Abstract

Boron films deposited by evaporation with an electron-beam were found to have a relatively high reflectance in the extreme ultraviolet with values similar to those of ion-beam-sputtered (IBS) SiC and IBS B4C. The largest reflectance was measured for an 11nm thick boron film. Some reflectance degradation was observed for boron films stored in a desiccator. Reflectance degradation varied from sample to sample and was found to be either similar to that of IBS SiC and IBS B4C or larger.

© 2008 Optical Society of America

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  1. J. I. Larruquert and R. A. M. Keski-Kuha, “Multilayer coatings with high reflectance in the EUV spectral region from 50 to 121.6 nm,” Appl. Opt. 38, 1231-1236 (1999).
  2. J. I. Larruquert and R. A. M. Keski-Kuha, “Sub-quarterwave multilayer coatings with high reflectance in the extreme ultraviolet,” Appl. Opt. 41, 5398-5404 (2002).
    [CrossRef]
  3. D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Y. A. Uspenskii, “Terbium-based extreme ultraviolet multilayers,” Opt. Lett. 30, 3186-3188 (2005).
    [CrossRef]
  4. B. Kjornrattanawanich, D. L. Windt, J. F. Seely, and Y. A. Uspenskii, “SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging,” Appl. Opt. 45, 1765-1772 (2006).
    [CrossRef]
  5. J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170T (2006).
    [CrossRef]
  6. B. Kjornrattanawanich, D. L. Windt, Y. A. Uspenskii, and J. F. Seely, “Optical constants determination of neodymium and gadolinium in the 3 nm to 100 nm wavelength range,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170U (2006).
    [CrossRef]
  7. W. J. Choyke, R. F. Farich, and R. A. Hoffman, “SiC, a new material for mirrors. 1: High power lasers; 2: VUV applications,” Appl. Opt. 15, 2006-2007 (1976).
  8. J. I. Larruquert and R. A. M. Keski-Kuha, “Optical properties of hot-pressed B4C in the extreme ultraviolet,” Appl. Opt. 39, 1537-1540 (2000).
  9. J. B. Kortright and D. L. Windt, “Amorphous silicon carbide coatings for extreme ultraviolet optics,” Appl. Opt. 27, 2841-2846 (1988).
  10. R. A. M. Keski-Kuha, J. F. Osantowski, H. Herzig, J. S. Gum, and A. R. Toft, “Normal incidence reflectance of ion beam deposited SiC films in the EUV,” Appl. Opt. 27, 2815-2816(1988).
  11. G. M. Blumenstock and R. A. M. Keski-Kuha, “Ion-beam-deposited boron carbide coatings for extreme ultraviolet,” Appl. Opt. 33, 5962-5963 (1994).
  12. G. Hass, G. F. Jacobus, and W. R. Hunter, “Optical properties of evaporated iridium in the vacuum ultraviolet from 500 Å to 2000 Å,” J. Opt. Soc. Am. 57, 758-762 (1967).
  13. J. I. Larruquert, José A. Méndez, and José A. Aznárez, “Non-oxidized Al-overcoated Ir bilayers with high reflectance in the extreme ultraviolet above 50 nm,” Opt. Eng. 41, 1418-1424(2002).
    [CrossRef]
  14. S. Labov, S. Bowyer, and G. Steele, “Boron and silicon: filters for the extreme ultraviolet,” Appl. Opt. 24, 576-578(1985).
  15. M. Fernández-Perea, J. I. Larruquert, J. A. Aznárez, J. A. Méndez, M. Vidal-Dasilva, E. M. Gullikson, A. Aquila, R. Soufli, and J. L. G. Fierro, “Optical constants of electron-beam evaporated boron films in the 6.8-900 eV photon energy range,” J. Opt. Soc. Am. A 24, 3800-3807 (2007).
    [CrossRef]
  16. J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, “Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films,” Rev. Sci. Instrum. 67, 497-502 (1996).
    [CrossRef]
  17. J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, “FUV reflectometer for in situ characterization of thin films deposited under UHV,” Proc. SPIE-Int. Soc. Opt. Eng. 4139, 92-101(2000).
    [CrossRef]
  18. S. Tolansky, Multiple-Beam Interferometry of Surfaces and Films (Oxford U. Press, 1948).
  19. N. Morita, “Optical constants of boron in visible and near infrared,” J. Sci. Res. Inst. 48, 8-12 (1954).
  20. N. Morita and A. Yamamoto, “Optical and electrical properties of boron,” Jpn. J. Appl. Phys. 14, 825-831 (1975).
    [CrossRef]
  21. J. I. Larruquert and R. A. M. Keski-Kuha, “Reflectance measurements and optical constants in the extreme ultraviolet for thin films of ion-beam-deposited SiC, Mo, Mg2Si, and InSb and of evaporated Cr,” Appl. Opt. 39, 2772-2781(2000).
  22. G. M. Blumenstock, R. A. M. Keski-Kuha, and M. L. Ginter, “Extreme ultraviolet optical properties of ion-beam-deposited boron carbide thin films,” Proc. SPIE-Int. Soc. Opt. Eng. 2515, 558-564 (1995).
    [CrossRef]
  23. J. I. Larruquert and R. A. M. Keski-Kuha, “Reflectance measurements and optical constants in the extreme ultraviolet of thin films of ion-beam-deposited carbon,” Opt. Commun. 183, 437-443 (2000).
    [CrossRef]
  24. T. Sasaki and K. Ishiguro, “Optical constants of silicon in the extreme ultraviolet,” Phys. Rev. 127, 1091-1092 (1962).
    [CrossRef]

