Abstract

Scanning illumination systems provide for a powerful and flexible means for controlling illumination coherence properties. Here we present a scanning Fourier synthesis illuminator that enables microfield extreme ultraviolet lithography to be performed on an intrinsically coherent synchrotron undulator beamline. The effectiveness of the system is demonstrated through a variety of print experiments, including the use of resolution enhancing coherence functions that enable the printing of 50-nm line-space features by use of a lithographic optic with a numerical aperture of 0.1 and an operational wavelength of 13.4 nm.

© 2003 Optical Society of America

Full Article  |  PDF Article

References

  • View by:
  • |
  • |
  • |

  1. R. Stulen, D. Sweeney, “Extreme ultraviolet lithography,” IEEE J. Quantum Electron. 35, 694–699 (1999).
    [CrossRef]
  2. D. Attwood, G. Sommargren, R. Beguiristain, K. Nguyen, J. Bokor, N. Ceglio, K. Jackson, M. Koike, J. Underwood, “Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography,” Appl. Opt. 32, 7022–7031 (1993).
    [CrossRef] [PubMed]
  3. D. W. Sweeney, R. Hudyma, H. N. Chapman, D. Shafer, “EUV optical design for a 100 nm CD imaging system,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE3331, 2–10 (1998).
    [CrossRef]
  4. J. W. Goodman, Statistical Optics, (Wiley, New York, 1986) Chap. 5, pp. 157–229.
  5. M. V. R. K. Murty, “Interference between wave fronts rotated or reversed with respect to each other and its relation to spatial coherence,” J. Opt. Soc. Am. 54, 1187–1190 (1964).
    [CrossRef]
  6. W. Martienssen, E. Spiller, “Coherence and Fluctuations in Light Beams,” Am. J. Phys. 32, 919–926 (1964).
    [CrossRef]
  7. K. Itoh, Y. Ohtsuka, “Illumination with a moving light source,” Opt. Commun. 31, 119–124 (1979).
    [CrossRef]
  8. K. Itoh, Y. Ohtsuka, “Coherence control by laser scanning,” Appl. Opt. 19, 3184–3188 (1980).
    [CrossRef] [PubMed]
  9. E. Arons, D. Dilworth, “Lensless imaging by spatial Fourier synthesis holography,” Appl. Opt. 35, 777–781 (1996).
    [CrossRef] [PubMed]
  10. E. Arons, D. Dilworth, “Analysis of Fourier synthesis holography for imaging through scattering media,” Appl. Opt. 34, 1841–1847 (1995).
    [CrossRef] [PubMed]
  11. P. Naulleau, “Analysis of the confined-reference coherence-encoding method for image transmission through optical fibers,” Appl. Opt. 36, 7386–7396 (1997).
    [CrossRef]
  12. C. Chang, P. Naulleau, E. Anderson, D. Attwood, “Spatial coherence characterization of undulator radiation,” Opt. Commun. 182, 24–34 (2000).
    [CrossRef]
  13. K. Goldberg, P. Naulleau, J. Bokor, H. Chapman, “Honing the accuracy of extreme ultraviolet optical system testing: at-wavelength and visible-light measurements of the ETS Set-2 projection optic,” InEmerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE 4688, (2002).
    [CrossRef]
  14. P. Naulleau, K. Goldberg, E. Anderson, P. Batson, P. Denham, S. Rekawa, J Bokor, “At wavelength characterization of the Engineering Test Stand Set-2 optic,” J. Vac. Sci. Technol. B 19, 2396–2400 (2001).
    [CrossRef]
  15. D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
    [CrossRef]
  16. P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
    [CrossRef]
  17. P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

2002

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

2001

P. Naulleau, K. Goldberg, E. Anderson, P. Batson, P. Denham, S. Rekawa, J Bokor, “At wavelength characterization of the Engineering Test Stand Set-2 optic,” J. Vac. Sci. Technol. B 19, 2396–2400 (2001).
[CrossRef]

2000

C. Chang, P. Naulleau, E. Anderson, D. Attwood, “Spatial coherence characterization of undulator radiation,” Opt. Commun. 182, 24–34 (2000).
[CrossRef]

1999

R. Stulen, D. Sweeney, “Extreme ultraviolet lithography,” IEEE J. Quantum Electron. 35, 694–699 (1999).
[CrossRef]

1997

1996

1995

1993

1980

1979

K. Itoh, Y. Ohtsuka, “Illumination with a moving light source,” Opt. Commun. 31, 119–124 (1979).
[CrossRef]

1964

Anderson, E.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

P. Naulleau, K. Goldberg, E. Anderson, P. Batson, P. Denham, S. Rekawa, J Bokor, “At wavelength characterization of the Engineering Test Stand Set-2 optic,” J. Vac. Sci. Technol. B 19, 2396–2400 (2001).
[CrossRef]

C. Chang, P. Naulleau, E. Anderson, D. Attwood, “Spatial coherence characterization of undulator radiation,” Opt. Commun. 182, 24–34 (2000).
[CrossRef]

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

Arons, E.

