Abstract

A reflective optical modulator based on acousto-optic modulation of light by a mirror corrugated with surface acoustic waves is presented. Modulation of optical amplitude, frequency, and phase is demonstrated at visible (633- and 488-nm) and deep UV (244-nm) wavelengths. The reflective modulator has eight channels and achieves a maximum first-order diffraction efficiency of 6.0%.

© 2004 Optical Society of America

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    [CrossRef]
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  26. J. B. Green, G. S. Kino, B. T. Khuri-Yakub, “Focused surface wave transducers on anisotropic substrates: a theory developed for the waveguided storage correlator,” in 1980 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 1980), pp. 69–73.
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2003 (1)

W. A. Barletta, H. Winick, “Introduction to special section on future light sources,” Nucl. Instrum. Methods Phys. Res. A 500, 1–10 (2003).
[CrossRef]

2002 (4)

W. Meyer-Ilse, D. Hamamoto, A. Nair, S. A. Lelièvre, G. Denbeaux, L. Johnson, A. L. Pearson, D. Yager, M. A. Legros, C. A. Larabell, “High resolution protein localization using soft x-ray microscopy,” J. Microsc. 201, 395–403 (2002).
[CrossRef]

D. Gil, R. Menon, X. Tang, H. I. Smith, D. J. D. Carter, “Parallel maskless optical lithography for prototyping, low-volume production, and research,” J. Vac. Sci. Technol. B 20, 2597–2601 (2002).
[CrossRef]

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

R. A. Bartels, A. Paul, H. Green, H. C. Kapteyn, M. M. Murnane, S. Backus, I. P. Christov, Y. Liu, D. Attwood, C. Jacobsen, “Generation of spatially coherent light at extreme ultraviolet wavelengths,” Science 297, 376–378 (2002).
[PubMed]

2000 (1)

1992 (1)

D. V. Roshchupkin, M. Brunel, F. de Bergevin, A. I. Erko, “X-ray space modulation by diffraction on an ultrasonic superlattice,” Nucl. Instrum. Methods Phys. Res. B 72, 471–476 (1992).
[CrossRef]

1988 (1)

A. V. Andreev, Y. V. Ponomarev, A. A. Smolin, “Diffraction of x rays by surface acoustic waves,” Sov. Tech. Phys. Lett. 14, 550–552 (1988).

1976 (1)

D. L. Hecht, “Multifrequency acoustooptic diffraction,” IEEE Trans. Sonics Ultrason. SU-24, 7–18 (1976).

1971 (1)

1970 (1)

L. Kuhn, M. L. Dakss, P. F. Heidrich, B. A. Scott, “Deflection of an optical guided wave by a surface acoustic wave,” Appl. Phys. Lett. 17, 265–267 (1970).
[CrossRef]

1969 (1)

1967 (1)

E. P. Ippen, “Diffraction of light by surface acoustic waves,” Proc. IEEE 55, 248–249 (1967).
[CrossRef]

1965 (1)

R. M. White, F. W. Voltmer, “Direct piezoelectric coupling to surface elastic waves,” Appl. Phys. Lett. 7, 314–316 (1965).
[CrossRef]

Anderson, E. H.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Andreev, A. V.

A. V. Andreev, Y. V. Ponomarev, A. A. Smolin, “Diffraction of x rays by surface acoustic waves,” Sov. Tech. Phys. Lett. 14, 550–552 (1988).

Attwood, D.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

R. A. Bartels, A. Paul, H. Green, H. C. Kapteyn, M. M. Murnane, S. Backus, I. P. Christov, Y. Liu, D. Attwood, C. Jacobsen, “Generation of spatially coherent light at extreme ultraviolet wavelengths,” Science 297, 376–378 (2002).
[PubMed]

Backus, S.

R. A. Bartels, A. Paul, H. Green, H. C. Kapteyn, M. M. Murnane, S. Backus, I. P. Christov, Y. Liu, D. Attwood, C. Jacobsen, “Generation of spatially coherent light at extreme ultraviolet wavelengths,” Science 297, 376–378 (2002).
[PubMed]

Barletta, W. A.

