Abstract

Laser-induced damage in bare glass substrates and thin films has long been widely acknowledged as a localized phenomenon associated with the presence of micrometer and submicrometer scale defects. The scanning of both optical absorption and scattering allows us to discriminate between absorbing and nonabsorbing defects and can give specific information about the origin of the defects. We investigate the spectral properties of defects in thin films and fused-silica surfaces. Absorbing and scattering defects are studied at different wavelengths in the ultraviolet, visible, and infrared ranges. Absorbing defects are shown to be highly wavelength dependent, whereas we have observed significant correlation between scattering defects.

© 2002 Optical Society of America

Full Article  |  PDF Article

References

  • View by:
  • |
  • |
  • |

  1. T. W. Walker, A. H. Guenther, P. Nielsen, “Pulsed laser-induced damage to thin-film optical coatings. II. Theory,” IEEE J. Quantum Electron. QE-17, 2053–2065 (1981).
    [CrossRef]
  2. M. R. Kozlowski, R. Chow, “Role of defects in laser damage of multilayer coatings,” in Laser-Induced Damage in Optical Materials: 1993, H. E. Bennett, L. L. Chase, A. H. Guenther, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2114, 640–649 (1994).
  3. J. Dijon, T. Poiroux, C. Desrumaux, “Nano absorbing centers: a key point in the laser damage of thin films,” in Laser-Induced Damage in Optical Materials: 1996, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2966, 315–325 (1997).
  4. M. D. Feit, J. H. Campbell, D. R. Faux, F. Y. Genin, M. R. Kozlowski, A. M. Robenchik, R. A. Riddle, A. Salleo, J. Yoshiyama, “Modeling of laser-induced surface cracks in silica at 355 nm,” in Laser-Induced Damage in Optical Materials: 1997, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, M. J. Soileau, eds., Proc. SPIE3244, 350–355 (1998).
  5. M. F. Koldunov, “Thermoelastic and ablation mechanisms of laser damage to the surface of transparent solids,” Quantum Electron. 28, 269–273 (1998).
    [CrossRef]
  6. P. A. Temple, “Examination of laser damage sites of transparent surfaces and films using internal reflection microscopy,” Natl. Bur. Stand. (U.S.) Spec. Publ. 568, 333–341 (1979).
  7. P. A. Temple, “Total internal reflection microscopy: a surface inspection technique,” Appl. Opt. 20, 2656–2664 (1981).
    [CrossRef] [PubMed]
  8. L. M. Sheehan, M. R. Kozlowski, D. W. Camp, “Application of total internal reflection microscopy for laser damage studies on fused silica,” in Laser-Induced Damage in Optical Materials: 1997, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, M. J. Soileau, eds., Proc. SPIE3244, 282–295 (1998).
  9. C. Amra, “Light scattering from multilayer optics. I. Tools of investigation,” J. Opt. Soc. Am. A 11, 197–210 (1994).
    [CrossRef]
  10. C. Amra, “Light scattering from multilayer optics. II. Application to experiment,” J. Opt. Soc. Am. A 11, 211–226 (1994).
    [CrossRef]
  11. S. Kassam, A. Duparré, K. Hehl, P. Bussemer, J. Neubert, “Light scattering from the volume of optical thin films: theory and experiment,” Appl. Opt. 31, 1304–1313 (1992).
    [CrossRef] [PubMed]
  12. S. Papernov, A. W. Schmid, J. Anzelotti, D. J. Smith, Z. R. Chrzan, “AFM-mapped nanoscale absorber-driven laser damage in UV high-reflector multilayers,” in 27th Annual Boalder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2714, 384–394 (1996).
  13. R. J. Tench, R. Chow, M. R. Kozlowski, “Characterization of defect geometries in multilayer optical coatings,” J. Vac. Sci. Technol. A 12, 2808–2813 (1994).
    [CrossRef]
  14. M. A. Paesler, P. J. Moyer, Near-Field Optics: Theory, Instrumentation, and applications (Wiley, New York, 1996).
  15. E. Welsch, D. Ristau, “Photothermal measurements on optical thin films,” Appl. Opt. 34, 7239–7253 (1995).
    [CrossRef] [PubMed]
  16. E. Welsch, “Absorption measurements,” in Handbook of Optical Properties: Thin Films for Optical Coatings, R. E. Hummel, K. H. Guenther, eds., (CRC Press, Boca Raton, Fla., 1995), Vol. 1, Chap. 9.
  17. M. Commandré, P. Roche, “Characterization of optical coatings by photothermal deflection,” Appl. Opt. 35, 5021–5034 (1996).
    [CrossRef] [PubMed]
  18. M. Commandré, P. Roche, J. P. Borgogno, G. Albrand, “Absorption mapping for characterization of glass surfaces,” Appl. Opt. 34, 2372–2379 (1995).
    [CrossRef] [PubMed]
  19. Z. L. Wu, M. Reichling, X.-Q. Hu, K. Balasubramanian, K. H. Guenther, “Absorption and thermal conductivity of oxide thin films measured by photothermal displacement and reflectance methods,” Appl. Opt. 32, 5660–5664 (1993).
    [CrossRef] [PubMed]
  20. E. Welsch, M. Reichling, “Micrometer resolved photothermal displacement inspection of optical coating,” J. Mod. Opt. 40, 1455–1475 (1993).
    [CrossRef]
  21. A. Bodemann, N. Kaiser, M. Reichling, E. Welsch, “Micrometer resolved inspection of defects and laser damage sites in UV high-reflecting coatings by photothermal displacement microscopy,” J. Phys. IV 4, C7611–C7614 (1994).
  22. M. Reichling, E. Welsch, A. Duparré, E. Matthias, “Photothermal absorption microscopy of defects in ZrO2 and MgF2 single-layer films,” Opt. Engl. 33, 1334–1342 (1994).
  23. M. Reichling, A. Bodeman, N. Kaiser, “New insight into defect-induced laser damage in UV multilayer coatings,” in Laser-Induced Damage in Optical Materials: 1994, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2428, 307–316 (1995).
  24. E. Welsch, K. Ettrich, H. Blasehke, P. Thomsen-Schmidt, D. Schaefer, N. Kaiser, “Investigation of the absorption induced damage in ultraviolet dielectric thin films,” Opt. Eng. 36, 504–514 (1997).
    [CrossRef]
  25. H. Scholze, Glass: Nature, Structure and Properties (Springer-Verlag, New York, 1991).
  26. L. B. Glebov, “Optical absorption and ionization of silicate glasses,” in Laser-Induced Damage in Optical Materials: 2000, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, K. L. Lewis, M. J. Soileau, eds., Proc. SPIE4347, 343–356 (2001).
  27. U. Willamowski, D. Ristau, T. Gross, P. Kadkhoda, H. Ehlers, K. Starke, “Untersuchungen zu ISO Standardmessverfarhen zur Charakterisierung optischer Laserkomponenten” in Instruments and Standard Test Procedures for Laser Beam and Optics Characterization (Laser Zentrum Hannover, Hannover, Germany, 1998).
  28. J. M. Bennett, L. Mattson, Introduction to Surface Roughness and Scattering, 2nd ed. (Optical Society of America, Washington, D.C., 1999).
  29. ISO Working Draft 13696, “Test method for radiation scattered by optical components,” ISO Technical Committee (International Organization for Standardization, Geneva, 1997).
  30. A. Gatto, “Défauts locaux absorbants et diffusants: Role et évolution dans l’irradiation, corrélation, etude multi-échelles,” Thèse de doctorat en Sciences (Université d’Aix-Marseille III, Marseille, France, 1999).
  31. A. During, L. Fossati, A. Gatto, M. Commandré, “Multiwavelength imaging of defects in UV optical materials,” in Optical Interference Coatings, Postconference Digest, A. A. Sawchuk, ed., Vol. 63 of OSA Trends in Optics and Photonics (Optical Society of America, Washington, D.C.2001).
  32. M. Commandré, E. Pelletier, “Measurements of absorption losses in TiO2 films by a collinear photothermal deflection technique,” Appl. Opt. 29, 4276–4283 (1990).
    [CrossRef] [PubMed]
  33. M. Commandré, P. Roche, “Characterization of absorption by photothermal deflection,” in Thin Films for Optical Systems, F. Flory, Efsd. (Marcel Dekker, New York, 1995), Chap. 12, pp. 329–365.