Attwood, D.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

C. Chang, P. Naulleau, E. Anderson, D. Attwood, “Spatial coherence characterization of undulator radiation,” Opt. Commun. 182, 24–34 (2000).
[CrossRef]

D. Attwood, G. Sommargren, R. Beguiristain, K. Nguyen, J. Bokor, N. Ceglio, K. Jackson, M. Koike, J. Underwood, “Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography,” Appl. Opt. 32, 7022–7031 (1993).
[CrossRef] [PubMed]

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Ballard, W.

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Batson, P.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

P. Naulleau, K. Goldberg, E. Anderson, P. Batson, P. Denham, S. Rekawa, J Bokor, “At wavelength characterization of the Engineering Test Stand Set-2 optic,” J. Vac. Sci. Technol. B 19, 2396–2400 (2001).
[CrossRef]

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

Beguiristain, R.

Berger, K.

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Bjorkholm, J.

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Blaedel, K.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Bokor, J

P. Naulleau, K. Goldberg, E. Anderson, P. Batson, P. Denham, S. Rekawa, J Bokor, “At wavelength characterization of the Engineering Test Stand Set-2 optic,” J. Vac. Sci. Technol. B 19, 2396–2400 (2001).
[CrossRef]

Bokor, J.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

D. Attwood, G. Sommargren, R. Beguiristain, K. Nguyen, J. Bokor, N. Ceglio, K. Jackson, M. Koike, J. Underwood, “Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography,” Appl. Opt. 32, 7022–7031 (1993).
[CrossRef] [PubMed]

K. Goldberg, P. Naulleau, J. Bokor, H. Chapman, “Honing the accuracy of extreme ultraviolet optical system testing: at-wavelength and visible-light measurements of the ETS Set-2 projection optic,” InEmerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE 4688, (2002).
[CrossRef]

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

Cardinale, G.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

Ceglio, N.

Chang, C.

C. Chang, P. Naulleau, E. Anderson, D. Attwood, “Spatial coherence characterization of undulator radiation,” Opt. Commun. 182, 24–34 (2000).
[CrossRef]

Chapman, H.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

K. Goldberg, P. Naulleau, J. Bokor, H. Chapman, “Honing the accuracy of extreme ultraviolet optical system testing: at-wavelength and visible-light measurements of the ETS Set-2 projection optic,” InEmerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE 4688, (2002).
[CrossRef]

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Chapman, H. N.

D. W. Sweeney, R. Hudyma, H. N. Chapman, D. Shafer, “EUV optical design for a 100 nm CD imaging system,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE3331, 2–10 (1998).
[CrossRef]

Denham, P.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

P. Naulleau, K. Goldberg, E. Anderson, P. Batson, P. Denham, S. Rekawa, J Bokor, “At wavelength characterization of the Engineering Test Stand Set-2 optic,” J. Vac. Sci. Technol. B 19, 2396–2400 (2001).
[CrossRef]

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

Dilworth, D.

Fisher, A.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

Folta, J.

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Goldberg, K.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

P. Naulleau, K. Goldberg, E. Anderson, P. Batson, P. Denham, S. Rekawa, J Bokor, “At wavelength characterization of the Engineering Test Stand Set-2 optic,” J. Vac. Sci. Technol. B 19, 2396–2400 (2001).
[CrossRef]

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

K. Goldberg, P. Naulleau, J. Bokor, H. Chapman, “Honing the accuracy of extreme ultraviolet optical system testing: at-wavelength and visible-light measurements of the ETS Set-2 projection optic,” InEmerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE 4688, (2002).
[CrossRef]

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

Goodman, J. W.

J. W. Goodman, Statistical Optics, (Wiley, New York, 1986) Chap. 5, pp. 157–229.

Gullikson, E.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Gwyn, C.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

Hale, L.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Hanzen, R.

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Harteneck, B.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

Hoef, B.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

Hudyma, R.

D. W. Sweeney, R. Hudyma, H. N. Chapman, D. Shafer, “EUV optical design for a 100 nm CD imaging system,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE3331, 2–10 (1998).
[CrossRef]

Itoh, K.

