Abstract

Photon-induced property changes of sputter-deposited GeO2–SiO2 thin glass films were investigated. Irradiation with ArF laser pulses induced the changes in refractive index of -10% and volume of +30% in the film without ablation. A Bragg grating with a positive sinusoid wave pattern was printed upon the film by irradiation with ArF excimer laser pulses through a phase mask. The irradiated area could be quickly etched by a HF solution. The ratio of etching rate of irradiated area to unirradiated area was higher than 30. A Bragg grating with a surface relief pattern was successfully formed on the film by irradiation with excimer laser pulses followed by chemical etching. Diffraction efficiency of the gratings increased by 25 times with the etching.

© 1997 Optical Society of America

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  1. K. O. Hill, B. Malo, F. Bilodeau, D. C. Johnson, J. Albert, “Bragg gratings fabricated in monomode photosensitive optical fiber by UV exposure through a phase mask,” Appl. Phys. Lett. 62, 1035–1037 (1993).
    [CrossRef]
  2. B. Poumellec, P. Guenot, I. Riant, P. Sansonetti, P. Niay, P. Bernag, J. F. Bayon, “UV induced densification during Bragg grating inscription in Ge:SiO2 preforms,” Opt. Mater. 4, 441–449 (1995).
    [CrossRef]
  3. P. Cordier, J. C. Doukhan, E. Fertein, P. Bernage, P. Niay, J. F. Bayon, T. Georges, “TEM characterization of structural changes in glass associated to Bragg grating inscription in a germanosilicate optical fiber preform,” Opt. Commun. 111, 269–275 (1994).
    [CrossRef]
  4. P. St. Russell, D. P. Hand, “Photoinduced refractive-index changes in germanosilicate fibers,” Opt. Lett. 15, 102–104 (1990).
    [CrossRef]
  5. J. Nishii, K. Fukumi, H. Yamanaka, H. Hosono, H. Kawazoe, “Photochemical reactions in GeO2–SiO2 glasses induced by ultraviolet irradiation: comparison between Hg lamp and excimer laser,” Phys. Rev. B 52, 1661–1665 (1995).
    [CrossRef]
  6. J. Nishii, N. Kitamura, H. Yamanaka, H. Hosono, H. Kawazoe, “Ultraviolet-radiation-induced chemical reactions through one- and two-photon absorption processes in GeO2–SiO2 glasses,” Opt. Lett. 20, 1184–1186 (1995).
    [CrossRef] [PubMed]
  7. H. Hosono, H. Kawazoe, J. Nishii, “Defect formation in SiO2:GeO2 glasses by irradiation with excimer laser light,” Phys. Rev. B 53, R11,921–R11,923 (1996).
    [CrossRef]
  8. E. J. Friebele, D. L. Griscom, “Color centers in glass optical fiber waveguides,” Mater. Res. Soc. Symp. Proc. 61, 319–331 (1985).
    [CrossRef]
  9. H. Hosono, M. Mizuguchi, H. Kawazoe, J. Nishii, “Correlation between GeE′ centers and optical absorption bands in SiO2:GeO2 glasses,” Jpn. J. Appl. Phys. 35, L234–236 (1996).
    [CrossRef]
  10. K. D. Simmoms, G. I. Stegeman, B. G. Potter, J. H. Simmons, “Photosensitivity of solgel-derived germanosilicate planar waveguides,” Opt. Lett. 18, 25–27 (1993).
    [CrossRef]
  11. J. Albert, B. Malo, K. O. Hill, D. C. Johnson, J. L. Brebner, R. Leonelli, “Refractive-index changes in fused silica produced by heavy-ion implantation followed by photobleaching,” Opt. Lett. 17, 23–25 (1992).
    [CrossRef]
  12. J. Nishii, A. Chayahara, K. Fukumi, K. Fujii, H. Yamanaka, H. Hosono, H. Kawazoe, “Comparison of formation process of ultraviolet induced color centers in GeO2–SiO2 glass fiber preform and Ge-implanted SiO2,” Nucl. Instrum. Methods B 116, 150–153 (1996).
    [CrossRef]
  13. J. Nishii, H. Yamanaka, H. Hosono, H. Kawazoe, “Characteristics of 5-eV absorption band in sputter deposited GeO2–SiO2 thin glass films,” Appl. Phys. Lett. 64, 282–284 (1994).
    [CrossRef]
  14. J. Nishii, H. Yamanaka, H. Hosono, H. Kawazoe, “Preparation of Bragg gratings in sputter-deposited GeO2–SiO2 glasses by excimer laser irradiation,” Opt. Lett. 21, 1360–1362 (1996).
    [CrossRef] [PubMed]
  15. H. Hosono, Y. Abe, D. L. Kinser, R. A. Weeks, K. Muta, H. Kawazoe, “Nature and origin of the 5-eV band in SiO2:GeO2 glasses,” Phys. Rev. B 46, 11,445–11,451 (1992).
    [CrossRef]
  16. R. A. B. Devine, “Ion implantation- and radiation-induced structural modifications in amorphous SiO2,” J. Non-Cryst. Solids 152, 50–58 (1993).
    [CrossRef]
  17. N. Kitamura, Y. Toguchi, S. Funo, H. Yamashita, M. Kinoshita, “Refractive index of densified silica glass,” J. Non-Cryst. Solids 159, 241–245 (1993).
    [CrossRef]