1998 (1)

M. F. Koldunov, “Thermoelastic and ablation mechanisms of laser damage to the surface of transparent solids,” Quantum Electron. 28, 269–273 (1998).
[CrossRef]

1997 (1)

E. Welsch, K. Ettrich, H. Blasehke, P. Thomsen-Schmidt, D. Schaefer, N. Kaiser, “Investigation of the absorption induced damage in ultraviolet dielectric thin films,” Opt. Eng. 36, 504–514 (1997).
[CrossRef]

1996 (1)

1995 (2)

1994 (5)

R. J. Tench, R. Chow, M. R. Kozlowski, “Characterization of defect geometries in multilayer optical coatings,” J. Vac. Sci. Technol. A 12, 2808–2813 (1994).
[CrossRef]

C. Amra, “Light scattering from multilayer optics. I. Tools of investigation,” J. Opt. Soc. Am. A 11, 197–210 (1994).
[CrossRef]

C. Amra, “Light scattering from multilayer optics. II. Application to experiment,” J. Opt. Soc. Am. A 11, 211–226 (1994).
[CrossRef]

A. Bodemann, N. Kaiser, M. Reichling, E. Welsch, “Micrometer resolved inspection of defects and laser damage sites in UV high-reflecting coatings by photothermal displacement microscopy,” J. Phys. IV 4, C7611–C7614 (1994).

M. Reichling, E. Welsch, A. Duparré, E. Matthias, “Photothermal absorption microscopy of defects in ZrO2 and MgF2 single-layer films,” Opt. Engl. 33, 1334–1342 (1994).

1993 (2)

1992 (1)

1990 (1)

1981 (2)

T. W. Walker, A. H. Guenther, P. Nielsen, “Pulsed laser-induced damage to thin-film optical coatings. II. Theory,” IEEE J. Quantum Electron. QE-17, 2053–2065 (1981).
[CrossRef]

P. A. Temple, “Total internal reflection microscopy: a surface inspection technique,” Appl. Opt. 20, 2656–2664 (1981).
[CrossRef] [PubMed]

1979 (1)

P. A. Temple, “Examination of laser damage sites of transparent surfaces and films using internal reflection microscopy,” Natl. Bur. Stand. (U.S.) Spec. Publ. 568, 333–341 (1979).

