Abstract

A novel atomic layer deposition process for the preparation of fluoride thin films in a temperature range of 225  °C400  °C is introduced. The crystallinity, morphology, composition, thicknesses, refractive indices, and transmittance of the films are analyzed. Low impurity levels are obtained at 350  °C400  °C with good stoichiometry. Refractive indices of 1.34–1.42 for MgF2, 1.43 for CaF2, and 1.57–1.61 for LaF3 films are obtained.

© 2008 Optical Society of America

Full Article  |  PDF Article

References

  • View by:
  • |
  • |
  • |

  1. U. Kaiser and N. Kaiser, "C-adsorption behaviour of thin fluoride films," Thin Solid Films 237, 250-254 (1994).
    [CrossRef]
  2. U. Kaiser, M. Adamik, G. Safran, P. B. Barna, S. Laux, and W. Richter, "Growth structure investigation of MgF2 and NdF3 films grown by molecular beam deposition on CaF2(111) substrates," Thin Solid Films 280, 5-15 (1996).
    [CrossRef]
  3. Z. Czigany, M. Adamik, and N. Kaiser, "248 nm laser interaction studies on LaF3/MgF2 optical coatings by cross-sectional transmission electron microscopy," Thin Solid Films 312, 176-181 (1998).
    [CrossRef]
  4. A. P. Purdy, A. D. Berry, R. T. Holm, M. Fatemi, and D. K. Gaskill, "Chemical vapor deposition experiments using new fluorinated acetylacetones of calcium, strontium and barium," Inorg. Chem. 28, 2799-2803 (1989).
    [CrossRef]
  5. R. Gardiner, D. W. Brown, P. S. Kirlin, and A. L. Rheingold, "Volatile barium β-diketonate polyether adducts. Synthesis, characterization, and metalloorganic chemical vapor deposition," Chem. Mater. 3, 1053-1059 (1991).
    [CrossRef]
  6. H. Sato and S. Sugawara, "Preparation of high quality barium fluoride thin film by chemical vapor deposition," Jpn. J. Appl. Phys. 32, L799-L801 (1993).
    [CrossRef]
  7. L. J. Lingg, A. D. Berry, A. P. Purdy, and K. J. Ewing, "Sodium fluoride thin films by chemical vapor deposition," Thin Solid Films 209, 9-16 (1992).
    [CrossRef]
  8. K. Fujiura, Y. Ohishi, and S. Takahashi, "Organometallic chemical vapor deposition of ZrF4-based fluoride glasses," Jpn. J. Appl. Phys. 28, L147-L149 (1989).
    [CrossRef]
  9. M. Ritala and M. Leskelä, Handbook of Thin Film Materials (Academic, 2001), Vol. 1, pp. 103-159.
  10. M. Ylilammi and T. Ranta-aho, "Metal fluoride thin films prepared by atomic layer deposition," J. Electrochem. Soc. 141, 1278-1284 (1994).
    [CrossRef]
  11. T. Pilvi, T. Hatanpää, E. Puukilainen, K. Arstila, M. Bischoff, U. Kaiser, N. Kaiser, M. Leskelä, and M. Ritala, "Study of novel ALD process for depositing MgF2 thin films," J. Mater. Chem. 17, 5077-5082 (2007).
    [CrossRef]
  12. T. Pilvi, K. Arstila, M. Leskelä, and M. Ritala, "Novel ALD process for depositing CaF2 thin films," Chem. Mater. 19, 3387-3392 (2007).
    [CrossRef]
  13. M. Ylilammi and T. Ranta-aho, "Optical determination of the film thicknesses in multilayer thin film structures," Thin Solid Films 232, 56-62 (1993).
    [CrossRef]
  14. M. Putkonen, T. Sajavaara, L. Niinistö, and J. Keinonen, "Analysis of ALD-processed thin films by ion-beam techniques," Anal. Bioanal. Chem. 382, 1791-1799 (2005).
    [CrossRef] [PubMed]
  15. A. Duparre, C. Ruppe, K. A. Pischow, M. Adamik, and P. B. Barna, "Atomic force microscopy on cross-sections of optical coatings: a new method," Thin Solid Films 261, 70-75 (1995).
  16. U. Kaiser, N. Kaiser, P. Weisbrodt, U. Mademann, E. Hacker, and H. Muller, "Structure of thin fluoride films deposited on amorphous substrates," Thin Solid Films 217, 7-16 (1992).
    [CrossRef]
  17. "UV coatings: materials and applications," CERAC Coating Materials News 12, 1-4 (2002), http://www.cerac.com/pubs/CMNarchives.htm.

