The optical properties and the surface morphologies of single-ion-beam sputtering (SIBS) and dual-ion-beam sputtering (DIBS) depositions of titanium oxide films are investigated and compared. In the DIBS process, the ion-assisted deposition by the voltage of a low ion beam ranged from 50 to 300 V at a 0% and 44% oxygen percentage. Cosputtering with materials of Si, SiO2 (fused silica), and Al is also utilized in SIBS to improve amorphous-structure film. For the low-absorption and surface-roughness film, the optimum deposition condition of DIBS and postdeposition baking temperature for SIBS and DIBS are essential to the process.
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