Abstract

We provide a detailed analysis of the various problems connected with the development of tunable thin-film filters for wavelength-division multiplexing applications. We examine the relation between the change in layer thickness and the central wavelength shift for various configurations and point out the significance of the structure of the reflectors, the spacer thickness, and the location of the active layers. We describe and compare practical arrangements using either temperature or an electric field as the driving parameter.

© 2002 Optical Society of America

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