2007 (2)

T. Pilvi, T. Hatanpää, E. Puukilainen, K. Arstila, M. Bischoff, U. Kaiser, N. Kaiser, M. Leskelä, and M. Ritala, "Study of novel ALD process for depositing MgF2 thin films," J. Mater. Chem. 17, 5077-5082 (2007).
[CrossRef]

T. Pilvi, K. Arstila, M. Leskelä, and M. Ritala, "Novel ALD process for depositing CaF2 thin films," Chem. Mater. 19, 3387-3392 (2007).
[CrossRef]

2005 (1)

M. Putkonen, T. Sajavaara, L. Niinistö, and J. Keinonen, "Analysis of ALD-processed thin films by ion-beam techniques," Anal. Bioanal. Chem. 382, 1791-1799 (2005).
[CrossRef] [PubMed]

2001 (1)

M. Ritala and M. Leskelä, Handbook of Thin Film Materials (Academic, 2001), Vol. 1, pp. 103-159.

1998 (1)

Z. Czigany, M. Adamik, and N. Kaiser, "248 nm laser interaction studies on LaF3/MgF2 optical coatings by cross-sectional transmission electron microscopy," Thin Solid Films 312, 176-181 (1998).
[CrossRef]

1996 (1)

U. Kaiser, M. Adamik, G. Safran, P. B. Barna, S. Laux, and W. Richter, "Growth structure investigation of MgF2 and NdF3 films grown by molecular beam deposition on CaF2(111) substrates," Thin Solid Films 280, 5-15 (1996).
[CrossRef]

1995 (1)

A. Duparre, C. Ruppe, K. A. Pischow, M. Adamik, and P. B. Barna, "Atomic force microscopy on cross-sections of optical coatings: a new method," Thin Solid Films 261, 70-75 (1995).

1994 (2)

U. Kaiser and N. Kaiser, "C-adsorption behaviour of thin fluoride films," Thin Solid Films 237, 250-254 (1994).
[CrossRef]

M. Ylilammi and T. Ranta-aho, "Metal fluoride thin films prepared by atomic layer deposition," J. Electrochem. Soc. 141, 1278-1284 (1994).
[CrossRef]

1993 (2)

H. Sato and S. Sugawara, "Preparation of high quality barium fluoride thin film by chemical vapor deposition," Jpn. J. Appl. Phys. 32, L799-L801 (1993).
[CrossRef]

M. Ylilammi and T. Ranta-aho, "Optical determination of the film thicknesses in multilayer thin film structures," Thin Solid Films 232, 56-62 (1993).
[CrossRef]

1992 (2)

U. Kaiser, N. Kaiser, P. Weisbrodt, U. Mademann, E. Hacker, and H. Muller, "Structure of thin fluoride films deposited on amorphous substrates," Thin Solid Films 217, 7-16 (1992).
[CrossRef]

L. J. Lingg, A. D. Berry, A. P. Purdy, and K. J. Ewing, "Sodium fluoride thin films by chemical vapor deposition," Thin Solid Films 209, 9-16 (1992).
[CrossRef]

1991 (1)

