Abstract

Boron films deposited by evaporation with an electron-beam were found to have a relatively high reflectance in the extreme ultraviolet with values similar to those of ion-beam-sputtered (IBS) SiC and IBS B4C. The largest reflectance was measured for an 11nm thick boron film. Some reflectance degradation was observed for boron films stored in a desiccator. Reflectance degradation varied from sample to sample and was found to be either similar to that of IBS SiC and IBS B4C or larger.

© 2008 Optical Society of America

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  1. J. I. Larruquert and R. A. M. Keski-Kuha, “Multilayer coatings with high reflectance in the EUV spectral region from 50 to 121.6 nm,” Appl. Opt. 38, 1231-1236 (1999).
  2. J. I. Larruquert and R. A. M. Keski-Kuha, “Sub-quarterwave multilayer coatings with high reflectance in the extreme ultraviolet,” Appl. Opt. 41, 5398-5404 (2002).
    [CrossRef]
  3. D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Y. A. Uspenskii, “Terbium-based extreme ultraviolet multilayers,” Opt. Lett. 30, 3186-3188 (2005).
    [CrossRef]
  4. B. Kjornrattanawanich, D. L. Windt, J. F. Seely, and Y. A. Uspenskii, “SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging,” Appl. Opt. 45, 1765-1772 (2006).
    [CrossRef]
  5. J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170T (2006).
    [CrossRef]
  6. B. Kjornrattanawanich, D. L. Windt, Y. A. Uspenskii, and J. F. Seely, “Optical constants determination of neodymium and gadolinium in the 3 nm to 100 nm wavelength range,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170U (2006).
    [CrossRef]
  7. W. J. Choyke, R. F. Farich, and R. A. Hoffman, “SiC, a new material for mirrors. 1: High power lasers; 2: VUV applications,” Appl. Opt. 15, 2006-2007 (1976).
  8. J. I. Larruquert and R. A. M. Keski-Kuha, “Optical properties of hot-pressed B4C in the extreme ultraviolet,” Appl. Opt. 39, 1537-1540 (2000).
  9. J. B. Kortright and D. L. Windt, “Amorphous silicon carbide coatings for extreme ultraviolet optics,” Appl. Opt. 27, 2841-2846 (1988).
  10. R. A. M. Keski-Kuha, J. F. Osantowski, H. Herzig, J. S. Gum, and A. R. Toft, “Normal incidence reflectance of ion beam deposited SiC films in the EUV,” Appl. Opt. 27, 2815-2816(1988).
  11. G. M. Blumenstock and R. A. M. Keski-Kuha, “Ion-beam-deposited boron carbide coatings for extreme ultraviolet,” Appl. Opt. 33, 5962-5963 (1994).
  12. G. Hass, G. F. Jacobus, and W. R. Hunter, “Optical properties of evaporated iridium in the vacuum ultraviolet from 500 Å to 2000 Å,” J. Opt. Soc. Am. 57, 758-762 (1967).
  13. J. I. Larruquert, José A. Méndez, and José A. Aznárez, “Non-oxidized Al-overcoated Ir bilayers with high reflectance in the extreme ultraviolet above 50 nm,” Opt. Eng. 41, 1418-1424(2002).
    [CrossRef]
  14. S. Labov, S. Bowyer, and G. Steele, “Boron and silicon: filters for the extreme ultraviolet,” Appl. Opt. 24, 576-578(1985).
  15. M. Fernández-Perea, J. I. Larruquert, J. A. Aznárez, J. A. Méndez, M. Vidal-Dasilva, E. M. Gullikson, A. Aquila, R. Soufli, and J. L. G. Fierro, “Optical constants of electron-beam evaporated boron films in the 6.8-900 eV photon energy range,” J. Opt. Soc. Am. A 24, 3800-3807 (2007).
    [CrossRef]
  16. J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, “Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films,” Rev. Sci. Instrum. 67, 497-502 (1996).
    [CrossRef]
  17. J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, “FUV reflectometer for in situ characterization of thin films deposited under UHV,” Proc. SPIE-Int. Soc. Opt. Eng. 4139, 92-101(2000).
    [CrossRef]
  18. S. Tolansky, Multiple-Beam Interferometry of Surfaces and Films (Oxford U. Press, 1948).
  19. N. Morita, “Optical constants of boron in visible and near infrared,” J. Sci. Res. Inst. 48, 8-12 (1954).
  20. N. Morita and A. Yamamoto, “Optical and electrical properties of boron,” Jpn. J. Appl. Phys. 14, 825-831 (1975).
    [CrossRef]
  21. J. I. Larruquert and R. A. M. Keski-Kuha, “Reflectance measurements and optical constants in the extreme ultraviolet for thin films of ion-beam-deposited SiC, Mo, Mg2Si, and InSb and of evaporated Cr,” Appl. Opt. 39, 2772-2781(2000).
  22. G. M. Blumenstock, R. A. M. Keski-Kuha, and M. L. Ginter, “Extreme ultraviolet optical properties of ion-beam-deposited boron carbide thin films,” Proc. SPIE-Int. Soc. Opt. Eng. 2515, 558-564 (1995).
    [CrossRef]
  23. J. I. Larruquert and R. A. M. Keski-Kuha, “Reflectance measurements and optical constants in the extreme ultraviolet of thin films of ion-beam-deposited carbon,” Opt. Commun. 183, 437-443 (2000).
    [CrossRef]
  24. T. Sasaki and K. Ishiguro, “Optical constants of silicon in the extreme ultraviolet,” Phys. Rev. 127, 1091-1092 (1962).
    [CrossRef]