1996 (4)

H. Hosono, H. Kawazoe, J. Nishii, “Defect formation in SiO2:GeO2 glasses by irradiation with excimer laser light,” Phys. Rev. B 53, R11,921–R11,923 (1996).
[CrossRef]

H. Hosono, M. Mizuguchi, H. Kawazoe, J. Nishii, “Correlation between GeE′ centers and optical absorption bands in SiO2:GeO2 glasses,” Jpn. J. Appl. Phys. 35, L234–236 (1996).
[CrossRef]

J. Nishii, A. Chayahara, K. Fukumi, K. Fujii, H. Yamanaka, H. Hosono, H. Kawazoe, “Comparison of formation process of ultraviolet induced color centers in GeO2–SiO2 glass fiber preform and Ge-implanted SiO2,” Nucl. Instrum. Methods B 116, 150–153 (1996).
[CrossRef]

J. Nishii, H. Yamanaka, H. Hosono, H. Kawazoe, “Preparation of Bragg gratings in sputter-deposited GeO2–SiO2 glasses by excimer laser irradiation,” Opt. Lett. 21, 1360–1362 (1996).
[CrossRef] [PubMed]

1995 (3)

B. Poumellec, P. Guenot, I. Riant, P. Sansonetti, P. Niay, P. Bernag, J. F. Bayon, “UV induced densification during Bragg grating inscription in Ge:SiO2 preforms,” Opt. Mater. 4, 441–449 (1995).
[CrossRef]

J. Nishii, K. Fukumi, H. Yamanaka, H. Hosono, H. Kawazoe, “Photochemical reactions in GeO2–SiO2 glasses induced by ultraviolet irradiation: comparison between Hg lamp and excimer laser,” Phys. Rev. B 52, 1661–1665 (1995).
[CrossRef]

J. Nishii, N. Kitamura, H. Yamanaka, H. Hosono, H. Kawazoe, “Ultraviolet-radiation-induced chemical reactions through one- and two-photon absorption processes in GeO2–SiO2 glasses,” Opt. Lett. 20, 1184–1186 (1995).
[CrossRef] [PubMed]

1994 (2)

P. Cordier, J. C. Doukhan, E. Fertein, P. Bernage, P. Niay, J. F. Bayon, T. Georges, “TEM characterization of structural changes in glass associated to Bragg grating inscription in a germanosilicate optical fiber preform,” Opt. Commun. 111, 269–275 (1994).
[CrossRef]

J. Nishii, H. Yamanaka, H. Hosono, H. Kawazoe, “Characteristics of 5-eV absorption band in sputter deposited GeO2–SiO2 thin glass films,” Appl. Phys. Lett. 64, 282–284 (1994).
[CrossRef]

1993 (4)

R. A. B. Devine, “Ion implantation- and radiation-induced structural modifications in amorphous SiO2,” J. Non-Cryst. Solids 152, 50–58 (1993).
[CrossRef]

N. Kitamura, Y. Toguchi, S. Funo, H. Yamashita, M. Kinoshita, “Refractive index of densified silica glass,” J. Non-Cryst. Solids 159, 241–245 (1993).
[CrossRef]

K. O. Hill, B. Malo, F. Bilodeau, D. C. Johnson, J. Albert, “Bragg gratings fabricated in monomode photosensitive optical fiber by UV exposure through a phase mask,” Appl. Phys. Lett. 62, 1035–1037 (1993).
[CrossRef]

K. D. Simmoms, G. I. Stegeman, B. G. Potter, J. H. Simmons, “Photosensitivity of solgel-derived germanosilicate planar waveguides,” Opt. Lett. 18, 25–27 (1993).
[CrossRef]

1992 (2)

J. Albert, B. Malo, K. O. Hill, D. C. Johnson, J. L. Brebner, R. Leonelli, “Refractive-index changes in fused silica produced by heavy-ion implantation followed by photobleaching,” Opt. Lett. 17, 23–25 (1992).
[CrossRef]

H. Hosono, Y. Abe, D. L. Kinser, R. A. Weeks, K. Muta, H. Kawazoe, “Nature and origin of the 5-eV band in SiO2:GeO2 glasses,” Phys. Rev. B 46, 11,445–11,451 (1992).
[CrossRef]

1990 (1)

1985 (1)

E. J. Friebele, D. L. Griscom, “Color centers in glass optical fiber waveguides,” Mater. Res. Soc. Symp. Proc. 61, 319–331 (1985).
[CrossRef]

Abe, Y.

H. Hosono, Y. Abe, D. L. Kinser, R. A. Weeks, K. Muta, H. Kawazoe, “Nature and origin of the 5-eV band in SiO2:GeO2 glasses,” Phys. Rev. B 46, 11,445–11,451 (1992).
[CrossRef]

Albert, J.

K. O. Hill, B. Malo, F. Bilodeau, D. C. Johnson, J. Albert, “Bragg gratings fabricated in monomode photosensitive optical fiber by UV exposure through a phase mask,” Appl. Phys. Lett. 62, 1035–1037 (1993).
[CrossRef]

J. Albert, B. Malo, K. O. Hill, D. C. Johnson, J. L. Brebner, R. Leonelli, “Refractive-index changes in fused silica produced by heavy-ion implantation followed by photobleaching,” Opt. Lett. 17, 23–25 (1992).
[CrossRef]

Bayon, J. F.

B. Poumellec, P. Guenot, I. Riant, P. Sansonetti, P. Niay, P. Bernag, J. F. Bayon, “UV induced densification during Bragg grating inscription in Ge:SiO2 preforms,” Opt. Mater. 4, 441–449 (1995).
[CrossRef]

P. Cordier, J. C. Doukhan, E. Fertein, P. Bernage, P. Niay, J. F. Bayon, T. Georges, “TEM characterization of structural changes in glass associated to Bragg grating inscription in a germanosilicate optical fiber preform,” Opt. Commun. 111, 269–275 (1994).
[CrossRef]

Bernag, P.

B. Poumellec, P. Guenot, I. Riant, P. Sansonetti, P. Niay, P. Bernag, J. F. Bayon, “UV induced densification during Bragg grating inscription in Ge:SiO2 preforms,” Opt. Mater. 4, 441–449 (1995).
[CrossRef]

Bernage, P.

P. Cordier, J. C. Doukhan, E. Fertein, P. Bernage, P. Niay, J. F. Bayon, T. Georges, “TEM characterization of structural changes in glass associated to Bragg grating inscription in a germanosilicate optical fiber preform,” Opt. Commun. 111, 269–275 (1994).
[CrossRef]

Bilodeau, F.

K. O. Hill, B. Malo, F. Bilodeau, D. C. Johnson, J. Albert, “Bragg gratings fabricated in monomode photosensitive optical fiber by UV exposure through a phase mask,” Appl. Phys. Lett. 62, 1035–1037 (1993).
[CrossRef]

Brebner, J. L.

