Abstract

We study theoretically and experimentally the increase of normal incidence reflectivity generated by addition of a third material in the period of a standard periodic multilayer, for wavelengths in the range 20 to 40 nm. The nature and thickness of the three materials has been optimized to provide the best enhancement of reflectivity. Theoretical reflectivity of an optimized B4C/Mo/Si multilayer reaches 42% at 32 nm. B4C/Mo/Si multilayers have been deposited with a magnetron sputtering system and a reflectivity of 34% at 32 nm has been measured on a synchrotron radiation source.

© 2005 Optical Society of America

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    [CrossRef]
  2. C. K. Carniglia, J. H. Apfel, “Maximum reflectance of multilayer dielectric mirrors in the presence of slight absorption,” J. Opt. Soc. Am. 70, 523–534 (1980).
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  5. J. I. Larruquert, “New layer-by-layer multilayer design method,” Opt. Soc. Am. A 19, 385–390 (2002).
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  7. P. Boher, L. Hennet, Ph. Houdy, “Three materials soft x-ray mirrors: theory and application,” in Advanced X-Ray/EUV Radiation Sources and Applications, J. P. Knaueur, G. K. Shenoy, eds., Proc. SPIE1345, 198–212 (1990).
    [CrossRef]
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    [CrossRef]
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    [CrossRef]
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    [CrossRef]
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    [CrossRef]
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2003 (1)

F. Delmotte, M. F. Ravet, F. Bridou, X. Song, A. Jerome, S. Boujdayane, S. Hubert, P. Zeitoun, M. Idir, P. Troussel, “Depot et calibration de multicouches pour l’optique XUV dans la gamme 10–30 nm,” J. Phys. IV France 108, 255–258 (2003).
[CrossRef]

2002 (2)

J. I. Larruquert, “New layer-by-layer multilayer design method,” Opt. Soc. Am. A 19, 385–390 (2002).
[CrossRef]

J. I. Larruquert, “Reflectance enhancement in the extreme ultraviolet and soft x rays by means of multilayers with more than two materials,” Opt. Soc. Am. A 19, 391–397 (2002).
[CrossRef]

2001 (1)

J. I. Larruquert, “Reflectance enhancement with sub-quarterwave multilayers of highly absorbing materials,” Opt. Soc. Am. A 18, 1406–1414 (2001).
[CrossRef]

2000 (1)

1998 (1)

1997 (1)

1993 (1)

B. L. Henke, E. M. Gullikson, J. C. Davis, “X-ray interactions: photoabsorption, scattering, and reflection at E= 50–30000 eV, Z= 1–92,” At. Data Nucl. Data Tables 54, 181–342 (1993).
[CrossRef]

1991 (1)

P. Boher, Ph. Houdy, L. Hennet, P. Müller, Z. G. Li, D. J. Smith, “Silicon/silicon oxide and silicon/silicon nitride multilayers for extreme ultraviolet optical applications,” Opt. Eng. 30, 1049–1060 (1991).
[CrossRef]

1990 (1)

F. Bridou, B. Pardo, “Automatic characterization of layers stacks from reflectivity measurments. Application to the study of the validity conditions of the grazing X-rays reflectometry,” J. Optics (Paris) 21, 183–191 (1990).
[CrossRef]

1980 (1)

Apfel, J. H.

Bajt, S.

C. Montcalm, S. Bajt, P. B. Mirkarimi, E. Spiller, F. J. Weber, J. A. Folta, “Multilayer reflective coatings for extreme-ultraviolet lithography,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE3331, 42–50 (1998).
[CrossRef]

Boher, P.