2007

2006

B. Kjornrattanawanich, D. L. Windt, J. F. Seely, and Y. A. Uspenskii, “SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging,” Appl. Opt. 45, 1765-1772 (2006).
[CrossRef]

J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170T (2006).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, Y. A. Uspenskii, and J. F. Seely, “Optical constants determination of neodymium and gadolinium in the 3 nm to 100 nm wavelength range,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170U (2006).
[CrossRef]

2005

2002

J. I. Larruquert and R. A. M. Keski-Kuha, “Sub-quarterwave multilayer coatings with high reflectance in the extreme ultraviolet,” Appl. Opt. 41, 5398-5404 (2002).
[CrossRef]

J. I. Larruquert, José A. Méndez, and José A. Aznárez, “Non-oxidized Al-overcoated Ir bilayers with high reflectance in the extreme ultraviolet above 50 nm,” Opt. Eng. 41, 1418-1424(2002).
[CrossRef]

2000

J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, “FUV reflectometer for in situ characterization of thin films deposited under UHV,” Proc. SPIE-Int. Soc. Opt. Eng. 4139, 92-101(2000).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, “Optical properties of hot-pressed B4C in the extreme ultraviolet,” Appl. Opt. 39, 1537-1540 (2000).

J. I. Larruquert and R. A. M. Keski-Kuha, “Reflectance measurements and optical constants in the extreme ultraviolet for thin films of ion-beam-deposited SiC, Mo, Mg2Si, and InSb and of evaporated Cr,” Appl. Opt. 39, 2772-2781(2000).

J. I. Larruquert and R. A. M. Keski-Kuha, “Reflectance measurements and optical constants in the extreme ultraviolet of thin films of ion-beam-deposited carbon,” Opt. Commun. 183, 437-443 (2000).
[CrossRef]

1999

1996

J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, “Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films,” Rev. Sci. Instrum. 67, 497-502 (1996).
[CrossRef]

1995

G. M. Blumenstock, R. A. M. Keski-Kuha, and M. L. Ginter, “Extreme ultraviolet optical properties of ion-beam-deposited boron carbide thin films,” Proc. SPIE-Int. Soc. Opt. Eng. 2515, 558-564 (1995).
[CrossRef]

1994

1988

1985

1976

1975

N. Morita and A. Yamamoto, “Optical and electrical properties of boron,” Jpn. J. Appl. Phys. 14, 825-831 (1975).
[CrossRef]

1967

1962

T. Sasaki and K. Ishiguro, “Optical constants of silicon in the extreme ultraviolet,” Phys. Rev. 127, 1091-1092 (1962).
[CrossRef]

1954

N. Morita, “Optical constants of boron in visible and near infrared,” J. Sci. Res. Inst. 48, 8-12 (1954).

Aquila, A.

Aznárez, J. A.

M. Fernández-Perea, J. I. Larruquert, J. A. Aznárez, J. A. Méndez, M. Vidal-Dasilva, E. M. Gullikson, A. Aquila, R. Soufli, and J. L. G. Fierro, “Optical constants of electron-beam evaporated boron films in the 6.8-900 eV photon energy range,” J. Opt. Soc. Am. A 24, 3800-3807 (2007).
[CrossRef]

J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, “FUV reflectometer for in situ characterization of thin films deposited under UHV,” Proc. SPIE-Int. Soc. Opt. Eng. 4139, 92-101(2000).
[CrossRef]

J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, “Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films,” Rev. Sci. Instrum. 67, 497-502 (1996).
[CrossRef]

Aznárez, José A.