J. Albert, B. Malo, K. O. Hill, D. C. Johnson, J. L. Brebner, R. Leonelli, “Refractive-index changes in fused silica produced by heavy-ion implantation followed by photobleaching,” Opt. Lett. 17, 23–25 (1992).
[CrossRef]

Chayahara, A.

J. Nishii, A. Chayahara, K. Fukumi, K. Fujii, H. Yamanaka, H. Hosono, H. Kawazoe, “Comparison of formation process of ultraviolet induced color centers in GeO2–SiO2 glass fiber preform and Ge-implanted SiO2,” Nucl. Instrum. Methods B 116, 150–153 (1996).
[CrossRef]

Cordier, P.

P. Cordier, J. C. Doukhan, E. Fertein, P. Bernage, P. Niay, J. F. Bayon, T. Georges, “TEM characterization of structural changes in glass associated to Bragg grating inscription in a germanosilicate optical fiber preform,” Opt. Commun. 111, 269–275 (1994).
[CrossRef]

Devine, R. A. B.

R. A. B. Devine, “Ion implantation- and radiation-induced structural modifications in amorphous SiO2,” J. Non-Cryst. Solids 152, 50–58 (1993).
[CrossRef]

Doukhan, J. C.

P. Cordier, J. C. Doukhan, E. Fertein, P. Bernage, P. Niay, J. F. Bayon, T. Georges, “TEM characterization of structural changes in glass associated to Bragg grating inscription in a germanosilicate optical fiber preform,” Opt. Commun. 111, 269–275 (1994).
[CrossRef]

Fertein, E.

P. Cordier, J. C. Doukhan, E. Fertein, P. Bernage, P. Niay, J. F. Bayon, T. Georges, “TEM characterization of structural changes in glass associated to Bragg grating inscription in a germanosilicate optical fiber preform,” Opt. Commun. 111, 269–275 (1994).
[CrossRef]

Friebele, E. J.

E. J. Friebele, D. L. Griscom, “Color centers in glass optical fiber waveguides,” Mater. Res. Soc. Symp. Proc. 61, 319–331 (1985).
[CrossRef]

Fujii, K.

J. Nishii, A. Chayahara, K. Fukumi, K. Fujii, H. Yamanaka, H. Hosono, H. Kawazoe, “Comparison of formation process of ultraviolet induced color centers in GeO2–SiO2 glass fiber preform and Ge-implanted SiO2,” Nucl. Instrum. Methods B 116, 150–153 (1996).
[CrossRef]

Fukumi, K.

J. Nishii, A. Chayahara, K. Fukumi, K. Fujii, H. Yamanaka, H. Hosono, H. Kawazoe, “Comparison of formation process of ultraviolet induced color centers in GeO2–SiO2 glass fiber preform and Ge-implanted SiO2,” Nucl. Instrum. Methods B 116, 150–153 (1996).
[CrossRef]

J. Nishii, K. Fukumi, H. Yamanaka, H. Hosono, H. Kawazoe, “Photochemical reactions in GeO2–SiO2 glasses induced by ultraviolet irradiation: comparison between Hg lamp and excimer laser,” Phys. Rev. B 52, 1661–1665 (1995).
[CrossRef]

Funo, S.

N. Kitamura, Y. Toguchi, S. Funo, H. Yamashita, M. Kinoshita, “Refractive index of densified silica glass,” J. Non-Cryst. Solids 159, 241–245 (1993).
[CrossRef]

Georges, T.

P. Cordier, J. C. Doukhan, E. Fertein, P. Bernage, P. Niay, J. F. Bayon, T. Georges, “TEM characterization of structural changes in glass associated to Bragg grating inscription in a germanosilicate optical fiber preform,” Opt. Commun. 111, 269–275 (1994).
[CrossRef]

Griscom, D. L.

E. J. Friebele, D. L. Griscom, “Color centers in glass optical fiber waveguides,” Mater. Res. Soc. Symp. Proc. 61, 319–331 (1985).
[CrossRef]

Guenot, P.

B. Poumellec, P. Guenot, I. Riant, P. Sansonetti, P. Niay, P. Bernag, J. F. Bayon, “UV induced densification during Bragg grating inscription in Ge:SiO2 preforms,” Opt. Mater. 4, 441–449 (1995).
[CrossRef]

Hand, D. P.