P. Boher, Ph. Houdy, L. Hennet, P. Müller, Z. G. Li, D. J. Smith, “Silicon/silicon oxide and silicon/silicon nitride multilayers for extreme ultraviolet optical applications,” Opt. Eng. 30, 1049–1060 (1991).
[CrossRef]

P. Boher, L. Hennet, Ph. Houdy, “Three materials soft x-ray mirrors: theory and application,” in Advanced X-Ray/EUV Radiation Sources and Applications, J. P. Knaueur, G. K. Shenoy, eds., Proc. SPIE1345, 198–212 (1990).
[CrossRef]

Bougnet, M.

M. F. Ravet, F. Bridou, X. Zhang-Song, A. Jerome, F. Delmotte, R. Mercier, M. Bougnet, P. Bouyries, J. P. Delaboudiniere, “Ion beam deposited Mo/Si multilayers for EUV imaging applications in astrophysics,” in Advances in Optical Thin Films, C. Amra, N. Kaiser, H. Macleod, eds., Proc. SPIE5250, 99–108 (2004).
[CrossRef]

Boujdayane, S.

F. Delmotte, M. F. Ravet, F. Bridou, X. Song, A. Jerome, S. Boujdayane, S. Hubert, P. Zeitoun, M. Idir, P. Troussel, “Depot et calibration de multicouches pour l’optique XUV dans la gamme 10–30 nm,” J. Phys. IV France 108, 255–258 (2003).
[CrossRef]

Bouyries, P.

M. F. Ravet, F. Bridou, X. Zhang-Song, A. Jerome, F. Delmotte, R. Mercier, M. Bougnet, P. Bouyries, J. P. Delaboudiniere, “Ion beam deposited Mo/Si multilayers for EUV imaging applications in astrophysics,” in Advances in Optical Thin Films, C. Amra, N. Kaiser, H. Macleod, eds., Proc. SPIE5250, 99–108 (2004).
[CrossRef]

Braat, J. J. M.

Bridou, F.

F. Delmotte, M. F. Ravet, F. Bridou, X. Song, A. Jerome, S. Boujdayane, S. Hubert, P. Zeitoun, M. Idir, P. Troussel, “Depot et calibration de multicouches pour l’optique XUV dans la gamme 10–30 nm,” J. Phys. IV France 108, 255–258 (2003).
[CrossRef]

F. Bridou, B. Pardo, “Automatic characterization of layers stacks from reflectivity measurments. Application to the study of the validity conditions of the grazing X-rays reflectometry,” J. Optics (Paris) 21, 183–191 (1990).
[CrossRef]

M. F. Ravet, F. Bridou, X. Zhang-Song, A. Jerome, F. Delmotte, R. Mercier, M. Bougnet, P. Bouyries, J. P. Delaboudiniere, “Ion beam deposited Mo/Si multilayers for EUV imaging applications in astrophysics,” in Advances in Optical Thin Films, C. Amra, N. Kaiser, H. Macleod, eds., Proc. SPIE5250, 99–108 (2004).
[CrossRef]

Carniglia, C. K.

Davis, J. C.

B. L. Henke, E. M. Gullikson, J. C. Davis, “X-ray interactions: photoabsorption, scattering, and reflection at E= 50–30000 eV, Z= 1–92,” At. Data Nucl. Data Tables 54, 181–342 (1993).
[CrossRef]

Delaboudiniere, J. P.

M. F. Ravet, F. Bridou, X. Zhang-Song, A. Jerome, F. Delmotte, R. Mercier, M. Bougnet, P. Bouyries, J. P. Delaboudiniere, “Ion beam deposited Mo/Si multilayers for EUV imaging applications in astrophysics,” in Advances in Optical Thin Films, C. Amra, N. Kaiser, H. Macleod, eds., Proc. SPIE5250, 99–108 (2004).
[CrossRef]

Delmotte, F.