J. I. Larruquert, José A. Méndez, and José A. Aznárez, “Non-oxidized Al-overcoated Ir bilayers with high reflectance in the extreme ultraviolet above 50 nm,” Opt. Eng. 41, 1418-1424(2002).
[CrossRef]

Blumenstock, G. M.

G. M. Blumenstock, R. A. M. Keski-Kuha, and M. L. Ginter, “Extreme ultraviolet optical properties of ion-beam-deposited boron carbide thin films,” Proc. SPIE-Int. Soc. Opt. Eng. 2515, 558-564 (1995).
[CrossRef]

G. M. Blumenstock and R. A. M. Keski-Kuha, “Ion-beam-deposited boron carbide coatings for extreme ultraviolet,” Appl. Opt. 33, 5962-5963 (1994).

Bowyer, S.

Choyke, W. J.

Farich, R. F.

Fernández-Perea, M.

Fierro, J. L. G.

Ginter, M. L.

G. M. Blumenstock, R. A. M. Keski-Kuha, and M. L. Ginter, “Extreme ultraviolet optical properties of ion-beam-deposited boron carbide thin films,” Proc. SPIE-Int. Soc. Opt. Eng. 2515, 558-564 (1995).
[CrossRef]

Gullikson, E. M.

Gum, J. S.

Hass, G.

Herzig, H.

Hoffman, R. A.

Hunter, W. R.

Ishiguro, K.

T. Sasaki and K. Ishiguro, “Optical constants of silicon in the extreme ultraviolet,” Phys. Rev. 127, 1091-1092 (1962).
[CrossRef]

Jacobus, G. F.

Keski-Kuha, R. A. M.

Kjornrattanawanich, B.

B. Kjornrattanawanich, D. L. Windt, Y. A. Uspenskii, and J. F. Seely, “Optical constants determination of neodymium and gadolinium in the 3 nm to 100 nm wavelength range,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170U (2006).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, J. F. Seely, and Y. A. Uspenskii, “SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging,” Appl. Opt. 45, 1765-1772 (2006).
[CrossRef]

J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170T (2006).
[CrossRef]

D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Y. A. Uspenskii, “Terbium-based extreme ultraviolet multilayers,” Opt. Lett. 30, 3186-3188 (2005).
[CrossRef]

Kortright, J. B.

Labov, S.

Larruquert, J. I.

M. Fernández-Perea, J. I. Larruquert, J. A. Aznárez, J. A. Méndez, M. Vidal-Dasilva, E. M. Gullikson, A. Aquila, R. Soufli, and J. L. G. Fierro, “Optical constants of electron-beam evaporated boron films in the 6.8-900 eV photon energy range,” J. Opt. Soc. Am. A 24, 3800-3807 (2007).
[CrossRef]

J. I. Larruquert, José A. Méndez, and José A. Aznárez, “Non-oxidized Al-overcoated Ir bilayers with high reflectance in the extreme ultraviolet above 50 nm,” Opt. Eng. 41, 1418-1424(2002).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, “Sub-quarterwave multilayer coatings with high reflectance in the extreme ultraviolet,” Appl. Opt. 41, 5398-5404 (2002).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, “Optical properties of hot-pressed B4C in the extreme ultraviolet,” Appl. Opt. 39, 1537-1540 (2000).

J. I. Larruquert and R. A. M. Keski-Kuha, “Reflectance measurements and optical constants in the extreme ultraviolet for thin films of ion-beam-deposited SiC, Mo, Mg2Si, and InSb and of evaporated Cr,” Appl. Opt. 39, 2772-2781(2000).

J. I. Larruquert and R. A. M. Keski-Kuha, “Reflectance measurements and optical constants in the extreme ultraviolet of thin films of ion-beam-deposited carbon,” Opt. Commun. 183, 437-443 (2000).
[CrossRef]

J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, “FUV reflectometer for in situ characterization of thin films deposited under UHV,” Proc. SPIE-Int. Soc. Opt. Eng. 4139, 92-101(2000).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, “Multilayer coatings with high reflectance in the EUV spectral region from 50 to 121.6 nm,” Appl. Opt. 38, 1231-1236 (1999).

J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, “Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films,” Rev. Sci. Instrum. 67, 497-502 (1996).
[CrossRef]

Méndez, J. A.