W. A. Barletta, H. Winick, “Introduction to special section on future light sources,” Nucl. Instrum. Methods Phys. Res. A 500, 1–10 (2003).
[CrossRef]

Bartels, R. A.

R. A. Bartels, A. Paul, H. Green, H. C. Kapteyn, M. M. Murnane, S. Backus, I. P. Christov, Y. Liu, D. Attwood, C. Jacobsen, “Generation of spatially coherent light at extreme ultraviolet wavelengths,” Science 297, 376–378 (2002).
[PubMed]

Batson, P.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Blaedel, K.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Bokor, J.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Brunel, M.

D. V. Roshchupkin, M. Brunel, F. de Bergevin, A. I. Erko, “X-ray space modulation by diffraction on an ultrasonic superlattice,” Nucl. Instrum. Methods Phys. Res. B 72, 471–476 (1992).
[CrossRef]

Campbell, C.

C. Campbell, Surface Acoustic Wave Devices for Mobile and Wireless Communications (Academic, San Diego, Calif., 1998).

Carter, D. J. D.

D. Gil, R. Menon, X. Tang, H. I. Smith, D. J. D. Carter, “Parallel maskless optical lithography for prototyping, low-volume production, and research,” J. Vac. Sci. Technol. B 20, 2597–2601 (2002).
[CrossRef]

Chapman, H.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Christov, I. P.

R. A. Bartels, A. Paul, H. Green, H. C. Kapteyn, M. M. Murnane, S. Backus, I. P. Christov, Y. Liu, D. Attwood, C. Jacobsen, “Generation of spatially coherent light at extreme ultraviolet wavelengths,” Science 297, 376–378 (2002).
[PubMed]

Dakss, M. L.

L. Kuhn, M. L. Dakss, P. F. Heidrich, B. A. Scott, “Deflection of an optical guided wave by a surface acoustic wave,” Appl. Phys. Lett. 17, 265–267 (1970).
[CrossRef]

de Bergevin, F.

D. V. Roshchupkin, M. Brunel, F. de Bergevin, A. I. Erko, “X-ray space modulation by diffraction on an ultrasonic superlattice,” Nucl. Instrum. Methods Phys. Res. B 72, 471–476 (1992).
[CrossRef]

Denbeaux, G.

W. Meyer-Ilse, D. Hamamoto, A. Nair, S. A. Lelièvre, G. Denbeaux, L. Johnson, A. L. Pearson, D. Yager, M. A. Legros, C. A. Larabell, “High resolution protein localization using soft x-ray microscopy,” J. Microsc. 201, 395–403 (2002).
[CrossRef]

Denham, P.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Duncan, B. D.

Elston, G.

G. Elston, “Intermodulation products in acousto-optic signal processing systems,” in 1985 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 1985), pp. 391–397.
[CrossRef]

Erko, A. I.

D. V. Roshchupkin, M. Brunel, F. de Bergevin, A. I. Erko, “X-ray space modulation by diffraction on an ultrasonic superlattice,” Nucl. Instrum. Methods Phys. Res. B 72, 471–476 (1992).
[CrossRef]

Franke, K.

H. Schmidt, K. Franke, F. Hoeller, G. Martin, M. Ross-Messemer, M. Weihnacht, “UV reflective modulation using SAWs with high amplitude,” in 2000 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 2000), pp. 655–658.
[CrossRef]

Garber, E. M.

C. S. Hartmann, P. V. Wright, R. J. Kansy, E. M. Garber, “An analysis of SAW interdigital transducers with internal reflections and the applications to the design of single-phase unidirectional transducers,” in 1982 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 1982), pp. 40–45.
[CrossRef]

Gil, D.

D. Gil, R. Menon, X. Tang, H. I. Smith, D. J. D. Carter, “Parallel maskless optical lithography for prototyping, low-volume production, and research,” J. Vac. Sci. Technol. B 20, 2597–2601 (2002).
[CrossRef]

Goldberg, K. A.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Green, H.