Hill, K. O.

K. O. Hill, B. Malo, F. Bilodeau, D. C. Johnson, J. Albert, “Bragg gratings fabricated in monomode photosensitive optical fiber by UV exposure through a phase mask,” Appl. Phys. Lett. 62, 1035–1037 (1993).
[CrossRef]

J. Albert, B. Malo, K. O. Hill, D. C. Johnson, J. L. Brebner, R. Leonelli, “Refractive-index changes in fused silica produced by heavy-ion implantation followed by photobleaching,” Opt. Lett. 17, 23–25 (1992).
[CrossRef]

Hosono, H.

J. Nishii, A. Chayahara, K. Fukumi, K. Fujii, H. Yamanaka, H. Hosono, H. Kawazoe, “Comparison of formation process of ultraviolet induced color centers in GeO2–SiO2 glass fiber preform and Ge-implanted SiO2,” Nucl. Instrum. Methods B 116, 150–153 (1996).
[CrossRef]

H. Hosono, M. Mizuguchi, H. Kawazoe, J. Nishii, “Correlation between GeE′ centers and optical absorption bands in SiO2:GeO2 glasses,” Jpn. J. Appl. Phys. 35, L234–236 (1996).
[CrossRef]

H. Hosono, H. Kawazoe, J. Nishii, “Defect formation in SiO2:GeO2 glasses by irradiation with excimer laser light,” Phys. Rev. B 53, R11,921–R11,923 (1996).
[CrossRef]

J. Nishii, H. Yamanaka, H. Hosono, H. Kawazoe, “Preparation of Bragg gratings in sputter-deposited GeO2–SiO2 glasses by excimer laser irradiation,” Opt. Lett. 21, 1360–1362 (1996).
[CrossRef] [PubMed]

J. Nishii, N. Kitamura, H. Yamanaka, H. Hosono, H. Kawazoe, “Ultraviolet-radiation-induced chemical reactions through one- and two-photon absorption processes in GeO2–SiO2 glasses,” Opt. Lett. 20, 1184–1186 (1995).
[CrossRef] [PubMed]

J. Nishii, K. Fukumi, H. Yamanaka, H. Hosono, H. Kawazoe, “Photochemical reactions in GeO2–SiO2 glasses induced by ultraviolet irradiation: comparison between Hg lamp and excimer laser,” Phys. Rev. B 52, 1661–1665 (1995).
[CrossRef]

J. Nishii, H. Yamanaka, H. Hosono, H. Kawazoe, “Characteristics of 5-eV absorption band in sputter deposited GeO2–SiO2 thin glass films,” Appl. Phys. Lett. 64, 282–284 (1994).
[CrossRef]

H. Hosono, Y. Abe, D. L. Kinser, R. A. Weeks, K. Muta, H. Kawazoe, “Nature and origin of the 5-eV band in SiO2:GeO2 glasses,” Phys. Rev. B 46, 11,445–11,451 (1992).
[CrossRef]

Johnson, D. C.

K. O. Hill, B. Malo, F. Bilodeau, D. C. Johnson, J. Albert, “Bragg gratings fabricated in monomode photosensitive optical fiber by UV exposure through a phase mask,” Appl. Phys. Lett. 62, 1035–1037 (1993).
[CrossRef]

J. Albert, B. Malo, K. O. Hill, D. C. Johnson, J. L. Brebner, R. Leonelli, “Refractive-index changes in fused silica produced by heavy-ion implantation followed by photobleaching,” Opt. Lett. 17, 23–25 (1992).
[CrossRef]

Kawazoe, H.

