Optical monitoring of periodic thin-film stacks by the termination
of each layer at the same constant photometric level has certain
advantages. One of these principal advantages is the error
compensation effect in the vicinity of the monitoring
wavelength. In this study, we examine, by simulation, the effect of
an error in the knowledge of the absolute value of the photometric
termination level on the probable stability in the manufacture of the
edge position of a blocked band. The results include equations that
allow the determination of the appropriate values of parameters
associated with the optimum termination levels to minimize the effects
of such errors.
© 1999 Optical Society of America
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