R. A. Bartels, A. Paul, H. Green, H. C. Kapteyn, M. M. Murnane, S. Backus, I. P. Christov, Y. Liu, D. Attwood, C. Jacobsen, “Generation of spatially coherent light at extreme ultraviolet wavelengths,” Science 297, 376–378 (2002).
[PubMed]

Green, J. B.

J. B. Green, G. S. Kino, B. T. Khuri-Yakub, “Focused surface wave transducers on anisotropic substrates: a theory developed for the waveguided storage correlator,” in 1980 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 1980), pp. 69–73.
[CrossRef]

Gullikson, E.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Gwyn, C. W.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Hale, L.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Hamamoto, D.

W. Meyer-Ilse, D. Hamamoto, A. Nair, S. A. Lelièvre, G. Denbeaux, L. Johnson, A. L. Pearson, D. Yager, M. A. Legros, C. A. Larabell, “High resolution protein localization using soft x-ray microscopy,” J. Microsc. 201, 395–403 (2002).
[CrossRef]

Harteneck, B.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Hartmann, C. S.

C. S. Hartmann, P. V. Wright, R. J. Kansy, E. M. Garber, “An analysis of SAW interdigital transducers with internal reflections and the applications to the design of single-phase unidirectional transducers,” in 1982 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 1982), pp. 40–45.
[CrossRef]

Hecht, D. L.

D. L. Hecht, “Multifrequency acoustooptic diffraction,” IEEE Trans. Sonics Ultrason. SU-24, 7–18 (1976).

Heidrich, P. F.

L. Kuhn, M. L. Dakss, P. F. Heidrich, B. A. Scott, “Deflection of an optical guided wave by a surface acoustic wave,” Appl. Phys. Lett. 17, 265–267 (1970).
[CrossRef]

Hoef, B.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Hoeller, F.

H. Schmidt, K. Franke, F. Hoeller, G. Martin, M. Ross-Messemer, M. Weihnacht, “UV reflective modulation using SAWs with high amplitude,” in 2000 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 2000), pp. 655–658.
[CrossRef]

Ippen, E. P.

E. P. Ippen, “Diffraction of light by surface acoustic waves,” Proc. IEEE 55, 248–249 (1967).
[CrossRef]

E. P. Ippen, “Diffraction of light by acoustic surface waves,” Ph.D. dissertation (University of California, Berkeley, Berkeley, Calif., 1968).

Jackson, K.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Jacobsen, C.

R. A. Bartels, A. Paul, H. Green, H. C. Kapteyn, M. M. Murnane, S. Backus, I. P. Christov, Y. Liu, D. Attwood, C. Jacobsen, “Generation of spatially coherent light at extreme ultraviolet wavelengths,” Science 297, 376–378 (2002).
[PubMed]

Johnson, L.

W. Meyer-Ilse, D. Hamamoto, A. Nair, S. A. Lelièvre, G. Denbeaux, L. Johnson, A. L. Pearson, D. Yager, M. A. Legros, C. A. Larabell, “High resolution protein localization using soft x-ray microscopy,” J. Microsc. 201, 395–403 (2002).
[CrossRef]

Kansy, R. J.

C. S. Hartmann, P. V. Wright, R. J. Kansy, E. M. Garber, “An analysis of SAW interdigital transducers with internal reflections and the applications to the design of single-phase unidirectional transducers,” in 1982 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 1982), pp. 40–45.
[CrossRef]

Kapteyn, H. C.

R. A. Bartels, A. Paul, H. Green, H. C. Kapteyn, M. M. Murnane, S. Backus, I. P. Christov, Y. Liu, D. Attwood, C. Jacobsen, “Generation of spatially coherent light at extreme ultraviolet wavelengths,” Science 297, 376–378 (2002).
[PubMed]

Khuri-Yakub, B. T.

J. B. Green, G. S. Kino, B. T. Khuri-Yakub, “Focused surface wave transducers on anisotropic substrates: a theory developed for the waveguided storage correlator,” in 1980 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 1980), pp. 69–73.
[CrossRef]

Kino, G. S.

J. B. Green, G. S. Kino, B. T. Khuri-Yakub, “Focused surface wave transducers on anisotropic substrates: a theory developed for the waveguided storage correlator,” in 1980 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 1980), pp. 69–73.
[CrossRef]

Korpel, A.

