Abstract

Ion- and plasma-assisted deposition has been extensively used for the fabrication of high-performance optical films with dense and smooth microstructures that are essential for applications such as low-loss and environmentally stable optics. SiO2 is a well-known amorphous material suitable for energetic deposition. SiO2 single layers and SiO2-based single-cavity narrow-bandpass filters were prepared by plasma-ion-assisted deposition. The refractive index and film thickness were determined by variable-angle spectroscopic ellipsometry. The high compressive stress of the densified film was correlated to increased packing density. The center wavelength shift of the narrow-bandpass filters as a function of sample-temperature as well as high-temperature annealing was determined via spectral transmission measurement. Structural relaxation of the densified SiO2 films was observed from the variation of the refractive index and physical thickness for the single layers and the center wavelength shift for the narrow-bandpass filters, suggesting elastic and plastic deformation of the densified films corresponding to a reversible and an irreversible center wavelength shift, respectively.

© 2008 Optical Society of America

Full Article  |  PDF Article

References

  • View by:
  • |
  • |
  • |

  1. H. Takashashi, "Temperature stability of thin-film narrow-bandpass filter produced by ion-assisted deposition," Appl. Opt. 34, 667-675 (1995).
    [CrossRef] [PubMed]
  2. A. Zöller, R. Götzelmann, K. Matl, and D. Cushing, "Temperature-stable bandpass filters deposited with plasma ion-assisted deposition," Appl. Opt. 35, 5609-5612 (1996).
    [CrossRef] [PubMed]
  3. R. Y. Tsai, C. S. Chang, C. W. Chu, T. Chen, F. Dai, S. Yan, and A. Chang, "Thermally stable narrow-bandpass filter prepared by reactive ion-assisted sputtering," Appl. Opt. 40, 1593-1598 (2001).
    [CrossRef]
  4. R. Thielsch, A. Gatto, and N. Kaiser, "Mechanical stress and thermal-elastic properties of oxide coating for use in the deep-ultraviolet spectral region," Appl. Opt. 41, 3211-3217 (2002).
    [CrossRef] [PubMed]
  5. H. Windischmann, "Intrinsic stress in sputtered thin films," J. Vac. Sci. Technol. A 9, 2431-2436 (1991).
    [CrossRef]
  6. J. Wang and R. L. Maier, "Correlation between mechanical stress and optical properties of SiO2/Ta2O5 multilayer UV narrow-bandpass filters deposited by plasma ion-assisted deposition," Proc. SPIE 5870, 587000E (2005).
  7. J. Wang, R. L. Maier, and H. Schreiber, "Wavefront control of SiO2-based ultraviolet narrow-bandpass filters prepared by plasma ion-assisted deposition," Appl. Opt. 46, 175-179 (2007).
    [CrossRef] [PubMed]
  8. J. Wang and R. L. Maier, "Surface assessment of CaF2 DUV and VUV optical components by quasi-Brewster angle technique," Appl. Opt. 45, 5621-5628 (2006).
    [CrossRef] [PubMed]
  9. S. H. Kim and C. K. Hwangbo, "Derivation of the center-wavelength shift of narrow bandpass filters under temperature change," Opt. Express 12, 5636-5639 (2004).
    [CrossRef]
  10. J. T. Brown, "Center wavelength shift dependence on substrate coefficient of thermal expansion for optical thin-film interference filters deposited by ion-beam sputtering," Appl. Opt. 43, 4506-4511 (2004).
    [CrossRef] [PubMed]

2007

2006

2005

J. Wang and R. L. Maier, "Correlation between mechanical stress and optical properties of SiO2/Ta2O5 multilayer UV narrow-bandpass filters deposited by plasma ion-assisted deposition," Proc. SPIE 5870, 587000E (2005).

2004

S. H. Kim and C. K. Hwangbo, "Derivation of the center-wavelength shift of narrow bandpass filters under temperature change," Opt. Express 12, 5636-5639 (2004).
[CrossRef]

J. T. Brown, "Center wavelength shift dependence on substrate coefficient of thermal expansion for optical thin-film interference filters deposited by ion-beam sputtering," Appl. Opt. 43, 4506-4511 (2004).
[CrossRef] [PubMed]

2002

R. Thielsch, A. Gatto, and N. Kaiser, "Mechanical stress and thermal-elastic properties of oxide coating for use in the deep-ultraviolet spectral region," Appl. Opt. 41, 3211-3217 (2002).
[CrossRef] [PubMed]

2001

1996

A. Zöller, R. Götzelmann, K. Matl, and D. Cushing, "Temperature-stable bandpass filters deposited with plasma ion-assisted deposition," Appl. Opt. 35, 5609-5612 (1996).
[CrossRef] [PubMed]

1995

1991

H. Windischmann, "Intrinsic stress in sputtered thin films," J. Vac. Sci. Technol. A 9, 2431-2436 (1991).
[CrossRef]

Brown, J. T.

Chang, A.

Chang, C. S.

Chen, T.

Chu, C. W.

Cushing, D.

A. Zöller, R. Götzelmann, K. Matl, and D. Cushing, "Temperature-stable bandpass filters deposited with plasma ion-assisted deposition," Appl. Opt. 35, 5609-5612 (1996).
[CrossRef] [PubMed]

Dai, F.

Gatto, A.

R. Thielsch, A. Gatto, and N. Kaiser, "Mechanical stress and thermal-elastic properties of oxide coating for use in the deep-ultraviolet spectral region," Appl. Opt. 41, 3211-3217 (2002).
[CrossRef] [PubMed]

Götzelmann, R.

A. Zöller, R. Götzelmann, K. Matl, and D. Cushing, "Temperature-stable bandpass filters deposited with plasma ion-assisted deposition," Appl. Opt. 35, 5609-5612 (1996).
[CrossRef] [PubMed]

Hwangbo, C. K.

S. H. Kim and C. K. Hwangbo, "Derivation of the center-wavelength shift of narrow bandpass filters under temperature change," Opt. Express 12, 5636-5639 (2004).
[CrossRef]

Kaiser, N.

R. Thielsch, A. Gatto, and N. Kaiser, "Mechanical stress and thermal-elastic properties of oxide coating for use in the deep-ultraviolet spectral region," Appl. Opt. 41, 3211-3217 (2002).
[CrossRef] [PubMed]

Kim, S. H.

S. H. Kim and C. K. Hwangbo, "Derivation of the center-wavelength shift of narrow bandpass filters under temperature change," Opt. Express 12, 5636-5639 (2004).
[CrossRef]

Maier, R. L.

Matl, K.

A. Zöller, R. Götzelmann, K. Matl, and D. Cushing, "Temperature-stable bandpass filters deposited with plasma ion-assisted deposition," Appl. Opt. 35, 5609-5612 (1996).
[CrossRef] [PubMed]

Schreiber, H.

Takashashi, H.

Thielsch, R.

R. Thielsch, A. Gatto, and N. Kaiser, "Mechanical stress and thermal-elastic properties of oxide coating for use in the deep-ultraviolet spectral region," Appl. Opt. 41, 3211-3217 (2002).
[CrossRef] [PubMed]

Tsai, R. Y.

Wang, J.

Windischmann, H.

H. Windischmann, "Intrinsic stress in sputtered thin films," J. Vac. Sci. Technol. A 9, 2431-2436 (1991).
[CrossRef]

Yan, S.

Zöller, A.

A. Zöller, R. Götzelmann, K. Matl, and D. Cushing, "Temperature-stable bandpass filters deposited with plasma ion-assisted deposition," Appl. Opt. 35, 5609-5612 (1996).
[CrossRef] [PubMed]

Appl. Opt.

A. Zöller, R. Götzelmann, K. Matl, and D. Cushing, "Temperature-stable bandpass filters deposited with plasma ion-assisted deposition," Appl. Opt. 35, 5609-5612 (1996).
[CrossRef] [PubMed]

R. Thielsch, A. Gatto, and N. Kaiser, "Mechanical stress and thermal-elastic properties of oxide coating for use in the deep-ultraviolet spectral region," Appl. Opt. 41, 3211-3217 (2002).
[CrossRef] [PubMed]

Appl. Opt.

J. Vac. Sci. Technol. A

H. Windischmann, "Intrinsic stress in sputtered thin films," J. Vac. Sci. Technol. A 9, 2431-2436 (1991).
[CrossRef]

Opt. Express

S. H. Kim and C. K. Hwangbo, "Derivation of the center-wavelength shift of narrow bandpass filters under temperature change," Opt. Express 12, 5636-5639 (2004).
[CrossRef]

Proc. SPIE

J. Wang and R. L. Maier, "Correlation between mechanical stress and optical properties of SiO2/Ta2O5 multilayer UV narrow-bandpass filters deposited by plasma ion-assisted deposition," Proc. SPIE 5870, 587000E (2005).

Cited By

OSA participates in CrossRef's Cited-By Linking service. Citing articles from OSA journals and other participating publishers are listed here.

Alert me when this article is cited.


Figures (4)

Fig. 1
Fig. 1

Refractive indices of SiO 2 single layers at 386 nm for various plasma-ion momentum transfers during PIAD, compared with the refractive index of a HPFS substrate (broken line).

Fig. 2
Fig. 2

(Color online) Compressive stress of SiO 2 single layers as a function of plasma-ion momentum transfer per deposition atom. The data points of circles, squares, and triangles represent 100, 500, and 1000 nm thick SiO 2 films, respectively.

Fig. 3
Fig. 3

Irreversible CWS of the SiO 2 -based UV NBF as a function of annealing temperature.

Fig. 4
Fig. 4

Reversible CWS of as-deposited (dots) and 300 °C annealed (triangles) SiO 2 -based UV NBF.

Tables (1)

Tables Icon

Table 1 Comparison of SiO2 Film Property before and after Annealing at 300 °C

Equations (2)

Equations on this page are rendered with MathJax. Learn more.

P = J i R κ 2 m i e V b ,
σ s = 2 E s 3 ( 1 ν s ) ( d s D ) 2 λ d f Δ f ,

Metrics