Abstract

Laser-induced-damage thresholds (LIDT’s) with various types of vitreous silica at 1064, 532, 355, and 266 nm are investigated. At 1064 nm no difference in the LIDT was observed in any sample. At 1064–355 nm the wavelength dependence of the LIDT of synthetic fused silica (SFS) can be described well by the relation I th = 1.45λ0.43, where I th is the LIDT in J/cm2 and λ is the wavelength in nanometers. At 266 nm, however, LIDT’s were smaller than half of the calculated value from the relation above. This difference can be explained by the damage mechanism; at 266 nm two-photon absorption-induced defects lower the LIDT as in the case of KrF-excimer-laser-induced defects, whereas at longer wavelengths the two-photon process does not occur. LIDT’s of fused quartz (FQ) at 532 and 355 nm and that of SFS containing ∼1000 ppm of Cl and no OH at 355 nm were a little lower than those of the other SFS’s. This lower LIDT may be related to the absorption of metallic impurities in FQ and dissolved Cl2 molecules in SFS. At 266 nm, on the other hand, LIDT’s of FQ’s were higher than those of most SFS’s.

© 1999 Optical Society of America

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References

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  1. N. Kuzuu, Sekiei Garasu no Sekai (Introduction to Silica Glass Science and Technology) (Kogyo Chosakai, Tokyo, 1995), in Japanese.
  2. R. Brückner, “Properties and structures of vitreous silica,” J. Non-Cryst. Solids 5, 123–175 (1970).
    [Crossref]
  3. D. L. Griscom, “Optical properties and structure of defects in silica glass,” J. Ceram. Soc. Jpn. 99, 923–942 (1991).
    [Crossref]
  4. Production Catalog (Nippon Silica Glass Company, Ltd., Tokyo, Japan, 1995).
  5. N. Kuzuu, T. Taga, N. Kamisugi, “Effect of SiOH and SiCl on ArF-excimer-laser-induced absorption in soot-remelted silica,” J. Appl. Phys. 81, 8011–8017 (1997).
    [Crossref]
  6. N. Kuzuu, Y. Komatsu, M. Murahara, “ArF-excimer-laser-induced emission and absorption bands in fused silica synthesized in reducing condition,” Phys. Rev. B 44, 9265–9270 (1991).
    [Crossref]
  7. N. Kuzuu, Y. Komatsu, M. Murahara, “ArF-excimer-laser-induced emission and absorption bands in fused silica synthesized in an oxidizing condition,” Phys. Rev. B 45, 2050–2054 (1992).
    [Crossref]
  8. N. Kuzuu, Y. Komatsu, M. Murahara, “Energy density and repetition-rate dependence of KrF-excimer-laser induced 1.9 eV emission band in type III fused silica,” Phys. Rev. B 47, 3078–3082 (1993).
    [Crossref]
  9. N. Kuzuu, M. Murahara, “Excimer-laser-induced emission bands in fused quartz,” Phys. Rev. B 47, 3083–3088 (1993).
    [Crossref]
  10. N. Kuzuu, “OH content dependence of ArF-excimer-laser-induced absorption in type-III fused silica,” in Laser-Induced Damage in Optical Materials: 1995, M. R. Kozlowski, B. E. Newman, M. J. Soileau, eds., Proc. SPIE2714, 71–79 (1996).
  11. N. Kuzuu, M. Murahara, “Effect of synthetic conditions on existence and nonexistence of ArF-excimer-laser and x-ray induced B2 band in type III fused silicas,” Phys. Rev. B 52, 3241–3247 (1995).
    [Crossref]
  12. S. YamagataEffect of dissolved hydrogen on durability of silica glass under excimer laser irradiationMineral. J. “,” 15, 333–342 (1991).
  13. D. R. Sempolinski, T. P. Seward, C. Smith, N. Borrelli, C. Rosplock, “Effect of glass formation conditions on KrF-excimer-laser-induced optical damage in synthetic silica,” J. Non-Cryst. Solids 203, 69–77 (1996).
    [Crossref]
  14. M. Shimbo, K. Sato, “Change in UV transmittance in silica photomask glass under KrF excimer laser irradiation,” Jpn. J. Appl. Phys. 34, 5640–5643 (1995).
    [Crossref]
  15. L. D. Merkle, N. Koumvakalis, M. Bass, “Laser induced bulk damage in SiO2 at 1.064, 0.532 and 0.355 µm,” in Laser Induced Damage in Optical Materials: 1983, H. E. Bennett, A. H. Guenther, D. Milam, B. E. Newman, eds., Natl. Bur. Stand. (U.S.) Spec. Publ. 688, 128–134 (1985).
  16. L. D. Merkle, M. Bass, R. T. Swimm, “Multiple pulse laser-induced bulk damage in crystalline and fused quartz at 1.064 and 0.532 µm,” in Laser Induced Damage in Optical Materials: 1982, H. E. Bennett, A. H. Guenther, D. Milam, B. E. Newman, eds., Natl. Bur. Stand. (U.S.) Spec. Publ. 669, 50–58 (1985).
  17. D. Kitriotis, L. D. Merkle, A. Dodson, “Multiple pulse damage studies of BK-7, KCl and SiO2 at 532 nm,” in Laser Induced Damage in Optical Materials: 1985,