Albrand, G.

Amra, C.

Anzelotti, J.

S. Papernov, A. W. Schmid, J. Anzelotti, D. J. Smith, Z. R. Chrzan, “AFM-mapped nanoscale absorber-driven laser damage in UV high-reflector multilayers,” in 27th Annual Boalder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2714, 384–394 (1996).

Balasubramanian, K.

Bennett, J. M.

J. M. Bennett, L. Mattson, Introduction to Surface Roughness and Scattering, 2nd ed. (Optical Society of America, Washington, D.C., 1999).

Blasehke, H.

E. Welsch, K. Ettrich, H. Blasehke, P. Thomsen-Schmidt, D. Schaefer, N. Kaiser, “Investigation of the absorption induced damage in ultraviolet dielectric thin films,” Opt. Eng. 36, 504–514 (1997).
[CrossRef]

Bodeman, A.

M. Reichling, A. Bodeman, N. Kaiser, “New insight into defect-induced laser damage in UV multilayer coatings,” in Laser-Induced Damage in Optical Materials: 1994, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2428, 307–316 (1995).

Bodemann, A.

A. Bodemann, N. Kaiser, M. Reichling, E. Welsch, “Micrometer resolved inspection of defects and laser damage sites in UV high-reflecting coatings by photothermal displacement microscopy,” J. Phys. IV 4, C7611–C7614 (1994).

Borgogno, J. P.

Bussemer, P.

Camp, D. W.

L. M. Sheehan, M. R. Kozlowski, D. W. Camp, “Application of total internal reflection microscopy for laser damage studies on fused silica,” in Laser-Induced Damage in Optical Materials: 1997, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, M. J. Soileau, eds., Proc. SPIE3244, 282–295 (1998).

Campbell, J. H.

M. D. Feit, J. H. Campbell, D. R. Faux, F. Y. Genin, M. R. Kozlowski, A. M. Robenchik, R. A. Riddle, A. Salleo, J. Yoshiyama, “Modeling of laser-induced surface cracks in silica at 355 nm,” in Laser-Induced Damage in Optical Materials: 1997, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, M. J. Soileau, eds., Proc. SPIE3244, 350–355 (1998).

Chow, R.

R. J. Tench, R. Chow, M. R. Kozlowski, “Characterization of defect geometries in multilayer optical coatings,” J. Vac. Sci. Technol. A 12, 2808–2813 (1994).
[CrossRef]

M. R. Kozlowski, R. Chow, “Role of defects in laser damage of multilayer coatings,” in Laser-Induced Damage in Optical Materials: 1993, H. E. Bennett, L. L. Chase, A. H. Guenther, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2114, 640–649 (1994).

Chrzan, Z. R.

S. Papernov, A. W. Schmid, J. Anzelotti, D. J. Smith, Z. R. Chrzan, “AFM-mapped nanoscale absorber-driven laser damage in UV high-reflector multilayers,” in 27th Annual Boalder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2714, 384–394 (1996).

Commandré, M.

M. Commandré, P. Roche, “Characterization of optical coatings by photothermal deflection,” Appl. Opt. 35, 5021–5034 (1996).
[CrossRef] [PubMed]

M. Commandré, P. Roche, J. P. Borgogno, G. Albrand, “Absorption mapping for characterization of glass surfaces,” Appl. Opt. 34, 2372–2379 (1995).
[CrossRef] [PubMed]

M. Commandré, E. Pelletier, “Measurements of absorption losses in TiO2 films by a collinear photothermal deflection technique,” Appl. Opt. 29, 4276–4283 (1990).
[CrossRef] [PubMed]

M. Commandré, P. Roche, “Characterization of absorption by photothermal deflection,” in Thin Films for Optical Systems, F. Flory, Efsd. (Marcel Dekker, New York, 1995), Chap. 12, pp. 329–365.

A. During, L. Fossati, A. Gatto, M. Commandré, “Multiwavelength imaging of defects in UV optical materials,” in Optical Interference Coatings, Postconference Digest, A. A. Sawchuk, ed., Vol. 63 of OSA Trends in Optics and Photonics (Optical Society of America, Washington, D.C.2001).

Desrumaux, C.

J. Dijon, T. Poiroux, C. Desrumaux, “Nano absorbing centers: a key point in the laser damage of thin films,” in Laser-Induced Damage in Optical Materials: 1996, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2966, 315–325 (1997).

Dijon, J.

J. Dijon, T. Poiroux, C. Desrumaux, “Nano absorbing centers: a key point in the laser damage of thin films,” in Laser-Induced Damage in Optical Materials: 1996, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2966, 315–325 (1997).

Duparré, A.

M. Reichling, E. Welsch, A. Duparré, E. Matthias, “Photothermal absorption microscopy of defects in ZrO2 and MgF2 single-layer films,” Opt. Engl. 33, 1334–1342 (1994).

