Abstract

A turning mirror is a key component in compact optical waveguide devices and high-density integrated optics. An improved two-step method for fabrication of high-quality, compact turning mirrors in silicon-on-insulator materials is proposed. First, inductively coupled plasma etching is applied to produce the turning mirror, which keeps the turning mirror compact; then silicon wet anisotropic etching is applied to enhance the quality of the turning mirror by of its polishing surface, correcting its orientation, and improving the verticality. The shape of the turning mirror fabricated by the two-step method is hexagonal or octagonal, matching the optical field of the rib waveguide well. A large effective mirror size to reflect light waves and reduced shrinkage of the mirror size during etching guarantee that a mirror produced by this two-step method will be more compact than previously designed mirrors.

© 2005 Optical Society of America

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