2007 (1)

2006 (3)

B. Kjornrattanawanich, D. L. Windt, J. F. Seely, and Y. A. Uspenskii, “SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging,” Appl. Opt. 45, 1765-1772 (2006).
[CrossRef]

J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170T (2006).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, Y. A. Uspenskii, and J. F. Seely, “Optical constants determination of neodymium and gadolinium in the 3 nm to 100 nm wavelength range,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170U (2006).
[CrossRef]

2005 (1)

2002 (2)

J. I. Larruquert and R. A. M. Keski-Kuha, “Sub-quarterwave multilayer coatings with high reflectance in the extreme ultraviolet,” Appl. Opt. 41, 5398-5404 (2002).
[CrossRef]

J. I. Larruquert, José A. Méndez, and José A. Aznárez, “Non-oxidized Al-overcoated Ir bilayers with high reflectance in the extreme ultraviolet above 50 nm,” Opt. Eng. 41, 1418-1424(2002).
[CrossRef]

2000 (4)

J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, “FUV reflectometer for in situ characterization of thin films deposited under UHV,” Proc. SPIE-Int. Soc. Opt. Eng. 4139, 92-101(2000).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, “Reflectance measurements and optical constants in the extreme ultraviolet of thin films of ion-beam-deposited carbon,” Opt. Commun. 183, 437-443 (2000).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, “Optical properties of hot-pressed B4C in the extreme ultraviolet,” Appl. Opt. 39, 1537-1540 (2000).

J. I. Larruquert and R. A. M. Keski-Kuha, “Reflectance measurements and optical constants in the extreme ultraviolet for thin films of ion-beam-deposited SiC, Mo, Mg2Si, and InSb and of evaporated Cr,” Appl. Opt. 39, 2772-2781(2000).

1999 (1)

1996 (1)

J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, “Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films,” Rev. Sci. Instrum. 67, 497-502 (1996).
[CrossRef]

1995 (1)

G. M. Blumenstock, R. A. M. Keski-Kuha, and M. L. Ginter, “Extreme ultraviolet optical properties of ion-beam-deposited boron carbide thin films,” Proc. SPIE-Int. Soc. Opt. Eng. 2515, 558-564 (1995).
[CrossRef]

1994 (1)

1988 (2)

1985 (1)

1976 (1)

1975 (1)

N. Morita and A. Yamamoto, “Optical and electrical properties of boron,” Jpn. J. Appl. Phys. 14, 825-831 (1975).
[CrossRef]

1967 (1)

1962 (1)

T. Sasaki and K. Ishiguro, “Optical constants of silicon in the extreme ultraviolet,” Phys. Rev. 127, 1091-1092 (1962).
[CrossRef]

1954 (1)

N. Morita, “Optical constants of boron in visible and near infrared,” J. Sci. Res. Inst. 48, 8-12 (1954).

Aquila, A.

Aznárez, J. A.

M. Fernández-Perea, J. I. Larruquert, J. A. Aznárez, J. A. Méndez, M. Vidal-Dasilva, E. M. Gullikson, A. Aquila, R. Soufli, and J. L. G. Fierro, “Optical constants of electron-beam evaporated boron films in the 6.8-900 eV photon energy range,” J. Opt. Soc. Am. A 24, 3800-3807 (2007).
[CrossRef]

J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, “FUV reflectometer for in situ characterization of thin films deposited under UHV,” Proc. SPIE-Int. Soc. Opt. Eng. 4139, 92-101(2000).
[CrossRef]

J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, “Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films,” Rev. Sci. Instrum. 67, 497-502 (1996).
[CrossRef]

Aznárez, José A.

