Abstract
Si:H alloys are being investigated for the high-index material in an interference filter to provide spectral control in an application of thermophotovoltaic energy conversion. In particular, a multilayer edge filter is being developed to provide high transmission of photons with wavelengths between 1.0 and 2.4 µm and high reflectance for wavelengths outside this range. Thin films of Si:H were deposited by means of rf reactive sputtering. Deposition parameters were varied to optimize the H content in Si:H coatings such that the refractive index was greater than 3. Optical absorption near 1 µm and Si:H infrared absorptions near 5 and 12 µm were minimized.
© 2002 Optical Society of America
Full Article | PDF ArticleMore Like This
Hidehiko Yoda, Kazuo Shiraishi, Yuji Hiratani, and Osamu Hanaizumi
Appl. Opt. 43(17) 3548-3554 (2004)
Yoshio Kawamata, Daisuke Ono, Hiroshi Ito, Hiroyuki Nikkuni, and Mikio Ito
Opt. Mater. Express 12(11) 4223-4234 (2022)
Rajendra Bhatt, Ivan Kravchenko, and Mool Gupta
Appl. Opt. 59(18) 5457-5462 (2020)