Abstract

The optical properties of silicon oxynitride films deposited by reactive dc magnetron sputtered films have been investigated. In particular the absorption characteristics of silicon nitride thin films in the visible spectrum and their optical bandgap were analyzed with regard to their composition and deposition properties. It can be shown that there is a significant difference between the absorption in the visible spectrum and the optical bandgap for these layers. The influence of unipolar and bipolar pulse modes on the optical layer properties is presented. The extinction coefficient for silicon nitride single layers could be reduced to a value of 2×104 at 500 nm without external heating. There is also the dependence of the absorption of silicon oxynitride layers on the discharge voltage. We present the resulting spectra of rugate and edge filters that consist of these layers and offer lower absorption than single layers.

© 2008 Optical Society of America

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References

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  1. H. Bartzsch, S. Lange, P. Frach, and K. Goedicke, “Graded refractive index layer systems for antireflective coatings and rugate filters deposited by reactive pulse magnetron sputtering,”Surf. Coat. Technol. 180-181, 616-620 (2004).
    [CrossRef]
  2. S. Lange, H. Bartzsch, P. Frach, and K. Goedicke, “Pulse magnetron sputtering in a reactive gas mixture of variable composition to manufacture multilayer and gradient optical coatings,”Thin Solid Films 502, 29-33 (2006).
    [CrossRef]
  3. D. Rats, D. Poitras, J. M. Soro, L. Martinu, and J. von Stebut, “Mechanical properties of plasma-deposited silicon-based inhomogeneous optical coatings,”Surf. Coat. Technol. 111, 220-228 (1999).
    [CrossRef]
  4. K. L. Lewis, R. Blacker, M. Corbett, G. A. Gurtman, and R. S. Wilson, “Comparison of production techniques for silicon oxynitride rugates and their effect on laser damage thresholds,” Proc. SPIE 3578, 179-187 (1999).
    [CrossRef]
  5. H. Bartzsch, P. Frach, and K. Goedicke, “Anode effects on energetic particle bombardment of the substrate in pulsed magnetron sputtering,”Surf. Coat. Technol. 132, 244-250 (2000).
    [CrossRef]
  6. J. Affinito and R. R. Parsons, “Mechanisms of voltage controlled, reactive, planar magnetron sputtering of Al in Ar/N2 and Ar/O2 atmospheres,”J. Vac. Sci. Technol. A 2, 1275-1284 (1984).
    [CrossRef]
  7. R. Swanepeol, “Determination of the thickness and optical constants of amorphous silicon,”J. Phys. E 16, 1214-1222 (1983).
    [CrossRef]
  8. E. C. Freeman and W. Paul, “Optical constants of rf sputtered hydrogenated amorphous Si,”Phys. Rev. B 20, 716-728 (1979).
    [CrossRef]
  9. J. Robertson, “Defects and hydrogen in amorphous silicon nitride,”Philos. Mag. B 69, 307-326 (1994).
    [CrossRef]
  10. H. Kersten, H. Deutsch, H. Steffen, G. M. W. Kroesen, and R. Hippler, “The energy balance at substrate surfaces during plasma processing,” Vacuum 63, 385-431 (2001).
    [CrossRef]
  11. Y. Zhao, Y. Wang, H. Gong, J. Shao, and Z. Fan, “Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors,” Appl. Surf. Sci. 210, 353-358 (2003).
    [CrossRef]
  12. J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, “Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films,” Thin Solid Films 515, 1674-1682 (2006).
    [CrossRef]
  13. B. G. Bovard, “Rugate filter theory: an overview,”Appl. Opt. 32, 5427-5442 (1993).
    [CrossRef] [PubMed]
  14. W. J. Gunning, R. L. Hall, F. Woodberry, W. H. Southwell, and N. S. Gluck, “Codeposition of continuous composition rugate filters,”Appl. Opt. 28, 2945-2948 (1989).
    [CrossRef]
  15. W. H. Southwell, “Using apodization functions to reduce sidelobes in rugate filters,”Appl. Opt. 28, 5091-5094 (1989).
    [CrossRef] [PubMed]