J. I. Larruquert, José A. Méndez, and José A. Aznárez, “Non-oxidized Al-overcoated Ir bilayers with high reflectance in the extreme ultraviolet above 50 nm,” Opt. Eng. 41, 1418-1424(2002).
[CrossRef]

Blumenstock, G. M.

G. M. Blumenstock, R. A. M. Keski-Kuha, and M. L. Ginter, “Extreme ultraviolet optical properties of ion-beam-deposited boron carbide thin films,” Proc. SPIE-Int. Soc. Opt. Eng. 2515, 558-564 (1995).
[CrossRef]

G. M. Blumenstock and R. A. M. Keski-Kuha, “Ion-beam-deposited boron carbide coatings for extreme ultraviolet,” Appl. Opt. 33, 5962-5963 (1994).

Bowyer, S.

Choyke, W. J.

Farich, R. F.

Fernández-Perea, M.

Fierro, J. L. G.

Ginter, M. L.

G. M. Blumenstock, R. A. M. Keski-Kuha, and M. L. Ginter, “Extreme ultraviolet optical properties of ion-beam-deposited boron carbide thin films,” Proc. SPIE-Int. Soc. Opt. Eng. 2515, 558-564 (1995).
[CrossRef]

Gullikson, E. M.

Gum, J. S.

Hass, G.

Herzig, H.

Hoffman, R. A.

Hunter, W. R.

Ishiguro, K.

T. Sasaki and K. Ishiguro, “Optical constants of silicon in the extreme ultraviolet,” Phys. Rev. 127, 1091-1092 (1962).
[CrossRef]

Jacobus, G. F.

Keski-Kuha, R. A. M.

Kjornrattanawanich, B.

B. Kjornrattanawanich, D. L. Windt, J. F. Seely, and Y. A. Uspenskii, “SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging,” Appl. Opt. 45, 1765-1772 (2006).
[CrossRef]

J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170T (2006).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, Y. A. Uspenskii, and J. F. Seely, “Optical constants determination of neodymium and gadolinium in the 3 nm to 100 nm wavelength range,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170U (2006).
[CrossRef]

D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Y. A. Uspenskii, “Terbium-based extreme ultraviolet multilayers,” Opt. Lett. 30, 3186-3188 (2005).
[CrossRef]

Kortright, J. B.

Labov, S.

Larruquert, J. I.

M. Fernández-Perea, J. I. Larruquert, J. A. Aznárez, J. A. Méndez, M. Vidal-Dasilva, E. M. Gullikson, A. Aquila, R. Soufli, and J. L. G. Fierro, “Optical constants of electron-beam evaporated boron films in the 6.8-900 eV photon energy range,” J. Opt. Soc. Am. A 24, 3800-3807 (2007).
[CrossRef]

J. I. Larruquert, José A. Méndez, and José A. Aznárez, “Non-oxidized Al-overcoated Ir bilayers with high reflectance in the extreme ultraviolet above 50 nm,” Opt. Eng. 41, 1418-1424(2002).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, “Sub-quarterwave multilayer coatings with high reflectance in the extreme ultraviolet,” Appl. Opt. 41, 5398-5404 (2002).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, “Reflectance measurements and optical constants in the extreme ultraviolet of thin films of ion-beam-deposited carbon,” Opt. Commun. 183, 437-443 (2000).
[CrossRef]

J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, “FUV reflectometer for in situ characterization of thin films deposited under UHV,” Proc. SPIE-Int. Soc. Opt. Eng. 4139, 92-101(2000).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, “Optical properties of hot-pressed B4C in the extreme ultraviolet,” Appl. Opt. 39, 1537-1540 (2000).

J. I. Larruquert and R. A. M. Keski-Kuha, “Reflectance measurements and optical constants in the extreme ultraviolet for thin films of ion-beam-deposited SiC, Mo, Mg2Si, and InSb and of evaporated Cr,” Appl. Opt. 39, 2772-2781(2000).

J. I. Larruquert and R. A. M. Keski-Kuha, “Multilayer coatings with high reflectance in the EUV spectral region from 50 to 121.6 nm,” Appl. Opt. 38, 1231-1236 (1999).

J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, “Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films,” Rev. Sci. Instrum. 67, 497-502 (1996).
[CrossRef]

Méndez, J. A.

