Abstract

Residual absorption in optical coatings and materials is directly measured by means of the laser-induced deflection (LID) technique. For transmissive coatings a measurement strategy is introduced that allows for the separation of different absorptions of the investigated sample (bulk, coating, surface) by use of only one sample. Laser irradiation yields absorption values between 2×103 and 2.9×102 for antireflecting and highly reflecting (HR) coatings at 193nm and 30.6×106 for a HR mirror at 527nm. Use of laser-induced fluorescence at 193nm excitation reveals trivalent cerium and prasodymium and hydrocarbons in different single layers and coatings. In addition to correlation with absorption data, the influence of a high fluorescence quantum yield on the absorption measurement is discussed.

© 2008 Optical Society of America

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References

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  1. E. Eva and K. Mann, "Calorimetric measurement of two-photon absorption and color-center formation in ultraviolet-window materials," Appl. Phys. A 62, 143-149 (1996).
    [CrossRef]
  2. S. Gliech, H. Gessner, A. Hultaker, and A. Duparre, "157- and 193-nm scatter, R, and T measurement technique," Proc. SPIE 5250, 137-145 (2004).
    [CrossRef]
  3. M. Guntau and W. Triebel, "Novel method to measure bulk absorption in optically transparent materials," Rev. Sci. Instrum. 71, 2279-2282 (2000).
    [CrossRef]
  4. W. Triebel, Ch. Mühlig, and S. Kufert, "Application of the laser induced deflection (LID) technique for low absorption measurements in bulk materials and coatings," Proc. SPIE 5965, 59651J (2005).
    [CrossRef]
  5. Ch. Mühlig, W. Triebel, S. Kufert, Ch. Noppeney, and H. Bernitzki, "Direct Measurements of Residual Absorption in fluoridic thin films and optical materials for DUV laser applications," Proc. SPIE 6403, 640317 (2007).
    [CrossRef]
  6. Ch. Mühlig, W. Triebel, H. Bernitzki, M. Klaus, J. Bergmann, S. thereforeKufert, and S. Bublitz, "Absorption and fluorescence measurements of DUV/VUV coatings," Proc. SPIE 5963, 59630P(2005).
    [CrossRef]
  7. Ch. Mühlig, W. Triebel, G. Töpfer, and A. Jordanov, "Calcium fluoride for ArF laser lithography--characterization by in situ transmission and LIF measurements," Proc. SPIE , 4932, 458-466 (2003).
    [CrossRef]
  8. U. Natura, Ch. Mühlig, W. Triebel, Ch. Görling, U. Leinhos, K. Mann, E. Eva, and A. Pfeiffer, "Characterization of 193 nm light absorption in fused silica and calcium fluoride by various measurement techniques (Round-Robin experiments)," CHOCLAB II -Brochure to the final presentation of the Eureka project EU-2359, VDI Technology Center (2003), pp. 280-294.
  9. K. H. Yang and J. A. DeLuca, "uv fluorescence of cerium-doped lutetium and lanthanum trifluorides, potential tunable coherent sources from 2760 to 3220 Å," Appl. Phys. Lett. 31, 594-596 (1977).
    [CrossRef]
  10. L. R. Elias, Wm. S. Heaps, and W. M. Yen, "Excitation of uv fluorescence in LaF3 doped with trivalent cerium and praseodymium," Phys. Rev. B 8, 4989-4995 (1973).
    [CrossRef]
  11. J. Heber, C. Mühlig, W. Triebel, N. Danz, R. Thielsch, and N. Kaiser, "Deep UV laser induced fluorescence in fluoride thin films," Appl. Phys. A 76, 123-128 (2003).
    [CrossRef]

2007 (1)

Ch. Mühlig, W. Triebel, S. Kufert, Ch. Noppeney, and H. Bernitzki, "Direct Measurements of Residual Absorption in fluoridic thin films and optical materials for DUV laser applications," Proc. SPIE 6403, 640317 (2007).
[CrossRef]

2005 (2)

Ch. Mühlig, W. Triebel, H. Bernitzki, M. Klaus, J. Bergmann, S. thereforeKufert, and S. Bublitz, "Absorption and fluorescence measurements of DUV/VUV coatings," Proc. SPIE 5963, 59630P(2005).
[CrossRef]

W. Triebel, Ch. Mühlig, and S. Kufert, "Application of the laser induced deflection (LID) technique for low absorption measurements in bulk materials and coatings," Proc. SPIE 5965, 59651J (2005).
[CrossRef]