R. Gardiner, D. W. Brown, P. S. Kirlin, and A. L. Rheingold, "Volatile barium β-diketonate polyether adducts. Synthesis, characterization, and metalloorganic chemical vapor deposition," Chem. Mater. 3, 1053-1059 (1991).
[CrossRef]

1989 (2)

K. Fujiura, Y. Ohishi, and S. Takahashi, "Organometallic chemical vapor deposition of ZrF4-based fluoride glasses," Jpn. J. Appl. Phys. 28, L147-L149 (1989).
[CrossRef]

A. P. Purdy, A. D. Berry, R. T. Holm, M. Fatemi, and D. K. Gaskill, "Chemical vapor deposition experiments using new fluorinated acetylacetones of calcium, strontium and barium," Inorg. Chem. 28, 2799-2803 (1989).
[CrossRef]

Adamik, M.

Z. Czigany, M. Adamik, and N. Kaiser, "248 nm laser interaction studies on LaF3/MgF2 optical coatings by cross-sectional transmission electron microscopy," Thin Solid Films 312, 176-181 (1998).
[CrossRef]

U. Kaiser, M. Adamik, G. Safran, P. B. Barna, S. Laux, and W. Richter, "Growth structure investigation of MgF2 and NdF3 films grown by molecular beam deposition on CaF2(111) substrates," Thin Solid Films 280, 5-15 (1996).
[CrossRef]

A. Duparre, C. Ruppe, K. A. Pischow, M. Adamik, and P. B. Barna, "Atomic force microscopy on cross-sections of optical coatings: a new method," Thin Solid Films 261, 70-75 (1995).

Arstila, K.

T. Pilvi, T. Hatanpää, E. Puukilainen, K. Arstila, M. Bischoff, U. Kaiser, N. Kaiser, M. Leskelä, and M. Ritala, "Study of novel ALD process for depositing MgF2 thin films," J. Mater. Chem. 17, 5077-5082 (2007).
[CrossRef]

T. Pilvi, K. Arstila, M. Leskelä, and M. Ritala, "Novel ALD process for depositing CaF2 thin films," Chem. Mater. 19, 3387-3392 (2007).
[CrossRef]

Barna, P. B.

U. Kaiser, M. Adamik, G. Safran, P. B. Barna, S. Laux, and W. Richter, "Growth structure investigation of MgF2 and NdF3 films grown by molecular beam deposition on CaF2(111) substrates," Thin Solid Films 280, 5-15 (1996).
[CrossRef]

A. Duparre, C. Ruppe, K. A. Pischow, M. Adamik, and P. B. Barna, "Atomic force microscopy on cross-sections of optical coatings: a new method," Thin Solid Films 261, 70-75 (1995).

Berry, A. D.

L. J. Lingg, A. D. Berry, A. P. Purdy, and K. J. Ewing, "Sodium fluoride thin films by chemical vapor deposition," Thin Solid Films 209, 9-16 (1992).
[CrossRef]

A. P. Purdy, A. D. Berry, R. T. Holm, M. Fatemi, and D. K. Gaskill, "Chemical vapor deposition experiments using new fluorinated acetylacetones of calcium, strontium and barium," Inorg. Chem. 28, 2799-2803 (1989).
[CrossRef]

Bischoff, M.

T. Pilvi, T. Hatanpää, E. Puukilainen, K. Arstila, M. Bischoff, U. Kaiser, N. Kaiser, M. Leskelä, and M. Ritala, "Study of novel ALD process for depositing MgF2 thin films," J. Mater. Chem. 17, 5077-5082 (2007).
[CrossRef]

Brown, D. W.

R. Gardiner, D. W. Brown, P. S. Kirlin, and A. L. Rheingold, "Volatile barium β-diketonate polyether adducts. Synthesis, characterization, and metalloorganic chemical vapor deposition," Chem. Mater. 3, 1053-1059 (1991).
[CrossRef]

Czigany, Z.