Kuhn, L.

L. Kuhn, M. L. Dakss, P. F. Heidrich, B. A. Scott, “Deflection of an optical guided wave by a surface acoustic wave,” Appl. Phys. Lett. 17, 265–267 (1970).
[CrossRef]

Larabell, C. A.

W. Meyer-Ilse, D. Hamamoto, A. Nair, S. A. Lelièvre, G. Denbeaux, L. Johnson, A. L. Pearson, D. Yager, M. A. Legros, C. A. Larabell, “High resolution protein localization using soft x-ray microscopy,” J. Microsc. 201, 395–403 (2002).
[CrossRef]

Legros, M. A.

W. Meyer-Ilse, D. Hamamoto, A. Nair, S. A. Lelièvre, G. Denbeaux, L. Johnson, A. L. Pearson, D. Yager, M. A. Legros, C. A. Larabell, “High resolution protein localization using soft x-ray microscopy,” J. Microsc. 201, 395–403 (2002).
[CrossRef]

Lelièvre, S. A.

W. Meyer-Ilse, D. Hamamoto, A. Nair, S. A. Lelièvre, G. Denbeaux, L. Johnson, A. L. Pearson, D. Yager, M. A. Legros, C. A. Larabell, “High resolution protein localization using soft x-ray microscopy,” J. Microsc. 201, 395–403 (2002).
[CrossRef]

Liu, Y.

R. A. Bartels, A. Paul, H. Green, H. C. Kapteyn, M. M. Murnane, S. Backus, I. P. Christov, Y. Liu, D. Attwood, C. Jacobsen, “Generation of spatially coherent light at extreme ultraviolet wavelengths,” Science 297, 376–378 (2002).
[PubMed]

Loewen, E. G.

E. G. Loewen, E. Popov, Diffraction Gratings and Applications (Marcel Dekker, New York, 1997).

Martin, G.

H. Schmidt, K. Franke, F. Hoeller, G. Martin, M. Ross-Messemer, M. Weihnacht, “UV reflective modulation using SAWs with high amplitude,” in 2000 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 2000), pp. 655–658.
[CrossRef]

Menon, R.

D. Gil, R. Menon, X. Tang, H. I. Smith, D. J. D. Carter, “Parallel maskless optical lithography for prototyping, low-volume production, and research,” J. Vac. Sci. Technol. B 20, 2597–2601 (2002).
[CrossRef]

Mermelstein, M. S.

M. S. Mermelstein, “Synthetic aperture microscopy,” Ph.D. dissertation (Massachusetts Institute of Technology, Cambridge, Mass., 1999).

Meyer-Ilse, W.

W. Meyer-Ilse, D. Hamamoto, A. Nair, S. A. Lelièvre, G. Denbeaux, L. Johnson, A. L. Pearson, D. Yager, M. A. Legros, C. A. Larabell, “High resolution protein localization using soft x-ray microscopy,” J. Microsc. 201, 395–403 (2002).
[CrossRef]

Mirkarimi, P.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Murnane, M. M.

R. A. Bartels, A. Paul, H. Green, H. C. Kapteyn, M. M. Murnane, S. Backus, I. P. Christov, Y. Liu, D. Attwood, C. Jacobsen, “Generation of spatially coherent light at extreme ultraviolet wavelengths,” Science 297, 376–378 (2002).
[PubMed]

Nair, A.

W. Meyer-Ilse, D. Hamamoto, A. Nair, S. A. Lelièvre, G. Denbeaux, L. Johnson, A. L. Pearson, D. Yager, M. A. Legros, C. A. Larabell, “High resolution protein localization using soft x-ray microscopy,” J. Microsc. 201, 395–403 (2002).
[CrossRef]

Naulleau, P.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

O’Connell, D.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Olynick, D.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Paul, A.

R. A. Bartels, A. Paul, H. Green, H. C. Kapteyn, M. M. Murnane, S. Backus, I. P. Christov, Y. Liu, D. Attwood, C. Jacobsen, “Generation of spatially coherent light at extreme ultraviolet wavelengths,” Science 297, 376–378 (2002).
[PubMed]

Pearson, A. L.

W. Meyer-Ilse, D. Hamamoto, A. Nair, S. A. Lelièvre, G. Denbeaux, L. Johnson, A. L. Pearson, D. Yager, M. A. Legros, C. A. Larabell, “High resolution protein localization using soft x-ray microscopy,” J. Microsc. 201, 395–403 (2002).
[CrossRef]

Ponomarev, Y. V.

A. V. Andreev, Y. V. Ponomarev, A. A. Smolin, “Diffraction of x rays by surface acoustic waves,” Sov. Tech. Phys. Lett. 14, 550–552 (1988).

Popov, E.

E. G. Loewen, E. Popov, Diffraction Gratings and Applications (Marcel Dekker, New York, 1997).

Powell, C.

Raml, G.

W. Ruile, G. Raml, A. Springer, R. Weigel, “A novel test device to characterize SAW acoustomigration,” in 2000 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 2000), pp. 275–278.
[CrossRef]

Rekawa, S.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Roshchupkin, D. V.

D. V. Roshchupkin, M. Brunel, F. de Bergevin, A. I. Erko, “X-ray space modulation by diffraction on an ultrasonic superlattice,” Nucl. Instrum. Methods Phys. Res. B 72, 471–476 (1992).
[CrossRef]

Ross-Messemer, M.

H. Schmidt, K. Franke, F. Hoeller, G. Martin, M. Ross-Messemer, M. Weihnacht, “UV reflective modulation using SAWs with high amplitude,” in 2000 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 2000), pp. 655–658.
[CrossRef]

Ruile, W.

W. Ruile, G. Raml, A. Springer, R. Weigel, “A novel test device to characterize SAW acoustomigration,” in 2000 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 2000), pp. 275–278.
[CrossRef]

Salmassi, F.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Schmidt, H.

H. Schmidt, K. Franke, F. Hoeller, G. Martin, M. Ross-Messemer, M. Weihnacht, “UV reflective modulation using SAWs with high amplitude,” in 2000 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 2000), pp. 655–658.
[CrossRef]

Scott, B. A.

L. Kuhn, M. L. Dakss, P. F. Heidrich, B. A. Scott, “Deflection of an optical guided wave by a surface acoustic wave,” Appl. Phys. Lett. 17, 265–267 (1970).
[CrossRef]

Smith, H. I.

D. Gil, R. Menon, X. Tang, H. I. Smith, D. J. D. Carter, “Parallel maskless optical lithography for prototyping, low-volume production, and research,” J. Vac. Sci. Technol. B 20, 2597–2601 (2002).
[CrossRef]

H. I. Smith, “Surface wave device fabrication,” in Surface Wave Filters: Design, Construction, and Use, H. Matthews, ed. (Wiley, New York, 1977), pp. 165–217.

Smolin, A. A.

A. V. Andreev, Y. V. Ponomarev, A. A. Smolin, “Diffraction of x rays by surface acoustic waves,” Sov. Tech. Phys. Lett. 14, 550–552 (1988).

Soufli, R.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Spiller, E.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

E. Spiller, Soft X-ray Optics (SPIE Press, Bellingham, Wash., 1994).
[CrossRef]

Springer, A.

W. Ruile, G. Raml, A. Springer, R. Weigel, “A novel test device to characterize SAW acoustomigration,” in 2000 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 2000), pp. 275–278.
[CrossRef]

Sweeney, D.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Tang, X.

D. Gil, R. Menon, X. Tang, H. I. Smith, D. J. D. Carter, “Parallel maskless optical lithography for prototyping, low-volume production, and research,” J. Vac. Sci. Technol. B 20, 2597–2601 (2002).
[CrossRef]

Taylor, J.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Tichenor, D.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Tsai, C. S.

C. S. Tsai, “Acousto-optical devices,” in Wiley Encyclopedia of Electrical and Electronics Engineering, J. G. Webster, ed. (Wiley, New York, 1999), Vol. 1, pp. 139–157.

Voltmer, F. W.