F. Delmotte, M. F. Ravet, F. Bridou, X. Song, A. Jerome, S. Boujdayane, S. Hubert, P. Zeitoun, M. Idir, P. Troussel, “Depot et calibration de multicouches pour l’optique XUV dans la gamme 10–30 nm,” J. Phys. IV France 108, 255–258 (2003).
[CrossRef]

M. F. Ravet, F. Bridou, X. Zhang-Song, A. Jerome, F. Delmotte, R. Mercier, M. Bougnet, P. Bouyries, J. P. Delaboudiniere, “Ion beam deposited Mo/Si multilayers for EUV imaging applications in astrophysics,” in Advances in Optical Thin Films, C. Amra, N. Kaiser, H. Macleod, eds., Proc. SPIE5250, 99–108 (2004).
[CrossRef]

DeLuca, E.

D. L. Windt, S. Donguy, J. Seely, B. Kjornrattanawanich, E. Mgullikson, C. C. Wlton, L. Golub, E. DeLuca, “EUV multilayers for solar physics,” in Optics for EUV, X-Ray, and Gamma-Ray Astronomy, O. Citterio, S. L. O’Dell, eds., Proc. SPIE5168, 1–11 (2004).
[CrossRef]

Donguy, S.

D. L. Windt, S. Donguy, J. Seely, B. Kjornrattanawanich, E. Mgullikson, C. C. Wlton, L. Golub, E. DeLuca, “EUV multilayers for solar physics,” in Optics for EUV, X-Ray, and Gamma-Ray Astronomy, O. Citterio, S. L. O’Dell, eds., Proc. SPIE5168, 1–11 (2004).
[CrossRef]

Folta, J. A.

C. Montcalm, S. Bajt, P. B. Mirkarimi, E. Spiller, F. J. Weber, J. A. Folta, “Multilayer reflective coatings for extreme-ultraviolet lithography,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE3331, 42–50 (1998).
[CrossRef]

Golub, L.

D. L. Windt, S. Donguy, J. Seely, B. Kjornrattanawanich, E. Mgullikson, C. C. Wlton, L. Golub, E. DeLuca, “EUV multilayers for solar physics,” in Optics for EUV, X-Ray, and Gamma-Ray Astronomy, O. Citterio, S. L. O’Dell, eds., Proc. SPIE5168, 1–11 (2004).
[CrossRef]

Gullikson, E. M.

Henke, B. L.

B. L. Henke, E. M. Gullikson, J. C. Davis, “X-ray interactions: photoabsorption, scattering, and reflection at E= 50–30000 eV, Z= 1–92,” At. Data Nucl. Data Tables 54, 181–342 (1993).
[CrossRef]

Hennet, L.

P. Boher, Ph. Houdy, L. Hennet, P. Müller, Z. G. Li, D. J. Smith, “Silicon/silicon oxide and silicon/silicon nitride multilayers for extreme ultraviolet optical applications,” Opt. Eng. 30, 1049–1060 (1991).
[CrossRef]

P. Boher, L. Hennet, Ph. Houdy, “Three materials soft x-ray mirrors: theory and application,” in Advanced X-Ray/EUV Radiation Sources and Applications, J. P. Knaueur, G. K. Shenoy, eds., Proc. SPIE1345, 198–212 (1990).
[CrossRef]

Houdy, Ph.

P. Boher, Ph. Houdy, L. Hennet, P. Müller, Z. G. Li, D. J. Smith, “Silicon/silicon oxide and silicon/silicon nitride multilayers for extreme ultraviolet optical applications,” Opt. Eng. 30, 1049–1060 (1991).
[CrossRef]

P. Boher, L. Hennet, Ph. Houdy, “Three materials soft x-ray mirrors: theory and application,” in Advanced X-Ray/EUV Radiation Sources and Applications, J. P. Knaueur, G. K. Shenoy, eds., Proc. SPIE1345, 198–212 (1990).
[CrossRef]

Hubert, S.

F. Delmotte, M. F. Ravet, F. Bridou, X. Song, A. Jerome, S. Boujdayane, S. Hubert, P. Zeitoun, M. Idir, P. Troussel, “Depot et calibration de multicouches pour l’optique XUV dans la gamme 10–30 nm,” J. Phys. IV France 108, 255–258 (2003).
[CrossRef]

Idir, M.

