Abstract

The recent interest in extreme-ultraviolet (EUV) lithography has led to the development of an array of at-wavelength metrologies implemented on synchrotron beamlines. These beamlines commonly use Kirkpatrick–Baez (K–B) systems consisting of two perpendicular, elliptically bent mirrors in series. To achieve high-efficiency focusing into a small spot, unprecedented fabrication and assembly tolerance is required of these systems. Here we present a detailed error-budget analysis and develop a set of specifications for diffraction-limited performance for the K–B optic operating on the EUV interferometry beamline at Lawrence Berkeley National Laboratory’s Advanced Light Source. The specifications are based on code v modeling tools developed explicitly for these optical systems. Although developed for one particular system, the alignment sensitivities presented here are relevant to K–B system designs in general.

© 2001 Optical Society of America

Full Article  |  PDF Article
OSA Recommended Articles
Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy

Patrick P. Naulleau, Kenneth A. Goldberg, Sang H. Lee, Chang Chang, David Attwood, and Jeffrey Bokor
Appl. Opt. 38(35) 7252-7263 (1999)

Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography

Regina Soufli, Russell M. Hudyma, Eberhard Spiller, Eric M. Gullikson, Mark A. Schmidt, Jeff C. Robinson, Sherry L. Baker, Christopher C. Walton, and John S. Taylor
Appl. Opt. 46(18) 3736-3746 (2007)

Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system

Claude Montcalm, R. Frederick Grabner, Russell M. Hudyma, Mark A. Schmidt, Eberhard Spiller, Christopher C. Walton, Marco Wedowski, and James A. Folta
Appl. Opt. 41(16) 3262-3269 (2002)

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Figures (8)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Tables (5)

You do not have subscription access to this journal. Article tables are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Metrics

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription