Abstract

The merit function space of mirror system for extreme ultraviolet (EUV) lithography is studied. Local minima situated in the multidimensional optical merit function space are connected via links that contain saddle points and form a network. We present networks for EUV lithographic objective designs and discuss how these networks change when control parameters, such as aperture and field, are varied, and constraints are used to limit the variation domain of the variables. A good solution in a network, obtained with a limited number of variables, has been locally optimized with all variables to meet practical requirements.

© 2007 Optical Society of America

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