F. Delmotte, M. F. Ravet, F. Bridou, X. Song, A. Jerome, S. Boujdayane, S. Hubert, P. Zeitoun, M. Idir, P. Troussel, “Depot et calibration de multicouches pour l’optique XUV dans la gamme 10–30 nm,” J. Phys. IV France 108, 255–258 (2003).
[CrossRef]

Jerome, A.

F. Delmotte, M. F. Ravet, F. Bridou, X. Song, A. Jerome, S. Boujdayane, S. Hubert, P. Zeitoun, M. Idir, P. Troussel, “Depot et calibration de multicouches pour l’optique XUV dans la gamme 10–30 nm,” J. Phys. IV France 108, 255–258 (2003).
[CrossRef]

M. F. Ravet, F. Bridou, X. Zhang-Song, A. Jerome, F. Delmotte, R. Mercier, M. Bougnet, P. Bouyries, J. P. Delaboudiniere, “Ion beam deposited Mo/Si multilayers for EUV imaging applications in astrophysics,” in Advances in Optical Thin Films, C. Amra, N. Kaiser, H. Macleod, eds., Proc. SPIE5250, 99–108 (2004).
[CrossRef]

Kjornrattanawanich, B.

D. L. Windt, S. Donguy, J. Seely, B. Kjornrattanawanich, E. Mgullikson, C. C. Wlton, L. Golub, E. DeLuca, “EUV multilayers for solar physics,” in Optics for EUV, X-Ray, and Gamma-Ray Astronomy, O. Citterio, S. L. O’Dell, eds., Proc. SPIE5168, 1–11 (2004).
[CrossRef]

Larruquert, J. I.

J. I. Larruquert, “New layer-by-layer multilayer design method,” Opt. Soc. Am. A 19, 385–390 (2002).
[CrossRef]

J. I. Larruquert, “Reflectance enhancement in the extreme ultraviolet and soft x rays by means of multilayers with more than two materials,” Opt. Soc. Am. A 19, 391–397 (2002).
[CrossRef]

J. I. Larruquert, “Reflectance enhancement with sub-quarterwave multilayers of highly absorbing materials,” Opt. Soc. Am. A 18, 1406–1414 (2001).
[CrossRef]

Li, Z. G.

P. Boher, Ph. Houdy, L. Hennet, P. Müller, Z. G. Li, D. J. Smith, “Silicon/silicon oxide and silicon/silicon nitride multilayers for extreme ultraviolet optical applications,” Opt. Eng. 30, 1049–1060 (1991).
[CrossRef]

Mercier, R.

M. F. Ravet, F. Bridou, X. Zhang-Song, A. Jerome, F. Delmotte, R. Mercier, M. Bougnet, P. Bouyries, J. P. Delaboudiniere, “Ion beam deposited Mo/Si multilayers for EUV imaging applications in astrophysics,” in Advances in Optical Thin Films, C. Amra, N. Kaiser, H. Macleod, eds., Proc. SPIE5250, 99–108 (2004).
[CrossRef]

Mgullikson, E.

D. L. Windt, S. Donguy, J. Seely, B. Kjornrattanawanich, E. Mgullikson, C. C. Wlton, L. Golub, E. DeLuca, “EUV multilayers for solar physics,” in Optics for EUV, X-Ray, and Gamma-Ray Astronomy, O. Citterio, S. L. O’Dell, eds., Proc. SPIE5168, 1–11 (2004).
[CrossRef]

Mirkarimi, P. B.

C. Montcalm, S. Bajt, P. B. Mirkarimi, E. Spiller, F. J. Weber, J. A. Folta, “Multilayer reflective coatings for extreme-ultraviolet lithography,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE3331, 42–50 (1998).
[CrossRef]

Montcalm, C.

