In our previous publication [Poitras et al.. Appl. Opt. 42, 4037–4044 (2003)], an incorrect version of Fig. 8 was printed. The correct version of the figure is presented here.

© 2003 Optical Society of America

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  1. D. Poitras, J. A. Dobrowolski, T. Cassidy, S. Moisa, “Ion-beam etching for the precise manufacture of optical coatings,” Appl. Opt. 42, 4037–4044 (2003).
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Fig. 8
Fig. 8

Filter with a transmittance that corresponds to the silhouette of a temple in Kyoto. (a) Refractive index profile of the filter; (b) target transmittance as a function of wavelength; (c) calculated transmittance of the system shown in (a) above; (d) measured transmittance of two filters fabricated without- and with ion beam etching. The thicknesses of the remaining layers were re-optimized in both instances.