S. Kassam, A. Duparré, K. Hehl, P. Bussemer, J. Neubert, “Light scattering from the volume of optical thin films: theory and experiment,” Appl. Opt. 31, 1304–1313 (1992).
[CrossRef] [PubMed]

During, A.

A. During, L. Fossati, A. Gatto, M. Commandré, “Multiwavelength imaging of defects in UV optical materials,” in Optical Interference Coatings, Postconference Digest, A. A. Sawchuk, ed., Vol. 63 of OSA Trends in Optics and Photonics (Optical Society of America, Washington, D.C.2001).

Ehlers, H.

U. Willamowski, D. Ristau, T. Gross, P. Kadkhoda, H. Ehlers, K. Starke, “Untersuchungen zu ISO Standardmessverfarhen zur Charakterisierung optischer Laserkomponenten” in Instruments and Standard Test Procedures for Laser Beam and Optics Characterization (Laser Zentrum Hannover, Hannover, Germany, 1998).

Ettrich, K.

E. Welsch, K. Ettrich, H. Blasehke, P. Thomsen-Schmidt, D. Schaefer, N. Kaiser, “Investigation of the absorption induced damage in ultraviolet dielectric thin films,” Opt. Eng. 36, 504–514 (1997).
[CrossRef]

Faux, D. R.

M. D. Feit, J. H. Campbell, D. R. Faux, F. Y. Genin, M. R. Kozlowski, A. M. Robenchik, R. A. Riddle, A. Salleo, J. Yoshiyama, “Modeling of laser-induced surface cracks in silica at 355 nm,” in Laser-Induced Damage in Optical Materials: 1997, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, M. J. Soileau, eds., Proc. SPIE3244, 350–355 (1998).

Feit, M. D.

M. D. Feit, J. H. Campbell, D. R. Faux, F. Y. Genin, M. R. Kozlowski, A. M. Robenchik, R. A. Riddle, A. Salleo, J. Yoshiyama, “Modeling of laser-induced surface cracks in silica at 355 nm,” in Laser-Induced Damage in Optical Materials: 1997, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, M. J. Soileau, eds., Proc. SPIE3244, 350–355 (1998).

Fossati, L.

A. During, L. Fossati, A. Gatto, M. Commandré, “Multiwavelength imaging of defects in UV optical materials,” in Optical Interference Coatings, Postconference Digest, A. A. Sawchuk, ed., Vol. 63 of OSA Trends in Optics and Photonics (Optical Society of America, Washington, D.C.2001).

Gatto, A.

A. During, L. Fossati, A. Gatto, M. Commandré, “Multiwavelength imaging of defects in UV optical materials,” in Optical Interference Coatings, Postconference Digest, A. A. Sawchuk, ed., Vol. 63 of OSA Trends in Optics and Photonics (Optical Society of America, Washington, D.C.2001).

A. Gatto, “Défauts locaux absorbants et diffusants: Role et évolution dans l’irradiation, corrélation, etude multi-échelles,” Thèse de doctorat en Sciences (Université d’Aix-Marseille III, Marseille, France, 1999).

Genin, F. Y.

M. D. Feit, J. H. Campbell, D. R. Faux, F. Y. Genin, M. R. Kozlowski, A. M. Robenchik, R. A. Riddle, A. Salleo, J. Yoshiyama, “Modeling of laser-induced surface cracks in silica at 355 nm,” in Laser-Induced Damage in Optical Materials: 1997, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, M. J. Soileau, eds., Proc. SPIE3244, 350–355 (1998).

Glebov, L. B.

L. B. Glebov, “Optical absorption and ionization of silicate glasses,” in Laser-Induced Damage in Optical Materials: 2000, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, K. L. Lewis, M. J. Soileau, eds., Proc. SPIE4347, 343–356 (2001).

Gross, T.

U. Willamowski, D. Ristau, T. Gross, P. Kadkhoda, H. Ehlers, K. Starke, “Untersuchungen zu ISO Standardmessverfarhen zur Charakterisierung optischer Laserkomponenten” in Instruments and Standard Test Procedures for Laser Beam and Optics Characterization (Laser Zentrum Hannover, Hannover, Germany, 1998).

Guenther, A. H.

T. W. Walker, A. H. Guenther, P. Nielsen, “Pulsed laser-induced damage to thin-film optical coatings. II. Theory,” IEEE J. Quantum Electron. QE-17, 2053–2065 (1981).
[CrossRef]

Guenther, K. H.

Hehl, K.

Hu, X.-Q.

Kadkhoda, P.

U. Willamowski, D. Ristau, T. Gross, P. Kadkhoda, H. Ehlers, K. Starke, “Untersuchungen zu ISO Standardmessverfarhen zur Charakterisierung optischer Laserkomponenten” in Instruments and Standard Test Procedures for Laser Beam and Optics Characterization (Laser Zentrum Hannover, Hannover, Germany, 1998).

Kaiser, N.

E. Welsch, K. Ettrich, H. Blasehke, P. Thomsen-Schmidt, D. Schaefer, N. Kaiser, “Investigation of the absorption induced damage in ultraviolet dielectric thin films,” Opt. Eng. 36, 504–514 (1997).
[CrossRef]

A. Bodemann, N. Kaiser, M. Reichling, E. Welsch, “Micrometer resolved inspection of defects and laser damage sites in UV high-reflecting coatings by photothermal displacement microscopy,” J. Phys. IV 4, C7611–C7614 (1994).

