'yanov, A. B. Severny, and K. P. Feoktistov, “Spectroscopy of solar active regions performed from Salyut-4,” Izv. Krym. Astrofiz. Obs. 59, 3-30 (1979).

Fernández-Perea, M.

Frost, F.

B. Ziberi, F. Frost, Th. Höche, and B. Rauschenbach, “Ripple pattern formation on silicon surfaces by low-energy ion-beam erosion: experiment and theory,” Phys. Rev. B 72, 235310(2005).

Fuchs, D.

Grande, M.

M. Grande, “Prospects for producing normal incidence aluminum reflectors in the 800 Å to 1200 Å range,” Internal Report RAL-84-037 (Rutherford Appleton Laboratory, 1984).

Grechko, G. M.

A. V. Bruns, G. M. Grechko, A. A. Gubarev, P. I. Klimuk, V. I. Sevast'yanov, A. B. Severny, and K. P. Feoktistov, “Spectroscopy of solar active regions performed from Salyut-4,” Izv. Krym. Astrofiz. Obs. 59, 3-30 (1979).

Gubarev, A. A.

A. V. Bruns, G. M. Grechko, A. A. Gubarev, P. I. Klimuk, V. I. Sevast'yanov, A. B. Severny, and K. P. Feoktistov, “Spectroscopy of solar active regions performed from Salyut-4,” Izv. Krym. Astrofiz. Obs. 59, 3-30 (1979).

Haindl, G.

Hamelmann, F.

Hass, G.

Heinzmann, U.

Höche, Th.

B. Ziberi, F. Frost, Th. Höche, and B. Rauschenbach, “Ripple pattern formation on silicon surfaces by low-energy ion-beam erosion: experiment and theory,” Phys. Rev. B 72, 235310(2005).

Hunter, W. R.

Ishiyama, W.

K. Soyama, W. Ishiyama, and K. Murakami, “Enhancement of reflectivity of multilayer neutron mirrors by ion polishing: optimization of the ion beam parameters,” J. Phys. Chem. Solids 60, 1587-1590 (1999).
[CrossRef]

Keski-Kuha, R. A. M.

Kleineberg, U.

Klimuk, P. I.

A. V. Bruns, G. M. Grechko, A. A. Gubarev, P. I. Klimuk, V. I. Sevast'yanov, A. B. Severny, and K. P. Feoktistov, “Spectroscopy of solar active regions performed from Salyut-4,” Izv. Krym. Astrofiz. Obs. 59, 3-30 (1979).

Korobitsyn, V. A.

Yu I. Dymshits, V. A. Korobitsyn, and A. A. Metel'nikov, “Effect of heating on the reflectivity of aluminum coatings in the vacuum ultraviolet,” Sov. J. Opt. Technol. 46, 649-651(1979).

Kretschmann, E.

Kröger, E.

Laporte, P.

Larruquert, J. I.

M. Fernández-Perea, J. I. Larruquert, J. A. Aznárez, A. Pons, and J. A. Méndez, “Vacuum ultraviolet coatings of Al protected with MgF2 prepared both by ion-beam sputtering and by evaporation,” Appl. Opt. 46, 4871-4878 (2007).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, “Far ultraviolet optical properties of MgF2 films deposited by ion-beam-sputtering and their application as protective coatings for Al,” Opt. Commun. 215, 93-99 (2003).

J. I. Larruquert and R. A. M. Keski-Kuha, “Multilayer coatings for narrowband imaging in the extreme ultraviolet,” Appl. Opt. 40, 1126-1131 (2001).
[CrossRef]

J. A. Méndez, J. I. Larruquert, and J. A. Aznárez, “Preservation of FUV aluminum reflectance by overcoating with C60 films,” Appl. Opt. 39, 149-156 (2000).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, “Multilayer coatings with high reflectance in the EUV spectral region from 50 to 121.6 nm,” Appl. Opt. 38, 1231-1236 (1999).
[CrossRef]

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Life prolongation of far ultraviolet reflecting aluminum coatings by periodic recoating of the oxidized surface,” Opt. Commun. 135, 60-64 (1997).

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Degradation of far ultraviolet reflectance of aluminum films exposed to atomic oxygen. In-orbit coating application,” Opt. Commun. 124, 208-215 (1996).

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Optical constants of aluminum films in the extreme ultraviolet interval of 82-77 nm,” Appl. Opt. 35, 5692-5697 (1996).

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Far ultraviolet reflectance measurements and optical constants of unoxidized Al films,” Appl. Opt. 34, 4892-4899 (1995).

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Far UV reflectance of UHV prepared Al films and its degradation after exposure to O2,” Appl. Opt. 33, 3518-3522 (1994).

Louis, E.

