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High-reflectivity HfO2/SiO2 ultraviolet mirrors

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Abstract

High-reflectivity dense multilayer coatings were produced for the ultraviolet spectral region. Thin-film single layers and UV mirrors were deposited by ion plating and plasma ion-assisted deposition high- energetic technologies. Optical characterizations of HfO2 and SiO2 single layers are made. The optical constants obtained for these two materials are presented. HfO2 and SiO2 mirrors with a reflectance of ∼99% near 250 nm are reported.

© 2002 Optical Society of America

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