M. Reichling, A. Bodeman, N. Kaiser, “New insight into defect-induced laser damage in UV multilayer coatings,” in Laser-Induced Damage in Optical Materials: 1994, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2428, 307–316 (1995).

Kassam, S.

Koldunov, M. F.

M. F. Koldunov, “Thermoelastic and ablation mechanisms of laser damage to the surface of transparent solids,” Quantum Electron. 28, 269–273 (1998).
[CrossRef]

Kozlowski, M. R.

R. J. Tench, R. Chow, M. R. Kozlowski, “Characterization of defect geometries in multilayer optical coatings,” J. Vac. Sci. Technol. A 12, 2808–2813 (1994).
[CrossRef]

M. D. Feit, J. H. Campbell, D. R. Faux, F. Y. Genin, M. R. Kozlowski, A. M. Robenchik, R. A. Riddle, A. Salleo, J. Yoshiyama, “Modeling of laser-induced surface cracks in silica at 355 nm,” in Laser-Induced Damage in Optical Materials: 1997, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, M. J. Soileau, eds., Proc. SPIE3244, 350–355 (1998).

M. R. Kozlowski, R. Chow, “Role of defects in laser damage of multilayer coatings,” in Laser-Induced Damage in Optical Materials: 1993, H. E. Bennett, L. L. Chase, A. H. Guenther, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2114, 640–649 (1994).

L. M. Sheehan, M. R. Kozlowski, D. W. Camp, “Application of total internal reflection microscopy for laser damage studies on fused silica,” in Laser-Induced Damage in Optical Materials: 1997, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, M. J. Soileau, eds., Proc. SPIE3244, 282–295 (1998).

Matthias, E.

M. Reichling, E. Welsch, A. Duparré, E. Matthias, “Photothermal absorption microscopy of defects in ZrO2 and MgF2 single-layer films,” Opt. Engl. 33, 1334–1342 (1994).

Mattson, L.

J. M. Bennett, L. Mattson, Introduction to Surface Roughness and Scattering, 2nd ed. (Optical Society of America, Washington, D.C., 1999).

Moyer, P. J.

M. A. Paesler, P. J. Moyer, Near-Field Optics: Theory, Instrumentation, and applications (Wiley, New York, 1996).

Neubert, J.

Nielsen, P.

T. W. Walker, A. H. Guenther, P. Nielsen, “Pulsed laser-induced damage to thin-film optical coatings. II. Theory,” IEEE J. Quantum Electron. QE-17, 2053–2065 (1981).
[CrossRef]

Paesler, M. A.

M. A. Paesler, P. J. Moyer, Near-Field Optics: Theory, Instrumentation, and applications (Wiley, New York, 1996).

Papernov, S.

S. Papernov, A. W. Schmid, J. Anzelotti, D. J. Smith, Z. R. Chrzan, “AFM-mapped nanoscale absorber-driven laser damage in UV high-reflector multilayers,” in 27th Annual Boalder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2714, 384–394 (1996).

Pelletier, E.

Poiroux, T.

J. Dijon, T. Poiroux, C. Desrumaux, “Nano absorbing centers: a key point in the laser damage of thin films,” in Laser-Induced Damage in Optical Materials: 1996, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2966, 315–325 (1997).

Reichling, M.

A. Bodemann, N. Kaiser, M. Reichling, E. Welsch, “Micrometer resolved inspection of defects and laser damage sites in UV high-reflecting coatings by photothermal displacement microscopy,” J. Phys. IV 4, C7611–C7614 (1994).

M. Reichling, E. Welsch, A. Duparré, E. Matthias, “Photothermal absorption microscopy of defects in ZrO2 and MgF2 single-layer films,” Opt. Engl. 33, 1334–1342 (1994).

E. Welsch, M. Reichling, “Micrometer resolved photothermal displacement inspection of optical coating,” J. Mod. Opt. 40, 1455–1475 (1993).
[CrossRef]

Z. L. Wu, M. Reichling, X.-Q. Hu, K. Balasubramanian, K. H. Guenther, “Absorption and thermal conductivity of oxide thin films measured by photothermal displacement and reflectance methods,” Appl. Opt. 32, 5660–5664 (1993).
[CrossRef] [PubMed]

M. Reichling, A. Bodeman, N. Kaiser, “New insight into defect-induced laser damage in UV multilayer coatings,” in Laser-Induced Damage in Optical Materials: 1994, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2428, 307–316 (1995).

Riddle, R. A.

M. D. Feit, J. H. Campbell, D. R. Faux, F. Y. Genin, M. R. Kozlowski, A. M. Robenchik, R. A. Riddle, A. Salleo, J. Yoshiyama, “Modeling of laser-induced surface cracks in silica at 355 nm,” in Laser-Induced Damage in Optical Materials: 1997, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, M. J. Soileau, eds., Proc. SPIE3244, 350–355 (1998).

Ristau, D.

E. Welsch, D. Ristau, “Photothermal measurements on optical thin films,” Appl. Opt. 34, 7239–7253 (1995).
[CrossRef] [PubMed]

U. Willamowski, D. Ristau, T. Gross, P. Kadkhoda, H. Ehlers, K. Starke, “Untersuchungen zu ISO Standardmessverfarhen zur Charakterisierung optischer Laserkomponenten” in Instruments and Standard Test Procedures for Laser Beam and Optics Characterization (Laser Zentrum Hannover, Hannover, Germany, 1998).

Robenchik, A. M.

M. D. Feit, J. H. Campbell, D. R. Faux, F. Y. Genin, M. R. Kozlowski, A. M. Robenchik, R. A. Riddle, A. Salleo, J. Yoshiyama, “Modeling of laser-induced surface cracks in silica at 355 nm,” in Laser-Induced Damage in Optical Materials: 1997, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, M. J. Soileau, eds., Proc. SPIE3244, 350–355 (1998).

Roche, P.

Salleo, A.

M. D. Feit, J. H. Campbell, D. R. Faux, F. Y. Genin, M. R. Kozlowski, A. M. Robenchik, R. A. Riddle, A. Salleo, J. Yoshiyama, “Modeling of laser-induced surface cracks in silica at 355 nm,” in Laser-Induced Damage in Optical Materials: 1997, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, M. J. Soileau, eds., Proc. SPIE3244, 350–355 (1998).

Schaefer, D.

E. Welsch, K. Ettrich, H. Blasehke, P. Thomsen-Schmidt, D. Schaefer, N. Kaiser, “Investigation of the absorption induced damage in ultraviolet dielectric thin films,” Opt. Eng. 36, 504–514 (1997).
[CrossRef]

Schmid, A. W.

S. Papernov, A. W. Schmid, J. Anzelotti, D. J. Smith, Z. R. Chrzan, “AFM-mapped nanoscale absorber-driven laser damage in UV high-reflector multilayers,” in 27th Annual Boalder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2714, 384–394 (1996).

Scholze, H.

H. Scholze, Glass: Nature, Structure and Properties (Springer-Verlag, New York, 1991).

Sheehan, L. M.

L. M. Sheehan, M. R. Kozlowski, D. W. Camp, “Application of total internal reflection microscopy for laser damage studies on fused silica,” in Laser-Induced Damage in Optical Materials: 1997, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, M. J. Soileau, eds., Proc. SPIE3244, 282–295 (1998).

Smith, D. J.

S. Papernov, A. W. Schmid, J. Anzelotti, D. J. Smith, Z. R. Chrzan, “AFM-mapped nanoscale absorber-driven laser damage in UV high-reflector multilayers,” in 27th Annual Boalder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2714, 384–394 (1996).

Starke, K.

U. Willamowski, D. Ristau, T. Gross, P. Kadkhoda, H. Ehlers, K. Starke, “Untersuchungen zu ISO Standardmessverfarhen zur Charakterisierung optischer Laserkomponenten” in Instruments and Standard Test Procedures for Laser Beam and Optics Characterization (Laser Zentrum Hannover, Hannover, Germany, 1998).

Temple, P. A.

P. A. Temple, “Total internal reflection microscopy: a surface inspection technique,” Appl. Opt. 20, 2656–2664 (1981).
[CrossRef] [PubMed]

P. A. Temple, “Examination of laser damage sites of transparent surfaces and films using internal reflection microscopy,” Natl. Bur. Stand. (U.S.) Spec. Publ. 568, 333–341 (1979).

Tench, R. J.

R. J. Tench, R. Chow, M. R. Kozlowski, “Characterization of defect geometries in multilayer optical coatings,” J. Vac. Sci. Technol. A 12, 2808–2813 (1994).
[CrossRef]

Thomsen-Schmidt, P.

E. Welsch, K. Ettrich, H. Blasehke, P. Thomsen-Schmidt, D. Schaefer, N. Kaiser, “Investigation of the absorption induced damage in ultraviolet dielectric thin films,” Opt. Eng. 36, 504–514 (1997).
[CrossRef]

Walker, T. W.

T. W. Walker, A. H. Guenther, P. Nielsen, “Pulsed laser-induced damage to thin-film optical coatings. II. Theory,” IEEE J. Quantum Electron. QE-17, 2053–2065 (1981).
[CrossRef]

Welsch, E.

E. Welsch, K. Ettrich, H. Blasehke, P. Thomsen-Schmidt, D. Schaefer, N. Kaiser, “Investigation of the absorption induced damage in ultraviolet dielectric thin films,” Opt. Eng. 36, 504–514 (1997).
[CrossRef]

E. Welsch, D. Ristau, “Photothermal measurements on optical thin films,” Appl. Opt. 34, 7239–7253 (1995).
[CrossRef] [PubMed]

M. Reichling, E. Welsch, A. Duparré, E. Matthias, “Photothermal absorption microscopy of defects in ZrO2 and MgF2 single-layer films,” Opt. Engl. 33, 1334–1342 (1994).

A. Bodemann, N. Kaiser, M. Reichling, E. Welsch, “Micrometer resolved inspection of defects and laser damage sites in UV high-reflecting coatings by photothermal displacement microscopy,” J. Phys. IV 4, C7611–C7614 (1994).