H. J. Voorma, E. Louis, F. Bijkerk, and S. Abdali, “Angular and energy dependence of ion bombardment of Mo/Si multilayers,” J. Appl. Phys. 82, 1876-1881 (1997).
[CrossRef]

Madden, R. P.

Maldé, C. N.

J. S. Edmends, C. N. Maldé, and S. J. B. Corrigan, “Measurements of the far ultraviolet reflectivity of evaporated aluminum films under exposure to O2, H2O, CO, and CO2,” Vacuum 40, 471-475 (1990).
[CrossRef]

Méndez, J. A.

M. Fernández-Perea, J. I. Larruquert, J. A. Aznárez, A. Pons, and J. A. Méndez, “Vacuum ultraviolet coatings of Al protected with MgF2 prepared both by ion-beam sputtering and by evaporation,” Appl. Opt. 46, 4871-4878 (2007).
[CrossRef]

J. A. Méndez, J. I. Larruquert, and J. A. Aznárez, “Preservation of FUV aluminum reflectance by overcoating with C60 films,” Appl. Opt. 39, 149-156 (2000).
[CrossRef]

J. A. Aznárez, J. A. Méndez, J. L. Sacedón, and M. Sánchez-Avedillo, “EDMO: experimental deposition of materials in orbit,” Preparing for the Future Newsletter (ESA Publications, 1998), Vol. 8, Issue 3, pp. 12-14.

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Life prolongation of far ultraviolet reflecting aluminum coatings by periodic recoating of the oxidized surface,” Opt. Commun. 135, 60-64 (1997).

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Optical constants of aluminum films in the extreme ultraviolet interval of 82-77 nm,” Appl. Opt. 35, 5692-5697 (1996).

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Degradation of far ultraviolet reflectance of aluminum films exposed to atomic oxygen. In-orbit coating application,” Opt. Commun. 124, 208-215 (1996).

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Far ultraviolet reflectance measurements and optical constants of unoxidized Al films,” Appl. Opt. 34, 4892-4899 (1995).

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Far UV reflectance of UHV prepared Al films and its degradation after exposure to O2,” Appl. Opt. 33, 3518-3522 (1994).

Menke, D.

Metel'nikov, A. A.

Yu I. Dymshits, V. A. Korobitsyn, and A. A. Metel'nikov, “Effect of heating on the reflectivity of aluminum coatings in the vacuum ultraviolet,” Sov. J. Opt. Technol. 46, 649-651(1979).

Murakami, K.

K. Soyama, W. Ishiyama, and K. Murakami, “Enhancement of reflectivity of multilayer neutron mirrors by ion polishing: optimization of the ion beam parameters,” J. Phys. Chem. Solids 60, 1587-1590 (1999).
[CrossRef]

Osantowski, J. F.

Pons, A.

Puik, E. J.

E. J. Puik, M. J. van der Wiel, H. Zeijlemaker, and J. Verhoeven, “Ion etching of thin W layers: enhanced reflectivity of W-C multilayer coatings,” Appl. Surf. Sci. 47, 63-76(1991).
[CrossRef]

Rahn, J. P.

Rauschenbach, B.

B. Ziberi, F. Frost, Th. Höche, and B. Rauschenbach, “Ripple pattern formation on silicon surfaces by low-energy ion-beam erosion: experiment and theory,” Phys. Rev. B 72, 235310(2005).

Rusponi, S.

S. Rusponi, C. Boragno, and U. Valbusa, “Ripple structure on Ag(110) surfaces induced by ion sputtering,” Phys. Rev. Lett. 78, 2795-2798 (1997).
[CrossRef]

Sacedón, J. L.

J. A. Aznárez, J. A. Méndez, J. L. Sacedón, and M. Sánchez-Avedillo, “EDMO: experimental deposition of materials in orbit,” Preparing for the Future Newsletter (ESA Publications, 1998), Vol. 8, Issue 3, pp. 12-14.

Sánchez-Avedillo, M.

J. A. Aznárez, J. A. Méndez, J. L. Sacedón, and M. Sánchez-Avedillo, “EDMO: experimental deposition of materials in orbit,” Preparing for the Future Newsletter (ESA Publications, 1998), Vol. 8, Issue 3, pp. 12-14.

Sevast'yanov, V. I.

A. V. Bruns, G. M. Grechko, A. A. Gubarev, P. I. Klimuk, V. I. Sevast'yanov, A. B. Severny, and K. P. Feoktistov, “Spectroscopy of solar active regions performed from Salyut-4,” Izv. Krym. Astrofiz. Obs. 59, 3-30 (1979).

Severny, A. B.

A. V. Bruns, G. M. Grechko, A. A. Gubarev, P. I. Klimuk, V. I. Sevast'yanov, A. B. Severny, and K. P. Feoktistov, “Spectroscopy of solar active regions performed from Salyut-4,” Izv. Krym. Astrofiz. Obs. 59, 3-30 (1979).