1997 (1)

N. Kuzuu, T. Taga, N. Kamisugi, “Effect of SiOH and SiCl on ArF-excimer-laser-induced absorption in soot-remelted silica,” J. Appl. Phys. 81, 8011–8017 (1997).
[Crossref]

1996 (1)

D. R. Sempolinski, T. P. Seward, C. Smith, N. Borrelli, C. Rosplock, “Effect of glass formation conditions on KrF-excimer-laser-induced optical damage in synthetic silica,” J. Non-Cryst. Solids 203, 69–77 (1996).
[Crossref]

1995 (2)

M. Shimbo, K. Sato, “Change in UV transmittance in silica photomask glass under KrF excimer laser irradiation,” Jpn. J. Appl. Phys. 34, 5640–5643 (1995).
[Crossref]

N. Kuzuu, M. Murahara, “Effect of synthetic conditions on existence and nonexistence of ArF-excimer-laser and x-ray induced B2 band in type III fused silicas,” Phys. Rev. B 52, 3241–3247 (1995).
[Crossref]

1993 (2)

N. Kuzuu, Y. Komatsu, M. Murahara, “Energy density and repetition-rate dependence of KrF-excimer-laser induced 1.9 eV emission band in type III fused silica,” Phys. Rev. B 47, 3078–3082 (1993).
[Crossref]

N. Kuzuu, M. Murahara, “Excimer-laser-induced emission bands in fused quartz,” Phys. Rev. B 47, 3083–3088 (1993).
[Crossref]

1992 (1)

N. Kuzuu, Y. Komatsu, M. Murahara, “ArF-excimer-laser-induced emission and absorption bands in fused silica synthesized in an oxidizing condition,” Phys. Rev. B 45, 2050–2054 (1992).
[Crossref]

1991 (3)

S. YamagataEffect of dissolved hydrogen on durability of silica glass under excimer laser irradiationMineral. J. “,” 15, 333–342 (1991).

N. Kuzuu, Y. Komatsu, M. Murahara, “ArF-excimer-laser-induced emission and absorption bands in fused silica synthesized in reducing condition,” Phys. Rev. B 44, 9265–9270 (1991).
[Crossref]

D. L. Griscom, “Optical properties and structure of defects in silica glass,” J. Ceram. Soc. Jpn. 99, 923–942 (1991).
[Crossref]

1970 (1)

R. Brückner, “Properties and structures of vitreous silica,” J. Non-Cryst. Solids 5, 123–175 (1970).
[Crossref]

Bass, M.

L. D. Merkle, N. Koumvakalis, M. Bass, “Laser induced bulk damage in SiO2 at 1.064, 0.532 and 0.355 µm,” in Laser Induced Damage in Optical Materials: 1983, H. E. Bennett, A. H. Guenther, D. Milam, B. E. Newman, eds., Natl. Bur. Stand. (U.S.) Spec. Publ. 688, 128–134 (1985).

L. D. Merkle, M. Bass, R. T. Swimm, “Multiple pulse laser-induced bulk damage in crystalline and fused quartz at 1.064 and 0.532 µm,” in Laser Induced Damage in Optical Materials: 1982, H. E. Bennett, A. H. Guenther, D. Milam, B. E. Newman, eds., Natl. Bur. Stand. (U.S.) Spec. Publ. 669, 50–58 (1985).

Borrelli, N.

D. R. Sempolinski, T. P. Seward, C. Smith, N. Borrelli, C. Rosplock, “Effect of glass formation conditions on KrF-excimer-laser-induced optical damage in synthetic silica,” J. Non-Cryst. Solids 203, 69–77 (1996).
[Crossref]

Brückner, R.

R. Brückner, “Properties and structures of vitreous silica,” J. Non-Cryst. Solids 5, 123–175 (1970).
[Crossref]

Griscom, D. L.