J. Nishii, A. Chayahara, K. Fukumi, K. Fujii, H. Yamanaka, H. Hosono, H. Kawazoe, “Comparison of formation process of ultraviolet induced color centers in GeO2–SiO2 glass fiber preform and Ge-implanted SiO2,” Nucl. Instrum. Methods B 116, 150–153 (1996).
[CrossRef]

H. Hosono, H. Kawazoe, J. Nishii, “Defect formation in SiO2:GeO2 glasses by irradiation with excimer laser light,” Phys. Rev. B 53, R11,921–R11,923 (1996).
[CrossRef]

H. Hosono, M. Mizuguchi, H. Kawazoe, J. Nishii, “Correlation between GeE′ centers and optical absorption bands in SiO2:GeO2 glasses,” Jpn. J. Appl. Phys. 35, L234–236 (1996).
[CrossRef]

J. Nishii, H. Yamanaka, H. Hosono, H. Kawazoe, “Preparation of Bragg gratings in sputter-deposited GeO2–SiO2 glasses by excimer laser irradiation,” Opt. Lett. 21, 1360–1362 (1996).
[CrossRef] [PubMed]

J. Nishii, N. Kitamura, H. Yamanaka, H. Hosono, H. Kawazoe, “Ultraviolet-radiation-induced chemical reactions through one- and two-photon absorption processes in GeO2–SiO2 glasses,” Opt. Lett. 20, 1184–1186 (1995).
[CrossRef] [PubMed]

J. Nishii, K. Fukumi, H. Yamanaka, H. Hosono, H. Kawazoe, “Photochemical reactions in GeO2–SiO2 glasses induced by ultraviolet irradiation: comparison between Hg lamp and excimer laser,” Phys. Rev. B 52, 1661–1665 (1995).
[CrossRef]

J. Nishii, H. Yamanaka, H. Hosono, H. Kawazoe, “Characteristics of 5-eV absorption band in sputter deposited GeO2–SiO2 thin glass films,” Appl. Phys. Lett. 64, 282–284 (1994).
[CrossRef]

H. Hosono, Y. Abe, D. L. Kinser, R. A. Weeks, K. Muta, H. Kawazoe, “Nature and origin of the 5-eV band in SiO2:GeO2 glasses,” Phys. Rev. B 46, 11,445–11,451 (1992).
[CrossRef]

Kinoshita, M.

N. Kitamura, Y. Toguchi, S. Funo, H. Yamashita, M. Kinoshita, “Refractive index of densified silica glass,” J. Non-Cryst. Solids 159, 241–245 (1993).
[CrossRef]

Kinser, D. L.

H. Hosono, Y. Abe, D. L. Kinser, R. A. Weeks, K. Muta, H. Kawazoe, “Nature and origin of the 5-eV band in SiO2:GeO2 glasses,” Phys. Rev. B 46, 11,445–11,451 (1992).
[CrossRef]

Kitamura, N.

Leonelli, R.

J. Albert, B. Malo, K. O. Hill, D. C. Johnson, J. L. Brebner, R. Leonelli, “Refractive-index changes in fused silica produced by heavy-ion implantation followed by photobleaching,” Opt. Lett. 17, 23–25 (1992).
[CrossRef]

Malo, B.

K. O. Hill, B. Malo, F. Bilodeau, D. C. Johnson, J. Albert, “Bragg gratings fabricated in monomode photosensitive optical fiber by UV exposure through a phase mask,” Appl. Phys. Lett. 62, 1035–1037 (1993).
[CrossRef]

J. Albert, B. Malo, K. O. Hill, D. C. Johnson, J. L. Brebner, R. Leonelli, “Refractive-index changes in fused silica produced by heavy-ion implantation followed by photobleaching,” Opt. Lett. 17, 23–25 (1992).
[CrossRef]

Mizuguchi, M.

H. Hosono, M. Mizuguchi, H. Kawazoe, J. Nishii, “Correlation between GeE′ centers and optical absorption bands in SiO2:GeO2 glasses,” Jpn. J. Appl. Phys. 35, L234–236 (1996).
[CrossRef]

Muta, K.

H. Hosono, Y. Abe, D. L. Kinser, R. A. Weeks, K. Muta, H. Kawazoe, “Nature and origin of the 5-eV band in SiO2:GeO2 glasses,” Phys. Rev. B 46, 11,445–11,451 (1992).
[CrossRef]

Niay, P.