2948 (1)

W. J. Gunning, R. L. Hall, F. Woodberry, W. H. Southwell, and N. S. Gluck, “Codeposition of continuous composition rugate filters,”Appl. Opt. 28, 2945-2948 (1989).
[CrossRef]

2006 (2)

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, “Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films,” Thin Solid Films 515, 1674-1682 (2006).
[CrossRef]

S. Lange, H. Bartzsch, P. Frach, and K. Goedicke, “Pulse magnetron sputtering in a reactive gas mixture of variable composition to manufacture multilayer and gradient optical coatings,”Thin Solid Films 502, 29-33 (2006).
[CrossRef]

2004 (1)

H. Bartzsch, S. Lange, P. Frach, and K. Goedicke, “Graded refractive index layer systems for antireflective coatings and rugate filters deposited by reactive pulse magnetron sputtering,”Surf. Coat. Technol. 180-181, 616-620 (2004).
[CrossRef]

2003 (1)

Y. Zhao, Y. Wang, H. Gong, J. Shao, and Z. Fan, “Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors,” Appl. Surf. Sci. 210, 353-358 (2003).
[CrossRef]

2001 (1)

H. Kersten, H. Deutsch, H. Steffen, G. M. W. Kroesen, and R. Hippler, “The energy balance at substrate surfaces during plasma processing,” Vacuum 63, 385-431 (2001).
[CrossRef]

2000 (1)

H. Bartzsch, P. Frach, and K. Goedicke, “Anode effects on energetic particle bombardment of the substrate in pulsed magnetron sputtering,”Surf. Coat. Technol. 132, 244-250 (2000).
[CrossRef]

1999 (2)

D. Rats, D. Poitras, J. M. Soro, L. Martinu, and J. von Stebut, “Mechanical properties of plasma-deposited silicon-based inhomogeneous optical coatings,”Surf. Coat. Technol. 111, 220-228 (1999).
[CrossRef]

K. L. Lewis, R. Blacker, M. Corbett, G. A. Gurtman, and R. S. Wilson, “Comparison of production techniques for silicon oxynitride rugates and their effect on laser damage thresholds,” Proc. SPIE 3578, 179-187 (1999).
[CrossRef]

1994 (1)

J. Robertson, “Defects and hydrogen in amorphous silicon nitride,”Philos. Mag. B 69, 307-326 (1994).
[CrossRef]

1993 (1)

B. G. Bovard, “Rugate filter theory: an overview,”Appl. Opt. 32, 5427-5442 (1993).
[CrossRef] [PubMed]

1989 (1)

W. H. Southwell, “Using apodization functions to reduce sidelobes in rugate filters,”Appl. Opt. 28, 5091-5094 (1989).
[CrossRef] [PubMed]

1984 (1)

J. Affinito and R. R. Parsons, “Mechanisms of voltage controlled, reactive, planar magnetron sputtering of Al in Ar/N2 and Ar/O2 atmospheres,”J. Vac. Sci. Technol. A 2, 1275-1284 (1984).
[CrossRef]

1983 (1)

R. Swanepeol, “Determination of the thickness and optical constants of amorphous silicon,”J. Phys. E 16, 1214-1222 (1983).
[CrossRef]

1979 (1)

E. C. Freeman and W. Paul, “Optical constants of rf sputtered hydrogenated amorphous Si,”Phys. Rev. B 20, 716-728 (1979).
[CrossRef]

Affinito, J.

J. Affinito and R. R. Parsons, “Mechanisms of voltage controlled, reactive, planar magnetron sputtering of Al in Ar/N2 and Ar/O2 atmospheres,”J. Vac. Sci. Technol. A 2, 1275-1284 (1984).
[CrossRef]

Amassian, A.

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, “Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films,” Thin Solid Films 515, 1674-1682 (2006).
[CrossRef]

Bartzsch, H.