E. Welsch, M. Reichling, “Micrometer resolved photothermal displacement inspection of optical coating,” J. Mod. Opt. 40, 1455–1475 (1993).
[CrossRef]

E. Welsch, “Absorption measurements,” in Handbook of Optical Properties: Thin Films for Optical Coatings, R. E. Hummel, K. H. Guenther, eds., (CRC Press, Boca Raton, Fla., 1995), Vol. 1, Chap. 9.

Willamowski, U.

U. Willamowski, D. Ristau, T. Gross, P. Kadkhoda, H. Ehlers, K. Starke, “Untersuchungen zu ISO Standardmessverfarhen zur Charakterisierung optischer Laserkomponenten” in Instruments and Standard Test Procedures for Laser Beam and Optics Characterization (Laser Zentrum Hannover, Hannover, Germany, 1998).

Wu, Z. L.

Yoshiyama, J.

M. D. Feit, J. H. Campbell, D. R. Faux, F. Y. Genin, M. R. Kozlowski, A. M. Robenchik, R. A. Riddle, A. Salleo, J. Yoshiyama, “Modeling of laser-induced surface cracks in silica at 355 nm,” in Laser-Induced Damage in Optical Materials: 1997, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, M. J. Soileau, eds., Proc. SPIE3244, 350–355 (1998).

Appl. Opt. (7)

IEEE J. Quantum Electron. (1)

T. W. Walker, A. H. Guenther, P. Nielsen, “Pulsed laser-induced damage to thin-film optical coatings. II. Theory,” IEEE J. Quantum Electron. QE-17, 2053–2065 (1981).
[CrossRef]

J. Mod. Opt. (1)

E. Welsch, M. Reichling, “Micrometer resolved photothermal displacement inspection of optical coating,” J. Mod. Opt. 40, 1455–1475 (1993).
[CrossRef]

J. Opt. Soc. Am. A (2)

J. Phys. IV (1)

A. Bodemann, N. Kaiser, M. Reichling, E. Welsch, “Micrometer resolved inspection of defects and laser damage sites in UV high-reflecting coatings by photothermal displacement microscopy,” J. Phys. IV 4, C7611–C7614 (1994).

J. Vac. Sci. Technol. A (1)

R. J. Tench, R. Chow, M. R. Kozlowski, “Characterization of defect geometries in multilayer optical coatings,” J. Vac. Sci. Technol. A 12, 2808–2813 (1994).
[CrossRef]

Natl. Bur. Stand. (U.S.) Spec. Publ. (1)

P. A. Temple, “Examination of laser damage sites of transparent surfaces and films using internal reflection microscopy,” Natl. Bur. Stand. (U.S.) Spec. Publ. 568, 333–341 (1979).

Opt. Eng. (1)

E. Welsch, K. Ettrich, H. Blasehke, P. Thomsen-Schmidt, D. Schaefer, N. Kaiser, “Investigation of the absorption induced damage in ultraviolet dielectric thin films,” Opt. Eng. 36, 504–514 (1997).
[CrossRef]

Opt. Engl. (1)

M. Reichling, E. Welsch, A. Duparré, E. Matthias, “Photothermal absorption microscopy of defects in ZrO2 and MgF2 single-layer films,” Opt. Engl. 33, 1334–1342 (1994).

Quantum Electron. (1)

M. F. Koldunov, “Thermoelastic and ablation mechanisms of laser damage to the surface of transparent solids,” Quantum Electron. 28, 269–273 (1998).
[CrossRef]

Other (16)

L. M. Sheehan, M. R. Kozlowski, D. W. Camp, “Application of total internal reflection microscopy for laser damage studies on fused silica,” in Laser-Induced Damage in Optical Materials: 1997, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, M. J. Soileau, eds., Proc. SPIE3244, 282–295 (1998).

M. R. Kozlowski, R. Chow, “Role of defects in laser damage of multilayer coatings,” in Laser-Induced Damage in Optical Materials: 1993, H. E. Bennett, L. L. Chase, A. H. Guenther, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2114, 640–649 (1994).

J. Dijon, T. Poiroux, C. Desrumaux, “Nano absorbing centers: a key point in the laser damage of thin films,” in Laser-Induced Damage in Optical Materials: 1996, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2966, 315–325 (1997).

M. D. Feit, J. H. Campbell, D. R. Faux, F. Y. Genin, M. R. Kozlowski, A. M. Robenchik, R. A. Riddle, A. Salleo, J. Yoshiyama, “Modeling of laser-induced surface cracks in silica at 355 nm,” in Laser-Induced Damage in Optical Materials: 1997, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, M. J. Soileau, eds., Proc. SPIE3244, 350–355 (1998).

M. A. Paesler, P. J. Moyer, Near-Field Optics: Theory, Instrumentation, and applications (Wiley, New York, 1996).

E. Welsch, “Absorption measurements,” in Handbook of Optical Properties: Thin Films for Optical Coatings, R. E. Hummel, K. H. Guenther, eds., (CRC Press, Boca Raton, Fla., 1995), Vol. 1, Chap. 9.

S. Papernov, A. W. Schmid, J. Anzelotti, D. J. Smith, Z. R. Chrzan, “AFM-mapped nanoscale absorber-driven laser damage in UV high-reflector multilayers,” in 27th Annual Boalder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2714, 384–394 (1996).

