Abstract

Single layer magnesium fluoride (MgF2) was deposited on fused-silica substrates by a molybdenum boat evaporation process at 193nm. The formation of various microstructures in relation to the different substrate temperatures and deposition rates were investigated. The relation between these microstructures (including cross-sectional morphology, surface roughness, and crystalline structures), the optical properties (including refractive index and optical loss) and stress, were all investigated. It was found that the laser-induced damage threshold (LIDT) would be affected by the microstructure, optical loss, and stress of the thin film. To obtain a larger LIDT value and better optical characteristics, MgF2 films should be deposited at a high substrate temperature (300°C) and at a low deposition rate (0.05nms-1).

© 2006 Optical Society of America

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