Z. Czigany, M. Adamik, and N. Kaiser, "248 nm laser interaction studies on LaF3/MgF2 optical coatings by cross-sectional transmission electron microscopy," Thin Solid Films 312, 176-181 (1998).
[CrossRef]

Duparre, A.

A. Duparre, C. Ruppe, K. A. Pischow, M. Adamik, and P. B. Barna, "Atomic force microscopy on cross-sections of optical coatings: a new method," Thin Solid Films 261, 70-75 (1995).

Ewing, K. J.

L. J. Lingg, A. D. Berry, A. P. Purdy, and K. J. Ewing, "Sodium fluoride thin films by chemical vapor deposition," Thin Solid Films 209, 9-16 (1992).
[CrossRef]

Fatemi, M.

A. P. Purdy, A. D. Berry, R. T. Holm, M. Fatemi, and D. K. Gaskill, "Chemical vapor deposition experiments using new fluorinated acetylacetones of calcium, strontium and barium," Inorg. Chem. 28, 2799-2803 (1989).
[CrossRef]

Fujiura, K.

K. Fujiura, Y. Ohishi, and S. Takahashi, "Organometallic chemical vapor deposition of ZrF4-based fluoride glasses," Jpn. J. Appl. Phys. 28, L147-L149 (1989).
[CrossRef]

Gardiner, R.

R. Gardiner, D. W. Brown, P. S. Kirlin, and A. L. Rheingold, "Volatile barium β-diketonate polyether adducts. Synthesis, characterization, and metalloorganic chemical vapor deposition," Chem. Mater. 3, 1053-1059 (1991).
[CrossRef]

Gaskill, D. K.

A. P. Purdy, A. D. Berry, R. T. Holm, M. Fatemi, and D. K. Gaskill, "Chemical vapor deposition experiments using new fluorinated acetylacetones of calcium, strontium and barium," Inorg. Chem. 28, 2799-2803 (1989).
[CrossRef]

Hacker, E.

U. Kaiser, N. Kaiser, P. Weisbrodt, U. Mademann, E. Hacker, and H. Muller, "Structure of thin fluoride films deposited on amorphous substrates," Thin Solid Films 217, 7-16 (1992).
[CrossRef]

Hatanpää, T.

T. Pilvi, T. Hatanpää, E. Puukilainen, K. Arstila, M. Bischoff, U. Kaiser, N. Kaiser, M. Leskelä, and M. Ritala, "Study of novel ALD process for depositing MgF2 thin films," J. Mater. Chem. 17, 5077-5082 (2007).
[CrossRef]

Holm, R. T.

A. P. Purdy, A. D. Berry, R. T. Holm, M. Fatemi, and D. K. Gaskill, "Chemical vapor deposition experiments using new fluorinated acetylacetones of calcium, strontium and barium," Inorg. Chem. 28, 2799-2803 (1989).
[CrossRef]

Kaiser, N.

T. Pilvi, T. Hatanpää, E. Puukilainen, K. Arstila, M. Bischoff, U. Kaiser, N. Kaiser, M. Leskelä, and M. Ritala, "Study of novel ALD process for depositing MgF2 thin films," J. Mater. Chem. 17, 5077-5082 (2007).
[CrossRef]

Z. Czigany, M. Adamik, and N. Kaiser, "248 nm laser interaction studies on LaF3/MgF2 optical coatings by cross-sectional transmission electron microscopy," Thin Solid Films 312, 176-181 (1998).
[CrossRef]

U. Kaiser and N. Kaiser, "C-adsorption behaviour of thin fluoride films," Thin Solid Films 237, 250-254 (1994).
[CrossRef]

U. Kaiser, N. Kaiser, P. Weisbrodt, U. Mademann, E. Hacker, and H. Muller, "Structure of thin fluoride films deposited on amorphous substrates," Thin Solid Films 217, 7-16 (1992).
[CrossRef]

Kaiser, U.

