Fabrication of two-dimensional photonic crystals with controlled defects by use of multiple exposures and direct write

Abstract

We have developed an approach for relatively rapid and easy fabrication of large-area two-dimensional (2-D) photonic crystal structures with controlled defects in the lattice. The technique is based on the combination of two lithographic steps in UV-sensitive SU-8 photoresist. First, multiple exposures of interference fringes are used in combination with precise rotation of the sample to define a 2-D lattice of holes. Second, a strongly focused UV laser beam is used to define line-defect waveguides by localized exposure in the recorded but not yet developed lattice from the first step. After development, the mask is transferred into a GaAs substrate with dry etching in chemically assisted ion-beam etching.

© 2003 Optical Society of America

Fully three-dimensional modeling of the fabrication and behavior of photonic crystals formed by holographic lithography

Raymond C. Rumpf and Eric G. Johnson
J. Opt. Soc. Am. A 21(9) 1703-1713 (2004)

Woodpile-type photonic crystals with orthorhombic or tetragonal symmetry formed through phase mask techniques

Yuankun Lin, David Rivera, and K. P. Chen
Opt. Express 14(2) 887-892 (2006)

Pattern-integrated interference lithography: single-exposure fabrication of photonic-crystal structures

Guy M. Burrow, Matthieu C. R. Leibovici, and Thomas K. Gaylord
Appl. Opt. 51(18) 4028-4041 (2012)

Fabrication of three-dimensional photonic crystals with multilayer photolithography

Peng Yao, Garrett J. Schneider, Dennis W. Prather, Eric D. Wetzel, and Daniel J. O’Brien
Opt. Express 13(7) 2370-2376 (2005)

Precisely introducing defects into periodic structures by using a double-step laser scanning technique

Ngoc Diep Lai, Jian Hung Lin, Wen Ping Liang, Chia Chen Hsu, and Cheng Hsiung Lin
Appl. Opt. 45(22) 5777-5782 (2006)