B. Poumellec, P. Guenot, I. Riant, P. Sansonetti, P. Niay, P. Bernag, J. F. Bayon, “UV induced densification during Bragg grating inscription in Ge:SiO2 preforms,” Opt. Mater. 4, 441–449 (1995).
[CrossRef]

P. Cordier, J. C. Doukhan, E. Fertein, P. Bernage, P. Niay, J. F. Bayon, T. Georges, “TEM characterization of structural changes in glass associated to Bragg grating inscription in a germanosilicate optical fiber preform,” Opt. Commun. 111, 269–275 (1994).
[CrossRef]

Nishii, J.

H. Hosono, M. Mizuguchi, H. Kawazoe, J. Nishii, “Correlation between GeE′ centers and optical absorption bands in SiO2:GeO2 glasses,” Jpn. J. Appl. Phys. 35, L234–236 (1996).
[CrossRef]

H. Hosono, H. Kawazoe, J. Nishii, “Defect formation in SiO2:GeO2 glasses by irradiation with excimer laser light,” Phys. Rev. B 53, R11,921–R11,923 (1996).
[CrossRef]

J. Nishii, A. Chayahara, K. Fukumi, K. Fujii, H. Yamanaka, H. Hosono, H. Kawazoe, “Comparison of formation process of ultraviolet induced color centers in GeO2–SiO2 glass fiber preform and Ge-implanted SiO2,” Nucl. Instrum. Methods B 116, 150–153 (1996).
[CrossRef]

J. Nishii, H. Yamanaka, H. Hosono, H. Kawazoe, “Preparation of Bragg gratings in sputter-deposited GeO2–SiO2 glasses by excimer laser irradiation,” Opt. Lett. 21, 1360–1362 (1996).
[CrossRef] [PubMed]

J. Nishii, N. Kitamura, H. Yamanaka, H. Hosono, H. Kawazoe, “Ultraviolet-radiation-induced chemical reactions through one- and two-photon absorption processes in GeO2–SiO2 glasses,” Opt. Lett. 20, 1184–1186 (1995).
[CrossRef] [PubMed]

J. Nishii, K. Fukumi, H. Yamanaka, H. Hosono, H. Kawazoe, “Photochemical reactions in GeO2–SiO2 glasses induced by ultraviolet irradiation: comparison between Hg lamp and excimer laser,” Phys. Rev. B 52, 1661–1665 (1995).
[CrossRef]

J. Nishii, H. Yamanaka, H. Hosono, H. Kawazoe, “Characteristics of 5-eV absorption band in sputter deposited GeO2–SiO2 thin glass films,” Appl. Phys. Lett. 64, 282–284 (1994).
[CrossRef]

Potter, B. G.

Poumellec, B.

B. Poumellec, P. Guenot, I. Riant, P. Sansonetti, P. Niay, P. Bernag, J. F. Bayon, “UV induced densification during Bragg grating inscription in Ge:SiO2 preforms,” Opt. Mater. 4, 441–449 (1995).
[CrossRef]

Riant, I.

B. Poumellec, P. Guenot, I. Riant, P. Sansonetti, P. Niay, P. Bernag, J. F. Bayon, “UV induced densification during Bragg grating inscription in Ge:SiO2 preforms,” Opt. Mater. 4, 441–449 (1995).
[CrossRef]

Russell, P. St.

Sansonetti, P.

B. Poumellec, P. Guenot, I. Riant, P. Sansonetti, P. Niay, P. Bernag, J. F. Bayon, “UV induced densification during Bragg grating inscription in Ge:SiO2 preforms,” Opt. Mater. 4, 441–449 (1995).
[CrossRef]

Simmoms, K. D.

Simmons, J. H.

Stegeman, G. I.

Toguchi, Y.

N. Kitamura, Y. Toguchi, S. Funo, H. Yamashita, M. Kinoshita, “Refractive index of densified silica glass,” J. Non-Cryst. Solids 159, 241–245 (1993).
[CrossRef]

Weeks, R. A.

H. Hosono, Y. Abe, D. L. Kinser, R. A. Weeks, K. Muta, H. Kawazoe, “Nature and origin of the 5-eV band in SiO2:GeO2 glasses,” Phys. Rev. B 46, 11,445–11,451 (1992).
[CrossRef]

Yamanaka, H.

