Abstract

The optical and microstructural properties of filters composed of TiO2  and  SiO2 multilayers deposited by different ion-assisted-deposition (IAD) parameters were investigated. The proper IAD coating conditions for mass-produced, environmentally stable, low-scattering, and low-absorption TiO2/SiO2 multilayers were obtained after comparison of these filters.

© 2006 Optical Society of America

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References

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  1. H. K. Pulker, G. Paesold, and E. Ritter, 'Refractive indices of TiO2 films produced by reactive evaporation of various titanium-oxygen phases,' Appl. Opt. 15, 2986-2991 (1976).
    [Crossref] [PubMed]
  2. P. J. Martin, H. A. Macleod, R. P. Netterfield, C. G. Pacey, and W. G. Sainty, 'Ion-beam-assisted deposition of thin films,' Appl. Opt. 22, 178-184 (1983).
    [Crossref] [PubMed]
  3. H. Niederward, S. Laux, M. Kennedy, U. Schallenberg, A. Duparre, M. Mertin, N. Kaiser, and D. Ristau, 'Ion-assisted deposition of oxide materials at room temperature by use of different ion sources' Appl. Opt. 38, 3610-3613 (1999).
    [Crossref]
  4. M. Commandre and E. Pelletier, 'Measurements of absorption losses in TiO2 film by a collinear photothermal deflection technique,' Appl. Opt. 29, 4276-4283 (1990).
    [Crossref] [PubMed]
  5. J. R. McNeil, G. A. Al-Jumaily, K. C. Jungling, and A. C. Barron, 'Properties of TiO2 and SiO2 thin films deposited using ion assisted deposition,' Appl. Opt. 24, 486-4489 (1985).
    [Crossref] [PubMed]
  6. J. R. McNeil, A. C. Barron, S. R. Wilson, and W. C. Herrmann, Jr., 'Ion-assisted deposition of optical thin films: low energy vs. high energy bombardment,' Appl. Opt. 23, 552-559 (1984).
    [Crossref] [PubMed]
  7. N. Albertineitti and H. T. Minden, 'Granularity in ion-beam-sputtered TiO2 films,' Appl. Opt. 35, 5620-5625 (1996).
    [Crossref]
  8. Q. Tang, K. Kikuchi, S. Ogura, and A. Macleod, 'Mechanism of columnar microstructure growth in titanium oxide thin films deposited by ion-beam assisted deposition,' J. Vac. Sci. Technol. A 17, 3379-3384 (1999).
    [Crossref]

1999 (2)

H. Niederward, S. Laux, M. Kennedy, U. Schallenberg, A. Duparre, M. Mertin, N. Kaiser, and D. Ristau, 'Ion-assisted deposition of oxide materials at room temperature by use of different ion sources' Appl. Opt. 38, 3610-3613 (1999).
[Crossref]

Q. Tang, K. Kikuchi, S. Ogura, and A. Macleod, 'Mechanism of columnar microstructure growth in titanium oxide thin films deposited by ion-beam assisted deposition,' J. Vac. Sci. Technol. A 17, 3379-3384 (1999).
[Crossref]

1996 (1)

1990 (1)

1985 (1)

1984 (1)

1983 (1)

1976 (1)

Albertineitti, N.

Al-Jumaily, G. A.

Barron, A. C.

Commandre, M.

Duparre, A.

Herrmann, W. C.

Jungling, K. C.

Kaiser, N.

Kennedy, M.

Kikuchi, K.

Q. Tang, K. Kikuchi, S. Ogura, and A. Macleod, 'Mechanism of columnar microstructure growth in titanium oxide thin films deposited by ion-beam assisted deposition,' J. Vac. Sci. Technol. A 17, 3379-3384 (1999).
[Crossref]

Laux, S.

Macleod, A.

Q. Tang, K. Kikuchi, S. Ogura, and A. Macleod, 'Mechanism of columnar microstructure growth in titanium oxide thin films deposited by ion-beam assisted deposition,' J. Vac. Sci. Technol. A 17, 3379-3384 (1999).
[Crossref]

Macleod, H. A.

Martin, P. J.

McNeil, J. R.

Mertin, M.

Minden, H. T.

Netterfield, R. P.

Niederward, H.

Ogura, S.

Q. Tang, K. Kikuchi, S. Ogura, and A. Macleod, 'Mechanism of columnar microstructure growth in titanium oxide thin films deposited by ion-beam assisted deposition,' J. Vac. Sci. Technol. A 17, 3379-3384 (1999).
[Crossref]

Pacey, C. G.

Paesold, G.

Pelletier, E.

Pulker, H. K.

Ristau, D.

Ritter, E.

Sainty, W. G.

Schallenberg, U.

Tang, Q.

Q. Tang, K. Kikuchi, S. Ogura, and A. Macleod, 'Mechanism of columnar microstructure growth in titanium oxide thin films deposited by ion-beam assisted deposition,' J. Vac. Sci. Technol. A 17, 3379-3384 (1999).
[Crossref]

Wilson, S. R.

Appl. Opt. (7)

J. Vac. Sci. Technol. A (1)

Q. Tang, K. Kikuchi, S. Ogura, and A. Macleod, 'Mechanism of columnar microstructure growth in titanium oxide thin films deposited by ion-beam assisted deposition,' J. Vac. Sci. Technol. A 17, 3379-3384 (1999).
[Crossref]

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Figures (6)

Fig. 1
Fig. 1

Schematic of OTFC-1300DBI coating system. EB, electron beam.

Fig. 2
Fig. 2

Refractive indices of TiO2 film at 550 nm deposited at different ion energies.

Fig. 3
Fig. 3

Optical-transmittance spectra of TiO2 film deposited at different ion energies.

Fig. 4
Fig. 4

(a) Cross section of TiO2∕SiO2 multilayers and (b) bird's-eye view of TiO2∕SiO2 multilayers.

Fig. 5
Fig. 5

(a) Cross section of TiO2∕SiO2 multilayers and (b) bird's-eye view of TiO2∕SiO2 multilayers.

Fig. 6
Fig. 6

Comparison of 42 layer IR-cut filters deposited by TiO2∕SiO2 under different conditions (without antireflective coating on back side).

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