Abstract

Multilayer coating results are discussed for the primary and secondary mirrors of the micro-exposure tool (MET): a 0.30 NA lithographic imaging system with a 200  μm×600  μm field of view at the wafer plane, operating in the extreme ultraviolet (EUV) region at an illumination wavelength around 13.4 nm. Mo∕Si multilayers were deposited by DC-magnetron sputtering on large-area, curved MET camera substrates. A velocity modulation technique was implemented to consistently achieve multilayer thickness profiles with added figure errors below 0.1 nm rms demonstrating sub-diffraction-limited performance, as defined by the classical diffraction limit of Rayleigh (0.25 waves peak to valley) or Marechal (0.07 waves rms). This work is an experimental demonstration of sub-diffraction- limited multilayer coatings for high-NA EUV imaging systems, which resulted in the highest resolution microfield EUV images to date.

© 2007 Optical Society of America

Full Article  |  PDF Article
OSA Recommended Articles
Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system

Claude Montcalm, R. Frederick Grabner, Russell M. Hudyma, Mark A. Schmidt, Eberhard Spiller, Christopher C. Walton, Marco Wedowski, and James A. Folta
Appl. Opt. 41(16) 3262-3269 (2002)

Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography

Yucong Zhu, Katsumi Sugisaki, Masashi Okada, Katsura Otaki, Zhiqiang Liu, Jun Kawakami, Mikihiko Ishii, Jun Saito, Katsuhiko Murakami, Masanobu Hasegawa, Chidane Ouchi, Seima Kato, Takayuki Hasegawa, Akiyoshi Suzuki, Hideo Yokota, and Masahito Niibe
Appl. Opt. 46(27) 6783-6792 (2007)

Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography

Paul B. Mirkarimi, Sasa Bajt, and Mark A. Wall
Appl. Opt. 39(10) 1617-1625 (2000)

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Figures (8)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Tables (6)

You do not have subscription access to this journal. Article tables are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Equations (1)

You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Metrics

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription