Fabrication of two-dimensional photonic crystals with controlled defects by use of multiple exposures and direct write

Abstract

We have developed an approach for relatively rapid and easy fabrication of large-area two-dimensional (2-D) photonic crystal structures with controlled defects in the lattice. The technique is based on the combination of two lithographic steps in UV-sensitive SU-8 photoresist. First, multiple exposures of interference fringes are used in combination with precise rotation of the sample to define a 2-D lattice of holes. Second, a strongly focused UV laser beam is used to define line-defect waveguides by localized exposure in the recorded but not yet developed lattice from the first step. After development, the mask is transferred into a GaAs substrate with dry etching in chemically assisted ion-beam etching.

© 2003 Optical Society of America

Fully three-dimensional modeling of the fabrication and behavior of photonic crystals formed by holographic lithography

Raymond C. Rumpf and Eric G. Johnson
J. Opt. Soc. Am. A 21(9) 1703-1713 (2004)

Five beam holographic lithography for simultaneous fabrication of three dimensional photonic crystal templates and line defects using phase tunable diffractive optical element

Yuankun Lin, Ahmad Harb, Karen Lozano, Di Xu, and K. P. Chen
Opt. Express 17(19) 16625-16631 (2009)

Arbitrary structuring of two-dimensional photonic crystals by use of phase-only Fourier gratings

Gwansu Lee, Seok Ho Song, Cha-Hwan Oh, and Pill-Soo Kim
Opt. Lett. 29(21) 2539-2541 (2004)

Rapid fabrication of large-area periodic structures containing well-defined defects by combining holography and mask techniques

Ngoc Diep Lai, Wen Ping Liang, Jian Hung Lin, and Chia Chen Hsu
Opt. Express 13(14) 5331-5337 (2005)

Pattern-integrated interference lithography: single-exposure fabrication of photonic-crystal structures

Guy M. Burrow, Matthieu C. R. Leibovici, and Thomas K. Gaylord
Appl. Opt. 51(18) 4028-4041 (2012)