Soyama, K.

K. Soyama, W. Ishiyama, and K. Murakami, “Enhancement of reflectivity of multilayer neutron mirrors by ion polishing: optimization of the ion beam parameters,” J. Phys. Chem. Solids 60, 1587-1590 (1999).
[CrossRef]

Spicer, W. E.

J. G. Endriz and W. E. Spicer, “Study of aluminum films. I. Optical studies of reflectance drops and surface oscillations on controlled-roughness films,” Phys. Rev. B 4, 4144-4159(1971).

Spiller, E.

E. Spiller, “Enhancement of the reflectivity of multilayer x-ray mirrors by ion polishing,” Opt. Eng. 29, 609-613 (1990).

E. Spiller, “Smoothing of multilayer x-ray mirrors by ion beam polishing,” Appl. Phys. Lett. 54, 2293-2295 (1989).
[CrossRef]

Stock, H. J.

Subtil, J. L.

Ulm, G.

Valbusa, U.

S. Rusponi, C. Boragno, and U. Valbusa, “Ripple structure on Ag(110) surfaces induced by ion sputtering,” Phys. Rev. Lett. 78, 2795-2798 (1997).
[CrossRef]

van der Wiel, M. J.

E. J. Puik, M. J. van der Wiel, H. Zeijlemaker, and J. Verhoeven, “Ion etching of thin W layers: enhanced reflectivity of W-C multilayer coatings,” Appl. Surf. Sci. 47, 63-76(1991).
[CrossRef]

Verhoeven, J.

E. J. Puik, M. J. van der Wiel, H. Zeijlemaker, and J. Verhoeven, “Ion etching of thin W layers: enhanced reflectivity of W-C multilayer coatings,” Appl. Surf. Sci. 47, 63-76(1991).
[CrossRef]

Vincent, L.

Voorma, H. J.

H. J. Voorma, E. Louis, F. Bijkerk, and S. Abdali, “Angular and energy dependence of ion bombardment of Mo/Si multilayers,” J. Appl. Phys. 82, 1876-1881 (1997).
[CrossRef]

Wehmeyer, O.

Zeijlemaker, H.

E. J. Puik, M. J. van der Wiel, H. Zeijlemaker, and J. Verhoeven, “Ion etching of thin W layers: enhanced reflectivity of W-C multilayer coatings,” Appl. Surf. Sci. 47, 63-76(1991).
[CrossRef]

Ziberi, B.

B. Ziberi, F. Frost, Th. Höche, and B. Rauschenbach, “Ripple pattern formation on silicon surfaces by low-energy ion-beam erosion: experiment and theory,” Phys. Rev. B 72, 235310(2005).

Appl. Opt. (10)

J. A. Méndez, J. I. Larruquert, and J. A. Aznárez, “Preservation of FUV aluminum reflectance by overcoating with C60 films,” Appl. Opt. 39, 149-156 (2000).
[CrossRef]

G. Hass and W. R. Hunter, “Calculated reflectance of aluminum-overcoated iridium in the vacuum ultraviolet from 500 Å to 2000 Å,” Appl. Opt. 6, 2097-2100 (1967).

J. M. Elson, J. P. Rahn, and J. M. Bennett, “Relationship of the total integrated scattering from multilayer-coated optics to angle of incidence, polarization, correlation length, and roughness cross-correlation properties,” Appl. Opt. 22, 3207-3219 (1983).

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Far UV reflectance of UHV prepared Al films and its degradation after exposure to O2,” Appl. Opt. 33, 3518-3522 (1994).

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Far ultraviolet reflectance measurements and optical constants of unoxidized Al films,” Appl. Opt. 34, 4892-4899 (1995).

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Optical constants of aluminum films in the extreme ultraviolet interval of 82-77 nm,” Appl. Opt. 35, 5692-5697 (1996).

H. J. Stock, G. Haindl, F. Hamelmann, D. Menke, O. Wehmeyer, U. Kleineberg, U. Heinzmann, P. Bulicke, D. Fuchs, and G. Ulm, “Carbon/titanium multilayers as soft-x-ray mirrors for the water window,” Appl. Opt. 37, 6002-6005 (1998).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, “Multilayer coatings with high reflectance in the EUV spectral region from 50 to 121.6 nm,” Appl. Opt. 38, 1231-1236 (1999).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, “Multilayer coatings for narrowband imaging in the extreme ultraviolet,” Appl. Opt. 40, 1126-1131 (2001).
[CrossRef]

