Abstract

An experimental setup, based on the laser-induced deflection technique, is developed to measure simultaneously the 244 nm laser absorption, scattering, and luminescence on optical components. The different techniques and methods that have been specifically developed to obtain both high resolution (micronic) and sensitivity (a few 107 of the incident power for the absorption, 108 for scattering and fluorescence) are presented. Different applications are then explored: the study of losses in deep UV multilayer coatings (HfO2/SiO2 mirrors) and the analysis of contamination defects on bare substrate and structural defects in optical coatings.

© 2006 Optical Society of America

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