Abstract

A precision laser pattern generator for writing arbitrary diffractive elements was developed as an alternative to Cartesian coordinate laser/electron-beam writers. This system allows for the fabrication of concentric continuous-relief and arbitrary binary patterns with minimum feature sizes of less than 0.6 µm and position accuracy of 0.1 µm over 300-mm substrates. Two resistless technologies of writing on chromium and on amorphous silicon films were developed and implemented. We investigated limit characteristics by writing special test structures. A 58-mm f/1.1 zone plate written directly is demonstrated at a λ/50 rms wave-front error corresponding to a 0.06-µm pattern accuracy. Several examples of fabricated diffractive elements are presented.

© 1999 Optical Society of America

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