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Ellipsometry of reflected and scattered fields for the analysis of substrate optical quality

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Abstract

Specular ellipsometry is a well-known and efficient technique to characterize surfaces and coatings. This technique has been extended to the measurement of scattered light. We present an experimental setup, using a polarization modulator, which permits us to characterize transition layers and roughness without a calibration procedure. Experimental results are presented concerning transition layers for damage threshold applications and for rough surfaces or bulks.

© 2006 Optical Society of America

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