2004 (1)

S. Gliech, H. Gessner, A. Hultaker, and A. Duparre, "157- and 193-nm scatter, R, and T measurement technique," Proc. SPIE 5250, 137-145 (2004).
[CrossRef]

2003 (3)

Ch. Mühlig, W. Triebel, G. Töpfer, and A. Jordanov, "Calcium fluoride for ArF laser lithography--characterization by in situ transmission and LIF measurements," Proc. SPIE , 4932, 458-466 (2003).
[CrossRef]

U. Natura, Ch. Mühlig, W. Triebel, Ch. Görling, U. Leinhos, K. Mann, E. Eva, and A. Pfeiffer, "Characterization of 193 nm light absorption in fused silica and calcium fluoride by various measurement techniques (Round-Robin experiments)," CHOCLAB II -Brochure to the final presentation of the Eureka project EU-2359, VDI Technology Center (2003), pp. 280-294.

J. Heber, C. Mühlig, W. Triebel, N. Danz, R. Thielsch, and N. Kaiser, "Deep UV laser induced fluorescence in fluoride thin films," Appl. Phys. A 76, 123-128 (2003).
[CrossRef]

2000 (1)

M. Guntau and W. Triebel, "Novel method to measure bulk absorption in optically transparent materials," Rev. Sci. Instrum. 71, 2279-2282 (2000).
[CrossRef]

1996 (1)

E. Eva and K. Mann, "Calorimetric measurement of two-photon absorption and color-center formation in ultraviolet-window materials," Appl. Phys. A 62, 143-149 (1996).
[CrossRef]

1977 (1)

K. H. Yang and J. A. DeLuca, "uv fluorescence of cerium-doped lutetium and lanthanum trifluorides, potential tunable coherent sources from 2760 to 3220 Å," Appl. Phys. Lett. 31, 594-596 (1977).
[CrossRef]

1973 (1)

L. R. Elias, Wm. S. Heaps, and W. M. Yen, "Excitation of uv fluorescence in LaF3 doped with trivalent cerium and praseodymium," Phys. Rev. B 8, 4989-4995 (1973).
[CrossRef]

Bergmann, J.

Ch. Mühlig, W. Triebel, H. Bernitzki, M. Klaus, J. Bergmann, S. thereforeKufert, and S. Bublitz, "Absorption and fluorescence measurements of DUV/VUV coatings," Proc. SPIE 5963, 59630P(2005).
[CrossRef]

Bernitzki, H.

Ch. Mühlig, W. Triebel, S. Kufert, Ch. Noppeney, and H. Bernitzki, "Direct Measurements of Residual Absorption in fluoridic thin films and optical materials for DUV laser applications," Proc. SPIE 6403, 640317 (2007).
[CrossRef]

Ch. Mühlig, W. Triebel, H. Bernitzki, M. Klaus, J. Bergmann, S. thereforeKufert, and S. Bublitz, "Absorption and fluorescence measurements of DUV/VUV coatings," Proc. SPIE 5963, 59630P(2005).
[CrossRef]

Bublitz, S.

Ch. Mühlig, W. Triebel, H. Bernitzki, M. Klaus, J. Bergmann, S. thereforeKufert, and S. Bublitz, "Absorption and fluorescence measurements of DUV/VUV coatings," Proc. SPIE 5963, 59630P(2005).
[CrossRef]

Danz, N.

J. Heber, C. Mühlig, W. Triebel, N. Danz, R. Thielsch, and N. Kaiser, "Deep UV laser induced fluorescence in fluoride thin films," Appl. Phys. A 76, 123-128 (2003).
[CrossRef]

DeLuca, J. A.

K. H. Yang and J. A. DeLuca, "uv fluorescence of cerium-doped lutetium and lanthanum trifluorides, potential tunable coherent sources from 2760 to 3220 Å," Appl. Phys. Lett. 31, 594-596 (1977).
[CrossRef]

Duparre, A.

S. Gliech, H. Gessner, A. Hultaker, and A. Duparre, "157- and 193-nm scatter, R, and T measurement technique," Proc. SPIE 5250, 137-145 (2004).
[CrossRef]

Elias, L. R.

L. R. Elias, Wm. S. Heaps, and W. M. Yen, "Excitation of uv fluorescence in LaF3 doped with trivalent cerium and praseodymium," Phys. Rev. B 8, 4989-4995 (1973).
[CrossRef]

Eva, E.