J. Nishii, A. Chayahara, K. Fukumi, K. Fujii, H. Yamanaka, H. Hosono, H. Kawazoe, “Comparison of formation process of ultraviolet induced color centers in GeO2–SiO2 glass fiber preform and Ge-implanted SiO2,” Nucl. Instrum. Methods B 116, 150–153 (1996).
[CrossRef]

J. Nishii, H. Yamanaka, H. Hosono, H. Kawazoe, “Preparation of Bragg gratings in sputter-deposited GeO2–SiO2 glasses by excimer laser irradiation,” Opt. Lett. 21, 1360–1362 (1996).
[CrossRef] [PubMed]

J. Nishii, N. Kitamura, H. Yamanaka, H. Hosono, H. Kawazoe, “Ultraviolet-radiation-induced chemical reactions through one- and two-photon absorption processes in GeO2–SiO2 glasses,” Opt. Lett. 20, 1184–1186 (1995).
[CrossRef] [PubMed]

J. Nishii, K. Fukumi, H. Yamanaka, H. Hosono, H. Kawazoe, “Photochemical reactions in GeO2–SiO2 glasses induced by ultraviolet irradiation: comparison between Hg lamp and excimer laser,” Phys. Rev. B 52, 1661–1665 (1995).
[CrossRef]

J. Nishii, H. Yamanaka, H. Hosono, H. Kawazoe, “Characteristics of 5-eV absorption band in sputter deposited GeO2–SiO2 thin glass films,” Appl. Phys. Lett. 64, 282–284 (1994).
[CrossRef]

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[CrossRef]

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[CrossRef]

J. Nishii, H. Yamanaka, H. Hosono, H. Kawazoe, “Characteristics of 5-eV absorption band in sputter deposited GeO2–SiO2 thin glass films,” Appl. Phys. Lett. 64, 282–284 (1994).
[CrossRef]

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[CrossRef]

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[CrossRef]

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[CrossRef]

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[CrossRef]

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[CrossRef]

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[CrossRef]

Opt. Lett. (5)

Opt. Mater. (1)

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[CrossRef]

Phys. Rev. B (3)

J. Nishii, K. Fukumi, H. Yamanaka, H. Hosono, H. Kawazoe, “Photochemical reactions in GeO2–SiO2 glasses induced by ultraviolet irradiation: comparison between Hg lamp and excimer laser,” Phys. Rev. B 52, 1661–1665 (1995).
[CrossRef]

H. Hosono, H. Kawazoe, J. Nishii, “Defect formation in SiO2:GeO2 glasses by irradiation with excimer laser light,” Phys. Rev. B 53, R11,921–R11,923 (1996).
[CrossRef]

H. Hosono, Y. Abe, D. L. Kinser, R. A. Weeks, K. Muta, H. Kawazoe, “Nature and origin of the 5-eV band in SiO2:GeO2 glasses,” Phys. Rev. B 46, 11,445–11,451 (1992).
[CrossRef]

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Figures (5)

Fig. 1
Fig. 1

Relationship between the power density of ArF laser pulses and the changes in refractive index at 633 nm and thickness of 46 GeO2–54 SiO2 thin glass films. We used a total of 200 irradiated pulses.

Fig. 2
Fig. 2

Scanning electron microscope images of the surface of 46 GeO2–54 SiO2 thin glass film irradiated with ten shots of ArF laser pulses (30 mJ/cm2): (a) before and (b) after etching.

Fig. 3
Fig. 3

Changes in refractive index and thickness of the laser irradiated area (200 shots of ArF laser pulses of 40 mJ/cm2) and unirradiated area of 46 GeO2–54 SiO2 thin glass film versus etching time.

Fig. 4
Fig. 4

Relationship between the etching time and the diffracted power of a He–Ne laser beam (633 nm) from the 46 GeO2–54 SiO2 thin film grating. The grating was formed by irradiation with 200 shots of ArF laser pulses of 40 mJ/cm2 through a phase mask with 1067-nm pitch.

Fig. 5
Fig. 5

Infrared absorption spectra of 46 GeO2–54 SiO2 thin glass films: (a) as deposited, (b) irradiated with 200 shots of ArF laser pulses (40 mJ/cm2), (c) and (d) after etching for 20 and 40 s, respectively.

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