M. Fernández-Perea, J. I. Larruquert, J. A. Aznárez, J. A. Méndez, M. Vidal-Dasilva, E. M. Gullikson, A. Aquila, R. Soufli, and J. L. G. Fierro, “Optical constants of electron-beam evaporated boron films in the 6.8-900 eV photon energy range,” J. Opt. Soc. Am. A 24, 3800-3807 (2007).
[CrossRef]

J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, “FUV reflectometer for in situ characterization of thin films deposited under UHV,” Proc. SPIE-Int. Soc. Opt. Eng. 4139, 92-101(2000).
[CrossRef]

J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, “Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films,” Rev. Sci. Instrum. 67, 497-502 (1996).
[CrossRef]

Méndez, José A.

J. I. Larruquert, José A. Méndez, and José A. Aznárez, “Non-oxidized Al-overcoated Ir bilayers with high reflectance in the extreme ultraviolet above 50 nm,” Opt. Eng. 41, 1418-1424(2002).
[CrossRef]

Morita, N.

N. Morita and A. Yamamoto, “Optical and electrical properties of boron,” Jpn. J. Appl. Phys. 14, 825-831 (1975).
[CrossRef]

N. Morita, “Optical constants of boron in visible and near infrared,” J. Sci. Res. Inst. 48, 8-12 (1954).

Osantowski, J. F.

Sasaki, T.

T. Sasaki and K. Ishiguro, “Optical constants of silicon in the extreme ultraviolet,” Phys. Rev. 127, 1091-1092 (1962).
[CrossRef]

Seely, J. F.

B. Kjornrattanawanich, D. L. Windt, Y. A. Uspenskii, and J. F. Seely, “Optical constants determination of neodymium and gadolinium in the 3 nm to 100 nm wavelength range,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170U (2006).
[CrossRef]

J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170T (2006).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, J. F. Seely, and Y. A. Uspenskii, “SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging,” Appl. Opt. 45, 1765-1772 (2006).
[CrossRef]

D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Y. A. Uspenskii, “Terbium-based extreme ultraviolet multilayers,” Opt. Lett. 30, 3186-3188 (2005).
[CrossRef]

Soufli, R.

Steele, G.

Toft, A. R.

Tolansky, S.

S. Tolansky, Multiple-Beam Interferometry of Surfaces and Films (Oxford U. Press, 1948).

Uspenskii, Y. A.

B. Kjornrattanawanich, D. L. Windt, J. F. Seely, and Y. A. Uspenskii, “SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging,” Appl. Opt. 45, 1765-1772 (2006).
[CrossRef]

J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170T (2006).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, Y. A. Uspenskii, and J. F. Seely, “Optical constants determination of neodymium and gadolinium in the 3 nm to 100 nm wavelength range,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170U (2006).
[CrossRef]

D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Y. A. Uspenskii, “Terbium-based extreme ultraviolet multilayers,” Opt. Lett. 30, 3186-3188 (2005).
[CrossRef]

Vidal-Dasilva, M.

Windt, D. L.

B. Kjornrattanawanich, D. L. Windt, Y. A. Uspenskii, and J. F. Seely, “Optical constants determination of neodymium and gadolinium in the 3 nm to 100 nm wavelength range,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170U (2006).
[CrossRef]

J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170T (2006).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, J. F. Seely, and Y. A. Uspenskii, “SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging,” Appl. Opt. 45, 1765-1772 (2006).
[CrossRef]

D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Y. A. Uspenskii, “Terbium-based extreme ultraviolet multilayers,” Opt. Lett. 30, 3186-3188 (2005).
[CrossRef]

J. B. Kortright and D. L. Windt, “Amorphous silicon carbide coatings for extreme ultraviolet optics,” Appl. Opt. 27, 2841-2846 (1988).

Yamamoto, A.

N. Morita and A. Yamamoto, “Optical and electrical properties of boron,” Jpn. J. Appl. Phys. 14, 825-831 (1975).
[CrossRef]

Appl. Opt. (10)

S. Labov, S. Bowyer, and G. Steele, “Boron and silicon: filters for the extreme ultraviolet,” Appl. Opt. 24, 576-578(1985).

J. B. Kortright and D. L. Windt, “Amorphous silicon carbide coatings for extreme ultraviolet optics,” Appl. Opt. 27, 2841-2846 (1988).

G. M. Blumenstock and R. A. M. Keski-Kuha, “Ion-beam-deposited boron carbide coatings for extreme ultraviolet,” Appl. Opt. 33, 5962-5963 (1994).

