Abstract

We report on a horn-shaped electro-optic scanner based on a ferroelectric LiTaO3 wafer that is capable of scanning 632.8-nm light by an unprecedented 14.88° angle for extraordinary polarized light and by 4.05° for ordinary polarized light. The device concept is based on micropatterning ferroelectric domains in the shape of a series of optimized prisms whose refractive index is electric field tunable through the electro-optic effect. We demonstrate what we believe is a novel technique of using electro-optic imaging microscopy for in situ monitoring of the process of domain micropatterning during device fabrication, thus eliminating imperfect process control based on ex situ monitoring of transient currents.

© 2001 Optical Society of America

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