K. Itoh, Y. Ohtsuka, “Coherence control by laser scanning,” Appl. Opt. 19, 3184–3188 (1980).
[CrossRef] [PubMed]

K. Itoh, Y. Ohtsuka, “Illumination with a moving light source,” Opt. Commun. 31, 119–124 (1979).
[CrossRef]

Jackson, K.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

D. Attwood, G. Sommargren, R. Beguiristain, K. Nguyen, J. Bokor, N. Ceglio, K. Jackson, M. Koike, J. Underwood, “Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography,” Appl. Opt. 32, 7022–7031 (1993).
[CrossRef] [PubMed]

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

Jefferson, K.

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Klebanoff, L.

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Koike, M.

Kubiak, G.

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

Lee, S.

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Leung, A.

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Martienssen, W.

W. Martienssen, E. Spiller, “Coherence and Fluctuations in Light Beams,” Am. J. Phys. 32, 919–926 (1964).
[CrossRef]

Mickan, U.

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Mirkarimi, P.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

Murty, M. V. R. K.

Naulleau, P.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

P. Naulleau, K. Goldberg, E. Anderson, P. Batson, P. Denham, S. Rekawa, J Bokor, “At wavelength characterization of the Engineering Test Stand Set-2 optic,” J. Vac. Sci. Technol. B 19, 2396–2400 (2001).
[CrossRef]

C. Chang, P. Naulleau, E. Anderson, D. Attwood, “Spatial coherence characterization of undulator radiation,” Opt. Commun. 182, 24–34 (2000).
[CrossRef]

P. Naulleau, “Analysis of the confined-reference coherence-encoding method for image transmission through optical fibers,” Appl. Opt. 36, 7386–7396 (1997).
[CrossRef]

K. Goldberg, P. Naulleau, J. Bokor, H. Chapman, “Honing the accuracy of extreme ultraviolet optical system testing: at-wavelength and visible-light measurements of the ETS Set-2 projection optic,” InEmerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE 4688, (2002).
[CrossRef]

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

Nguyen, K.

O’Connell, D.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Ohtsuka, Y.

K. Itoh, Y. Ohtsuka, “Coherence control by laser scanning,” Appl. Opt. 19, 3184–3188 (1980).
[CrossRef] [PubMed]

K. Itoh, Y. Ohtsuka, “Illumination with a moving light source,” Opt. Commun. 31, 119–124 (1979).
[CrossRef]

Olynick, D.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

Panning, E.

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Ray-Chaudhuri, A.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Rekawa, S.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

P. Naulleau, K. Goldberg, E. Anderson, P. Batson, P. Denham, S. Rekawa, J Bokor, “At wavelength characterization of the Engineering Test Stand Set-2 optic,” J. Vac. Sci. Technol. B 19, 2396–2400 (2001).
[CrossRef]

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

Replogle, W.

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Salmassi, F.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

Shafer, D.

D. W. Sweeney, R. Hudyma, H. N. Chapman, D. Shafer, “EUV optical design for a 100 nm CD imaging system,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE3331, 2–10 (1998).
[CrossRef]

Sommargren, G.

D. Attwood, G. Sommargren, R. Beguiristain, K. Nguyen, J. Bokor, N. Ceglio, K. Jackson, M. Koike, J. Underwood, “Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography,” Appl. Opt. 32, 7022–7031 (1993).
[CrossRef] [PubMed]

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Soufli, R.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Spiller, E.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

W. Martienssen, E. Spiller, “Coherence and Fluctuations in Light Beams,” Am. J. Phys. 32, 919–926 (1964).
[CrossRef]

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

Stulen, R.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

R. Stulen, D. Sweeney, “Extreme ultraviolet lithography,” IEEE J. Quantum Electron. 35, 694–699 (1999).
[CrossRef]

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

Sweeney, D.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

R. Stulen, D. Sweeney, “Extreme ultraviolet lithography,” IEEE J. Quantum Electron. 35, 694–699 (1999).
[CrossRef]

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

Sweeney, D. W.

D. W. Sweeney, R. Hudyma, H. N. Chapman, D. Shafer, “EUV optical design for a 100 nm CD imaging system,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE3331, 2–10 (1998).
[CrossRef]

Taylor, J.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Tichenor, D.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Underwood, J.

Walton, C.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

Wronosky, J.

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Yan, P.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

Zhang, G.

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

Am. J. Phys.

W. Martienssen, E. Spiller, “Coherence and Fluctuations in Light Beams,” Am. J. Phys. 32, 919–926 (1964).
[CrossRef]

Appl. Opt.