S. Lange, H. Bartzsch, P. Frach, and K. Goedicke, “Pulse magnetron sputtering in a reactive gas mixture of variable composition to manufacture multilayer and gradient optical coatings,”Thin Solid Films 502, 29-33 (2006).
[CrossRef]

H. Bartzsch, S. Lange, P. Frach, and K. Goedicke, “Graded refractive index layer systems for antireflective coatings and rugate filters deposited by reactive pulse magnetron sputtering,”Surf. Coat. Technol. 180-181, 616-620 (2004).
[CrossRef]

H. Bartzsch, P. Frach, and K. Goedicke, “Anode effects on energetic particle bombardment of the substrate in pulsed magnetron sputtering,”Surf. Coat. Technol. 132, 244-250 (2000).
[CrossRef]

Blacker, R.

K. L. Lewis, R. Blacker, M. Corbett, G. A. Gurtman, and R. S. Wilson, “Comparison of production techniques for silicon oxynitride rugates and their effect on laser damage thresholds,” Proc. SPIE 3578, 179-187 (1999).
[CrossRef]

Bovard, B. G.

B. G. Bovard, “Rugate filter theory: an overview,”Appl. Opt. 32, 5427-5442 (1993).
[CrossRef] [PubMed]

Corbett, M.

K. L. Lewis, R. Blacker, M. Corbett, G. A. Gurtman, and R. S. Wilson, “Comparison of production techniques for silicon oxynitride rugates and their effect on laser damage thresholds,” Proc. SPIE 3578, 179-187 (1999).
[CrossRef]

Deutsch, H.

H. Kersten, H. Deutsch, H. Steffen, G. M. W. Kroesen, and R. Hippler, “The energy balance at substrate surfaces during plasma processing,” Vacuum 63, 385-431 (2001).
[CrossRef]

Fan, Z.

Y. Zhao, Y. Wang, H. Gong, J. Shao, and Z. Fan, “Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors,” Appl. Surf. Sci. 210, 353-358 (2003).
[CrossRef]

Frach, P.

S. Lange, H. Bartzsch, P. Frach, and K. Goedicke, “Pulse magnetron sputtering in a reactive gas mixture of variable composition to manufacture multilayer and gradient optical coatings,”Thin Solid Films 502, 29-33 (2006).
[CrossRef]

H. Bartzsch, S. Lange, P. Frach, and K. Goedicke, “Graded refractive index layer systems for antireflective coatings and rugate filters deposited by reactive pulse magnetron sputtering,”Surf. Coat. Technol. 180-181, 616-620 (2004).
[CrossRef]

H. Bartzsch, P. Frach, and K. Goedicke, “Anode effects on energetic particle bombardment of the substrate in pulsed magnetron sputtering,”Surf. Coat. Technol. 132, 244-250 (2000).
[CrossRef]

Freeman, E. C.

E. C. Freeman and W. Paul, “Optical constants of rf sputtered hydrogenated amorphous Si,”Phys. Rev. B 20, 716-728 (1979).
[CrossRef]

Gluck, N. S.

W. J. Gunning, R. L. Hall, F. Woodberry, W. H. Southwell, and N. S. Gluck, “Codeposition of continuous composition rugate filters,”Appl. Opt. 28, 2945-2948 (1989).
[CrossRef]

Goedicke, K.

S. Lange, H. Bartzsch, P. Frach, and K. Goedicke, “Pulse magnetron sputtering in a reactive gas mixture of variable composition to manufacture multilayer and gradient optical coatings,”Thin Solid Films 502, 29-33 (2006).
[CrossRef]

H. Bartzsch, S. Lange, P. Frach, and K. Goedicke, “Graded refractive index layer systems for antireflective coatings and rugate filters deposited by reactive pulse magnetron sputtering,”Surf. Coat. Technol. 180-181, 616-620 (2004).
[CrossRef]

H. Bartzsch, P. Frach, and K. Goedicke, “Anode effects on energetic particle bombardment of the substrate in pulsed magnetron sputtering,”Surf. Coat. Technol. 132, 244-250 (2000).
[CrossRef]

Gong, H.

Y. Zhao, Y. Wang, H. Gong, J. Shao, and Z. Fan, “Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors,” Appl. Surf. Sci. 210, 353-358 (2003).
[CrossRef]

Gunning, W. J.

