Abstract

We present a procedure for the optical characterization of thin-film stacks from spectrophotometric data. The procedure overcomes the intrinsic limitations arising in the numerical determination of many parameters from reflectance or transmittance spectra measurements. The key point is to use all the information available from the manufacturing process in a single global optimization process. The method is illustrated by a case study of solgel applications.

© 2003 Optical Society of America

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References

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  1. S. Bosch, J. Ferré-Borull, J. Sancho-Parramon, “A general purpose software for optical characterisation of thin films: Specific features for microelectronic applications,” Solid-State Electron. 45, 703–709 (2001).
    [CrossRef]
  2. H. A. Macleod, Thin Film Optical Filters (Wiley, New York, 1976).
  3. S. Bosch, N. Leinfellner, E. Quesnel, A. Duparré, J. Ferré-Borrull, S. Guenster, D. Ristau, “New procedure for the optical characterization of high-quality thin films,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, G. A. Al-Jumaily, A. Duparré, B. Singh, eds., Proc. SPIE4099, 124–130 (2000).
    [CrossRef]
  4. W. H. Press, S. A. Teukolsky, W. T. Vetterling, B. P. Flannery, Numerical Recipes in C (Cambridge University Press, New York, 1992).
  5. M. C. Ferrara, S. Mazzarelli, J. Sancho-Parramon, S. Bosch. “Sol-gel process for the production of large area coatings,” presented at the III Workshop Italiano Sol-Gel, Trento, Italy, 13–14 June 2002.
  6. C. J. Brinker, G. W. Scherer, The Physics and the Chemistry of Sol-gel Processing (Academic, New York, 1990).

2001 (1)

S. Bosch, J. Ferré-Borull, J. Sancho-Parramon, “A general purpose software for optical characterisation of thin films: Specific features for microelectronic applications,” Solid-State Electron. 45, 703–709 (2001).
[CrossRef]

Bosch, S.

S. Bosch, J. Ferré-Borull, J. Sancho-Parramon, “A general purpose software for optical characterisation of thin films: Specific features for microelectronic applications,” Solid-State Electron. 45, 703–709 (2001).
[CrossRef]

S. Bosch, N. Leinfellner, E. Quesnel, A. Duparré, J. Ferré-Borrull, S. Guenster, D. Ristau, “New procedure for the optical characterization of high-quality thin films,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, G. A. Al-Jumaily, A. Duparré, B. Singh, eds., Proc. SPIE4099, 124–130 (2000).
[CrossRef]

M. C. Ferrara, S. Mazzarelli, J. Sancho-Parramon, S. Bosch. “Sol-gel process for the production of large area coatings,” presented at the III Workshop Italiano Sol-Gel, Trento, Italy, 13–14 June 2002.

Brinker, C. J.

C. J. Brinker, G. W. Scherer, The Physics and the Chemistry of Sol-gel Processing (Academic, New York, 1990).

Duparré, A.

S. Bosch, N. Leinfellner, E. Quesnel, A. Duparré, J. Ferré-Borrull, S. Guenster, D. Ristau, “New procedure for the optical characterization of high-quality thin films,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, G. A. Al-Jumaily, A. Duparré, B. Singh, eds., Proc. SPIE4099, 124–130 (2000).
[CrossRef]

Ferrara, M. C.

M. C. Ferrara, S. Mazzarelli, J. Sancho-Parramon, S. Bosch. “Sol-gel process for the production of large area coatings,” presented at the III Workshop Italiano Sol-Gel, Trento, Italy, 13–14 June 2002.

Ferré-Borrull, J.

S. Bosch, N. Leinfellner, E. Quesnel, A. Duparré, J. Ferré-Borrull, S. Guenster, D. Ristau, “New procedure for the optical characterization of high-quality thin films,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, G. A. Al-Jumaily, A. Duparré, B. Singh, eds., Proc. SPIE4099, 124–130 (2000).
[CrossRef]

Ferré-Borull, J.

S. Bosch, J. Ferré-Borull, J. Sancho-Parramon, “A general purpose software for optical characterisation of thin films: Specific features for microelectronic applications,” Solid-State Electron. 45, 703–709 (2001).
[CrossRef]

Flannery, B. P.

W. H. Press, S. A. Teukolsky, W. T. Vetterling, B. P. Flannery, Numerical Recipes in C (Cambridge University Press, New York, 1992).

Guenster, S.

S. Bosch, N. Leinfellner, E. Quesnel, A. Duparré, J. Ferré-Borrull, S. Guenster, D. Ristau, “New procedure for the optical characterization of high-quality thin films,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, G. A. Al-Jumaily, A. Duparré, B. Singh, eds., Proc. SPIE4099, 124–130 (2000).
[CrossRef]

Leinfellner, N.

S. Bosch, N. Leinfellner, E. Quesnel, A. Duparré, J. Ferré-Borrull, S. Guenster, D. Ristau, “New procedure for the optical characterization of high-quality thin films,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, G. A. Al-Jumaily, A. Duparré, B. Singh, eds., Proc. SPIE4099, 124–130 (2000).
[CrossRef]

Macleod, H. A.

H. A. Macleod, Thin Film Optical Filters (Wiley, New York, 1976).

Mazzarelli, S.

M. C. Ferrara, S. Mazzarelli, J. Sancho-Parramon, S. Bosch. “Sol-gel process for the production of large area coatings,” presented at the III Workshop Italiano Sol-Gel, Trento, Italy, 13–14 June 2002.

Press, W. H.

W. H. Press, S. A. Teukolsky, W. T. Vetterling, B. P. Flannery, Numerical Recipes in C (Cambridge University Press, New York, 1992).

Quesnel, E.

S. Bosch, N. Leinfellner, E. Quesnel, A. Duparré, J. Ferré-Borrull, S. Guenster, D. Ristau, “New procedure for the optical characterization of high-quality thin films,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, G. A. Al-Jumaily, A. Duparré, B. Singh, eds., Proc. SPIE4099, 124–130 (2000).
[CrossRef]

Ristau, D.

S. Bosch, N. Leinfellner, E. Quesnel, A. Duparré, J. Ferré-Borrull, S. Guenster, D. Ristau, “New procedure for the optical characterization of high-quality thin films,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, G. A. Al-Jumaily, A. Duparré, B. Singh, eds., Proc. SPIE4099, 124–130 (2000).
[CrossRef]

Sancho-Parramon, J.

S. Bosch, J. Ferré-Borull, J. Sancho-Parramon, “A general purpose software for optical characterisation of thin films: Specific features for microelectronic applications,” Solid-State Electron. 45, 703–709 (2001).
[CrossRef]

M. C. Ferrara, S. Mazzarelli, J. Sancho-Parramon, S. Bosch. “Sol-gel process for the production of large area coatings,” presented at the III Workshop Italiano Sol-Gel, Trento, Italy, 13–14 June 2002.

Scherer, G. W.

C. J. Brinker, G. W. Scherer, The Physics and the Chemistry of Sol-gel Processing (Academic, New York, 1990).

Teukolsky, S. A.

W. H. Press, S. A. Teukolsky, W. T. Vetterling, B. P. Flannery, Numerical Recipes in C (Cambridge University Press, New York, 1992).

Vetterling, W. T.

W. H. Press, S. A. Teukolsky, W. T. Vetterling, B. P. Flannery, Numerical Recipes in C (Cambridge University Press, New York, 1992).

Solid-State Electron. (1)

S. Bosch, J. Ferré-Borull, J. Sancho-Parramon, “A general purpose software for optical characterisation of thin films: Specific features for microelectronic applications,” Solid-State Electron. 45, 703–709 (2001).
[CrossRef]

Other (5)

H. A. Macleod, Thin Film Optical Filters (Wiley, New York, 1976).

S. Bosch, N. Leinfellner, E. Quesnel, A. Duparré, J. Ferré-Borrull, S. Guenster, D. Ristau, “New procedure for the optical characterization of high-quality thin films,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, G. A. Al-Jumaily, A. Duparré, B. Singh, eds., Proc. SPIE4099, 124–130 (2000).
[CrossRef]

W. H. Press, S. A. Teukolsky, W. T. Vetterling, B. P. Flannery, Numerical Recipes in C (Cambridge University Press, New York, 1992).

M. C. Ferrara, S. Mazzarelli, J. Sancho-Parramon, S. Bosch. “Sol-gel process for the production of large area coatings,” presented at the III Workshop Italiano Sol-Gel, Trento, Italy, 13–14 June 2002.

C. J. Brinker, G. W. Scherer, The Physics and the Chemistry of Sol-gel Processing (Academic, New York, 1990).

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Figures (4)

Fig. 1
Fig. 1

Sketch of the multilayer configuration.

Fig. 2
Fig. 2

Calculated dispersions of the three materials for the samples A–D.

Fig. 3
Fig. 3

Calculated dispersions of the three materials in the global fitting.

Fig. 4
Fig. 4

Comparison among the measured (experimental) data, the individual fit of sample D (χ2 = 0.11), and the corresponding global fitting (χ2 = 0.89).

Tables (3)

Tables Icon

Table 1 Withdrawal Speeds for Obtaining the Layers of the Samples A–D

Tables Icon

Table 2 Calculated Parameters for the Samples A–D Obtained by a Sample-by-Sample Characterization

Tables Icon

Table 3 Calculated Parameters by a Simultaneous Four-Sample Characterization

Equations (3)

Equations on this page are rendered with MathJax. Learn more.

χ2P1, , Pm=1n-m-1i=1nyi-yxiσi2,
χ2P11,  Pm11, P12,  Pm22, , P1q,  Pmqq=1nq-m-1j=1qi=1nyij-yjxiσij2,
nλ=n0+n1λ2, kλ=0.

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