IEEE J. Quantum Electron.

R. Stulen, D. Sweeney, “Extreme ultraviolet lithography,” IEEE J. Quantum Electron. 35, 694–699 (1999).
[CrossRef]

J. Opt. Soc. Am.

J. Vac. Sci. Technol. B

P. Naulleau, K. Goldberg, E. Anderson, P. Batson, P. Denham, S. Rekawa, J Bokor, “At wavelength characterization of the Engineering Test Stand Set-2 optic,” J. Vac. Sci. Technol. B 19, 2396–2400 (2001).
[CrossRef]

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,” J. Vac. Sci. Technol. B (2002).

Opt. Commun.

K. Itoh, Y. Ohtsuka, “Illumination with a moving light source,” Opt. Commun. 31, 119–124 (1979).
[CrossRef]

C. Chang, P. Naulleau, E. Anderson, D. Attwood, “Spatial coherence characterization of undulator radiation,” Opt. Commun. 182, 24–34 (2000).
[CrossRef]

Other

K. Goldberg, P. Naulleau, J. Bokor, H. Chapman, “Honing the accuracy of extreme ultraviolet optical system testing: at-wavelength and visible-light measurements of the ETS Set-2 projection optic,” InEmerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE 4688, (2002).
[CrossRef]

D. W. Sweeney, R. Hudyma, H. N. Chapman, D. Shafer, “EUV optical design for a 100 nm CD imaging system,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE3331, 2–10 (1998).
[CrossRef]

J. W. Goodman, Statistical Optics, (Wiley, New York, 1986) Chap. 5, pp. 157–229.

D. Tichenor, A. Ray-Chaudhuri, S. Lee, H. Chapman, W. Replogle, K. Berger, R. Stulen, G. Kubiak, L. Klebanoff, J. Wronosky, D. O’Connell, A. Leung, K. Jefferson, W. Ballard, L. Hale, K. Blaedel, J. Taylor, J. Folta, E. Spiller, R. Soufli, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gullikson, J. Bokor, D. Attwood, U. Mickan, R. Hanzen, E. Panning, P. Yan, J. Bjorkholm, C. Gwyn, “Initial Results from the EUV Engineering Test Stand,” in Soft X-Ray and EUV Imaging Systems II, D. A. Tichenor, J. A. Folta, eds., Proc. SPIE4506, 639–645 (2001).
[CrossRef]

P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, G. Kubiak, D. O’Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, “Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,” in Emerging Lithographic Technologies VI, R. L. Engelstad, ed., Proc. SPIE4688, 64–72 (2002).
[CrossRef]

Cited By

OSA participates in CrossRef's Cited-By Linking service. Citing articles from OSA journals and other participating publishers are listed here.

Alert me when this article is cited.


Figures (7)

Fig. 1
Fig. 1

Schematic of scanning Fourier-synthesis illuminator. A two-dimensional angle scanning turning mirror serves as an effective source that is re-imaged to the reticle by use of a spherical mirror. The spatial bandwidth (coherence) of the effective source is synthesized through the scanning process.

Fig. 2
Fig. 2

Schematic of a microfield static printing system.

Fig. 3
Fig. 3

Series of EUV pupil fills generated by the scanning system configured in Fig. 2 and recorded through the lithographic ETS Set-2 optic. A back-thinned back-illuminated EUV CCD camera is used to capture the pupil-fill images.

Fig. 4
Fig. 4

Coherent images (σ ≈ 0) obtained with the scanning system turned off: (a) 100-nm line-space pattern in focus, (b) 100-nm line-space pattern 1.5 μm out of focus, (c) 70-nm line-space pattern in focus.

Fig. 5
Fig. 5

Partially coherent images with disk fill (σ = 0.8) obtained with the scanning system turned on: (a) 100-nm line-space pattern in focus, (b) 70-nm line-space pattern in focus, (c) 70-nm line-space pattern 0.6 μm out of focus.

Fig. 6
Fig. 6

(a)–(c) Show printing results with dipole illumination, where the pole separation is set to enhance vertical lines. (a) 70-nm elbows demonstrating the resolution loss in the horizontal direction. (b) 60-nm line-space pattern. (c) 50-nm line-space pattern. For comparison purposes (d) shows the 50-nm line-space pattern printed using conventional disk illumination with a σ of 0.8.

Fig. 7
Fig. 7

For comparison Manhattan geometry 70-nm elbows printed using ETS (a) and disk (b) pupil fills (σ = 0.7).

Metrics