M. Fernández-Perea, J. I. Larruquert, J. A. Aznárez, J. A. Méndez, M. Vidal-Dasilva, E. M. Gullikson, A. Aquila, R. Soufli, and J. L. G. Fierro, “Optical constants of electron-beam evaporated boron films in the 6.8-900 eV photon energy range,” J. Opt. Soc. Am. A 24, 3800-3807 (2007).
[CrossRef]

J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, “FUV reflectometer for in situ characterization of thin films deposited under UHV,” Proc. SPIE-Int. Soc. Opt. Eng. 4139, 92-101(2000).
[CrossRef]

J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, “Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films,” Rev. Sci. Instrum. 67, 497-502 (1996).
[CrossRef]

Méndez, José A.

J. I. Larruquert, José A. Méndez, and José A. Aznárez, “Non-oxidized Al-overcoated Ir bilayers with high reflectance in the extreme ultraviolet above 50 nm,” Opt. Eng. 41, 1418-1424(2002).
[CrossRef]

Morita, N.

N. Morita and A. Yamamoto, “Optical and electrical properties of boron,” Jpn. J. Appl. Phys. 14, 825-831 (1975).
[CrossRef]

N. Morita, “Optical constants of boron in visible and near infrared,” J. Sci. Res. Inst. 48, 8-12 (1954).

Osantowski, J. F.

Sasaki, T.

T. Sasaki and K. Ishiguro, “Optical constants of silicon in the extreme ultraviolet,” Phys. Rev. 127, 1091-1092 (1962).
[CrossRef]

Seely, J. F.

B. Kjornrattanawanich, D. L. Windt, Y. A. Uspenskii, and J. F. Seely, “Optical constants determination of neodymium and gadolinium in the 3 nm to 100 nm wavelength range,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170U (2006).
[CrossRef]

J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170T (2006).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, J. F. Seely, and Y. A. Uspenskii, “SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging,” Appl. Opt. 45, 1765-1772 (2006).
[CrossRef]

D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Y. A. Uspenskii, “Terbium-based extreme ultraviolet multilayers,” Opt. Lett. 30, 3186-3188 (2005).
[CrossRef]

Soufli, R.

Steele, G.

Toft, A. R.

Tolansky, S.

S. Tolansky, Multiple-Beam Interferometry of Surfaces and Films (Oxford U. Press, 1948).

Uspenskii, Y. A.

B. Kjornrattanawanich, D. L. Windt, Y. A. Uspenskii, and J. F. Seely, “Optical constants determination of neodymium and gadolinium in the 3 nm to 100 nm wavelength range,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170U (2006).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, J. F. Seely, and Y. A. Uspenskii, “SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging,” Appl. Opt. 45, 1765-1772 (2006).
[CrossRef]

J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170T (2006).
[CrossRef]

D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Y. A. Uspenskii, “Terbium-based extreme ultraviolet multilayers,” Opt. Lett. 30, 3186-3188 (2005).
[CrossRef]

Vidal-Dasilva, M.

Windt, D. L.

J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170T (2006).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, J. F. Seely, and Y. A. Uspenskii, “SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging,” Appl. Opt. 45, 1765-1772 (2006).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, Y. A. Uspenskii, and J. F. Seely, “Optical constants determination of neodymium and gadolinium in the 3 nm to 100 nm wavelength range,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170U (2006).
[CrossRef]

D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Y. A. Uspenskii, “Terbium-based extreme ultraviolet multilayers,” Opt. Lett. 30, 3186-3188 (2005).
[CrossRef]

J. B. Kortright and D. L. Windt, “Amorphous silicon carbide coatings for extreme ultraviolet optics,” Appl. Opt. 27, 2841-2846 (1988).

Yamamoto, A.

N. Morita and A. Yamamoto, “Optical and electrical properties of boron,” Jpn. J. Appl. Phys. 14, 825-831 (1975).
[CrossRef]

Appl. Opt.

J. I. Larruquert and R. A. M. Keski-Kuha, “Multilayer coatings with high reflectance in the EUV spectral region from 50 to 121.6 nm,” Appl. Opt. 38, 1231-1236 (1999).

J. I. Larruquert and R. A. M. Keski-Kuha, “Sub-quarterwave multilayer coatings with high reflectance in the extreme ultraviolet,” Appl. Opt. 41, 5398-5404 (2002).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, J. F. Seely, and Y. A. Uspenskii, “SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging,” Appl. Opt. 45, 1765-1772 (2006).
[CrossRef]

W. J. Choyke, R. F. Farich, and R. A. Hoffman, “SiC, a new material for mirrors. 1: High power lasers; 2: VUV applications,” Appl. Opt. 15, 2006-2007 (1976).