C. Montcalm, S. Bajt, P. B. Mirkarimi, E. Spiller, F. J. Weber, J. A. Folta, “Multilayer reflective coatings for extreme-ultraviolet lithography,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE3331, 42–50 (1998).
[CrossRef]

Müller, P.

P. Boher, Ph. Houdy, L. Hennet, P. Müller, Z. G. Li, D. J. Smith, “Silicon/silicon oxide and silicon/silicon nitride multilayers for extreme ultraviolet optical applications,” Opt. Eng. 30, 1049–1060 (1991).
[CrossRef]

Pardo, B.

F. Bridou, B. Pardo, “Automatic characterization of layers stacks from reflectivity measurments. Application to the study of the validity conditions of the grazing X-rays reflectometry,” J. Optics (Paris) 21, 183–191 (1990).
[CrossRef]

Ravet, M. F.

F. Delmotte, M. F. Ravet, F. Bridou, X. Song, A. Jerome, S. Boujdayane, S. Hubert, P. Zeitoun, M. Idir, P. Troussel, “Depot et calibration de multicouches pour l’optique XUV dans la gamme 10–30 nm,” J. Phys. IV France 108, 255–258 (2003).
[CrossRef]

M. F. Ravet, F. Bridou, X. Zhang-Song, A. Jerome, F. Delmotte, R. Mercier, M. Bougnet, P. Bouyries, J. P. Delaboudiniere, “Ion beam deposited Mo/Si multilayers for EUV imaging applications in astrophysics,” in Advances in Optical Thin Films, C. Amra, N. Kaiser, H. Macleod, eds., Proc. SPIE5250, 99–108 (2004).
[CrossRef]

Seely, J.

D. L. Windt, S. Donguy, J. Seely, B. Kjornrattanawanich, E. Mgullikson, C. C. Wlton, L. Golub, E. DeLuca, “EUV multilayers for solar physics,” in Optics for EUV, X-Ray, and Gamma-Ray Astronomy, O. Citterio, S. L. O’Dell, eds., Proc. SPIE5168, 1–11 (2004).
[CrossRef]

Singh, M.

Smith, D. J.

P. Boher, Ph. Houdy, L. Hennet, P. Müller, Z. G. Li, D. J. Smith, “Silicon/silicon oxide and silicon/silicon nitride multilayers for extreme ultraviolet optical applications,” Opt. Eng. 30, 1049–1060 (1991).
[CrossRef]

Song, X.

F. Delmotte, M. F. Ravet, F. Bridou, X. Song, A. Jerome, S. Boujdayane, S. Hubert, P. Zeitoun, M. Idir, P. Troussel, “Depot et calibration de multicouches pour l’optique XUV dans la gamme 10–30 nm,” J. Phys. IV France 108, 255–258 (2003).
[CrossRef]

Soufli, R.

Spiller, E.

C. Montcalm, S. Bajt, P. B. Mirkarimi, E. Spiller, F. J. Weber, J. A. Folta, “Multilayer reflective coatings for extreme-ultraviolet lithography,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE3331, 42–50 (1998).
[CrossRef]

E. Spiller, Soft X-Ray Optics (SPIE, Bellingham, Wash., 1994).
[CrossRef]

Troussel, P.

F. Delmotte, M. F. Ravet, F. Bridou, X. Song, A. Jerome, S. Boujdayane, S. Hubert, P. Zeitoun, M. Idir, P. Troussel, “Depot et calibration de multicouches pour l’optique XUV dans la gamme 10–30 nm,” J. Phys. IV France 108, 255–258 (2003).
[CrossRef]

Weber, F. J.

C. Montcalm, S. Bajt, P. B. Mirkarimi, E. Spiller, F. J. Weber, J. A. Folta, “Multilayer reflective coatings for extreme-ultraviolet lithography,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE3331, 42–50 (1998).
[CrossRef]

Windt, D. L.