T. Pilvi, T. Hatanpää, E. Puukilainen, K. Arstila, M. Bischoff, U. Kaiser, N. Kaiser, M. Leskelä, and M. Ritala, "Study of novel ALD process for depositing MgF2 thin films," J. Mater. Chem. 17, 5077-5082 (2007).
[CrossRef]

U. Kaiser, M. Adamik, G. Safran, P. B. Barna, S. Laux, and W. Richter, "Growth structure investigation of MgF2 and NdF3 films grown by molecular beam deposition on CaF2(111) substrates," Thin Solid Films 280, 5-15 (1996).
[CrossRef]

U. Kaiser and N. Kaiser, "C-adsorption behaviour of thin fluoride films," Thin Solid Films 237, 250-254 (1994).
[CrossRef]

U. Kaiser, N. Kaiser, P. Weisbrodt, U. Mademann, E. Hacker, and H. Muller, "Structure of thin fluoride films deposited on amorphous substrates," Thin Solid Films 217, 7-16 (1992).
[CrossRef]

Keinonen, J.

M. Putkonen, T. Sajavaara, L. Niinistö, and J. Keinonen, "Analysis of ALD-processed thin films by ion-beam techniques," Anal. Bioanal. Chem. 382, 1791-1799 (2005).
[CrossRef] [PubMed]

Kirlin, P. S.

R. Gardiner, D. W. Brown, P. S. Kirlin, and A. L. Rheingold, "Volatile barium β-diketonate polyether adducts. Synthesis, characterization, and metalloorganic chemical vapor deposition," Chem. Mater. 3, 1053-1059 (1991).
[CrossRef]

Laux, S.

U. Kaiser, M. Adamik, G. Safran, P. B. Barna, S. Laux, and W. Richter, "Growth structure investigation of MgF2 and NdF3 films grown by molecular beam deposition on CaF2(111) substrates," Thin Solid Films 280, 5-15 (1996).
[CrossRef]

Leskelä, M.

T. Pilvi, T. Hatanpää, E. Puukilainen, K. Arstila, M. Bischoff, U. Kaiser, N. Kaiser, M. Leskelä, and M. Ritala, "Study of novel ALD process for depositing MgF2 thin films," J. Mater. Chem. 17, 5077-5082 (2007).
[CrossRef]

T. Pilvi, K. Arstila, M. Leskelä, and M. Ritala, "Novel ALD process for depositing CaF2 thin films," Chem. Mater. 19, 3387-3392 (2007).
[CrossRef]

M. Ritala and M. Leskelä, Handbook of Thin Film Materials (Academic, 2001), Vol. 1, pp. 103-159.

Lingg, L. J.

L. J. Lingg, A. D. Berry, A. P. Purdy, and K. J. Ewing, "Sodium fluoride thin films by chemical vapor deposition," Thin Solid Films 209, 9-16 (1992).
[CrossRef]

Mademann, U.

U. Kaiser, N. Kaiser, P. Weisbrodt, U. Mademann, E. Hacker, and H. Muller, "Structure of thin fluoride films deposited on amorphous substrates," Thin Solid Films 217, 7-16 (1992).
[CrossRef]

Muller, H.

U. Kaiser, N. Kaiser, P. Weisbrodt, U. Mademann, E. Hacker, and H. Muller, "Structure of thin fluoride films deposited on amorphous substrates," Thin Solid Films 217, 7-16 (1992).
[CrossRef]

Niinistö, L.

M. Putkonen, T. Sajavaara, L. Niinistö, and J. Keinonen, "Analysis of ALD-processed thin films by ion-beam techniques," Anal. Bioanal. Chem. 382, 1791-1799 (2005).
[CrossRef] [PubMed]

Ohishi, Y.

K. Fujiura, Y. Ohishi, and S. Takahashi, "Organometallic chemical vapor deposition of ZrF4-based fluoride glasses," Jpn. J. Appl. Phys. 28, L147-L149 (1989).
[CrossRef]

Pilvi, T.