W. J. Gunning, R. L. Hall, F. Woodberry, W. H. Southwell, and N. S. Gluck, “Codeposition of continuous composition rugate filters,”Appl. Opt. 28, 2945-2948 (1989).
[CrossRef]

Gurtman, G. A.

K. L. Lewis, R. Blacker, M. Corbett, G. A. Gurtman, and R. S. Wilson, “Comparison of production techniques for silicon oxynitride rugates and their effect on laser damage thresholds,” Proc. SPIE 3578, 179-187 (1999).
[CrossRef]

Hall, R. L.

W. J. Gunning, R. L. Hall, F. Woodberry, W. H. Southwell, and N. S. Gluck, “Codeposition of continuous composition rugate filters,”Appl. Opt. 28, 2945-2948 (1989).
[CrossRef]

Hippler, R.

H. Kersten, H. Deutsch, H. Steffen, G. M. W. Kroesen, and R. Hippler, “The energy balance at substrate surfaces during plasma processing,” Vacuum 63, 385-431 (2001).
[CrossRef]

Kersten, H.

H. Kersten, H. Deutsch, H. Steffen, G. M. W. Kroesen, and R. Hippler, “The energy balance at substrate surfaces during plasma processing,” Vacuum 63, 385-431 (2001).
[CrossRef]

Klemberg-Sapieha, J. E.

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, “Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films,” Thin Solid Films 515, 1674-1682 (2006).
[CrossRef]

Kroesen, G. M. W.

H. Kersten, H. Deutsch, H. Steffen, G. M. W. Kroesen, and R. Hippler, “The energy balance at substrate surfaces during plasma processing,” Vacuum 63, 385-431 (2001).
[CrossRef]

Lange, S.

S. Lange, H. Bartzsch, P. Frach, and K. Goedicke, “Pulse magnetron sputtering in a reactive gas mixture of variable composition to manufacture multilayer and gradient optical coatings,”Thin Solid Films 502, 29-33 (2006).
[CrossRef]

H. Bartzsch, S. Lange, P. Frach, and K. Goedicke, “Graded refractive index layer systems for antireflective coatings and rugate filters deposited by reactive pulse magnetron sputtering,”Surf. Coat. Technol. 180-181, 616-620 (2004).
[CrossRef]

Lewis, K. L.

K. L. Lewis, R. Blacker, M. Corbett, G. A. Gurtman, and R. S. Wilson, “Comparison of production techniques for silicon oxynitride rugates and their effect on laser damage thresholds,” Proc. SPIE 3578, 179-187 (1999).
[CrossRef]

Martinu, L.

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, “Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films,” Thin Solid Films 515, 1674-1682 (2006).
[CrossRef]

D. Rats, D. Poitras, J. M. Soro, L. Martinu, and J. von Stebut, “Mechanical properties of plasma-deposited silicon-based inhomogeneous optical coatings,”Surf. Coat. Technol. 111, 220-228 (1999).
[CrossRef]

Masse, J.-P.

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, “Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films,” Thin Solid Films 515, 1674-1682 (2006).
[CrossRef]

Parsons, R. R.

J. Affinito and R. R. Parsons, “Mechanisms of voltage controlled, reactive, planar magnetron sputtering of Al in Ar/N2 and Ar/O2 atmospheres,”J. Vac. Sci. Technol. A 2, 1275-1284 (1984).
[CrossRef]

Paul, W.

E. C. Freeman and W. Paul, “Optical constants of rf sputtered hydrogenated amorphous Si,”Phys. Rev. B 20, 716-728 (1979).
[CrossRef]

Poitras, D.

D. Rats, D. Poitras, J. M. Soro, L. Martinu, and J. von Stebut, “Mechanical properties of plasma-deposited silicon-based inhomogeneous optical coatings,”Surf. Coat. Technol. 111, 220-228 (1999).
[CrossRef]

Rats, D.

D. Rats, D. Poitras, J. M. Soro, L. Martinu, and J. von Stebut, “Mechanical properties of plasma-deposited silicon-based inhomogeneous optical coatings,”Surf. Coat. Technol. 111, 220-228 (1999).
[CrossRef]

Robertson, J.

