Abstract

Bar-code patterns were produced upon gold-coated glass spheres 8 mm in diameter with a novel projection photolithography exposure system that included a computer-controlled rotation stage-and-shutter arrangement. The patterns extended in an equatorial band about the entire 360° periphery of the sphere. To obtain uniform thickness of the photoresist layer, we dip coated the spheres and removed the excess with an absorption pad. The widths of the bars in the pattern were in the range 21.85 ± 0.6 μm at the equator, and the relative error in the angular position of the pattern features was less than 0.025°. The patterned spheres are suitable for use in optically interrogated flying spot magnetic heading sensors.

© 2005 Optical Society of America

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  1. R. C. Jaeger, Introduction to Microelectronic Fabrication, 2nd ed. (Prentice-Hall, Upper Saddle River, N.J., 2002).
  2. K. E. Paul, M. Prentiss, G. M. Whitesides, “Patterning spherical surfaces at the two-hundred-nanometer scale using soft lithography,” Adv. Funct. Mater. 13, 259–263 (2003).
    [CrossRef]
  3. http://www.ballsemi.com . This website illustrates an alternative method for producing photolithographic patterns on curved surfaces.

2003 (1)

K. E. Paul, M. Prentiss, G. M. Whitesides, “Patterning spherical surfaces at the two-hundred-nanometer scale using soft lithography,” Adv. Funct. Mater. 13, 259–263 (2003).
[CrossRef]

Jaeger, R. C.

R. C. Jaeger, Introduction to Microelectronic Fabrication, 2nd ed. (Prentice-Hall, Upper Saddle River, N.J., 2002).

Paul, K. E.

K. E. Paul, M. Prentiss, G. M. Whitesides, “Patterning spherical surfaces at the two-hundred-nanometer scale using soft lithography,” Adv. Funct. Mater. 13, 259–263 (2003).
[CrossRef]

Prentiss, M.

K. E. Paul, M. Prentiss, G. M. Whitesides, “Patterning spherical surfaces at the two-hundred-nanometer scale using soft lithography,” Adv. Funct. Mater. 13, 259–263 (2003).
[CrossRef]

Whitesides, G. M.

K. E. Paul, M. Prentiss, G. M. Whitesides, “Patterning spherical surfaces at the two-hundred-nanometer scale using soft lithography,” Adv. Funct. Mater. 13, 259–263 (2003).
[CrossRef]

Adv. Funct. Mater. (1)

K. E. Paul, M. Prentiss, G. M. Whitesides, “Patterning spherical surfaces at the two-hundred-nanometer scale using soft lithography,” Adv. Funct. Mater. 13, 259–263 (2003).
[CrossRef]

Other (2)

http://www.ballsemi.com . This website illustrates an alternative method for producing photolithographic patterns on curved surfaces.

R. C. Jaeger, Introduction to Microelectronic Fabrication, 2nd ed. (Prentice-Hall, Upper Saddle River, N.J., 2002).

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