D. L. Windt, S. Donguy, J. Seely, B. Kjornrattanawanich, E. Mgullikson, C. C. Wlton, L. Golub, E. DeLuca, “EUV multilayers for solar physics,” in Optics for EUV, X-Ray, and Gamma-Ray Astronomy, O. Citterio, S. L. O’Dell, eds., Proc. SPIE5168, 1–11 (2004).
[CrossRef]

Wlton, C. C.

D. L. Windt, S. Donguy, J. Seely, B. Kjornrattanawanich, E. Mgullikson, C. C. Wlton, L. Golub, E. DeLuca, “EUV multilayers for solar physics,” in Optics for EUV, X-Ray, and Gamma-Ray Astronomy, O. Citterio, S. L. O’Dell, eds., Proc. SPIE5168, 1–11 (2004).
[CrossRef]

Zeitoun, P.

F. Delmotte, M. F. Ravet, F. Bridou, X. Song, A. Jerome, S. Boujdayane, S. Hubert, P. Zeitoun, M. Idir, P. Troussel, “Depot et calibration de multicouches pour l’optique XUV dans la gamme 10–30 nm,” J. Phys. IV France 108, 255–258 (2003).
[CrossRef]

Zhang-Song, X.

M. F. Ravet, F. Bridou, X. Zhang-Song, A. Jerome, F. Delmotte, R. Mercier, M. Bougnet, P. Bouyries, J. P. Delaboudiniere, “Ion beam deposited Mo/Si multilayers for EUV imaging applications in astrophysics,” in Advances in Optical Thin Films, C. Amra, N. Kaiser, H. Macleod, eds., Proc. SPIE5250, 99–108 (2004).
[CrossRef]

Appl. Opt. (3)

At. Data Nucl. Data Tables (1)

B. L. Henke, E. M. Gullikson, J. C. Davis, “X-ray interactions: photoabsorption, scattering, and reflection at E= 50–30000 eV, Z= 1–92,” At. Data Nucl. Data Tables 54, 181–342 (1993).
[CrossRef]

J. Opt. Soc. Am. (1)

J. Optics (Paris) (1)

F. Bridou, B. Pardo, “Automatic characterization of layers stacks from reflectivity measurments. Application to the study of the validity conditions of the grazing X-rays reflectometry,” J. Optics (Paris) 21, 183–191 (1990).
[CrossRef]

J. Phys. IV France (1)

F. Delmotte, M. F. Ravet, F. Bridou, X. Song, A. Jerome, S. Boujdayane, S. Hubert, P. Zeitoun, M. Idir, P. Troussel, “Depot et calibration de multicouches pour l’optique XUV dans la gamme 10–30 nm,” J. Phys. IV France 108, 255–258 (2003).
[CrossRef]

Opt. Eng. (1)

P. Boher, Ph. Houdy, L. Hennet, P. Müller, Z. G. Li, D. J. Smith, “Silicon/silicon oxide and silicon/silicon nitride multilayers for extreme ultraviolet optical applications,” Opt. Eng. 30, 1049–1060 (1991).
[CrossRef]

Opt. Soc. Am. A (3)

J. I. Larruquert, “Reflectance enhancement with sub-quarterwave multilayers of highly absorbing materials,” Opt. Soc. Am. A 18, 1406–1414 (2001).
[CrossRef]

J. I. Larruquert, “New layer-by-layer multilayer design method,” Opt. Soc. Am. A 19, 385–390 (2002).
[CrossRef]

J. I. Larruquert, “Reflectance enhancement in the extreme ultraviolet and soft x rays by means of multilayers with more than two materials,” Opt. Soc. Am. A 19, 391–397 (2002).
[CrossRef]

Other (7)

P. Boher, L. Hennet, Ph. Houdy, “Three materials soft x-ray mirrors: theory and application,” in Advanced X-Ray/EUV Radiation Sources and Applications, J. P. Knaueur, G. K. Shenoy, eds., Proc. SPIE1345, 198–212 (1990).
[CrossRef]