T. Pilvi, T. Hatanpää, E. Puukilainen, K. Arstila, M. Bischoff, U. Kaiser, N. Kaiser, M. Leskelä, and M. Ritala, "Study of novel ALD process for depositing MgF2 thin films," J. Mater. Chem. 17, 5077-5082 (2007).
[CrossRef]

T. Pilvi, K. Arstila, M. Leskelä, and M. Ritala, "Novel ALD process for depositing CaF2 thin films," Chem. Mater. 19, 3387-3392 (2007).
[CrossRef]

Pischow, K. A.

A. Duparre, C. Ruppe, K. A. Pischow, M. Adamik, and P. B. Barna, "Atomic force microscopy on cross-sections of optical coatings: a new method," Thin Solid Films 261, 70-75 (1995).

Purdy, A. P.

L. J. Lingg, A. D. Berry, A. P. Purdy, and K. J. Ewing, "Sodium fluoride thin films by chemical vapor deposition," Thin Solid Films 209, 9-16 (1992).
[CrossRef]

A. P. Purdy, A. D. Berry, R. T. Holm, M. Fatemi, and D. K. Gaskill, "Chemical vapor deposition experiments using new fluorinated acetylacetones of calcium, strontium and barium," Inorg. Chem. 28, 2799-2803 (1989).
[CrossRef]

Putkonen, M.

M. Putkonen, T. Sajavaara, L. Niinistö, and J. Keinonen, "Analysis of ALD-processed thin films by ion-beam techniques," Anal. Bioanal. Chem. 382, 1791-1799 (2005).
[CrossRef] [PubMed]

Puukilainen, E.

T. Pilvi, T. Hatanpää, E. Puukilainen, K. Arstila, M. Bischoff, U. Kaiser, N. Kaiser, M. Leskelä, and M. Ritala, "Study of novel ALD process for depositing MgF2 thin films," J. Mater. Chem. 17, 5077-5082 (2007).
[CrossRef]

Ranta-aho, T.

M. Ylilammi and T. Ranta-aho, "Metal fluoride thin films prepared by atomic layer deposition," J. Electrochem. Soc. 141, 1278-1284 (1994).
[CrossRef]

M. Ylilammi and T. Ranta-aho, "Optical determination of the film thicknesses in multilayer thin film structures," Thin Solid Films 232, 56-62 (1993).
[CrossRef]

Rheingold, A. L.

R. Gardiner, D. W. Brown, P. S. Kirlin, and A. L. Rheingold, "Volatile barium β-diketonate polyether adducts. Synthesis, characterization, and metalloorganic chemical vapor deposition," Chem. Mater. 3, 1053-1059 (1991).
[CrossRef]

Richter, W.

U. Kaiser, M. Adamik, G. Safran, P. B. Barna, S. Laux, and W. Richter, "Growth structure investigation of MgF2 and NdF3 films grown by molecular beam deposition on CaF2(111) substrates," Thin Solid Films 280, 5-15 (1996).
[CrossRef]

Ritala, M.

T. Pilvi, K. Arstila, M. Leskelä, and M. Ritala, "Novel ALD process for depositing CaF2 thin films," Chem. Mater. 19, 3387-3392 (2007).
[CrossRef]

T. Pilvi, T. Hatanpää, E. Puukilainen, K. Arstila, M. Bischoff, U. Kaiser, N. Kaiser, M. Leskelä, and M. Ritala, "Study of novel ALD process for depositing MgF2 thin films," J. Mater. Chem. 17, 5077-5082 (2007).
[CrossRef]

M. Ritala and M. Leskelä, Handbook of Thin Film Materials (Academic, 2001), Vol. 1, pp. 103-159.

Ruppe, C.

A. Duparre, C. Ruppe, K. A. Pischow, M. Adamik, and P. B. Barna, "Atomic force microscopy on cross-sections of optical coatings: a new method," Thin Solid Films 261, 70-75 (1995).

Safran, G.