M. Reichling, A. Bodeman, N. Kaiser, “New insight into defect-induced laser damage in UV multilayer coatings,” in Laser-Induced Damage in Optical Materials: 1994, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2428, 307–316 (1995).

M. Commandré, P. Roche, “Characterization of absorption by photothermal deflection,” in Thin Films for Optical Systems, F. Flory, Efsd. (Marcel Dekker, New York, 1995), Chap. 12, pp. 329–365.

H. Scholze, Glass: Nature, Structure and Properties (Springer-Verlag, New York, 1991).

L. B. Glebov, “Optical absorption and ionization of silicate glasses,” in Laser-Induced Damage in Optical Materials: 2000, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, K. L. Lewis, M. J. Soileau, eds., Proc. SPIE4347, 343–356 (2001).

U. Willamowski, D. Ristau, T. Gross, P. Kadkhoda, H. Ehlers, K. Starke, “Untersuchungen zu ISO Standardmessverfarhen zur Charakterisierung optischer Laserkomponenten” in Instruments and Standard Test Procedures for Laser Beam and Optics Characterization (Laser Zentrum Hannover, Hannover, Germany, 1998).

J. M. Bennett, L. Mattson, Introduction to Surface Roughness and Scattering, 2nd ed. (Optical Society of America, Washington, D.C., 1999).

ISO Working Draft 13696, “Test method for radiation scattered by optical components,” ISO Technical Committee (International Organization for Standardization, Geneva, 1997).

A. Gatto, “Défauts locaux absorbants et diffusants: Role et évolution dans l’irradiation, corrélation, etude multi-échelles,” Thèse de doctorat en Sciences (Université d’Aix-Marseille III, Marseille, France, 1999).

A. During, L. Fossati, A. Gatto, M. Commandré, “Multiwavelength imaging of defects in UV optical materials,” in Optical Interference Coatings, Postconference Digest, A. A. Sawchuk, ed., Vol. 63 of OSA Trends in Optics and Photonics (Optical Society of America, Washington, D.C.2001).

Cited By

OSA participates in CrossRef's Cited-By Linking service. Citing articles from OSA journals and other participating publishers are listed here.

Alert me when this article is cited.


Figures (7)

Fig. 1
Fig. 1

Experimental setup.

Fig. 2
Fig. 2

Absorption and scattering mappings at wavelengths of 363 514 nm on a fused-silica substrate. Both the top view and the perspective are given for each wavelength in this example. The experimental conditions are a 25-µm pump-beam diameter with an incident angle of 30° and s polarization, a 25-µm sampling step, and a mapped area of 500 µm × 500 µm (21 × 21 points).

Fig. 3
Fig. 3

Absorption and scattering mappings at wavelengths of 363 and 514 nm for a HfO2 film deposited by electron-beam evaporation on a fused-silica substrate. The experimental conditions are the same as in Fig. 2. A gray-level scale is given for each mapping.

Fig. 4
Fig. 4

Absorption and scattering mappings at wavelengths of 363 and 514 nm for MgF2 deposited by electron-beam evaporation on a fused-silica substrate. The experimental conditions are the same as in Fig. 2.

Fig. 5
Fig. 5

Absorption and scattering mappings at 514-nm wavelength centered on the same point as the mappings in Fig. 4, but the mapped field is now 750 µm × 750 µm (31 × 31 points). Other experimental conditions are the same as in Fig. 4. With absorption mapping we can observe the imprint of UV scanning.

Fig. 6
Fig. 6

Rare case of correlation between absorption mappings. Absorption and scattering mappings at wavelengths of 363 and 514 nm for a Sc2O3 film deposited by electron-beam evaporation on a fused-silica substrate. The experimental conditions are the same as in Fig. 2.

Fig. 7
Fig. 7

Absorption and scattering mappings at wavelengths of 363, 514, and 1.06 µm for a HfO2 film deposited by electron-beam evaporation on a fused-silica substrate. The experimental conditions are the same as in Fig. 2 for the UV and visible ranges. For λ = 1064 nm, the pump beam is focused at normal incidence on the sample surface.

Tables (5)

Tables Icon

Table 1 Absorption, Scattering and Correlation Values from Fig. 2 for a Fused-Silica Bare Substrate

Tables Icon

Table 2 Absorption, Scattering, and Correlation Values from Fig. 3 for HfO2 Film Sample 1

Tables Icon

Table 3 Absorption, Scattering, and Correlation Values from Fig. 4 for MgF2 Film

Tables Icon

Table 4 Absorption, Scattering, and Correlation Values from Fig. 6 for Sc2O3 Film

Tables Icon

Table 5 Absorption, Scattering, and Correlation Values from Fig. 7 for HfO2 Film Sample 2

Equations (6)

Equations on this page are rendered with MathJax. Learn more.

ai, j=Ai, j-AmeanklAk, l-Amean21/2,
Amean=mnAm, nNP.
CorF, Gi, j=klFk, lGk-i, l-j.
CORF, G=maxi0, j0CorF, Gi, j.
PCEF, G=maxi0, j0|CorF, Gi, j|2ijklFk, lGk-i, l-j2.
PCE=max|CorF, Gi, j|2ijklFk, lGk-i, l-j2max|CorF, Fi, j|2ijklFk, lFk-i, l-j2.

Metrics