U. Natura, Ch. Mühlig, W. Triebel, Ch. Görling, U. Leinhos, K. Mann, E. Eva, and A. Pfeiffer, "Characterization of 193 nm light absorption in fused silica and calcium fluoride by various measurement techniques (Round-Robin experiments)," CHOCLAB II -Brochure to the final presentation of the Eureka project EU-2359, VDI Technology Center (2003), pp. 280-294.

E. Eva and K. Mann, "Calorimetric measurement of two-photon absorption and color-center formation in ultraviolet-window materials," Appl. Phys. A 62, 143-149 (1996).
[CrossRef]

Gessner, H.

S. Gliech, H. Gessner, A. Hultaker, and A. Duparre, "157- and 193-nm scatter, R, and T measurement technique," Proc. SPIE 5250, 137-145 (2004).
[CrossRef]

Gliech, S.

S. Gliech, H. Gessner, A. Hultaker, and A. Duparre, "157- and 193-nm scatter, R, and T measurement technique," Proc. SPIE 5250, 137-145 (2004).
[CrossRef]

Görling, Ch.

U. Natura, Ch. Mühlig, W. Triebel, Ch. Görling, U. Leinhos, K. Mann, E. Eva, and A. Pfeiffer, "Characterization of 193 nm light absorption in fused silica and calcium fluoride by various measurement techniques (Round-Robin experiments)," CHOCLAB II -Brochure to the final presentation of the Eureka project EU-2359, VDI Technology Center (2003), pp. 280-294.

Guntau, M.

M. Guntau and W. Triebel, "Novel method to measure bulk absorption in optically transparent materials," Rev. Sci. Instrum. 71, 2279-2282 (2000).
[CrossRef]

Heaps, Wm. S.

L. R. Elias, Wm. S. Heaps, and W. M. Yen, "Excitation of uv fluorescence in LaF3 doped with trivalent cerium and praseodymium," Phys. Rev. B 8, 4989-4995 (1973).
[CrossRef]

Heber, J.

J. Heber, C. Mühlig, W. Triebel, N. Danz, R. Thielsch, and N. Kaiser, "Deep UV laser induced fluorescence in fluoride thin films," Appl. Phys. A 76, 123-128 (2003).
[CrossRef]

Hultaker, A.

S. Gliech, H. Gessner, A. Hultaker, and A. Duparre, "157- and 193-nm scatter, R, and T measurement technique," Proc. SPIE 5250, 137-145 (2004).
[CrossRef]

Jordanov, A.

Ch. Mühlig, W. Triebel, G. Töpfer, and A. Jordanov, "Calcium fluoride for ArF laser lithography--characterization by in situ transmission and LIF measurements," Proc. SPIE , 4932, 458-466 (2003).
[CrossRef]

Kaiser, N.

J. Heber, C. Mühlig, W. Triebel, N. Danz, R. Thielsch, and N. Kaiser, "Deep UV laser induced fluorescence in fluoride thin films," Appl. Phys. A 76, 123-128 (2003).
[CrossRef]

Klaus, M.

Ch. Mühlig, W. Triebel, H. Bernitzki, M. Klaus, J. Bergmann, S. thereforeKufert, and S. Bublitz, "Absorption and fluorescence measurements of DUV/VUV coatings," Proc. SPIE 5963, 59630P(2005).
[CrossRef]

Kufert, S.

Ch. Mühlig, W. Triebel, S. Kufert, Ch. Noppeney, and H. Bernitzki, "Direct Measurements of Residual Absorption in fluoridic thin films and optical materials for DUV laser applications," Proc. SPIE 6403, 640317 (2007).
[CrossRef]

W. Triebel, Ch. Mühlig, and S. Kufert, "Application of the laser induced deflection (LID) technique for low absorption measurements in bulk materials and coatings," Proc. SPIE 5965, 59651J (2005).
[CrossRef]

Ch. Mühlig, W. Triebel, H. Bernitzki, M. Klaus, J. Bergmann, S. thereforeKufert, and S. Bublitz, "Absorption and fluorescence measurements of DUV/VUV coatings," Proc. SPIE 5963, 59630P(2005).
[CrossRef]

Leinhos, U.

U. Natura, Ch. Mühlig, W. Triebel, Ch. Görling, U. Leinhos, K. Mann, E. Eva, and A. Pfeiffer, "Characterization of 193 nm light absorption in fused silica and calcium fluoride by various measurement techniques (Round-Robin experiments)," CHOCLAB II -Brochure to the final presentation of the Eureka project EU-2359, VDI Technology Center (2003), pp. 280-294.