U. Kaiser, M. Adamik, G. Safran, P. B. Barna, S. Laux, and W. Richter, "Growth structure investigation of MgF2 and NdF3 films grown by molecular beam deposition on CaF2(111) substrates," Thin Solid Films 280, 5-15 (1996).
[CrossRef]

Sajavaara, T.

M. Putkonen, T. Sajavaara, L. Niinistö, and J. Keinonen, "Analysis of ALD-processed thin films by ion-beam techniques," Anal. Bioanal. Chem. 382, 1791-1799 (2005).
[CrossRef] [PubMed]

Sato, H.

H. Sato and S. Sugawara, "Preparation of high quality barium fluoride thin film by chemical vapor deposition," Jpn. J. Appl. Phys. 32, L799-L801 (1993).
[CrossRef]

Sugawara, S.

H. Sato and S. Sugawara, "Preparation of high quality barium fluoride thin film by chemical vapor deposition," Jpn. J. Appl. Phys. 32, L799-L801 (1993).
[CrossRef]

Takahashi, S.

K. Fujiura, Y. Ohishi, and S. Takahashi, "Organometallic chemical vapor deposition of ZrF4-based fluoride glasses," Jpn. J. Appl. Phys. 28, L147-L149 (1989).
[CrossRef]

Weisbrodt, P.

U. Kaiser, N. Kaiser, P. Weisbrodt, U. Mademann, E. Hacker, and H. Muller, "Structure of thin fluoride films deposited on amorphous substrates," Thin Solid Films 217, 7-16 (1992).
[CrossRef]

Ylilammi, M.

M. Ylilammi and T. Ranta-aho, "Metal fluoride thin films prepared by atomic layer deposition," J. Electrochem. Soc. 141, 1278-1284 (1994).
[CrossRef]

M. Ylilammi and T. Ranta-aho, "Optical determination of the film thicknesses in multilayer thin film structures," Thin Solid Films 232, 56-62 (1993).
[CrossRef]

Inorg. Chem. (1)

A. P. Purdy, A. D. Berry, R. T. Holm, M. Fatemi, and D. K. Gaskill, "Chemical vapor deposition experiments using new fluorinated acetylacetones of calcium, strontium and barium," Inorg. Chem. 28, 2799-2803 (1989).
[CrossRef]

Anal. Bioanal. Chem. (1)

M. Putkonen, T. Sajavaara, L. Niinistö, and J. Keinonen, "Analysis of ALD-processed thin films by ion-beam techniques," Anal. Bioanal. Chem. 382, 1791-1799 (2005).
[CrossRef] [PubMed]

CERAC Coating Materials News (1)

"UV coatings: materials and applications," CERAC Coating Materials News 12, 1-4 (2002), http://www.cerac.com/pubs/CMNarchives.htm.

Chem. Mater. (2)

T. Pilvi, K. Arstila, M. Leskelä, and M. Ritala, "Novel ALD process for depositing CaF2 thin films," Chem. Mater. 19, 3387-3392 (2007).
[CrossRef]

R. Gardiner, D. W. Brown, P. S. Kirlin, and A. L. Rheingold, "Volatile barium β-diketonate polyether adducts. Synthesis, characterization, and metalloorganic chemical vapor deposition," Chem. Mater. 3, 1053-1059 (1991).
[CrossRef]

J. Electrochem. Soc. (1)

M. Ylilammi and T. Ranta-aho, "Metal fluoride thin films prepared by atomic layer deposition," J. Electrochem. Soc. 141, 1278-1284 (1994).
[CrossRef]

J. Mater. Chem. (1)

T. Pilvi, T. Hatanpää, E. Puukilainen, K. Arstila, M. Bischoff, U. Kaiser, N. Kaiser, M. Leskelä, and M. Ritala, "Study of novel ALD process for depositing MgF2 thin films," J. Mater. Chem. 17, 5077-5082 (2007).
[CrossRef]