J. Robertson, “Defects and hydrogen in amorphous silicon nitride,”Philos. Mag. B 69, 307-326 (1994).
[CrossRef]

Shao, J.

Y. Zhao, Y. Wang, H. Gong, J. Shao, and Z. Fan, “Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors,” Appl. Surf. Sci. 210, 353-358 (2003).
[CrossRef]

Soro, J. M.

D. Rats, D. Poitras, J. M. Soro, L. Martinu, and J. von Stebut, “Mechanical properties of plasma-deposited silicon-based inhomogeneous optical coatings,”Surf. Coat. Technol. 111, 220-228 (1999).
[CrossRef]

Southwell, W. H.

W. J. Gunning, R. L. Hall, F. Woodberry, W. H. Southwell, and N. S. Gluck, “Codeposition of continuous composition rugate filters,”Appl. Opt. 28, 2945-2948 (1989).
[CrossRef]

W. H. Southwell, “Using apodization functions to reduce sidelobes in rugate filters,”Appl. Opt. 28, 5091-5094 (1989).
[CrossRef] [PubMed]

Steffen, H.

H. Kersten, H. Deutsch, H. Steffen, G. M. W. Kroesen, and R. Hippler, “The energy balance at substrate surfaces during plasma processing,” Vacuum 63, 385-431 (2001).
[CrossRef]

Swanepeol, R.

R. Swanepeol, “Determination of the thickness and optical constants of amorphous silicon,”J. Phys. E 16, 1214-1222 (1983).
[CrossRef]

Szymanowski, H.

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, “Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films,” Thin Solid Films 515, 1674-1682 (2006).
[CrossRef]

von Stebut, J.

D. Rats, D. Poitras, J. M. Soro, L. Martinu, and J. von Stebut, “Mechanical properties of plasma-deposited silicon-based inhomogeneous optical coatings,”Surf. Coat. Technol. 111, 220-228 (1999).
[CrossRef]

Wang, Y.

Y. Zhao, Y. Wang, H. Gong, J. Shao, and Z. Fan, “Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors,” Appl. Surf. Sci. 210, 353-358 (2003).
[CrossRef]

Wilson, R. S.

K. L. Lewis, R. Blacker, M. Corbett, G. A. Gurtman, and R. S. Wilson, “Comparison of production techniques for silicon oxynitride rugates and their effect on laser damage thresholds,” Proc. SPIE 3578, 179-187 (1999).
[CrossRef]

Woodberry, F.

W. J. Gunning, R. L. Hall, F. Woodberry, W. H. Southwell, and N. S. Gluck, “Codeposition of continuous composition rugate filters,”Appl. Opt. 28, 2945-2948 (1989).
[CrossRef]

Zabeida, O.

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, “Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films,” Thin Solid Films 515, 1674-1682 (2006).
[CrossRef]

Zhao, Y.

Y. Zhao, Y. Wang, H. Gong, J. Shao, and Z. Fan, “Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors,” Appl. Surf. Sci. 210, 353-358 (2003).
[CrossRef]

Appl. Opt. (3)

B. G. Bovard, “Rugate filter theory: an overview,”Appl. Opt. 32, 5427-5442 (1993).
[CrossRef] [PubMed]

W. J. Gunning, R. L. Hall, F. Woodberry, W. H. Southwell, and N. S. Gluck, “Codeposition of continuous composition rugate filters,”Appl. Opt. 28, 2945-2948 (1989).
[CrossRef]

W. H. Southwell, “Using apodization functions to reduce sidelobes in rugate filters,”Appl. Opt. 28, 5091-5094 (1989).
[CrossRef] [PubMed]

Appl. Surf. Sci. (1)

Y. Zhao, Y. Wang, H. Gong, J. Shao, and Z. Fan, “Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors,” Appl. Surf. Sci. 210, 353-358 (2003).
[CrossRef]

