Abstract

We describe the fabrication of large areas (4 cm2) of metallic structures or aperture elements that have ∼100–350-nm linewidths and act as frequency-selective surfaces. These structures are fabricated with a type of soft lithography—near-field contact-mode photolithography—that uses a thin elastomeric mask having topography on its surface and is in conformal contact with a layer of photoresist. The mask acts as an optical element to create minima in the intensity of light delivered to the photoresist. Depending on the type of photoresist used, lines of, or trenches in, photoresist are formed on the substrate by exposure, development, and lift-off. These surfaces act as bandpass or bandgap filters in the infrared.

© 2001 Optical Society of America

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