J. I. Larruquert and R. A. M. Keski-Kuha, “Optical properties of hot-pressed B4C in the extreme ultraviolet,” Appl. Opt. 39, 1537-1540 (2000).

J. B. Kortright and D. L. Windt, “Amorphous silicon carbide coatings for extreme ultraviolet optics,” Appl. Opt. 27, 2841-2846 (1988).

R. A. M. Keski-Kuha, J. F. Osantowski, H. Herzig, J. S. Gum, and A. R. Toft, “Normal incidence reflectance of ion beam deposited SiC films in the EUV,” Appl. Opt. 27, 2815-2816(1988).

G. M. Blumenstock and R. A. M. Keski-Kuha, “Ion-beam-deposited boron carbide coatings for extreme ultraviolet,” Appl. Opt. 33, 5962-5963 (1994).

S. Labov, S. Bowyer, and G. Steele, “Boron and silicon: filters for the extreme ultraviolet,” Appl. Opt. 24, 576-578(1985).

J. I. Larruquert and R. A. M. Keski-Kuha, “Reflectance measurements and optical constants in the extreme ultraviolet for thin films of ion-beam-deposited SiC, Mo, Mg2Si, and InSb and of evaporated Cr,” Appl. Opt. 39, 2772-2781(2000).

J. Opt. Soc. Am.

J. Opt. Soc. Am. A

J. Sci. Res. Inst.

N. Morita, “Optical constants of boron in visible and near infrared,” J. Sci. Res. Inst. 48, 8-12 (1954).

Jpn. J. Appl. Phys.

N. Morita and A. Yamamoto, “Optical and electrical properties of boron,” Jpn. J. Appl. Phys. 14, 825-831 (1975).
[CrossRef]

Opt. Commun.

J. I. Larruquert and R. A. M. Keski-Kuha, “Reflectance measurements and optical constants in the extreme ultraviolet of thin films of ion-beam-deposited carbon,” Opt. Commun. 183, 437-443 (2000).
[CrossRef]

Opt. Eng.

J. I. Larruquert, José A. Méndez, and José A. Aznárez, “Non-oxidized Al-overcoated Ir bilayers with high reflectance in the extreme ultraviolet above 50 nm,” Opt. Eng. 41, 1418-1424(2002).
[CrossRef]

Opt. Lett.

Phys. Rev.

T. Sasaki and K. Ishiguro, “Optical constants of silicon in the extreme ultraviolet,” Phys. Rev. 127, 1091-1092 (1962).
[CrossRef]

Proc. SPIE-Int. Soc. Opt. Eng.

J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170T (2006).
[CrossRef]

B. Kjornrattanawanich, D. L. Windt, Y. A. Uspenskii, and J. F. Seely, “Optical constants determination of neodymium and gadolinium in the 3 nm to 100 nm wavelength range,” Proc. SPIE-Int. Soc. Opt. Eng. 6317, 63170U (2006).
[CrossRef]

G. M. Blumenstock, R. A. M. Keski-Kuha, and M. L. Ginter, “Extreme ultraviolet optical properties of ion-beam-deposited boron carbide thin films,” Proc. SPIE-Int. Soc. Opt. Eng. 2515, 558-564 (1995).
[CrossRef]

J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, “FUV reflectometer for in situ characterization of thin films deposited under UHV,” Proc. SPIE-Int. Soc. Opt. Eng. 4139, 92-101(2000).
[CrossRef]

Rev. Sci. Instrum.

J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, “Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films,” Rev. Sci. Instrum. 67, 497-502 (1996).
[CrossRef]

Other

S. Tolansky, Multiple-Beam Interferometry of Surfaces and Films (Oxford U. Press, 1948).

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Figures (4)

Fig. 1
Fig. 1

Reflectance versus wavelength of freshly deposited boron films of three different thicknesses. Calculated reflectance of an opaque boron film is also plotted.

Fig. 2
Fig. 2

Reflectance of a freshly deposited boron film compared with the reflectance of IBS SiC [21], IBS B 4 C [22], IBS carbon [23], and bulk silicon [24].

Fig. 3
Fig. 3

Reflectance of an 11 nm thick boron film both freshly deposited and after a storage of six months in a desiccator.

Fig. 4
Fig. 4

Reflectance of a 33 nm thick boron film both freshly deposited and after several storage periods in air and in a desiccator.

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