Mann, K.

U. Natura, Ch. Mühlig, W. Triebel, Ch. Görling, U. Leinhos, K. Mann, E. Eva, and A. Pfeiffer, "Characterization of 193 nm light absorption in fused silica and calcium fluoride by various measurement techniques (Round-Robin experiments)," CHOCLAB II -Brochure to the final presentation of the Eureka project EU-2359, VDI Technology Center (2003), pp. 280-294.

E. Eva and K. Mann, "Calorimetric measurement of two-photon absorption and color-center formation in ultraviolet-window materials," Appl. Phys. A 62, 143-149 (1996).
[CrossRef]

Mühlig, C.

J. Heber, C. Mühlig, W. Triebel, N. Danz, R. Thielsch, and N. Kaiser, "Deep UV laser induced fluorescence in fluoride thin films," Appl. Phys. A 76, 123-128 (2003).
[CrossRef]

Mühlig, Ch.

Ch. Mühlig, W. Triebel, S. Kufert, Ch. Noppeney, and H. Bernitzki, "Direct Measurements of Residual Absorption in fluoridic thin films and optical materials for DUV laser applications," Proc. SPIE 6403, 640317 (2007).
[CrossRef]

Ch. Mühlig, W. Triebel, H. Bernitzki, M. Klaus, J. Bergmann, S. thereforeKufert, and S. Bublitz, "Absorption and fluorescence measurements of DUV/VUV coatings," Proc. SPIE 5963, 59630P(2005).
[CrossRef]

W. Triebel, Ch. Mühlig, and S. Kufert, "Application of the laser induced deflection (LID) technique for low absorption measurements in bulk materials and coatings," Proc. SPIE 5965, 59651J (2005).
[CrossRef]

Ch. Mühlig, W. Triebel, G. Töpfer, and A. Jordanov, "Calcium fluoride for ArF laser lithography--characterization by in situ transmission and LIF measurements," Proc. SPIE , 4932, 458-466 (2003).
[CrossRef]

U. Natura, Ch. Mühlig, W. Triebel, Ch. Görling, U. Leinhos, K. Mann, E. Eva, and A. Pfeiffer, "Characterization of 193 nm light absorption in fused silica and calcium fluoride by various measurement techniques (Round-Robin experiments)," CHOCLAB II -Brochure to the final presentation of the Eureka project EU-2359, VDI Technology Center (2003), pp. 280-294.

Natura, U.

U. Natura, Ch. Mühlig, W. Triebel, Ch. Görling, U. Leinhos, K. Mann, E. Eva, and A. Pfeiffer, "Characterization of 193 nm light absorption in fused silica and calcium fluoride by various measurement techniques (Round-Robin experiments)," CHOCLAB II -Brochure to the final presentation of the Eureka project EU-2359, VDI Technology Center (2003), pp. 280-294.

Noppeney, Ch.

Ch. Mühlig, W. Triebel, S. Kufert, Ch. Noppeney, and H. Bernitzki, "Direct Measurements of Residual Absorption in fluoridic thin films and optical materials for DUV laser applications," Proc. SPIE 6403, 640317 (2007).
[CrossRef]

Pfeiffer, A.

U. Natura, Ch. Mühlig, W. Triebel, Ch. Görling, U. Leinhos, K. Mann, E. Eva, and A. Pfeiffer, "Characterization of 193 nm light absorption in fused silica and calcium fluoride by various measurement techniques (Round-Robin experiments)," CHOCLAB II -Brochure to the final presentation of the Eureka project EU-2359, VDI Technology Center (2003), pp. 280-294.

Thielsch, R.

J. Heber, C. Mühlig, W. Triebel, N. Danz, R. Thielsch, and N. Kaiser, "Deep UV laser induced fluorescence in fluoride thin films," Appl. Phys. A 76, 123-128 (2003).
[CrossRef]

Töpfer, G.

Ch. Mühlig, W. Triebel, G. Töpfer, and A. Jordanov, "Calcium fluoride for ArF laser lithography--characterization by in situ transmission and LIF measurements," Proc. SPIE , 4932, 458-466 (2003).
[CrossRef]

Triebel, W.