Jpn. J. Appl. Phys. (2)

H. Sato and S. Sugawara, "Preparation of high quality barium fluoride thin film by chemical vapor deposition," Jpn. J. Appl. Phys. 32, L799-L801 (1993).
[CrossRef]

K. Fujiura, Y. Ohishi, and S. Takahashi, "Organometallic chemical vapor deposition of ZrF4-based fluoride glasses," Jpn. J. Appl. Phys. 28, L147-L149 (1989).
[CrossRef]

Thin Solid Films (7)

U. Kaiser and N. Kaiser, "C-adsorption behaviour of thin fluoride films," Thin Solid Films 237, 250-254 (1994).
[CrossRef]

U. Kaiser, M. Adamik, G. Safran, P. B. Barna, S. Laux, and W. Richter, "Growth structure investigation of MgF2 and NdF3 films grown by molecular beam deposition on CaF2(111) substrates," Thin Solid Films 280, 5-15 (1996).
[CrossRef]

Z. Czigany, M. Adamik, and N. Kaiser, "248 nm laser interaction studies on LaF3/MgF2 optical coatings by cross-sectional transmission electron microscopy," Thin Solid Films 312, 176-181 (1998).
[CrossRef]

L. J. Lingg, A. D. Berry, A. P. Purdy, and K. J. Ewing, "Sodium fluoride thin films by chemical vapor deposition," Thin Solid Films 209, 9-16 (1992).
[CrossRef]

M. Ylilammi and T. Ranta-aho, "Optical determination of the film thicknesses in multilayer thin film structures," Thin Solid Films 232, 56-62 (1993).
[CrossRef]

A. Duparre, C. Ruppe, K. A. Pischow, M. Adamik, and P. B. Barna, "Atomic force microscopy on cross-sections of optical coatings: a new method," Thin Solid Films 261, 70-75 (1995).

U. Kaiser, N. Kaiser, P. Weisbrodt, U. Mademann, E. Hacker, and H. Muller, "Structure of thin fluoride films deposited on amorphous substrates," Thin Solid Films 217, 7-16 (1992).
[CrossRef]

Other (1)

M. Ritala and M. Leskelä, Handbook of Thin Film Materials (Academic, 2001), Vol. 1, pp. 103-159.

Cited By

OSA participates in CrossRef's Cited-By Linking service. Citing articles from OSA journals and other participating publishers are listed here.

Alert me when this article is cited.


Figures (5)

Fig. 1
Fig. 1

Growth rate of C a F 2 films on silicon as a function of the C a ( t h d ) 2 and T i F 4 pulse lengths at 350   ° C . The T i F 4 pulse and purge times were 1.0 s (on the left), and the C a ( t h d ) 2 pulse time was 2.5 s and the purge times were 1.0 s (on the right) [12].

Fig. 2
Fig. 2

GI-XRD patterns of M g F 2 , C a F 2 , and L a F 3 thin films deposited on silicon at 350   ° C .

Fig. 3
Fig. 3

Cross-sectional TEM images of approximately 280 n m thick M g F 2 thin film deposited on Si at 250   ° C .

Fig. 4
Fig. 4

Cross-sectional SEM images of M g F 2 , L a F 3 , and C a F 2 thin films deposited on Si at 350   ° C .

Fig. 5
Fig. 5

Transmission spectra of a quartz substrate and 155 nm MgF2 film, 143 nm CaF2 film, and 106 nm LaF3 film on quartz deposited at 350 °C.

Tables (1)

Tables Icon

Table 1 Compositions (at. %) of MgF2, CaF2, and LaF3 Thin Films Deposited at 350 °C as Measured by TOF-ERDA

Equations (1)

Equations on this page are rendered with MathJax. Learn more.

2 C a ( t h d ) 2 ( g ) + T i F 4 ( g ) 2 C a F 2 ( s ) + T i ( t h d ) 4 ( g ) .

Metrics