D. L. Griscom, “Optical properties and structure of defects in silica glass,” J. Ceram. Soc. Jpn. 99, 923–942 (1991).
[Crossref]

Kamisugi, N.

N. Kuzuu, T. Taga, N. Kamisugi, “Effect of SiOH and SiCl on ArF-excimer-laser-induced absorption in soot-remelted silica,” J. Appl. Phys. 81, 8011–8017 (1997).
[Crossref]

Komatsu, Y.

N. Kuzuu, Y. Komatsu, M. Murahara, “Energy density and repetition-rate dependence of KrF-excimer-laser induced 1.9 eV emission band in type III fused silica,” Phys. Rev. B 47, 3078–3082 (1993).
[Crossref]

N. Kuzuu, Y. Komatsu, M. Murahara, “ArF-excimer-laser-induced emission and absorption bands in fused silica synthesized in an oxidizing condition,” Phys. Rev. B 45, 2050–2054 (1992).
[Crossref]

N. Kuzuu, Y. Komatsu, M. Murahara, “ArF-excimer-laser-induced emission and absorption bands in fused silica synthesized in reducing condition,” Phys. Rev. B 44, 9265–9270 (1991).
[Crossref]

Koumvakalis, N.

L. D. Merkle, N. Koumvakalis, M. Bass, “Laser induced bulk damage in SiO2 at 1.064, 0.532 and 0.355 µm,” in Laser Induced Damage in Optical Materials: 1983, H. E. Bennett, A. H. Guenther, D. Milam, B. E. Newman, eds., Natl. Bur. Stand. (U.S.) Spec. Publ. 688, 128–134 (1985).

Kuzuu, N.

N. Kuzuu, T. Taga, N. Kamisugi, “Effect of SiOH and SiCl on ArF-excimer-laser-induced absorption in soot-remelted silica,” J. Appl. Phys. 81, 8011–8017 (1997).
[Crossref]

N. Kuzuu, M. Murahara, “Effect of synthetic conditions on existence and nonexistence of ArF-excimer-laser and x-ray induced B2 band in type III fused silicas,” Phys. Rev. B 52, 3241–3247 (1995).
[Crossref]

N. Kuzuu, Y. Komatsu, M. Murahara, “Energy density and repetition-rate dependence of KrF-excimer-laser induced 1.9 eV emission band in type III fused silica,” Phys. Rev. B 47, 3078–3082 (1993).
[Crossref]

N. Kuzuu, M. Murahara, “Excimer-laser-induced emission bands in fused quartz,” Phys. Rev. B 47, 3083–3088 (1993).
[Crossref]

N. Kuzuu, Y. Komatsu, M. Murahara, “ArF-excimer-laser-induced emission and absorption bands in fused silica synthesized in an oxidizing condition,” Phys. Rev. B 45, 2050–2054 (1992).
[Crossref]

N. Kuzuu, Y. Komatsu, M. Murahara, “ArF-excimer-laser-induced emission and absorption bands in fused silica synthesized in reducing condition,” Phys. Rev. B 44, 9265–9270 (1991).
[Crossref]

N. Kuzuu, Sekiei Garasu no Sekai (Introduction to Silica Glass Science and Technology) (Kogyo Chosakai, Tokyo, 1995), in Japanese.

N. Kuzuu, “OH content dependence of ArF-excimer-laser-induced absorption in type-III fused silica,” in Laser-Induced Damage in Optical Materials: 1995, M. R. Kozlowski, B. E. Newman, M. J. Soileau, eds., Proc. SPIE2714, 71–79 (1996).

Merkle, L. D.

L. D. Merkle, M. Bass, R. T. Swimm, “Multiple pulse laser-induced bulk damage in crystalline and fused quartz at 1.064 and 0.532 µm,” in Laser Induced Damage in Optical Materials: 1982, H. E. Bennett, A. H. Guenther, D. Milam, B. E. Newman, eds., Natl. Bur. Stand. (U.S.) Spec. Publ. 669, 50–58 (1985).

L. D. Merkle, N. Koumvakalis, M. Bass, “Laser induced bulk damage in SiO2 at 1.064, 0.532 and 0.355 µm,” in Laser Induced Damage in Optical Materials: 1983, H. E. Bennett, A. H. Guenther, D. Milam, B. E. Newman, eds., Natl. Bur. Stand. (U.S.) Spec. Publ. 688, 128–134 (1985).

Murahara, M.

N. Kuzuu, M. Murahara, “Effect of synthetic conditions on existence and nonexistence of ArF-excimer-laser and x-ray induced B2 band in type III fused silicas,” Phys. Rev. B 52, 3241–3247 (1995).
[Crossref]

N. Kuzuu, M. Murahara, “Excimer-laser-induced emission bands in fused quartz,” Phys. Rev. B 47, 3083–3088 (1993).
[Crossref]

N. Kuzuu, Y. Komatsu, M. Murahara, “Energy density and repetition-rate dependence of KrF-excimer-laser induced 1.9 eV emission band in type III fused silica,” Phys. Rev. B 47, 3078–3082 (1993).
[Crossref]

N. Kuzuu, Y. Komatsu, M. Murahara, “ArF-excimer-laser-induced emission and absorption bands in fused silica synthesized in an oxidizing condition,” Phys. Rev. B 45, 2050–2054 (1992).
[Crossref]

N. Kuzuu, Y. Komatsu, M. Murahara, “ArF-excimer-laser-induced emission and absorption bands in fused silica synthesized in reducing condition,” Phys. Rev. B 44, 9265–9270 (1991).
[Crossref]

Rosplock, C.

D. R. Sempolinski, T. P. Seward, C. Smith, N. Borrelli, C. Rosplock, “Effect of glass formation conditions on KrF-excimer-laser-induced optical damage in synthetic silica,” J. Non-Cryst. Solids 203, 69–77 (1996).
[Crossref]

Sato, K.

M. Shimbo, K. Sato, “Change in UV transmittance in silica photomask glass under KrF excimer laser irradiation,” Jpn. J. Appl. Phys. 34, 5640–5643 (1995).
[Crossref]

Sempolinski, D. R.

D. R. Sempolinski, T. P. Seward, C. Smith, N. Borrelli, C. Rosplock, “Effect of glass formation conditions on KrF-excimer-laser-induced optical damage in synthetic silica,” J. Non-Cryst. Solids 203, 69–77 (1996).
[Crossref]

Seward, T. P.

D. R. Sempolinski, T. P. Seward, C. Smith, N. Borrelli, C. Rosplock, “Effect of glass formation conditions on KrF-excimer-laser-induced optical damage in synthetic silica,” J. Non-Cryst. Solids 203, 69–77 (1996).
[Crossref]

Shimbo, M.

M. Shimbo, K. Sato, “Change in UV transmittance in silica photomask glass under KrF excimer laser irradiation,” Jpn. J. Appl. Phys. 34, 5640–5643 (1995).
[Crossref]

Smith, C.

D. R. Sempolinski, T. P. Seward, C. Smith, N. Borrelli, C. Rosplock, “Effect of glass formation conditions on KrF-excimer-laser-induced optical damage in synthetic silica,” J. Non-Cryst. Solids 203, 69–77 (1996).
[Crossref]

Swimm, R. T.

L. D. Merkle, M. Bass, R. T. Swimm, “Multiple pulse laser-induced bulk damage in crystalline and fused quartz at 1.064 and 0.532 µm,” in Laser Induced Damage in Optical Materials: 1982, H. E. Bennett, A. H. Guenther, D. Milam, B. E. Newman, eds., Natl. Bur. Stand. (U.S.) Spec. Publ. 669, 50–58 (1985).

Taga, T.

N. Kuzuu, T. Taga, N. Kamisugi, “Effect of SiOH and SiCl on ArF-excimer-laser-induced absorption in soot-remelted silica,” J. Appl. Phys. 81, 8011–8017 (1997).
[Crossref]

Yamagata, S.

S. YamagataEffect of dissolved hydrogen on durability of silica glass under excimer laser irradiationMineral. J. “,” 15, 333–342 (1991).

J. Appl. Phys. (1)

N. Kuzuu, T. Taga, N. Kamisugi, “Effect of SiOH and SiCl on ArF-excimer-laser-induced absorption in soot-remelted silica,” J. Appl. Phys. 81, 8011–8017 (1997).
[Crossref]

J. Ceram. Soc. Jpn. (1)

D. L. Griscom, “Optical properties and structure of defects in silica glass,” J. Ceram. Soc. Jpn. 99, 923–942 (1991).
[Crossref]

J. Non-Cryst. Solids (2)

R. Brückner, “Properties and structures of vitreous silica,” J. Non-Cryst. Solids 5, 123–175 (1970).
[Crossref]

D. R. Sempolinski, T. P. Seward, C. Smith, N. Borrelli, C. Rosplock, “Effect of glass formation conditions on KrF-excimer-laser-induced optical damage in synthetic silica,” J. Non-Cryst. Solids 203, 69–77 (1996).
[Crossref]

Jpn. J. Appl. Phys. (1)

M. Shimbo, K. Sato, “Change in UV transmittance in silica photomask glass under KrF excimer laser irradiation,” Jpn. J. Appl. Phys. 34, 5640–5643 (1995).
[Crossref]

Mineral. J. (1)

S. YamagataEffect of dissolved hydrogen on durability of silica glass under excimer laser irradiationMineral. J. “,” 15, 333–342 (1991).

Phys. Rev. B (5)

N. Kuzuu, M. Murahara, “Effect of synthetic conditions on existence and nonexistence of ArF-excimer-laser and x-ray induced B2 band in type III fused silicas,” Phys. Rev. B 52, 3241–3247 (1995).
[Crossref]

N. Kuzuu, Y. Komatsu, M. Murahara, “ArF-excimer-laser-induced emission and absorption bands in fused silica synthesized in reducing condition,” Phys. Rev. B 44, 9265–9270 (1991).
[Crossref]

N. Kuzuu, Y. Komatsu, M. Murahara, “ArF-excimer-laser-induced emission and absorption bands in fused silica synthesized in an oxidizing condition,” Phys. Rev. B 45, 2050–2054 (1992).
[Crossref]

N. Kuzuu, Y. Komatsu, M. Murahara, “Energy density and repetition-rate dependence of KrF-excimer-laser induced 1.9 eV emission band in type III fused silica,” Phys. Rev. B 47, 3078–3082 (1993).
[Crossref]

N. Kuzuu, M. Murahara, “Excimer-laser-induced emission bands in fused quartz,” Phys. Rev. B 47, 3083–3088 (1993).
[Crossref]

Other (6)

N. Kuzuu, “OH content dependence of ArF-excimer-laser-induced absorption in type-III fused silica,” in Laser-Induced Damage in Optical Materials: 1995, M. R. Kozlowski, B. E. Newman, M. J. Soileau, eds., Proc. SPIE2714, 71–79 (1996).

N. Kuzuu, Sekiei Garasu no Sekai (Introduction to Silica Glass Science and Technology) (Kogyo Chosakai, Tokyo, 1995), in Japanese.

Production Catalog (Nippon Silica Glass Company, Ltd., Tokyo, Japan, 1995).

L. D. Merkle, N. Koumvakalis, M. Bass, “Laser induced bulk damage in SiO2 at 1.064, 0.532 and 0.355 µm,” in Laser Induced Damage in Optical Materials: 1983, H. E. Bennett, A. H. Guenther, D. Milam, B. E. Newman, eds., Natl. Bur. Stand. (U.S.) Spec. Publ. 688, 128–134 (1985).

L. D. Merkle, M. Bass, R. T. Swimm, “Multiple pulse laser-induced bulk damage in crystalline and fused quartz at 1.064 and 0.532 µm,” in Laser Induced Damage in Optical Materials: 1982, H. E. Bennett, A. H. Guenther, D. Milam, B. E. Newman, eds., Natl. Bur. Stand. (U.S.) Spec. Publ. 669, 50–58 (1985).

D. Kitriotis, L. D. Merkle, A. Dodson, “Multiple pulse damage studies of BK-7, KCl and SiO2 at 532 nm,” in Laser Induced Damage in Optical Materials: 1985,

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Figures (5)

Fig. 1
Fig. 1

Wavelength dependence of LIDT.

Fig. 2
Fig. 2

Transmission spectra of samples used in the present study. The thicknesses of the samples are 1 cm.

Fig. 3
Fig. 3

Transmission spectra of annealed OX irradiated with KrF and ArF lasers (100-mJ/cm2 pulse, 50 Hz, 104 shots). The sample was annealed at 1150 °C for 1 h.

Fig. 4
Fig. 4

Result of the Gaussian peak decomposition of the difference spectra of ArF- and KrF-excimer-laser-induced absorption spectra in the annealed sample of OX shown in Fig. 3.

Fig. 5
Fig. 5

Transmission spectra of ED-B before and after irradiation with a KrF laser (400-mJ/cm2 pulse, 100 Hz, 106 shots).

Tables (3)

Tables Icon

Table 1 Impurities of Samples Used in the Present Studya

Tables Icon

Table 2 LIDT of v-SiO2

Tables Icon

Table 3 Peak Positions and FWHM of the Absorption Component in Fig. 4

Equations (1)

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I th = 1.45 λ 0.43 ,

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