Ch. Mühlig, W. Triebel, S. Kufert, Ch. Noppeney, and H. Bernitzki, "Direct Measurements of Residual Absorption in fluoridic thin films and optical materials for DUV laser applications," Proc. SPIE 6403, 640317 (2007).
[CrossRef]

Ch. Mühlig, W. Triebel, H. Bernitzki, M. Klaus, J. Bergmann, S. thereforeKufert, and S. Bublitz, "Absorption and fluorescence measurements of DUV/VUV coatings," Proc. SPIE 5963, 59630P(2005).
[CrossRef]

W. Triebel, Ch. Mühlig, and S. Kufert, "Application of the laser induced deflection (LID) technique for low absorption measurements in bulk materials and coatings," Proc. SPIE 5965, 59651J (2005).
[CrossRef]

Ch. Mühlig, W. Triebel, G. Töpfer, and A. Jordanov, "Calcium fluoride for ArF laser lithography--characterization by in situ transmission and LIF measurements," Proc. SPIE , 4932, 458-466 (2003).
[CrossRef]

U. Natura, Ch. Mühlig, W. Triebel, Ch. Görling, U. Leinhos, K. Mann, E. Eva, and A. Pfeiffer, "Characterization of 193 nm light absorption in fused silica and calcium fluoride by various measurement techniques (Round-Robin experiments)," CHOCLAB II -Brochure to the final presentation of the Eureka project EU-2359, VDI Technology Center (2003), pp. 280-294.

J. Heber, C. Mühlig, W. Triebel, N. Danz, R. Thielsch, and N. Kaiser, "Deep UV laser induced fluorescence in fluoride thin films," Appl. Phys. A 76, 123-128 (2003).
[CrossRef]

M. Guntau and W. Triebel, "Novel method to measure bulk absorption in optically transparent materials," Rev. Sci. Instrum. 71, 2279-2282 (2000).
[CrossRef]

Yang, K. H.

K. H. Yang and J. A. DeLuca, "uv fluorescence of cerium-doped lutetium and lanthanum trifluorides, potential tunable coherent sources from 2760 to 3220 Å," Appl. Phys. Lett. 31, 594-596 (1977).
[CrossRef]

Yen, W. M.

L. R. Elias, Wm. S. Heaps, and W. M. Yen, "Excitation of uv fluorescence in LaF3 doped with trivalent cerium and praseodymium," Phys. Rev. B 8, 4989-4995 (1973).
[CrossRef]

Appl. Phys. A (1)

J. Heber, C. Mühlig, W. Triebel, N. Danz, R. Thielsch, and N. Kaiser, "Deep UV laser induced fluorescence in fluoride thin films," Appl. Phys. A 76, 123-128 (2003).
[CrossRef]

Appl. Phys. Lett. (1)

K. H. Yang and J. A. DeLuca, "uv fluorescence of cerium-doped lutetium and lanthanum trifluorides, potential tunable coherent sources from 2760 to 3220 Å," Appl. Phys. Lett. 31, 594-596 (1977).
[CrossRef]

Appl. Phys. A (1)

E. Eva and K. Mann, "Calorimetric measurement of two-photon absorption and color-center formation in ultraviolet-window materials," Appl. Phys. A 62, 143-149 (1996).
[CrossRef]

Phys. Rev. B (1)

L. R. Elias, Wm. S. Heaps, and W. M. Yen, "Excitation of uv fluorescence in LaF3 doped with trivalent cerium and praseodymium," Phys. Rev. B 8, 4989-4995 (1973).
[CrossRef]

Proc. SPIE (3)

Ch. Mühlig, W. Triebel, H. Bernitzki, M. Klaus, J. Bergmann, S. thereforeKufert, and S. Bublitz, "Absorption and fluorescence measurements of DUV/VUV coatings," Proc. SPIE 5963, 59630P(2005).
[CrossRef]

S. Gliech, H. Gessner, A. Hultaker, and A. Duparre, "157- and 193-nm scatter, R, and T measurement technique," Proc. SPIE 5250, 137-145 (2004).
[CrossRef]

W. Triebel, Ch. Mühlig, and S. Kufert, "Application of the laser induced deflection (LID) technique for low absorption measurements in bulk materials and coatings," Proc. SPIE 5965, 59651J (2005).
[CrossRef]

Proc. SPIE (2)

Ch. Mühlig, W. Triebel, S. Kufert, Ch. Noppeney, and H. Bernitzki, "Direct Measurements of Residual Absorption in fluoridic thin films and optical materials for DUV laser applications," Proc. SPIE 6403, 640317 (2007).
[CrossRef]

Ch. Mühlig, W. Triebel, G. Töpfer, and A. Jordanov, "Calcium fluoride for ArF laser lithography--characterization by in situ transmission and LIF measurements," Proc. SPIE , 4932, 458-466 (2003).
[CrossRef]

Rev. Sci. Instrum. (1)

M. Guntau and W. Triebel, "Novel method to measure bulk absorption in optically transparent materials," Rev. Sci. Instrum. 71, 2279-2282 (2000).
[CrossRef]

Other (1)

U. Natura, Ch. Mühlig, W. Triebel, Ch. Görling, U. Leinhos, K. Mann, E. Eva, and A. Pfeiffer, "Characterization of 193 nm light absorption in fused silica and calcium fluoride by various measurement techniques (Round-Robin experiments)," CHOCLAB II -Brochure to the final presentation of the Eureka project EU-2359, VDI Technology Center (2003), pp. 280-294.

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Figures (14)

Fig. 1
Fig. 1

Sketch of the LID measurement principle including calculated isolines of temperature and refractive index for fused silica as well as the probe beam propagation.

Fig. 2
Fig. 2

Examples of calibration samples with different electrical heaters for simulating the temperature and refractive-index profiles that are due to (a) surface and (b) bulk absorption.

Fig. 3
Fig. 3

Homogeneous spatial ArF laser beam profile of 6 m m × 6 m m for direct absorption measurements.

Fig. 4
Fig. 4

Dependence of the calibration coefficients for bulk and thin-film and surface absorptions on the probe beam position along the sample length. The substrate material is CaF 2 with a geometry of 20 m m × 20 m m × 10 m m . Measurements were taken with a double probe beam passing through the sample.

Fig. 5
Fig. 5

Dependence of the calibration coefficients for bulk and thin-film and surface absorptions on the probe beam position along the sample length. The substrate material is fused silica with a geometry of 20 m m × 20 m m × 20 m m . Measurements were taken with a quadruple probe beam passing through the sample.

Fig. 6
Fig. 6

LID signals of sample 1 dependent on the probe beam position along the sample thickness for ArF laser irradiation at 193 nm with a fluence of H = 36 mJ / cm 2 and a repetition rate of f = 1 kHz .

Fig. 7
Fig. 7

LID signals of sample 2 dependent on the probe beam position along the sample thickness for ArF laser irradiation at 193 nm with a fluence of H = 0.5 mJ / cm 2 and a repetition rate of f = 1 kHz .

Fig. 8
Fig. 8

LID signals of samples 3 and 4 for ArF laser irradiation at 193 nm with a fluence of H = 17 mJ / cm 2 and a repetition rate of f = 1 kHz . The results of sample 3 are rescaled for better viewing.

Fig. 9
Fig. 9

LID signal of sample 5 for Nd:YLF laser irradiation at 527 nm with a fluence of H = 22 mJ / cm 2 and a repetition rate of f = 1 kHz .

Fig. 10
Fig. 10

LIF spectrum, excited at 193 nm with a fluence of H = 15 mJ / cm 2 , for a 50 nm LaF 3 single layer deposited onto a silicon substrate (sample 6 in Table 1). The spectrum was taken at a recording duration of 10 μs.

Fig. 11
Fig. 11

LIF spectra of an AR coating on a silicon substrate (sample 7 in Table 1) showing the change in the hydrocarbon fluorescence peaks around 290 and 430 nm that is due to ArF laser irradiation at a fluence of H = 15 mJ / cm 2 . The spectra were taken at a recording duration of 100 ns. The spectrum after ArF laser irradiation is rescaled for better viewing.

Fig. 12
Fig. 12

Integral fluorescence intensities for the two hydrocarbon peaks around 290 and 430 nm from Fig. 11 dependent on the ArF laser irradiation dose.

Fig. 13
Fig. 13

LIF spectra of two different HR coatings (samples 3 and 4 from Table 1). The excitation wavelength is 193 nm with a fluence of H = 15 mJ / cm 2 . The spectra were taken at a recording duration of 100 ns. The spectrum for sample 3 is rescaled for better viewing.

Fig. 14
Fig. 14

Highly resolved LIF spectra of the HR coatings from Fig. 13. The excitation wavelength is 193 nm with a fluence of H = 15 mJ / cm 2 . The spectra were taken at a recording duration of 10 μs.

Tables (1)

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Table 1 Summary of the Investigated Samples

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