M. Fernández-Perea, J. I. Larruquert, J. A. Aznárez, A. Pons, and J. A. Méndez, “Vacuum ultraviolet coatings of Al protected with MgF2 prepared both by ion-beam sputtering and by evaporation,” Appl. Opt. 46, 4871-4878 (2007).
[CrossRef]

Appl. Phys. Lett. (1)

E. Spiller, “Smoothing of multilayer x-ray mirrors by ion beam polishing,” Appl. Phys. Lett. 54, 2293-2295 (1989).
[CrossRef]

Appl. Surf. Sci. (1)

E. J. Puik, M. J. van der Wiel, H. Zeijlemaker, and J. Verhoeven, “Ion etching of thin W layers: enhanced reflectivity of W-C multilayer coatings,” Appl. Surf. Sci. 47, 63-76(1991).
[CrossRef]

Izv. Krym. Astrofiz. Obs. (1)

A. V. Bruns, G. M. Grechko, A. A. Gubarev, P. I. Klimuk, V. I. Sevast'yanov, A. B. Severny, and K. P. Feoktistov, “Spectroscopy of solar active regions performed from Salyut-4,” Izv. Krym. Astrofiz. Obs. 59, 3-30 (1979).

J. Appl. Phys. (1)

H. J. Voorma, E. Louis, F. Bijkerk, and S. Abdali, “Angular and energy dependence of ion bombardment of Mo/Si multilayers,” J. Appl. Phys. 82, 1876-1881 (1997).
[CrossRef]

J. Opt. Soc. Am. (4)

J. Phys. Chem. Solids (1)

K. Soyama, W. Ishiyama, and K. Murakami, “Enhancement of reflectivity of multilayer neutron mirrors by ion polishing: optimization of the ion beam parameters,” J. Phys. Chem. Solids 60, 1587-1590 (1999).
[CrossRef]

J. Phys. D (1)

W. M. Burton, “Removable volatile protective coatings for aluminised mirrors used in far-ultraviolet space astronomy,” J. Phys. D 16, L129-L132 (1983).

Opt. Commun. (3)

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Degradation of far ultraviolet reflectance of aluminum films exposed to atomic oxygen. In-orbit coating application,” Opt. Commun. 124, 208-215 (1996).

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, “Life prolongation of far ultraviolet reflecting aluminum coatings by periodic recoating of the oxidized surface,” Opt. Commun. 135, 60-64 (1997).

J. I. Larruquert and R. A. M. Keski-Kuha, “Far ultraviolet optical properties of MgF2 films deposited by ion-beam-sputtering and their application as protective coatings for Al,” Opt. Commun. 215, 93-99 (2003).

Opt. Eng. (1)

E. Spiller, “Enhancement of the reflectivity of multilayer x-ray mirrors by ion polishing,” Opt. Eng. 29, 609-613 (1990).

Phys. Rev. B (3)

B. Ziberi, F. Frost, Th. Höche, and B. Rauschenbach, “Ripple pattern formation on silicon surfaces by low-energy ion-beam erosion: experiment and theory,” Phys. Rev. B 72, 235310(2005).

E. Chason, W. L. Chan, and M. S. Bharathi, “Kinetic Monte Carlo simulations of ion-induced ripple formation: dependence on flux, temperature, and defect concentration in the linear regime,” Phys. Rev. B 74, 224103 (2006).

J. G. Endriz and W. E. Spicer, “Study of aluminum films. I. Optical studies of reflectance drops and surface oscillations on controlled-roughness films,” Phys. Rev. B 4, 4144-4159(1971).

Phys. Rev. Lett. (1)

S. Rusponi, C. Boragno, and U. Valbusa, “Ripple structure on Ag(110) surfaces induced by ion sputtering,” Phys. Rev. Lett. 78, 2795-2798 (1997).
[CrossRef]

Sov. J. Opt. Technol. (1)

Yu I. Dymshits, V. A. Korobitsyn, and A. A. Metel'nikov, “Effect of heating on the reflectivity of aluminum coatings in the vacuum ultraviolet,” Sov. J. Opt. Technol. 46, 649-651(1979).

Vacuum (1)

J. S. Edmends, C. N. Maldé, and S. J. B. Corrigan, “Measurements of the far ultraviolet reflectivity of evaporated aluminum films under exposure to O2, H2O, CO, and CO2,” Vacuum 40, 471-475 (1990).
[CrossRef]

Other (2)

M. Grande, “Prospects for producing normal incidence aluminum reflectors in the 800 Å to 1200 Å range,” Internal Report RAL-84-037 (Rutherford Appleton Laboratory, 1984).

J. A. Aznárez, J. A. Méndez, J. L. Sacedón, and M. Sánchez-Avedillo, “EDMO: experimental deposition of materials in orbit,” Preparing for the Future Newsletter (ESA Publications, 1998), Vol. 8, Issue 3, pp. 12-14.

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