J. I. Larruquert and R. A. M. Keski-Kuha, “Multilayer coatings with high reflectance in the EUV spectral region from 50 to 121.6 nm,” Appl. Opt. 38, 1231-1236 (1999).

J. I. Larruquert and R. A. M. Keski-Kuha, “Optical properties of hot-pressed B4C in the extreme ultraviolet,” Appl. Opt. 39, 1537-1540 (2000).

J. I. Larruquert and R. A. M. Keski-Kuha, “Reflectance measurements and optical constants in the extreme ultraviolet for thin films of ion-beam-deposited SiC, Mo, Mg2Si, and InSb and of evaporated Cr,” Appl. Opt. 39, 2772-2781(2000).

J. I. Larruquert and R. A. M. Keski-Kuha, “Sub-quarterwave multilayer coatings with high reflectance in the extreme ultraviolet,” Appl. Opt. 41, 5398-5404 (2002).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, J. F. Seely, and Y. A. Uspenskii, “SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging,” Appl. Opt. 45, 1765-1772 (2006).
[CrossRef]

R. A. M. Keski-Kuha, J. F. Osantowski, H. Herzig, J. S. Gum, and A. R. Toft, “Normal incidence reflectance of ion beam deposited SiC films in the EUV,” Appl. Opt. 27, 2815-2816(1988).

W. J. Choyke, R. F. Farich, and R. A. Hoffman, “SiC, a new material for mirrors. 1: High power lasers; 2: VUV applications,” Appl. Opt. 15, 2006-2007 (1976).

J. Opt. Soc. Am. (1)

J. Opt. Soc. Am. A (1)

J. Sci. Res. Inst. (1)

N. Morita, “Optical constants of boron in visible and near infrared,” J. Sci. Res. Inst. 48, 8-12 (1954).

Jpn. J. Appl. Phys. (1)

N. Morita and A. Yamamoto, “Optical and electrical properties of boron,” Jpn. J. Appl. Phys. 14, 825-831 (1975).
[CrossRef]

Opt. Commun. (1)

J. I. Larruquert and R. A. M. Keski-Kuha, “Reflectance measurements and optical constants in the extreme ultraviolet of thin films of ion-beam-deposited carbon,” Opt. Commun. 183, 437-443 (2000).
[CrossRef]

Opt. Eng. (1)

J. I. Larruquert, José A. Méndez, and José A. Aznárez, “Non-oxidized Al-overcoated Ir bilayers with high reflectance in the extreme ultraviolet above 50 nm,” Opt. Eng. 41, 1418-1424(2002).
[CrossRef]

Opt. Lett. (1)

Phys. Rev. (1)

T. Sasaki and K. Ishiguro, “Optical constants of silicon in the extreme ultraviolet,” Phys. Rev. 127, 1091-1092 (1962).
[CrossRef]

Proc. SPIE-Int. Soc. Opt. Eng. (4)

J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170T (2006).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, Y. A. Uspenskii, and J. F. Seely, “Optical constants determination of neodymium and gadolinium in the 3 nm to 100 nm wavelength range,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170U (2006).
[CrossRef]

G. M. Blumenstock, R. A. M. Keski-Kuha, and M. L. Ginter, “Extreme ultraviolet optical properties of ion-beam-deposited boron carbide thin films,” Proc. SPIE-Int. Soc. Opt. Eng. 2515, 558-564 (1995).
[CrossRef]

J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, “FUV reflectometer for in situ characterization of thin films deposited under UHV,” Proc. SPIE-Int. Soc. Opt. Eng. 4139, 92-101(2000).
[CrossRef]

Rev. Sci. Instrum. (1)

J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, “Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films,” Rev. Sci. Instrum. 67, 497-502 (1996).
[CrossRef]

Other (1)

S. Tolansky, Multiple-Beam Interferometry of Surfaces and Films (Oxford U. Press, 1948).

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Figures (4)

Fig. 1
Fig. 1

Reflectance versus wavelength of freshly deposited boron films of three different thicknesses. Calculated reflectance of an opaque boron film is also plotted.

Fig. 2
Fig. 2

Reflectance of a freshly deposited boron film compared with the reflectance of IBS SiC [21], IBS B 4 C [22], IBS carbon [23], and bulk silicon [24].

Fig. 3
Fig. 3

Reflectance of an 11 nm thick boron film both freshly deposited and after a storage of six months in a desiccator.

Fig. 4
Fig. 4

Reflectance of a 33 nm thick boron film both freshly deposited and after several storage periods in air and in a desiccator.

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