J. Vac. Sci. Technol. A (1)

J. Affinito and R. R. Parsons, “Mechanisms of voltage controlled, reactive, planar magnetron sputtering of Al in Ar/N2 and Ar/O2 atmospheres,”J. Vac. Sci. Technol. A 2, 1275-1284 (1984).
[CrossRef]

J. Phys. E (1)

R. Swanepeol, “Determination of the thickness and optical constants of amorphous silicon,”J. Phys. E 16, 1214-1222 (1983).
[CrossRef]

Philos. Mag. B (1)

J. Robertson, “Defects and hydrogen in amorphous silicon nitride,”Philos. Mag. B 69, 307-326 (1994).
[CrossRef]

Phys. Rev. B (1)

E. C. Freeman and W. Paul, “Optical constants of rf sputtered hydrogenated amorphous Si,”Phys. Rev. B 20, 716-728 (1979).
[CrossRef]

Proc. SPIE (1)

K. L. Lewis, R. Blacker, M. Corbett, G. A. Gurtman, and R. S. Wilson, “Comparison of production techniques for silicon oxynitride rugates and their effect on laser damage thresholds,” Proc. SPIE 3578, 179-187 (1999).
[CrossRef]

Surf. Coat. Technol. (1)

H. Bartzsch, S. Lange, P. Frach, and K. Goedicke, “Graded refractive index layer systems for antireflective coatings and rugate filters deposited by reactive pulse magnetron sputtering,”Surf. Coat. Technol. 180-181, 616-620 (2004).
[CrossRef]

Surf. Coat. Technol. (2)

H. Bartzsch, P. Frach, and K. Goedicke, “Anode effects on energetic particle bombardment of the substrate in pulsed magnetron sputtering,”Surf. Coat. Technol. 132, 244-250 (2000).
[CrossRef]

D. Rats, D. Poitras, J. M. Soro, L. Martinu, and J. von Stebut, “Mechanical properties of plasma-deposited silicon-based inhomogeneous optical coatings,”Surf. Coat. Technol. 111, 220-228 (1999).
[CrossRef]

Thin Solid Films (2)

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, “Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films,” Thin Solid Films 515, 1674-1682 (2006).
[CrossRef]

S. Lange, H. Bartzsch, P. Frach, and K. Goedicke, “Pulse magnetron sputtering in a reactive gas mixture of variable composition to manufacture multilayer and gradient optical coatings,”Thin Solid Films 502, 29-33 (2006).
[CrossRef]

Vacuum (1)

H. Kersten, H. Deutsch, H. Steffen, G. M. W. Kroesen, and R. Hippler, “The energy balance at substrate surfaces during plasma processing,” Vacuum 63, 385-431 (2001).
[CrossRef]

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Figures (8)

Fig. 1
Fig. 1

Refractive index n and extinction coefficient of layers deposited in the unipolar pulse mode dependent on the resulting nitrogen flows.

Fig. 2
Fig. 2

Refractive index n and extinction coefficient of layers deposited in the bipolar pulse mode dependent on the resulting nitrogen flows.

Fig. 3
Fig. 3

Absorption coefficient for silicon nitride layers deposited at different process conditions in the unipolar and bipolar pulse modes.

Fig. 4
Fig. 4

Dependence of the refractive index of silicon oxynitride layers with varying oxygen content and at different reactive working points defined by discharge value V in the unipolar pulse mode.

Fig. 5
Fig. 5

Dependence of the extinction coefficient of silicon oxynitride layers with varying oxygen content and at different reactive working points defined by discharge voltage V in the unipolar pulse mode.

Fig. 6
Fig. 6

Dependence of refractive index and extinction coefficient of silicon nitride layers deposited at different deposition times in the bipolar pulse mode.

Fig. 7
Fig. 7

Spectrum of the deposited rugate filter and the calculated spectrum.

Fig. 8
Fig. 8

Spectrum of the deposited edge filter and the calculated spectrum.

Tables (1)

Tables Icon

Table 1 Composition, Optical Bandgap, Refractive Index, and Extinction Coefficient of Silicon Nitride Layers Deposited at Various Resulting Gas Flows and Pulse Modes

Metrics