R. M. White, F. W. Voltmer, “Direct piezoelectric coupling to surface elastic waves,” Appl. Phys. Lett. 7, 314–316 (1965).
[CrossRef]

Walton, C.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Weigel, R.

W. Ruile, G. Raml, A. Springer, R. Weigel, “A novel test device to characterize SAW acoustomigration,” in 2000 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 2000), pp. 275–278.
[CrossRef]

Weihnacht, M.

H. Schmidt, K. Franke, F. Hoeller, G. Martin, M. Ross-Messemer, M. Weihnacht, “UV reflective modulation using SAWs with high amplitude,” in 2000 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 2000), pp. 655–658.
[CrossRef]

White, R. M.

R. M. White, F. W. Voltmer, “Direct piezoelectric coupling to surface elastic waves,” Appl. Phys. Lett. 7, 314–316 (1965).
[CrossRef]

Whitman, R. L.

Winick, H.

W. A. Barletta, H. Winick, “Introduction to special section on future light sources,” Nucl. Instrum. Methods Phys. Res. A 500, 1–10 (2003).
[CrossRef]

Wright, P. V.

C. S. Hartmann, P. V. Wright, R. J. Kansy, E. M. Garber, “An analysis of SAW interdigital transducers with internal reflections and the applications to the design of single-phase unidirectional transducers,” in 1982 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 1982), pp. 40–45.
[CrossRef]

Yager, D.

W. Meyer-Ilse, D. Hamamoto, A. Nair, S. A. Lelièvre, G. Denbeaux, L. Johnson, A. L. Pearson, D. Yager, M. A. Legros, C. A. Larabell, “High resolution protein localization using soft x-ray microscopy,” J. Microsc. 201, 395–403 (2002).
[CrossRef]

Yan, P.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Zhang, G.

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Zory, P.

Appl. Opt. (3)

Appl. Phys. Lett. (2)

L. Kuhn, M. L. Dakss, P. F. Heidrich, B. A. Scott, “Deflection of an optical guided wave by a surface acoustic wave,” Appl. Phys. Lett. 17, 265–267 (1970).
[CrossRef]

R. M. White, F. W. Voltmer, “Direct piezoelectric coupling to surface elastic waves,” Appl. Phys. Lett. 7, 314–316 (1965).
[CrossRef]

IEEE Trans. Sonics Ultrason. (1)

D. L. Hecht, “Multifrequency acoustooptic diffraction,” IEEE Trans. Sonics Ultrason. SU-24, 7–18 (1976).

J. Microsc. (1)

W. Meyer-Ilse, D. Hamamoto, A. Nair, S. A. Lelièvre, G. Denbeaux, L. Johnson, A. L. Pearson, D. Yager, M. A. Legros, C. A. Larabell, “High resolution protein localization using soft x-ray microscopy,” J. Microsc. 201, 395–403 (2002).
[CrossRef]

J. Vac. Sci. Technol. B (2)

D. Gil, R. Menon, X. Tang, H. I. Smith, D. J. D. Carter, “Parallel maskless optical lithography for prototyping, low-volume production, and research,” J. Vac. Sci. Technol. B 20, 2597–2601 (2002).
[CrossRef]

P. Naulleau, K. A. Goldberg, E. H. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, D. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, “Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic,” J. Vac. Sci. Technol. B 20, 2829–2833 (2002).
[CrossRef]

Nucl. Instrum. Methods Phys. Res. A (1)

W. A. Barletta, H. Winick, “Introduction to special section on future light sources,” Nucl. Instrum. Methods Phys. Res. A 500, 1–10 (2003).
[CrossRef]

Nucl. Instrum. Methods Phys. Res. B (1)

D. V. Roshchupkin, M. Brunel, F. de Bergevin, A. I. Erko, “X-ray space modulation by diffraction on an ultrasonic superlattice,” Nucl. Instrum. Methods Phys. Res. B 72, 471–476 (1992).
[CrossRef]

Proc. IEEE (1)

E. P. Ippen, “Diffraction of light by surface acoustic waves,” Proc. IEEE 55, 248–249 (1967).
[CrossRef]

Science (1)

R. A. Bartels, A. Paul, H. Green, H. C. Kapteyn, M. M. Murnane, S. Backus, I. P. Christov, Y. Liu, D. Attwood, C. Jacobsen, “Generation of spatially coherent light at extreme ultraviolet wavelengths,” Science 297, 376–378 (2002).
[PubMed]

Sov. Tech. Phys. Lett. (1)

A. V. Andreev, Y. V. Ponomarev, A. A. Smolin, “Diffraction of x rays by surface acoustic waves,” Sov. Tech. Phys. Lett. 14, 550–552 (1988).