M. F. Ravet, F. Bridou, X. Zhang-Song, A. Jerome, F. Delmotte, R. Mercier, M. Bougnet, P. Bouyries, J. P. Delaboudiniere, “Ion beam deposited Mo/Si multilayers for EUV imaging applications in astrophysics,” in Advances in Optical Thin Films, C. Amra, N. Kaiser, H. Macleod, eds., Proc. SPIE5250, 99–108 (2004).
[CrossRef]

D. L. Windt, S. Donguy, J. Seely, B. Kjornrattanawanich, E. Mgullikson, C. C. Wlton, L. Golub, E. DeLuca, “EUV multilayers for solar physics,” in Optics for EUV, X-Ray, and Gamma-Ray Astronomy, O. Citterio, S. L. O’Dell, eds., Proc. SPIE5168, 1–11 (2004).
[CrossRef]

E. Spiller, Soft X-Ray Optics (SPIE, Bellingham, Wash., 1994).
[CrossRef]

IMD software developed by David Windt, see http://cletus.phys.columbia.edu/~win .

C. Montcalm, S. Bajt, P. B. Mirkarimi, E. Spiller, F. J. Weber, J. A. Folta, “Multilayer reflective coatings for extreme-ultraviolet lithography,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE3331, 42–50 (1998).
[CrossRef]

F. Borgatti, A. De Luisa, B. Doyle, A. Giglia, N. Mahne, I. Pasquali, M. Pedio, G. Selvaggi, S. Nannarone, G. Naletto, M. G. Pelizzo, G. Tondello, “The new Bear beamline: a short presentation,” elettra news47(2003), see http://www.elettra.trieste.it/science/elettranews/volume47/en117.html .

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Figures (7)

Fig. 1
Fig. 1

Optical constants of B4C, Mo, a-Si, and Si3N4 at 32 nm plotted in the complex index plane.

Fig. 2
Fig. 2

Calculated reflectivity spectra of an optimized B4C/Si multilayer (continus curve), an optimized B4C/Mo/Si multilayer (dashed curve), and a multilayer made of the same stack in reverse order (Si/Mo/B4C) (dotted curve) at the incidence angle of 0°.

Fig. 3
Fig. 3

Peak reflectance versus wavelength for Mo/Si (circles), B4C/Si (triangles), and B4C/Mo/Si (squares) optimized multilayers. For each wavelength, the design has been optimized with our program.

Fig. 4
Fig. 4

(a) Optimized reflectance of B4C/Mo/Si multilayer (squares) and B4C/Si multilayer (triangles) versus number of periods in the stack. (b) Optimized thicknesses of Mo (crosses), B4C (circles), and Si (rhombuses) corresponding to B4C/Mo/Si reflectance shown in (a) versus number of periods.

Fig. 5
Fig. 5

Schematic of the magnetron sputtering deposition chamber: (a) top view and (b) side view.

Fig. 6
Fig. 6

Grazing-angle reflectometry at 0.154 nm of a B4C/Mo/Si5 multilayer: experimental data (dots) and fitted curve (solid curve).

Fig. 7
Fig. 7

Measured and calculated reflectivities of a B4C/Mo/Si three-component multilayer at 10 deg in S polarization. Parameters of the simulated curve are given in the text.

Tables (5)

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Table 1 Optical Constant at 32 nm and Density of a B4C, Mo, Si, Si3N4a

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Table 2 Reflectivity (R) at 32 nm and Layer Thicknesses of Three-Component Multilayers Made of B4C, Mo, and Si

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Table 3 Reflectivity (R) and Optimized Thicknesses for Three-Component Multilayers and Standard Multilayers

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Table 4 Effective Deposition Rates of Si, B4C, and Mo Layers

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Table 5 B4C/Mo/Si Multilayer Parameters Deduced from x-Ray Grazing-Angle Reflectometry Measurement

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