Other (13)

G. Elston, “Intermodulation products in acousto-optic signal processing systems,” in 1985 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 1985), pp. 391–397.
[CrossRef]

E. Spiller, Soft X-ray Optics (SPIE Press, Bellingham, Wash., 1994).
[CrossRef]

C. Campbell, Surface Acoustic Wave Devices for Mobile and Wireless Communications (Academic, San Diego, Calif., 1998).

M. S. Mermelstein, “Synthetic aperture microscopy,” Ph.D. dissertation (Massachusetts Institute of Technology, Cambridge, Mass., 1999).

C. S. Tsai, “Acousto-optical devices,” in Wiley Encyclopedia of Electrical and Electronics Engineering, J. G. Webster, ed. (Wiley, New York, 1999), Vol. 1, pp. 139–157.

H. Schmidt, K. Franke, F. Hoeller, G. Martin, M. Ross-Messemer, M. Weihnacht, “UV reflective modulation using SAWs with high amplitude,” in 2000 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 2000), pp. 655–658.
[CrossRef]

E. P. Ippen, “Diffraction of light by acoustic surface waves,” Ph.D. dissertation (University of California, Berkeley, Berkeley, Calif., 1968).

D. Zwillinger, ed., CRC Standard Mathematical Tables and Formulae (CRC Press, Boca Raton, Fla., 1996).

H. I. Smith, “Surface wave device fabrication,” in Surface Wave Filters: Design, Construction, and Use, H. Matthews, ed. (Wiley, New York, 1977), pp. 165–217.

E. G. Loewen, E. Popov, Diffraction Gratings and Applications (Marcel Dekker, New York, 1997).

W. Ruile, G. Raml, A. Springer, R. Weigel, “A novel test device to characterize SAW acoustomigration,” in 2000 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 2000), pp. 275–278.
[CrossRef]

C. S. Hartmann, P. V. Wright, R. J. Kansy, E. M. Garber, “An analysis of SAW interdigital transducers with internal reflections and the applications to the design of single-phase unidirectional transducers,” in 1982 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 1982), pp. 40–45.
[CrossRef]

J. B. Green, G. S. Kino, B. T. Khuri-Yakub, “Focused surface wave transducers on anisotropic substrates: a theory developed for the waveguided storage correlator,” in 1980 IEEE Ultrasonics Symposium (Institute of Electrical and Electronics Engineers, New York, 1980), pp. 69–73.
[CrossRef]

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Figures (5)

Fig. 1
Fig. 1

(a) Reflective SAW optical modulator. (b) Detail of photomask used to fabricate the linear array of eight independent modulators.

Fig. 2
Fig. 2

Diffracted field generated by a reflective SAW optical modulator array. Eight +1-order diffracted beams, eight -1-order diffracted beams, and the specular reflection of a cylindrically expanded incident laser beam are visible.

Fig. 3
Fig. 3

First-order diffraction efficiency versus input rf power for a single modulator.

Fig. 4
Fig. 4

Cross talk between two adjacent modulators. The input to one modulator was varied while the input to the second modulator was turned off.

Fig. 5
Fig. 5

Modulation of optical phase. We detected optical phase by interfering two +1-order diffracted beams generated by two SAW optical modulators. The spatial phase of the resulting fringe pattern shifts in response to the difference in rf phase between the drive signals.

Equations (3)

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E r ,   t = a   cos k   ·   r - ω t + ϕ + 2 A ω   sin K   ·   r - Ω t + Φ ,
E r ,   t = n = -   aJ n 2 A ω cos k + n K   ·   r - ω + n Ω t + ϕ + n Φ ,
t r = l + d / v ,

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